公开(公告)号：US20020105995A1

公开(公告)日：2002-08-08

申请号：US10036848

申请日：2001-11-06

Applicant: Lambda Physik AG

Inventor： Sergei V. Govorkov ,  Gonxue Hua

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/106 ,  H01S3/2258

Abstract: A molecular fluorine laser system for generating a laser output beam around 157 nm includes a discharge chamber filled with a gas mixture including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected to a discharge circuit for energizing the gas mixture, and a resonator. The resonator includes at least one optic for selecting a primary line including suppressing a secondary line among multiple characteristic photoemission lines around 157 nm. The same or a different optic, which may be intracavity or alternatively extracavity, may be configured for polarizing the selected line so that the output beam has a polarization of at least substantially 95% when the beam exits the laser system.

Abstract translation: 用于产生约157nm的激光输出光束的分子氟激光系统包括：填充有分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极，并连接到用于激发气体混合物的放电电路;以及 谐振器。 谐振器包括至少一个用于选择主线的光学器件，包括抑制157nm附近的多个特征光电子发射线中的次级线。 可以将相同或不同的光学元件（其可以是腔内或可选地为外腔）配置为使所选择的线偏振，使得当光束离开激光系统时，输出光束具有至少基本上95％的偏振。

公开(公告)号：US20020101902A1

公开(公告)日：2002-08-01

申请号：US10114620

申请日：2002-04-01

Applicant: Lambda Physik AG

Inventor： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

IPC: H01S003/223

CPC classification number: G03F7/70025 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225

Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber. The driving voltage is determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

公开(公告)号：US20020101900A1

公开(公告)日：2002-08-01

申请号：US10001217

申请日：2001-11-30

Applicant: Lambda Physik AG

Inventor： Sergei V. Govorkov ,  Gongxue Hua

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/106 ,  H01S3/2258

Abstract: A molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected to a discharge circuit for energizing the gas mixture, and a resonator for generating an output beam. The resonator includes at least one wavelength selection optic for selecting a primary line among multiple characteristic photoemission lines around 157 nm including suppressing a secondary line among the plurality of characteristic photoemission lines around 157 nm to below 1%. The resonator further includes at least one polarizing optic for polarizing the selected line so that the output beam has a polarization of at least substantially 95%, and preferably 97.5% or more.

Abstract translation: 分子氟激光系统包括：填充有至少包括分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极并连接到用于激励气体混合物的放电电路，以及用于产生输出光束的谐振器 。 谐振器包括至少一个波长选择光学器件，用于在157nm以下的多个特征光发射线中选择一条主线，包括抑制157nm附近的多个特征光电子发射线中的次级线至低于1％。 谐振器还包括至少一个偏振光学器件，用于偏振所选择的线，使得输出光束具有至少大致为95％，优选为97.5％或更大的极化。

公开(公告)号：US20020075933A1

公开(公告)日：2002-06-20

申请号：US10077328

申请日：2002-02-15

Applicant: Lambda Physik AG

Inventor： Uwe Stamm ,  Sergei V. Govorkov

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/0057 ,  H01S3/0315 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0805 ,  H01S3/081 ,  H01S3/0812 ,  H01S3/106 ,  H01S3/1062 ,  H01S3/1305 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2258 ,  Y10S372/70

Abstract: A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.

Abstract translation: 窄带分子氟激光系统包括振荡器和放大器，其中振荡器产生具有小于1μm的线宽的157nm波束，并且放大器将波束的功率增加到高于预定量，例如多于一个或多个 瓦特。 所述振荡器包括：填充有分子氟和缓冲气体的激光气体的放电室，所述放电室内的电极连接到用于激励分子氟的放电电路;以及谐振器，包括所述放电室，用于产生具有波长 约157nm。 线狭窄光学器件包括内部和/或超谐振器，用于将激光束的线宽减小到小于1 pm。 放大器可以是相同的或不同的放电室，并且光学和/或电子延迟可用于来自振荡器的定时脉冲以放大器的放电电流中的最大值到达放大器。

