公开(公告)号：US08238641B2

公开(公告)日：2012-08-07

申请号：US12213590

申请日：2008-06-20

Applicant: Kazuhisa Shibata ,  Hiroyuki Ishigaki

Inventor： Kazuhisa Shibata ,  Hiroyuki Ishigaki

IPC: G06K9/00 ,  G01J3/42 ,  G01N21/47 ,  G01B11/30

CPC classification number: G01N21/8806 ,  G01N21/55 ,  G01N21/57 ,  G01N2201/0635

Abstract: There is provided a method of evaluating quantitatively surface properties such as cleanness and quality of the surface of a work that has been evaluated in the past by visual appearance inspection. A determined pattern 14 is made from plural concentric circles arranged at a center of an object lens in a taking picture device 12. A front edge of a probe is in contact with the surface of a work by the probe 10 that is provided at a middle portion of a cylindrical case 11 in a vertical direction so that the surface of the work and the determined pattern face each other. The determined pattern is illuminated by light of a light source so that a reflected image of the determined pattern is projected onto the surface of the work. A picture of the reflected image is taken by the taking picture device. The resulted image data includes standard deviation of brightness distribution of the resulted image data positioned on radius lines extending in all directions to outside from a center of the ring pattern image. A relative value between the resulted standard deviation and the standard deviation of the amplitude of the brightness distribution of the image data on a plurality of lines of the criteria mirror surface is determined as the mirror index. The image clarity of the surface of the work is evaluated from the mirror index of the plurality of lines.

Abstract translation: 提供了一种定量评估过去通过视觉外观检查评估的工作表面的清洁度和质量的定量表征性质的方法。 确定的图案14由布置在拍摄装置12中的物镜的中心处的多个同心圆制成。探针的前边缘通过设置在中间的探针10与工件的表面接触 圆柱形壳体11的垂直方向的一部分，使得工件的表面和确定的图案彼此面对。 所确定的图案由光源的光照亮，使得所确定的图案的反射图像投影到作品的表面上。 拍摄装置拍摄反射图像的图像。 所得到的图像数据包括位于在从环形图案图像的中心向所有方向延伸到外部的半径线上的所得到的图像数据的亮度分布的标准偏差。 确定所得到的标准偏差与标准镜面的多行上的图像数据的亮度分布的幅度的标准偏差之间的相对值作为镜像索引。 根据多行的镜像索引来评估作品表面的图像清晰度。

公开(公告)号：US20120069344A1

公开(公告)日：2012-03-22

申请号：US13146550

申请日：2010-01-28

Applicant: Zhaowei Liu

Inventor： Zhaowei Liu

IPC: G01B9/02

CPC classification number: G02B21/16 ,  G01B9/04 ,  G01B11/2441 ,  G01N21/6458 ,  G01N21/648 ,  G01N2201/0635 ,  G01N2201/0675 ,  G02B5/008 ,  G02B27/60

Abstract: Disclosed are systems, apparatus, methods and devices, including a method that includes generating two or more sequential surface plasmon interference patterns, at least one of the two or more sequential surface plasmon interference patterns being different from another of the two or more sequential surface plasmon interference patterns, and capturing respective images of a specimen resulting from the interference patterns. Also disclosed is a method that includes generating two or more sequential optical interference patterns, at least one of the two or more sequential optical interference patterns being different from another of the interference patterns, and removing from each of the generated interference patterns, using a beam stopper, a corresponding zero-order diffraction light component included in the respective generated patterns to obtain resultant corresponding two or more sequential optical interference patterns, directed at a specimen, with missing respective zero-order light components.

Abstract translation: 公开了一种系统，装置，方法和装置，包括一种方法，包括产生两个或多个顺序表面等离子体激元干涉图案，两个或更多个顺序表面等离子体激元干涉图案中的至少一个不同于两个或多个顺序表面等离子体激元 干涉图案，并捕获由干涉图案产生的样本的各个图像。 还公开了一种方法，其包括生成两个或多个顺序光学干涉图案，所述两个或更多个顺序光学干涉图案中的至少一个与干涉图案中的另一个不同，以及使用光束从每个所生成的干涉图案中移除 阻挡器，包括在各个生成的图案中的对应的零级衍射光分量，以获得指向样本的相应的两个或更多个顺序的光学干涉图案，缺少相应的零级光分量。

公开(公告)号：US20110286000A1

公开(公告)日：2011-11-24

申请号：US13122062

申请日：2009-10-01

Applicant: Xin-Hua Hu ,  Cheng Chen

Inventor： Xin-Hua Hu ,  Cheng Chen

IPC: G01N21/55

CPC classification number: G01N21/4738 ,  G01N21/4785 ,  G01N2021/4709 ,  G01N2021/4735 ,  G01N2201/0635

