公开(公告)号：US20030077020A1

公开(公告)日：2003-04-24

申请号：US09794773

申请日：2001-02-27

Inventor： Robert E. Stewart ,  Agop H. Cherbettchain ,  Samuel Fersht ,  David B. Hall

IPC: G02B006/35

CPC classification number: G02B26/0866 ,  B81B3/0024 ,  B81B2201/045 ,  B81B2203/0109 ,  B81B2203/051 ,  B81B2203/053 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/358 ,  G02B6/3584 ,  G02B26/0841 ,  H01H2001/0042

Abstract: A bi-stable micro-actuator is formed from a first and a second silicon-on-insulator wafer fused together at an electrical contact layer. A cover has a V-groove that defines an optical axis. A collimated optical signal source in the V-groove couples an optical signal to an optical port in the V-groove. A mirror surface on the transfer member blocks or reflects the optical signal. The transfer member has a point of support at the first and second end. The central portion of the transfer member carrying a mirror is displaced from the compressive axis with transfer member in a bowed first or second state. The mirror blocks or reflects the optical axis. An expandable structure applies a compressive force between the first and second point of support along the compressive axis to hold the transfer member in a bowed first state or a bowed second state. A control signal is applied to a heating element in the expandable structure to reduce the compressive force transferring the transfer member to a second state. The central portion of the transfer member moves from a bowed first state past the compressive axis into a bowed second state to clear the optical axis.

Abstract translation: 双稳态微致动器由在电接触层处熔合在一起的第一和第二绝缘体上硅晶片形成。 盖具有限定光轴的V形槽。 V沟槽中的准直光信号源将光信号耦合到V沟槽中的光端口。 转印部件上的镜面阻挡或反射光信号。 传送构件在第一和第二端具有支撑点。 携带反射镜的转印部件的中心部分处于压缩轴线，转印部件处于弯曲的第一或第二状态。 镜子阻挡或反射光轴。 可膨胀结构沿着压缩轴线在第一和第二支撑点之间施加压缩力，以将转移构件保持在弯曲的第一状态或弓形的第二状态。 控制信号被施加到可膨胀结构中的加热元件，以减小将转印构件传递到第二状态的压缩力。 转印构件的中心部分从弯曲的第一状态经过压缩轴线移动到弯曲的第二状态以清除光轴。

公开(公告)号：US20030048036A1

公开(公告)日：2003-03-13

申请号：US09944395

申请日：2001-08-31

Inventor： Mark Alan Lemkin

IPC: G21H001/00

CPC classification number: G02B26/0841 ,  B81B3/0037 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/053

Abstract: A comb-finger microstructure is disclosed for use in optical switching arrays, beam steering, optical displays, disk drive head actuators and the like. The microstructure is capable of producing linear or nonlinear actuation forces, perpendicular to the surface of a chip in which the microactuator is formed, as a function of applied voltages. The microstructure further provides the ability to detect the position of a movable structure with respect to a stationary or anchored structure.

Abstract translation: 公开了用于光学开关阵列，光束转向，光学显示器，盘驱动头致动器等的梳状微结构。 微结构能够产生垂直于其中形成有微致动器的芯片的表面的线性或非线性致动力，作为施加的电压的函数。 微结构进一步提供了检测可移动结构相对于静止或锚定结构的位置的能力。

公开(公告)号：US06531947B1

公开(公告)日：2003-03-11

申请号：US09659798

申请日：2000-09-12

Applicant: Billy L. Weaver ,  Douglas P. Goetz ,  Kathy L. Hagen ,  Mike E. Hamerly ,  Robert G. Smith ,  Silva K. Theiss

Inventor： Billy L. Weaver ,  Douglas P. Goetz ,  Kathy L. Hagen ,  Mike E. Hamerly ,  Robert G. Smith ,  Silva K. Theiss

IPC: H01H6104

CPC classification number: B81B3/0024 ,  B81B3/0037 ,  B81B2201/031 ,  B81B2201/045 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/058 ,  B82Y15/00 ,  H01H2061/006 ,  H01H2061/008

Abstract: A micrometer sized, single-stage, vertical thermal actuator with controlled bending capable of repeatable and rapid movement of a micrometer-sized optical device off the surface of a substrate. The vertical thermal actuator is constructed on a surface of a substrate. At least one hot arm has a first end anchored to the surface and a free end located above the surface. A cold arm has a first end anchored to the surface and a free end. The cold arm is located above the hot arm relative to the surface. The cold arm is adapted to provide controlled bending near the first end thereof. A member mechanically and electrically couples the free ends of the hot and cold arms such that the actuator bends generally at the flexure so that the member moves away from the substrate when current is applied to at least the hot arm.

