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    Muscadine grape plant named 'Majesty'
    22.
    植物专利
    Muscadine grape plant named 'Majesty' 有权
    麝香葡萄植物“陛下”

    公开(公告)号：US20100242143P1

    公开(公告)日：2010-09-23

    申请号：US12082850

    申请日：2008-04-15

    申请人： Jiang Lu ,  Zhong-bo Ren ,  Xia Xu

    发明人： Jiang Lu ,  Zhong-bo Ren ,  Xia Xu

    IPC分类号： A01H5/00

    CPC分类号： A01H6/88 ,  A01H5/08

    摘要： A new and distinct cultivar of the muscadine grape plant, Vitis rotundifolia Michx., which has exceptionally good flavor, firm flesh texture with relatively thin skin, and a larger berry than the current grapes that are produced commercially. The vines of this cultivar are vigorous, productive and disease resistant.

    摘要翻译： 麝香葡萄植物Vitis rotundifolia Michx的新鲜而独特的品种，具有非常好的风味，坚实的肉质质地，皮肤相对薄，以及比目前商业生产的葡萄更大的浆果。 这种栽培品种的葡萄藤是有活力，有生产力和抗病性的。

    METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS
    26.
    发明申请
    METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS 审中-公开
    在原子层沉积过程中调节沉积速率的方法

    公开(公告)号：US20100062149A1

    公开(公告)日：2010-03-11

    申请号：US12465471

    申请日：2009-05-13

    申请人： Paul Ma ,  Joseph F. Aubuchon ,  Jiang Lu ,  Mei Chang

    发明人： Paul Ma ,  Joseph F. Aubuchon ,  Jiang Lu ,  Mei Chang

    IPC分类号： B05D5/12

    CPC分类号： H01L21/76841 ,  C23C16/45534 ,  C23C16/52

    摘要： Embodiments of the invention provide methods for depositing a material on a substrate within a processing chamber during a vapor deposition process, such as an atomic layer deposition (ALD) process. In one embodiment, a method is provided which includes sequentially exposing the substrate to a first precursor gas and at least a second precursor gas while depositing a material on the substrate during the ALD process, and continuously or periodically exposing the substrate to a treatment gas prior to and/or during the ALD process. The deposition rate of the material being deposited may be controlled by varying the amount of treatment gas exposed to the substrate. In one example, tantalum nitride is deposited on the substrate and the alkylamino metal precursor gas contains a tantalum precursor, such as pentakis(dimethylamino) tantalum (PDMAT), the second precursor gas contains a nitrogen precursor, such as ammonia, and the treatment gas contains dimethylamine (DMA).

    摘要翻译： 本发明的实施例提供了在诸如原子层沉积（ALD）工艺的气相沉积工艺期间将材料沉积在处理室内的衬底上的方法。 在一个实施例中，提供了一种方法，其包括在ALD工艺期间将衬底沉积到衬底上的同时将衬底依次暴露于第一前体气体和至少第二前体气体，并且连续地或周期地将衬底暴露于处理气体之前 到和/或在ALD过程期间。 可以通过改变暴露于衬底的处理气体的量来控制被沉积的材料的沉积速率。 在一个实例中，氮化钽沉积在衬底上，并且烷基氨基金属前体气体包含钽前体，例如五（二甲基氨基）钽（PDMAT）），第二前体气体含有氮前体如氨，并且处理气体 含有二甲胺（DMA）。

    COBALT DEPOSITION ON BARRIER SURFACES
    27.
    发明申请
    COBALT DEPOSITION ON BARRIER SURFACES 有权
    铜棒沉积在阻挡层表面上

    公开(公告)号：US20090053426A1

    公开(公告)日：2009-02-26

    申请号：US12201976

    申请日：2008-08-29

    申请人： JIANG LU ,  Hyoung-Chan Ha ,  Paul Ma ,  Seshadri Ganguli ,  Joseph F. Aubuchon ,  Sang Ho Yu ,  Murali K. Narasimhan

