Method for tuning a deposition rate during an atomic layer deposition process
    1.
    发明授权
    Method for tuning a deposition rate during an atomic layer deposition process 有权
    在原子层沉积过程中调整沉积速率的方法

    公开(公告)号:US09418890B2

    公开(公告)日:2016-08-16

    申请号:US14279260

    申请日:2014-05-15

    摘要: Embodiments of the invention provide methods for depositing a material on a substrate within a processing chamber during a vapor deposition process, such as an atomic layer deposition (ALD) process. In one embodiment, a method is provided which includes sequentially exposing the substrate to a first precursor gas and at least a second precursor gas while depositing a material on the substrate during the ALD process, and continuously or periodically exposing the substrate to a treatment gas prior to and/or during the ALD process. The deposition rate of the material being deposited may be controlled by varying the amount of treatment gas exposed to the substrate. In one example, tantalum nitride is deposited on the substrate and the alkylamino metal precursor gas contains a tantalum precursor, such as pentakis(dimethylamino) tantalum (PDMAT), the second precursor gas contains a nitrogen precursor, such as ammonia, and the treatment gas contains dimethylamine (DMA).

    摘要翻译: 本发明的实施例提供了在诸如原子层沉积(ALD)工艺的气相沉积工艺期间将材料沉积在处理室内的衬底上的方法。 在一个实施例中,提供了一种方法,其包括在ALD工艺期间将衬底沉积到衬底上的同时将衬底依次暴露于第一前体气体和至少第二前体气体,并且连续地或周期地将衬底暴露于处理气体之前 到和/或在ALD过程期间。 可以通过改变暴露于衬底的处理气体的量来控制被沉积的材料的沉积速率。 在一个实例中,氮化钽沉积在衬底上,并且烷基氨基金属前体气体包含钽前体,例如五(二甲基氨基)钽(PDMAT)),第二前体气体含有氮前体如氨,并且处理气体 含有二甲胺(DMA)。

    Hemangio colony forming cells and non-engrafting hemangio cells
    2.
    发明授权
    Hemangio colony forming cells and non-engrafting hemangio cells 有权
    血管瘤集落形成细胞和非移植血管瘤细胞

    公开(公告)号:US09410123B2

    公开(公告)日:2016-08-09

    申请号:US12991096

    申请日:2009-05-06

    IPC分类号: C12N5/00 C12N5/0789

    摘要: Methods of generating and expanding human hemangio-colony forming cells and non-engrafting hemangio cells in vitro and methods of expanding and using such cells are disclosed. The methods permit the production of large numbers of hemangio-colony forming cells, non-engrafting hemangio cells as well as derivative cells, such as hematopoietic and endothelial cells. The cells obtained by the methods disclosed may be used for a variety of research, clinical, and therapeutic applications. Human non-engrafting hemangio cells are a novel progenitor cell population that is related to but distinct from the hemangioblast and human hemangio-colony forming cells. The invention also provides compositions, preparations, and solutions comprising hemangio-colony forming cells, non-engrafting hemangio cells or cells differentiated therefrom. The compositions, preparations, and solutions include cryopreserved preparations and substantially purified preparations, as well as mixed compositions formulated in combination with related hemangioblast progenitor cell types that can engraft into the bone marrow.

    摘要翻译: 公开了在体外产生和扩大人血管瘤集落形成细胞和非移植血管瘤细胞的方法以及扩增和使用这些细胞的方法。 该方法允许生产大量的血管瘤集落形成细胞,非移植血管瘤细胞以及衍生细胞,如造血细胞和内皮细胞。 通过所公开的方法获得的细胞可用于各种研究,临床和治疗应用。 人类非移植血管瘤细胞是与成血管细胞和人类血管瘤集落形成细胞相关但不同的新型祖细胞群。 本发明还提供包含血管瘤集落形成细胞,非移植血管瘤细胞或与其分化的细胞的组合物,制剂和溶液。 组合物,制剂和溶液包括冷冻保存的制剂和基本纯化的制剂,以及与可以移入骨髓的相关成血管细胞祖细胞类型组合配制的混合组合物。

    METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS
    4.
    发明申请
    METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS 有权
    在原子层沉积过程中调节沉积速率的方法

    公开(公告)号:US20140248772A1

    公开(公告)日:2014-09-04

    申请号:US14279260

    申请日:2014-05-15

    IPC分类号: H01L21/768

    摘要: Embodiments of the invention provide methods for depositing a material on a substrate within a processing chamber during a vapor deposition process, such as an atomic layer deposition (ALD) process. In one embodiment, a method is provided which includes sequentially exposing the substrate to a first precursor gas and at least a second precursor gas while depositing a material on the substrate during the ALD process, and continuously or periodically exposing the substrate to a treatment gas prior to and/or during the ALD process. The deposition rate of the material being deposited may be controlled by varying the amount of treatment gas exposed to the substrate. In one example, tantalum nitride is deposited on the substrate and the alkylamino metal precursor gas contains a tantalum precursor, such as pentakis(dimethylamino) tantalum (PDMAT), the second precursor gas contains a nitrogen precursor, such as ammonia, and the treatment gas contains dimethylamine (DMA).