Abstract: Methods and systems for optically characterizing a turbid sample are provided. A structured light beam is impinged on the sample. The sample includes an embedded region. A reflected light image of the structured light beam is detected from the sample. A measured reflectance image of the structured light beam for the sample is determined based on the reflected light image and a reflectance standard. The following parameters are determined: absorption coefficients ÿa, scattering coefficient ÿs and anisotropy factor g of the sample from the reflectance image. A size parameter of the embedded region is estimated based on the absorption coefficients ÿa, scattering coefficient ÿs and/or anisotropy factor g of the sample from the measured reflectance image.

Abstract translation: 提供了用于光学表征混浊样品的方法和系统。 结构化光束撞击样品。 样本包括一个嵌入区域。 从样品中检测结构化光束的反射光图像。 基于反射光图像和反射率标准确定样品的结构化光束的测量反射率图像。 确定以下参数：来自反射图像的样品的吸收系数μa，散射系数μs和各向异性因子g。 基于来自测量的反射率图像的样品的吸收系数μa，散射系数μs和/或各向异性因子g来估计嵌入区域的尺寸参数。

公开(公告)号：US08056700B2

公开(公告)日：2011-11-15

申请号：US12099774

申请日：2008-04-08

Applicant: Arye Malek ,  Joshua J. Hackney ,  Franz W. Ulrich

Inventor： Arye Malek ,  Joshua J. Hackney ,  Franz W. Ulrich

IPC: B07C5/02

CPC classification number: B07C5/3422 ,  B07C5/3404 ,  G01N21/8901 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/845 ,  G01N2201/0635 ,  G02B13/22 ,  Y10S209/922

Abstract: Manufacturing lines include inspection systems for monitoring the quality of parts produced. Manufacturing lines for making semiconductor devices generally inspect each fabricated part. The information obtained is used to fix manufacturing problems in the semiconductor fab plant. A machine-vision system for inspecting devices includes a flipper mechanism. After being inspected at a first station, a tray-transfer device moves the tray from the first inspection station to a flipper mechanism. The flipper mechanism includes two jaws, a mover, and a rotator. The flipper mechanism turns the devices over and places the devices in a second tray so that another surface of the device can be inspected. A second tray-transfer device moves the second tray from the flipper to a second inspection station. The mover of the flipper mechanism removes the tray from the first inspection surface and places a tray at the second inspection surface.

Abstract translation: 生产线包括用于监测生产零件质量的检测系统。 用于制造半导体器件的制造线通常检查每个制造的部件。 获得的信息用于解决半导体晶圆厂的制造问题。 用于检查装置的机器视觉系统包括翻转机构。 在第一站检查后，托盘传送装置将托盘从第一检查站移动到翻动机构。 导板机构包括两个钳口，一个动子和一个旋转器。 导板机构将装置转过来并将装置放置在第二托盘中，使得可以检查装置的另一个表面。 第二托盘传送装置将第二托盘从托板移动到第二检查台。 导板机构的移动器从第一检查表面移除托盘，并将托盘放置在第二检查表面。

公开(公告)号：US20110228068A1

公开(公告)日：2011-09-22

申请号：US12728110

申请日：2010-03-19

Applicant: Jong Buhm Park

Inventor： Jong Buhm Park

IPC: H04N7/18

CPC classification number: G01N21/6458 ,  G01N15/1434 ,  G01N2015/145 ,  G01N2201/0635

Abstract: A synthetic aperture optics (SAO) imaging method minimizes the number of selective excitation patterns used to illuminate the imaging target, based on the objects' physical characteristics corresponding to spatial frequency content from the illuminated target and/or one or more parameters of the optical imaging system used for SAO. With the minimized number of selective excitation patterns, the time required to perform SAO is reduced dramatically, thereby allowing SAO to be used with DNA sequencing applications that require massive parallelization for cost reduction and high throughput. In addition, an SAO apparatus optimized to perform the SAO method is provided. The SAO apparatus includes a plurality of interference pattern generation modules that can be arranged in a half-ring shape.