公开(公告)号：US20020057723A1

公开(公告)日：2002-05-16

申请号：US09960875

申请日：2001-09-21

Applicant: Lambda Physik AG

Inventor： Juergen Kleinschmidt

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  H01S3/1055 ,  H01S3/106

Abstract: An excimer or molecular fluorine laser system a wavefront compensating optic within its resonator for adjusting the curvature of the wavefront of the beam for compensating wavefront distortions and thereby enhancing the spectral purity of the beam. The wavefront compensating optic may be a plate, such as a null lens. One or both surfaces of the null lens may be adjustable and/or have an adjustable curvature for controlling the wavefront distortion compensation. A multi-compartment enclosure may be included having at least one optical component of the line-narrowing unit within each compartment. An atmosphere within at least one compartment is preferably controlled for controlling the spectral purity of the beam by controlling an amount of wavefront distortion compensation. The wavefront compensating optic may be sealably disposed between adjacent compartments.

Abstract translation: 准分子或分子氟激光系统在其谐振器内的波前补偿光学器件，用于调整波束的波前的曲率以补偿波前失真，从而增强光束的光谱纯度。 波前补偿光学元件可以是板，例如零透镜。 零透镜的一个或两个表面可以是可调节的和/或具有用于控制波前失真补偿的可调曲率。 可以包括多隔室外壳，其具有每个隔室内的线条变窄单元的至少一个光学部件。 优选地控制至少一个室内的气氛，以通过控制波前失真补偿量来控制光束的光谱纯度。 波前补偿光学元件可以密封地设置在相邻的隔室之间。

公开(公告)号：US20020034207A1

公开(公告)日：2002-03-21

申请号：US09965492

申请日：2001-09-26

Applicant: Lambda Physik AG

Inventor： Sergei V. Govorkov ,  Klaus Wolfgang Vogler ,  Frank Voss ,  Rainer Patzel

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  B23K2103/05 ,  G01J1/4257 ,  G03F7/70025 ,  G03F7/70558 ,  G03F7/70808 ,  H01S3/0014 ,  H01S3/134

Abstract: A system is provided for delivering a laser beam of wavelength less than 200 nm from a laser, such as an F2 laser or ArF laser, through a sealed enclosure sealably connected to the laser, and preferably to another housing, leading ultimately to a workpiece. The enclosure is preferably evacuated and back-filled with an inert gas to adequately deplete any air, water, hydrocarbons or oxygen within the enclosure. Thereafter or alternatively, an inert gas flow is established and maintained within the enclosure during operation of the laser. The inert gas preferably has high purity, e.g., more than 99.5% and preferably more than 99.999%, wherein the inert is preferably nitrogen or a noble gas. The enclosure is preferably sealed by a window transparent to the sub-200 nm radiation for preventing contaminants generated in the enclosure from entering the housing and contaminating surfaces therein. The enclosure is preferably made of steel and/or copper, and the window is preferably made of CaF2.

Abstract translation: 提供了一种系统，用于通过可密封地连接到激光器的密封外壳，优选地将最终导向工件的激光器等激光器（例如F2激光器或ArF激光器）传送波长小于200nm的激光束。 外壳优选被抽空并用惰性气体反填充以充分消耗外壳内的任何空气，水，碳氢化合物或氧气。 之后或者替代地，在激光器的操作期间建立惰性气体流并保持在外壳内。 惰性气体优选具有高纯度，例如超过99.5％，优选大于99.999％，其中惰性气体优选为氮气或惰性气体。 外壳优选由对于200nm以下的辐射透明的窗口密封，以防止在外壳中产生的污染物进入壳体和污染表面。 外壳优选由钢和/或铜制成，并且窗口优选地由CaF 2制成。

公开(公告)号：US20020021731A1

公开(公告)日：2002-02-21

申请号：US09905640

申请日：2001-07-12

Applicant: Lambda Physik AG

Inventor： Igor Bragin ,  Juergen Kleinschmidt ,  Gerhard Ahlborn

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  B03C3/41 ,  B03C3/49 ,  B03C3/68 ,  B03C2201/04 ,  B03C2201/24 ,  H01S3/036