    摘要翻译: 本发明的实施例提供了在诸如原子层沉积(ALD)工艺的气相沉积工艺期间将材料沉积在处理室内的衬底上的方法。 在一个实施例中,提供了一种方法,其包括在ALD工艺期间将衬底沉积到衬底上的同时将衬底依次暴露于第一前体气体和至少第二前体气体,并且连续地或周期地将衬底暴露于处理气体之前 到和/或在ALD过程期间。 可以通过改变暴露于衬底的处理气体的量来控制被沉积的材料的沉积速率。 在一个实例中,氮化钽沉积在衬底上,并且烷基氨基金属前体气体包含钽前体,例如五(二甲氨基)钽(PDMAT)),第二前体气体含有氮前体如氨,并且处理气体 含有二甲胺(DMA)。

    Evaporative air cooler
    7.
    发明授权
    Evaporative air cooler 失效
    蒸发式空气冷却器

    公开(公告)号:US5147581A

    公开(公告)日:1992-09-15

    申请号:US650209

    申请日:1991-02-04

    申请人: Qiu-Jiang Lu

    发明人: Qiu-Jiang Lu

    IPC分类号: F24F6/16

    CPC分类号: F24F6/16

    摘要: An evaporative air cooler with a rotary fan blowing and evaporating droplets generated by an impeller, which shares the same motor shaft with the rotary fan. The evaporative air cooler comprises a housing (1) having rear inlets (23), front outlets (3), and a motor-supporting plate (6). An electric motor (7) is vertically mounted to the plate with its rotating shaft being directed downward and connected to a rotary fan (9). The rotary fan sucks, blows and evaporate droplets produced by an impeller (14) with blades (11) and a fluid-sucking tube (13).

    摘要翻译: 具有旋转风扇的蒸发式空气冷却器,其由叶轮产生并与旋转风扇共享相同的电动机轴。 蒸发空气冷却器包括具有后入口(23),前出口(3)和马达支撑板(6)的壳体(1)。 电动机(7)垂直安装在板上,其旋转轴向下并连接到旋转风扇(9)。 旋转风扇用叶片(11)和吸液管(13)吸收,吹动和蒸发由叶轮(14)产生的液滴。

    IN-VEHICLE GARAGE DOOR MONITOR
    8.
    发明申请

    公开(公告)号:US20170140646A1

    公开(公告)日:2017-05-18

    申请号:US15340738

    申请日:2016-11-01

    申请人: Jiang Lu Fangqin Liu

    发明人: Jiang Lu Fangqin Liu

    IPC分类号: G08G1/0962

    CPC分类号: G08B21/18 E05F15/77

    摘要: An in-vehicle garage door monitoring system. An example monitoring system includes a sensor mounted near a garage door to determine a status of the garage door. The example monitoring system also includes a transmitter mounted near the garage door and communicatively coupled with the sensor, the transmitter issuing a signal corresponding to the status of the garage door. The example monitoring system also includes a receiver at the vehicle to receive the signal from the transmitter, the receiver issuing at least one notification to an occupant of the vehicle indicating the status of the garage door.

    LASER GUIDED PARKING ASSISTANCE DEVICE
    9.
    发明申请
    LASER GUIDED PARKING ASSISTANCE DEVICE 审中-公开
    激光导向停车辅助装置

    公开(公告)号:US20170021767A1

    公开(公告)日:2017-01-26

    申请号:US15216987

    申请日:2016-07-22

    申请人: Jiang Lu Fangqin Liu

    发明人: Jiang Lu Fangqin Liu

    摘要: A laser guided parking assistance device and methods of operation are disclosed. An example laser guided parking assistance device includes a tilt switch to detect a vertical orientation of a horizontal orientation. The laser guided parking assistance device also includes a laser to emit a laser light beam in response to the tilt switch detecting the horizontal orientation. In an example, a laser guided parking assistance device is configured as a circuit including a battery power source, a laser diode connected in series with the battery power source, and a first tilt switch connected between the battery power source and the laser diode. The tilt switch opens in a vertical position to cut electrical power from the battery power source to the laser diode The first tilt switch closes in a horizontal position to connect electrical power from the battery power source to the laser diode.

    摘要翻译: 公开了一种激光引导停车辅助装置和操作方法。 示例性激光引导停车辅助装置包括用于检测水平取向的垂直取向的倾斜开关。 激光引导停车辅助装置还包括激光器,响应于倾斜开关检测水平方向而发射激光束。 在一个示例中,激光引导停车辅助装置被配置为包括电池电源,与电池电源串联的激光二极管和连接在电池电源和激光二极管之间的第一倾斜开关的电路。 倾斜开关处于垂直位置,以将电力从电池电源切割到激光二极管。第一倾斜开关处于水平位置,以将来自电池电源的电力连接到激光二极管。