公开(公告)号：US20070268496A1

公开(公告)日：2007-11-22

申请号：US11803553

申请日：2007-05-15

申请人： Artur Boesser ,  Andreas Schaaf

发明人： Artur Boesser ,  Andreas Schaaf

IPC分类号： G01B11/02 ,  G01B11/00

CPC分类号： G01B9/02084 ,  G01B9/02007 ,  G01B2290/25 ,  G01B2290/60 ,  G01B2290/70 ,  G03F7/70775

摘要： A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector (34) via a measuring objective (21) having its optical axis (20) aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.

摘要翻译： 一种用于高精度测量衬底上至少一个结构的坐标的方法。 提供了在X / Y坐标方向上可移动的平台，其被放置在干涉光学测量系统中。 通过其光轴（20）在Z坐标方向上排列的测量物镜（21）将基板上的结构成像在至少一个检测器（34）上。 该结构用所谓的双扫描成像。 因此可以消除系统错误。

公开(公告)号：US07193699B2

公开(公告)日：2007-03-20

申请号：US10774520

申请日：2004-02-09

申请人： Detlef Michelsson

发明人： Detlef Michelsson

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： The invention is based on a method and an apparatus for scanning a semiconductor wafer (1), on-the-fly images of regions on the wafer being acquired using a camera (3). Upon a scan line changeover, a continuously curved displacement track is generated by at least partial superimposition of the relative motions between the wafer (1) and camera (3) in the direction of the scan lines and perpendicular thereto. As a result, time is saved and wafer throughput is increased.

摘要翻译： 本发明基于用于扫描半导体晶片（1）的方法和装置，使用相机（3）获取晶片上的区域的即时图像。 在扫描线切换时，通过晶片（1）和照相机（3）之间的相对运动在扫描线的方向上并与其垂直的至少部分叠加来产生连续弯曲的位移轨迹。 结果，节省了时间并增加了晶片吞吐量。

公开(公告)号：US20070052954A1

公开(公告)日：2007-03-08

申请号：US11463471

申请日：2006-08-09

申请人： Wolfgang Sulik ,  Michael Heiden

发明人： Wolfgang Sulik ,  Michael Heiden

IPC分类号： G01N21/88

CPC分类号： G01N21/9501

摘要： An apparatus for inspecting a surface of a wafer includes an illumination device for illuminating an imaging area of the wafer with at least one broad-band spectrum, and an optical imaging device with a detector for polychromatic imaging of the imaging area of the wafer based on the illumination, wherein the imaging device includes a filter arrangement for selecting a plurality of narrow-band spectra. In addition, a method for inspecting the surface of a wafer, includes the steps of leveling a plurality of narrow-band spectra to a common intensity range, illuminating an imaging area of the wafer with at least one broad-band spectrum, and imaging a plurality of narrow-band spectra from the imaging area based on the illumination.

摘要翻译： 一种用于检查晶片表面的装置包括用于利用至少一个宽带光谱照射晶片的成像区域的照明装置，以及具有用于晶片成像区域的多色成像检测器的光学成像装置，其基于 照明，其中所述成像装置包括用于选择多个窄带光谱的滤光器装置。 此外，用于检查晶片表面的方法包括以下步骤：将多个窄带光谱调平到公共强度范围，用至少一个宽带光谱照射晶片的成像区域，并对 基于照明的来自成像区域的多个窄带光谱。

公开(公告)号：US20060286811A1

公开(公告)日：2006-12-21

申请号：US11454740

申请日：2006-06-16

申请人： Michael Heiden ,  Erwin Thiel ,  Christof Krampe-Zadler

发明人： Michael Heiden ,  Erwin Thiel ,  Christof Krampe-Zadler

IPC分类号： H01L21/469

CPC分类号： G01N21/6456 ,  G01N21/9501 ,  G01N21/9503

摘要： The present invention relates to a method of optically imaging a wafer with a photoresist layer, wherein an imaging area on the surface of the wafer is illuminated with light and a fluorescence image is taken in the imaging area based on the fluorescent light irradiated due to the illumination by the excitation light.