Abstract: An excimer or molecular fluorine laser system is provided which emits a laser beam during operation and has a gas mixture with a gas composition initially provided within a discharge chamber. The laser system includes a discharge chamber containing a laser gas mixture at least including a halogen-containing species and a buffer gas, multiple electrodes within the discharge chamber and connected to a discharge circuit for energizing the gas mixture, a resonator for generating a laser beam, an electrostatic precipitator for having a voltage applied thereto and for receiving and precipitating contaminant particulates from a flow of the gas mixture, and a processor for monitoring the corona discharge ignition voltage of the electrostatic precipitator and for determining a status of said gas mixture based on the monitored voltage.

Abstract translation: 提供准分子或分子氟激光系统，其在操作期间发射激光束，并且具有最初设置在放电室内的气体组成的气体混合物。 激光系统包括：放电室，其包含至少包含含卤物质和缓冲气体的激光气体混合物，放电室内的多个电极，并连接到用于激励气体混合物的放电电路;激光束产生激光束 ，用于施加电压并用于从气体混合物流中接收和沉淀污染物颗粒的静电除尘器，以及用于监测静电除尘器的电晕放电点火电压并用于基于以下方式确定所述气体混合物的状态的处理器： 监测电压。

公开(公告)号：US20020018505A1

公开(公告)日：2002-02-14

申请号：US09883097

申请日：2001-06-13

Applicant: Lambda Physik AG

Inventor： Dirk Basting ,  Sergei Govorkov ,  Juergen Kleinschmidt ,  Peter Lokai ,  Uwe Stamm

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/4257 ,  G03F7/70025 ,  G03F7/70558 ,  G03F7/70808 ,  H01S3/0014 ,  H01S3/0315 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/1062 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2258

Abstract: A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.

Abstract translation: F2激光器包括填充有包括分子氟的气体混合物的放电室，用于在包括初级线和次级线的157nm和158nm之间的波长范围内产生光谱发射，多个电极与用于生产的电源电路 用于激发分子氟的脉冲放电，包括放电室的谐振器和用于产生具有小于1ms的带宽的激光束的干涉仪，以及耦合在反馈环路中的波长监测器，用于监测光谱分布 的激光束。 处理器基于监测的光谱分布来控制干涉测量装置的干涉光谱，使得光谱分布内的边带基本上最小化。

公开(公告)号：US20020012368A1

公开(公告)日：2002-01-31

申请号：US09849600

申请日：2001-05-04

Applicant: Lambda Physik AG

Inventor： Jurgen Kleinschmidt ,  Uwe Stamm ,  Klaus Vogler ,  Peter Lokai

IPC: H01S003/13

CPC classification number: H01S3/1392 ,  H01S3/225

Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

Abstract translation: 波长校准系统确定准分子或分子激光系统的窄谱分光发射带的绝对波长。 该系统包括模块，该模块包括与激光系统的可变范围内的变窄带周围的激光输出光束的分量光学相互作用的元件。 通过监测模块内的电压变化来检测层间谐振，或者通过光电检测设备检测光吸收。 当发生光学转变并被检测时，窄带的绝对波长可以精确地确定。 当该系统具体包括ArF-准分子激光室时，该模块优选地是含有吸光约193nm的元素的加合加速器，该元件优选为选自砷，碳，氧，铁 ，气态烃，卤化烃，碳污染的惰性气体，锗和铂蒸气。 当该系统具体包括F2激光室时，该模块优选为含有吸收约157nm的元素的加合加速器，该元件优选为选自硒，溴和硅的气体或蒸汽。 该模块可选地是可配置为用光吸收气体吹扫的净化室。

公开(公告)号：US20010050938A1

公开(公告)日：2001-12-13

申请号：US09826301

申请日：2001-04-03

Applicant: Lambda Physik AG.

Inventor： Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Ulrich Rebhan

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/225

Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.