公开(公告)号：US20210008606A1

公开(公告)日：2021-01-14

申请号：US16924633

申请日：2020-07-09

Applicant: SEMES CO., LTD.

Inventor： Inhwang PARK ,  Gui Su PARK ,  Young Hun LEE ,  Youngseop CHOI ,  Seung Hoon OH ,  Jonghyeon WOO ,  Jin Mo JAE

IPC: B08B7/00 ,  H01L21/67

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

公开(公告)号：US10831103B2

公开(公告)日：2020-11-10

申请号：US16565661

申请日：2019-09-10

Applicant: SEMES CO., LTD.

Inventor： Kihoon Choi ,  Chan Young Heo ,  Do Heon Kim ,  Hae-Won Choi ,  Jaeseong Lee ,  Anton Koriakin ,  Ji Soo Jeong

IPC: G03D3/00 ,  G03F7/16 ,  G03F7/30 ,  G03F7/32 ,  B08B3/04

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

公开(公告)号：US20200346548A1

公开(公告)日：2020-11-05

申请号：US16933435

申请日：2020-07-20

Applicant: SEMES CO., LTD.

Inventor： Sung Hyun LEE ,  Jung Hun LEE ,  Dong Won SHIN

IPC: B60L13/04 ,  B61B13/12 ,  B61B13/08

Abstract: A transfer apparatus includes a guide rails extending parallel with each other, a vehicle configured to be movable along the guide rails, and a contactless driving module mounted to the vehicle. The contactless driving module includes a pair of running rails extending parallel with the guide rails and comprising a plurality of first permanent magnets and a plurality of second permanent magnets arranged in a extending direction, respectively, a driving wheel disposed between the running rails to be spaced apart from the running rails and comprising a plurality of third permanent magnets arranged in a circumferential direction, and a driving unit for rotating the driving wheel. Particularly, at least one of the third permanent magnets is disposed between the first permanent magnets and the second permanent magnets.

公开(公告)号：US20200346304A1

公开(公告)日：2020-11-05

申请号：US16862086

申请日：2020-04-29

Applicant: SEMES CO., LTD.

Inventor： Ohyeol KWON ,  Jun Keon AHN ,  Byungsun BANG

IPC: B23K26/362 ,  G02B27/14 ,  G02B27/09 ,  G02B26/10 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/402

Abstract: An apparatus includes a support unit supporting a substrate including a film, a laser generation unit that generates a laser beam to process the film, a beam splitter that splits the laser beam into a first laser beam travelling along a first path toward an upper edge of the substrate and a second laser beam travelling along a second path toward a lower edge of the substrate, a first beam shaping unit on the first path shaping the first laser beam, a second beam shaping unit on the second path shaping the second laser beam, a first beam scanning unit downstream of the first beam shaping unit that applies the first laser beam to the upper edge in the manner of scanning, and a second beam scanning unit downstream of the second beam shaping unit that applies the second laser beam to the lower edge in the manner of scanning.

公开(公告)号：US10825699B2

公开(公告)日：2020-11-03

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： Buyoung Jung ,  Jonghan Kim ,  Young Jin Jang ,  Jin Tack Yu ,  Youngjun Choi ,  Daehun Kim ,  Byungsun Bang ,  Jonghyeon Woo ,  Heehwan Kim ,  Cheol-Yong Shin ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

公开(公告)号：US20200335364A1

公开(公告)日：2020-10-22

申请号：US16916246

申请日：2020-06-30

Applicant: SEMES CO., LTD.

Inventor： YOUNG HUN LEE ,  EUI SANG LIM

IPC: H01L21/67 ,  B08B3/02

Abstract: Disclosed is a method for liquid-treating a substrate. In a method for treating a substrate, the substrate may be treated by supplying a treatment liquid onto the rotating substrate by using a first nozzle and a second nozzle, the first nozzle supplies the treatment liquid to an area including a central area on the substrate, and the second nozzle supplies the treatment liquid to a peripheral area of the substrate.

公开(公告)号：US10773281B2

公开(公告)日：2020-09-15

申请号：US15721188

申请日：2017-09-29

Applicant: SEMES CO., LTD.

Inventor： Ki-Moon Kang ,  Anton Koriakin ,  In Il Jung ,  Hae-Won Choi

IPC: C11D7/50 ,  B08B7/00 ,  H01L21/67 ,  C11D11/00 ,  H01L21/311 ,  C07C31/02

Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.

公开(公告)号：US10755899B2

公开(公告)日：2020-08-25

申请号：US14744427

申请日：2015-06-19

Applicant: SEMES CO., LTD.

Inventor： Yong Su Jang ,  Sun Rae Kim ,  Sung Hwan Hong

IPC: H01J37/32

Abstract: The inventive concepts provide a substrate treating apparatus. The apparatus includes a process chamber, a substrate support unit, a gas supply unit, a microwave applying unit, an antenna plate, a slow-wave plate, a dielectric plate, and an exhaust baffle, and a liner. The liner includes a body having a ring shape facing an inner sidewall of the process chamber, and a flange extending from the body into a wall portion of the process chamber. The flange prevents an electric field of a microwave and a process gas from being provided into a gap between the process chamber and the body. Thus, it is possible to inhibit particles from being generated by damage of the inner sidewall of the process chamber by plasma, and drift distances of the particles can be reduced to inhibit the particles from reaching a substrate.

公开(公告)号：US10751990B2

公开(公告)日：2020-08-25

申请号：US16503427

申请日：2019-07-03

Applicant: SEMES CO., LTD.

Inventor： Keun Hwa Yang ,  Soon Yong Jeong ,  Jung Wan Hong ,  Gon Kim

IPC: B41J2/045 ,  G01N21/31 ,  B41J2/14

Abstract: Disclosed is an apparatus for detecting liquid discharge characteristics according to an embodiment of the present invention, the apparatus including: a liquid supply unit supplying a liquid; a liquid guide unit including a flow path through which the liquid supplied from the liquid supply unit passes and a nozzle mounting portion communicating with the flow path and on which the nozzle is mounted and guiding the liquid supplied from the liquid supply unit to the nozzle mounted on the nozzle mounting portion; a lighting unit projecting light onto the liquid passing through the flow path inside the liquid guide unit; and a camera obtaining an image of the liquid discharged from the nozzle by being arranged toward the nozzle.

公开(公告)号：US10714352B2

公开(公告)日：2020-07-14

申请号：US15681347

申请日：2017-08-19

Applicant: SEMES CO., LTD.

Inventor： Min Jung Park ,  Jung Yul Lee ,  Hyun Hee Lee ,  Soo Hyun Cho

IPC: H01L21/302 ,  H01L21/027 ,  H01L21/67 ,  H01L21/687 ,  F26B5/04 ,  H01L21/02 ,  H01L21/311 ,  H01L21/683 ,  H01L21/60 ,  H01L21/306

Abstract: Disclosed are an apparatus and a method for treating a substrate. The method includes repeatedly rotating the substrate alternately at a first speed and at a second speed while the treatment liquid is supplied, and the second speed is higher than the first speed.