摘要翻译： 本发明涉及一种利用光致抗蚀剂层对晶片进行光学成像的方法，其中用光照射晶片表面上的成像区域，并且基于由于该光刻胶照射的荧光而在成像区域中拍摄荧光图像 通过激发光照明。

公开(公告)号：US20060279743A1

公开(公告)日：2006-12-14

申请号：US11432949

申请日：2006-05-12

申请人： Hans-Artur Boesser ,  Klaus-Dieter Adam

发明人： Hans-Artur Boesser ,  Klaus-Dieter Adam

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01B9/0207 ,  G01B9/02002 ,  G01B9/02018 ,  G01B9/02021 ,  G01B2290/70

摘要： A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at least one interferometric correction means. An interferometric measuring means is operable with the laser light of a laser of at least one wavelength. Correction results can be generated with the interferometric correction means allowing conclusions to be drawn with respect to the actual wavelength of the laser light during a position determination of the positioning stage in order to take into account variations of the wavelength of the laser light, in particular due to ambient conditions, when evaluating the measuring results. The interferometric correction means is arranged proximate to the interferometric measuring means, and the proximity corresponds to a predeterminable portion of the maximum traversing path of the positioning stage.

摘要翻译： 一种测量装置，用于确定以可移动的方式在至少一个方向上布置有可预定的最大横向路径的定位台的相对位置。 测量装置包括至少一个干涉测量装置和至少一个干涉校正装置。 干涉测量装置可操作于具有至少一个波长的激光的激光。 可以用干涉校正装置产生校正结果，以便在定位台的位置确定期间相对于激光的实际波长得出结论，以便考虑到激光的波长的变化，特别是 由于环境条件，在评估测量结果时。 干涉校正装置设置在干涉测量装置附近，并且接近度对应于定位台的最大横移路径的可预定部分。

公开(公告)号：US20060279729A1

公开(公告)日：2006-12-14

申请号：US11409941

申请日：2006-04-24

申请人： Michael Heiden ,  Albert Kreh

发明人： Michael Heiden ,  Albert Kreh

IPC分类号： G01N21/88

CPC分类号： G01N21/95607

摘要： The present invention relates to a method of inspecting a wafer, wherein the wafer has a first area of periodically arranged SAWs and at least one second area of SAWs displaced with respect to the first area. The method comprises the steps of optically imaging the first area of the wafer by moving an imaging window in the period direction, displacing the imaging window relative to the wafer, optically imaging the second area of the wafer by moving the displaced imaging window in the period direction, and evaluating the image by comparing partial images.

摘要翻译： 本发明涉及一种检查晶片的方法，其中晶片具有周期性布置的SAW的第一区域和相对于第一区域移位的SAW的至少一个第二区域。 该方法包括以下步骤：通过在周期方向上移动成像窗口来对成像窗口的第一区域进行光学成像，使成像窗口相对于晶片移位，通过在周期内移动位移的成像窗口来对晶片的第二区域进行光学成像 方向，并通过比较部分图像来评估图像。

公开(公告)号：US20120320382A1

公开(公告)日：2012-12-20

申请号：US13571873

申请日：2012-08-10

申请人： Michael Heiden

发明人： Michael Heiden

IPC分类号： G01B11/03

CPC分类号： G01B9/02027 ,  G01B9/02012 ,  G01B9/02082 ,  G01B11/002 ,  G01B11/03 ,  G03F1/84 ,  G03F7/70616

摘要： A device for determining the position of a structure on an object in relation to a coordinate system is disclosed. The object is placed on a measuring table which is movable in one plane, wherein a block defines the plane. At least one optical arrangement is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement comprises an illumination apparatus for reflected light illumination and/or transmitted light illumination and at least one first or second optical element, wherein at least part of the at least one optical element extends into the space between the block and an optical system support. At least one encapsulation is provided, encapsulating at least one optical component of at least one optical arrangement and/or at least one optical element.