    发明人： JIANG LU ,  Hyoung-Chan Ha ,  Paul Ma ,  Seshadri Ganguli ,  Joseph F. Aubuchon ,  Sang Ho Yu ,  Murali K. Narasimhan

    IPC分类号： B05D5/12 ,  B05D3/06

    CPC分类号： H01L21/76871 ,  C23C16/16 ,  C23C16/18 ,  C23C16/42 ,  C23C16/56 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/28568 ,  H01L21/76846 ,  H01L21/76862 ,  H01L21/76864 ,  H01L21/76873

    摘要： Embodiments of the invention provide processes for depositing a cobalt layer on a barrier layer and subsequently depositing a conductive material, such as copper or a copper alloy, thereon. In one embodiment, a method for depositing materials on a substrate surface is provided which includes forming a barrier layer on a substrate, exposing the substrate to dicobalt hexacarbonyl butylacetylene (CCTBA) and hydrogen to form a cobalt layer on the barrier layer during a vapor deposition process (e.g., CVD or ALD), and depositing a conductive material over the cobalt layer. In some examples, the barrier layer and/or the cobalt layer may be exposed to a gas or a reagent during a treatment process, such as a thermal process, an in situ plasma process, or a remote plasma process.

    摘要翻译： 本发明的实施方案提供了在阻挡层上沉积钴层并随后在其上沉积诸如铜或铜合金的导电材料的方法。 在一个实施例中，提供了一种在衬底表面上沉积材料的方法，其包括在衬底上形成阻挡层，将衬底暴露于六羰基丁基乙炔二钴（CCTBA）和氢，以在气相沉积期间在阻挡层上形成钴层 工艺（例如，CVD或ALD），以及在钴层上沉积导电材料。 在一些实例中，阻挡层和/或钴层可以在诸如热处理，原位等离子体处理或远程等离子体处理的处理过程中暴露于气体或试剂。

    Method and system for enhancing classified ads
    30.
    发明申请
    Method and system for enhancing classified ads 审中-公开
    加强分类广告的方法和系统

    公开(公告)号：US20050289004A1

    公开(公告)日：2005-12-29

    申请号：US11120121

    申请日：2005-05-02

    申请人： Qiu-Jiang Lu

    发明人： Qiu-Jiang Lu

    IPC分类号： G06F17/00 ,  G06Q30/00

    CPC分类号： G06Q30/02 ,  G06Q30/0273

    摘要： The present invention provides a method and system for registering and enhancing a traditional paper-based classified ad. The ad is placed by an advertiser and received by a server system of a website. The server system receives ad information such as for-sale item description, accepted payment methods, and advertiser's contact phone number etc. The server system registers the ad, and assigns the ad a unique identifier. The server system then creates web addresses for the ad with a direct combination of the website's domain name and the ad identifier or the phone number. The server system provides the advertiser the web addresses for inclusion into a paper-based ad or for telling ad inquirers via phone. The server system then allows a reader of the paper-based ad to access the ad with the web addresses, and displays detailed ad information to the reader. The server system may also concurrently serve other advertisers for ad registering as well as other ad readers for ad detail viewing.

    摘要翻译： 本发明提供了一种用于登记和增强传统纸张分类广告的方法和系统。 广告由广告客户放置，并由网站的服务器系统接收。 服务器系统接收诸如待售物品描述，接受的付款方式和广告商的联系电话号码等广告信息。服务器系统注册广告，并为广告分配唯一的标识符。 服务器系统然后直接组合网站的域名和广告标识符或电话号码来创建广告的网址。 服务器系统为广告客户提供包含在基于纸张的广告中的网址或通过电话告诉广告查询者。 然后，服务器系统允许纸质广告的读者通过网址访问广告，并向读者显示详细的广告信息。 服务器系统还可以同时为其他广告客户进行广告注册以及其他广告阅读器进行广告细节查看。