Abstract translation: 基于对象对应于来自被照射的目标的空间频率内容的物理特性和/或光学成像的一个或多个参数，合成孔径光学（SAO）成像方法最小化用于照射成像目标的选择性激发图案的数量 系统用于SAO。 使用最小数量的选择性激发模式，执行SAO所需的时间显着降低，从而允许SAO与需要大规模并行化以降低成本和高吞吐量的DNA测序应用一起使用。 另外，提供了优化以执行SAO方法的SAO装置。 SAO装置包括可以布置成半环形状的多个干涉图案生成模块。

公开(公告)号：US20100296104A1

公开(公告)日：2010-11-25

申请号：US12469893

申请日：2009-05-21

Applicant: Gil Abramovich ,  Kevin George Harding ,  Ralph Gerald Isaacs ,  Guiju Song ,  Joseph Benjamin Ross ,  Jianming Zheng

Inventor： Gil Abramovich ,  Kevin George Harding ,  Ralph Gerald Isaacs ,  Guiju Song ,  Joseph Benjamin Ross ,  Jianming Zheng

IPC: G01B11/24

CPC classification number: G01B11/2527 ,  G01N21/8806 ,  G01N2201/0635 ,  G02B13/22

Abstract: An inspection system is provided. The inspection system comprises a light source, a grating, a phase shifting unit, an imager, and a processor. The light source is configured to generate light. The grating is in a path of the generated light and is configured to produce a grating image after the light passes through the grating. The phase shifting unit is configured to form and reflect a plurality of phase shifted patterns of the grating image onto an object surface to form a plurality of projected phase shifting patterns. The imager is configured to obtain image data of the projected phase shifted patterns. The processor is configured to reconstruct the object surface from the image data. An inspection method and a phase shifting projector are also presented.

Abstract translation: 提供检查系统。 检查系统包括光源，光栅，相移单元，成像器和处理器。 光源被配置为产生光。 光栅处于所生成的光的路径中，并且被配置为在光通过光栅之后产生光栅图像。 相移单元被配置为将光栅图像的多个相移图案形成并反射到物体表面上以形成多个投影相移图案。 成像器被配置为获得投影的相移图案的图像数据。 处理器被配置为从图像数据重建物体表面。 还提出了检测方法和移相投影机。

公开(公告)号：US20100075327A1

公开(公告)日：2010-03-25

申请号：US12561221

申请日：2009-09-16

Applicant: Kenneth Mark Maxham ,  Jon Sorenson ,  John Eid ,  Patrick Marks ,  Kevin Travers ,  Donald Gray ,  Robin Emig ,  Mark Chaisson ,  Benjamin Flusberg

Inventor： Kenneth Mark Maxham ,  Jon Sorenson ,  John Eid ,  Patrick Marks ,  Kevin Travers ,  Donald Gray ,  Robin Emig ,  Mark Chaisson ,  Benjamin Flusberg

IPC: C12Q1/68 ,  G01N21/76 ,  G01N33/00

CPC classification number: G01N21/6452 ,  C12Q1/6869 ,  G01N21/6428 ,  G01N2201/0635 ,  Y10T436/143333 ,  C12Q2525/119 ,  C12Q2521/125 ,  C12Q2537/149

Abstract: Methods, devices, and systems for performing intermittent detection during analytical reactions are provided. Such methods facilitate collection of reaction data from disparate reaction times. Further, such methods are useful for reducing photo-induced damage of one or more reactants in an illuminated analytical reaction at a given reaction time. In preferred embodiments, the reaction mixture is subjected to at least one illuminated and non-illuminated period and allowed to proceed such that the time in which the reaction mixture is illuminated is less than a photo-induced damage threshold period.

Abstract translation: 提供了在分析反应期间执行间歇检测的方法，装置和系统。 这种方法有助于从不同的反应时间收集反应数据。 此外，这样的方法可用于在给定的反应时间下降低照明分析反应中一种或多种反应物的光诱导损伤。 在优选的实施方案中，将反应混合物经受至少一个照明和非照射期，并允许进行，使得反应混合物被照射的时间小于光诱导的损伤阈值期。

公开(公告)号：US20090316959A1

公开(公告)日：2009-12-24

申请号：US12213590

申请日：2008-06-20

Applicant: Kazuhisa Shibata ,  Hiroyuki Ishigaki

Inventor： Kazuhisa Shibata ,  Hiroyuki Ishigaki

IPC: G06K9/00

CPC classification number: G01N21/8806 ,  G01N21/55 ,  G01N21/57 ,  G01N2201/0635

Abstract: There is provided a method of evaluating quantitatively surface properties such as cleanness and quality of the surface of a work that has been evaluated in the past by visual appearance inspection. A determined pattern 14 is made from plural concentric circles arranged at a center of an object lens in a taking picture device 12. A front edge of a probe is in contact with the surface of a work by the probe 10 that is provided at a middle portion of a cylindrical case 11 in a vertical direction so that the surface of the work and the determined pattern face each other. The determined pattern is illuminated by light of a light source so that a reflected image of the determined pattern is projected onto the surface of the work. A picture of the reflected image is taken by the taking picture device. The resulted image data includes standard deviation of brightness distribution of the resulted image data positioned on radius lines extending in all directions to outside from a center of the ring pattern image. A relative value between the resulted standard deviation and the standard deviation of the amplitude of the brightness distribution of the image data on a plurality of lines of the criteria mirror surface is determined as the mirror index. The image clarity of the surface of the work is evaluated from the mirror index of the plurality of lines.