摘要翻译： 公开了一种用于确定相对于坐标系的物体上的结构的位置的装置。 物体被放置在可在一个平面中移动的测量台上，其中块限定平面。 为透射光照射和/或反射光照明提供至少一个光学装置。 光学装置包括用于反射光照射和/或透射光照明的照明装置和至少一个第一或第二光学元件，其中至少一个光学元件的至少一部分延伸到块与光学系统支撑件之间的空间中 。 提供至少一个封装，封装至少一个光学布置的至少一个光学部件和/或至少一个光学元件。

公开(公告)号：US08087799B2

公开(公告)日：2012-01-03

申请号：US12286253

申请日：2008-09-29

申请人： Kurt Hahn ,  Michael Hofmann ,  Christof Krampe-Zadler

发明人： Kurt Hahn ,  Michael Hofmann ,  Christof Krampe-Zadler

IPC分类号： F21V1/04

CPC分类号： G01N21/9503 ,  G01N21/8806 ,  G01N2201/0626 ,  G01N2201/0627 ,  G01N2201/0634

摘要： An illumination mean for the inspection of flat substrates is disclosed. The flat substrate includes an upper edge area, a lower edge area and a front area. The illumination means is formed as an annular segment and comprises an opening into which at least the edge area of the flat substrate extends. A plurality of light sources are arranged on an annular segment in a housing. Inside the housing, a reflective element is provided so that the light from the light sources does not impinge perpendicularly on the upper edge area, the lower edge area and the front area of the flat substrate.

摘要翻译： 公开了用于检查平板基板的照明平均值。 平面基板包括上边缘区域，下边缘区域和前部区域。 照明装置形成为环形部分，并且包括至少平坦基板的边缘区域延伸到的开口。 多个光源布置在壳体中的环形部分上。 在壳体内部，设置反射元件，使得来自光源的光线不会垂直地照射在平坦基板的上边缘区域，下边缘区域和前部区域上。

公开(公告)号：US08056434B2

公开(公告)日：2011-11-15

申请号：US12217891

申请日：2008-07-09

申请人： Tillman Ehrenberg

发明人： Tillman Ehrenberg

IPC分类号： G05G11/00

CPC分类号： G01B5/0002 ,  Y10T74/18568 ,  Y10T74/20354

摘要： An advancing means for a multi-coordinate measurement table including a drive unit having a friction rod and a motor for each coordinate axis (x, y). The motor contacts one side of the friction rod with its motor shaft and at least one press roller contacts the other side of the friction rod. At least one pressing means is provided biasing the press roller, the friction rod and the motor shaft against each other with a pressing force, whereby the motor shaft frictionally engages the friction rod and converts the rotational movement of the motor into a linear movement of the friction rod. A method for controlling such an advancing means is disclosed as well.

摘要翻译： 一种用于多坐标测量台的推进装置，包括具有用于每个坐标轴（x，y）的摩擦杆和马达的驱动单元。 马达与马达轴接触摩擦杆的一侧，至少有一个压力滚轮与摩擦杆的另一侧接触。 提供至少一个按压装置，以压力使压辊，摩擦杆和电动机轴彼此偏压，由此电动机轴摩擦地接合摩擦杆并将电动机的旋转运动转换成线性运动 摩擦杆 还公开了一种用于控制这种推进装置的方法。

公开(公告)号：US07939789B2

公开(公告)日：2011-05-10

申请号：US12228583

申请日：2008-08-14

申请人： Michael Heiden ,  Klaus Rinn ,  Andreas Schaaf

发明人： Michael Heiden ,  Klaus Rinn ,  Andreas Schaaf

IPC分类号： H01L27/00 ,  G01J1/44

CPC分类号： H04N1/40

摘要： A method for reproducibly determining object characteristics is disclosed. Herein an object is imaged onto a detector by means of an imaging optics and detected thereon. A correction function k is applied to a brightness measuring result N originally detected by a detector in such a way, that a corrected brightness measuring result N′ is proportional to a brightness I impinging on the detector.

摘要翻译： 公开了一种可再现地确定对象特性的方法。 这里通过成像光学元件将物体成像到检测器上并在其上检测。 校正函数k被施加到由检测器最初检测到的亮度测量结果N，校正的亮度测量结果N'与入射到检测器上的亮度I成比例。