公开(公告)号：US20020159170A1

公开(公告)日：2002-10-31

申请号：US09950710

申请日：2001-09-13

Applicant: Fujitsu Limited

Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

IPC: G02B005/08

CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

公开(公告)号：US20020135855A1

公开(公告)日：2002-09-26

申请号：US09917490

申请日：2001-07-28

Inventor： Michael J. Daneman ,  Behrang Behin ,  Satinderpall S. Pannu

IPC: G02B026/00

CPC classification number: G02B6/3556 ,  B81B3/0021 ,  B81B2201/033 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  B81B2207/07 ,  B81C1/00214 ,  G02B6/3512 ,  G02B6/3518 ,  G02B6/3542 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/357 ,  G02B6/3584 ,  G02B26/0833 ,  G02B26/085 ,  G02B26/0858 ,  G02B26/0866 ,  H02N1/008

Abstract: A beam steering module and switching system. The steering module is composed of a NnullM array of single axis mirrors able to rotate about a particular axis (X-axis), a second NnullM array of single axis mirrors able to rotate about an axis orthogonal to that of the first NnullM array of mirrors (Y-axis), and a relay lens designed to image the first mirror array onto the second mirror array such that the beam angle may be controlled in both the X and Y-axis by adjusting the angle of the appropriate mirrors in the X and Y mirror arrays. Two steering modules may be combined to form a switching system. With two such steering modules, it is possible to completely determine, at the plane of the output fiber array, the position and angle of an optical beam emerging from any of the input fibers.

Abstract translation: 光束转向模块和开关系统。 转向模块由能够围绕特定轴线（X轴）旋转的单轴镜的N×M阵列组成，能够围绕与第一N×M阵列阵列的轴正交的轴线旋转的单轴镜的第二N×M阵列 （Y轴）和设计成将第一反射镜阵列成像到第二反射镜阵列上的中继透镜，使得可以通过调整X中的适当反射镜的角度来控制X和Y轴两者的光束角度，以及 Y镜阵列。 可以组合两个转向模块以形成切换系统。 使用两个这样的转向模块，可以在输出光纤阵列的平面处完全确定从任何输入光纤出射的光束的位置和角度。

公开(公告)号：US20020121502A1

公开(公告)日：2002-09-05

申请号：US09954864

申请日：2001-09-17

Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

IPC: C23F001/00

CPC classification number: B81B3/00 ,  B81B2201/045 ,  B81C1/00476 ,  B81C1/00531 ,  B81C1/00595 ,  B81C99/0025 ,  B81C2201/0138 ,  B82Y30/00 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/32135

Abstract: The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. Also, the etch selectivity can be improved by doping the sacrificial material.

Abstract translation: 通过使用作为惰性气体氟化物或卤素氟化物的蚀刻剂气体在诸如微机电结构的微结构中蚀刻牺牲硅部分，相对于微结构的其它部分，通过减慢蚀刻速率对硅部分具有更大的选择性 。 蚀刻速率优选为30um / hr或更小，并且可以为3um / hr或甚至更小。 通过向蚀刻剂气体中添加非蚀刻剂气体添加剂也提高了选择性。 优选地，具有低于分子氮的摩尔平均配方重量的非蚀刻剂气态添加剂相对于具有较高配方重量的气体添加剂提供了显着的优点，通过在更短的时间段内完成蚀刻，同时仍然实现相同的改进 选择性。 通过精确确定去除步骤的终点的能力也增强了蚀刻工艺。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。 此外，通过掺杂牺牲材料可以改善蚀刻选择性。

公开(公告)号：US20020104990A1

公开(公告)日：2002-08-08

申请号：US10025978

申请日：2001-12-19

Inventor： Dana Richard DeReus ,  Shawn Jay Cunningham ,  Arthur S. Morris

IPC: H01L029/06

CPC classification number: G02B26/0866 ,  B81B3/0051 ,  B81B7/0067 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2201/047 ,  B81B2203/051 ,  B81C1/00182 ,  B81C2201/019 ,  B81C2203/0109 ,  G02B6/3512 ,  G02B6/353 ,  G02B6/3548 ,  G02B6/356 ,  G02B6/3566 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3576 ,  G02B6/3578 ,  G02B6/3582 ,  G02B6/3584 ,  G02B26/0841 ,  G02B26/085 ,  G02B26/0858 ,  H01H2001/0052 ,  H01L2224/48091 ,  H01L2924/00014

Abstract: An across-wafer optical MEMS device includes a protective lid having across-wafer light-transmissive portions. The across-wafer optical MEMS device allows light to pass in a direction substantially parallel to a surface on which the optical MEMS device is mounted. The light-transmissive portions in the protective lid allow light to pass from an optical device located on one side of the optical MEMS device to a second device located on another side of the optical MEMS device. A plurality of optical MEMS devices can be located on the substrate and enclosed by the same lid without wafer-level encapsulation of each optical MEMS device.