Abstract translation: 提供了一种定量评估过去通过视觉外观检查评估的工作表面的清洁度和质量的定量表征性质的方法。 确定的图案14由布置在拍摄装置12中的物镜的中心处的多个同心圆制成。探针的前边缘通过设置在中间的探针10与工件的表面接触 圆柱形壳体11的垂直方向的一部分，使得工件的表面和确定的图案彼此面对。 所确定的图案由光源的光照亮，使得所确定的图案的反射图像投影到作品的表面上。 拍摄装置拍摄反射图像的图像。 所得到的图像数据包括位于在从环形图案图像的中心向所有方向延伸到外部的半径线上的所得到的图像数据的亮度分布的标准偏差。 确定所得到的标准偏差与标准镜面的多行上的图像数据的亮度分布的幅度的标准偏差之间的相对值作为镜像索引。 根据多行的镜像索引来评估作品表面的图像清晰度。

公开(公告)号：US07498164B2

公开(公告)日：2009-03-03

申请号：US10456196

申请日：2003-06-06

Applicant: Mark F. Oldham ,  Eugene F. Young

Inventor： Mark F. Oldham ,  Eugene F. Young

IPC: C12M1/34 ,  C12M3/00 ,  G01N21/64 ,  G01J1/58 ,  F21V9/16

CPC classification number: G01N21/6486 ,  B01L3/5085 ,  B01L7/52 ,  C12Q2545/101 ,  G01N21/274 ,  G01N21/6428 ,  G01N21/645 ,  G01N21/6452 ,  G01N2021/6419 ,  G01N2021/6421 ,  G01N2021/6439 ,  G01N2021/6441 ,  G01N2021/6463 ,  G01N2021/6482 ,  G01N2201/0245 ,  G01N2201/0628 ,  G01N2201/0635 ,  Y10S435/808 ,  Y10S435/809

Abstract: An instrument is provided that can monitor nucleic acid sequence amplifications reactions, for example, PCR amplification of DNA and DNA fragments. The instrument includes a multi-notch filter disposed along one or both of an excitation beam path and an emission beam path. Methods are also provided for monitoring nucleic acid sequence amplifications using an instrument that includes a multi-notch filter disposed along a beam path.

Abstract translation: 提供了可以监测核酸序列扩增反应的仪器，例如DNA和DNA片段的PCR扩增。 仪器包括沿激发光束路径和发射光束路径中的一个或两个设置的多陷波滤波器。 还提供了使用包括沿着光束路径设置的多陷波滤波器的仪器来监测核酸序列扩增的方法。

公开(公告)号：US20090009767A1

公开(公告)日：2009-01-08

申请号：US12217410

申请日：2008-07-03

Applicant: Steven J. Boege ,  Howard G. King ,  Eugene F. Young ,  Johannes P. Sluis ,  Mark F. Oldham

Inventor： Steven J. Boege ,  Howard G. King ,  Eugene F. Young ,  Johannes P. Sluis ,  Mark F. Oldham

IPC: G01N21/64

CPC classification number: G01N21/6486 ,  B01L7/52 ,  C12Q2545/101 ,  G01N21/6452 ,  G01N2021/6419 ,  G01N2021/6421 ,  G01N2021/6439 ,  G01N2021/6441 ,  G01N2021/6463 ,  G01N2021/6482 ,  G01N2201/0245 ,  G01N2201/0628 ,  G01N2201/0635 ,  Y10S435/808 ,  Y10S435/809

Abstract: An optical instrument is provided for simultaneously illuminating two or more spaced-apart reaction regions with excitation beams generated by a light source. The light source can include an area light array of light emitting diodes, one or more solid state lasers, one or more micro-wire lasers, or a combination thereof. According to various embodiments, a Fresnel lens can be disposed along a beam bath between the light source and the reaction regions. Methods of analysis using the optical instrument are also provided.

Abstract translation: 提供了一种光学仪器，用于同时用由光源产生的激发光束照射两个或更多个间隔开的反应区域。 光源可以包括发光二极管的区域光阵列，一个或多个固态激光器，一个或多个微线激光器，或其组合。 根据各种实施例，菲涅耳透镜可以沿着光源和反应区域之间的光束槽设置。 还提供了使用光学仪器的分析方法。