Abstract translation: 跨晶圆光学MEMS器件包括具有跨晶片光透射部分的保护盖。 跨晶圆光学MEMS器件允许光在基本上平行于安装有光学MEMS器件的表面的方向上通过。 保护盖中的透光部分允许光从位于光学MEMS器件的一侧的光学器件通过到位于光学MEMS器件另一侧的第二器件。 多个光学MEMS器件可以位于基板上并由相同的盖子包围，而不需要每个光学MEMS器件的晶片级封装。

公开(公告)号：US20020084499A1

公开(公告)日：2002-07-04

申请号：US09843913

申请日：2001-04-27

Inventor： Hung-Yi Lin ,  Weileun Fang

IPC: H01L029/82 ,  H01L029/06

CPC classification number: B81B3/0037 ,  B81B2201/045 ,  B81B2203/0118 ,  B81B2203/053

Abstract: A micro-mechanical actuator is disclosed for actuating an object in a micro-electro-mechanical system. One end of the object is flexibly connected a substrate, and another end is flexibly connected to an auxiliary lever which is further connected to an actuating force generator. The auxiliary lever receives an actuating force generated from the actuating force generator to perform a levering operation about a fulcrum. The position of the fulcrum allows an portion of the auxiliary lever connected to the object has a shift larger than a shift of another portion of the auxiliary lever connected to the actuating force generator in response to the actuating force.

Abstract translation: 公开了一种用于致动微机电系统中的物体的微机械致动器。 物体的一端柔性地连接基板，另一端柔性地连接到辅助杠杆，辅助杠杆进一步连接到致动力发生器。 辅助杆接收从致动力发生器产生的致动力，以围绕支点执行杠杆操作。 支点的位置允许连接到物体的辅助杆的一部分响应于致动力而大于连接到致动力发生器的辅助杆的另一部分的移动。

公开(公告)号：US20020050744A1

公开(公告)日：2002-05-02

申请号：US09939422

申请日：2001-08-24

Inventor： Jonathan Bernstein ,  William P. Taylor ,  Gregory A. Kirkos ,  Marc Waelti

IPC: H02K041/00

CPC classification number: B81B3/0062 ,  B81B7/04 ,  B81B2201/045 ,  B81B2207/015 ,  B81C2203/0109 ,  B81C2203/035 ,  G02B26/0841 ,  G02B26/085

Abstract: An array of magnetically actuated MEMS mirror devices is provided having stationary magnets configured to provide strong magnetic fields in the plane of the mirrors without any magnets or magnet-system components in the plane of the mirrors. Also, a magnetically actuated mirror device is provided that includes an improved actuation coil configuration that provides greater torque during mirror actuation. In addition, a mechanism is provided to detect the angular deflection of a moveable mirror. Also, an improved process is provided for manufacturing MEMS mirror devices.

Abstract translation: 提供了一种磁致MEMS MEMS装置的阵列，其具有固定磁体，其被配置为在反射镜的平面中没有任何磁体或磁体系统部件，在镜的平面中提供强磁场。 而且，提供了一种磁致动反射镜装置，其包括改进的致动线圈构造，其在镜子致动期间提供更大的扭矩。 此外，提供了一种用于检测可移动镜的角度偏转的机构。 而且，提供了一种用于制造MEMS反射镜装置的改进方法。

公开(公告)号：US20020013054A1

公开(公告)日：2002-01-31

申请号：US09854288

申请日：2001-05-11

Inventor： Kenneth R. Farmer, II ,  Richard A. Brown ,  Vladimir Anatolyevich Aksyuk ,  David John Bishop ,  James Albert Walker

IPC: H01L021/302 ,  H01L021/461

CPC classification number: B81C1/00182 ,  B81B2201/045 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81C2201/019 ,  B81C2203/031 ,  G02B26/0841

Abstract: A simple method for making large, uniformly flat electrostatically actuated micro-mirrors for use as variable attenuators and switches in optical networking systems is disclosed. The devices are fabricated by fusion bonding ultra-thin, single crystal silicon wafers to micromachined silicon substrates, forming robust, non-deforming reflective surfaces which are simpler to fabricate than similar devices fabricated by conventional chemical vapor deposition of polycrystalline silicon, which require careful engineering to avoid stress-induced deformation.

Abstract translation: 公开了一种用于制造用于光网络系统中的可变衰减器和开关的大的，均匀平坦的静电致动微镜的简单方法。 这些器件通过将超薄单晶硅晶片熔合到微加工硅衬底上，形成坚固的非变形反射表面，其制造比通过常规化学气相沉积多晶硅制造的类似器件更为简单，这些器件需要仔细的工程 以避免应力引起的变形。