Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device
    23.
    发明授权
    Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device 有权
    密封技术用于减少气密密封装置所需的时间和由此产生的密封装置

    公开(公告)号:US07722929B2

    公开(公告)日:2010-05-25

    申请号:US11820855

    申请日:2007-06-21

    Abstract: A sealing method for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device (e.g., a hermetically sealed OLED device) are described herein. The sealing method includes the steps of: (1) cooling an un-encapsulated device; (2) depositing a sealing material over at least a portion of the cooled device to form an encapsulated device; and (3) heat treating the encapsulated device to form a hermetically sealed device. In one embodiment, the sealing material is a low liquidus temperature inorganic (LLT) material such as, for example, tin-fluorophosphate glass, tungsten-doped tin fluorophosphate glass, chalcogenide glass, tellurite glass, borate glass and phosphate glass. In another embodiment, the sealing material is a Sn2+-containing inorganic oxide material such as, for example, SnO, SnO+P2O5 and SnO+BPO4.

    Abstract translation: 这里描述了用于减少密封装置所需的时间和所得的密封装置(例如,气密密封的OLED装置)的密封方法。 密封方法包括以下步骤:(1)冷却未封装的装置; (2)在冷却装置的至少一部分上沉积密封材料以形成封装装置; 和(3)对封装的装置进行热处理以形成密封装置。 在一个实施方案中,密封材料是低液相线温度无机(LLT)材料,例如锡 - 氟磷酸盐玻璃,掺杂钨的锡氟磷酸盐玻璃,硫族化物玻璃,碲酸盐玻璃,硼酸盐玻璃和磷酸盐玻璃。 在另一个实施例中,密封材料是含Sn2 +的无机氧化物材料,例如SnO,SnO + P2O5和SnO + BPO4。

    LLT barrier layer for top emission display device, method and apparatus
    25.
    发明申请
    LLT barrier layer for top emission display device, method and apparatus 审中-公开
    用于顶部发射显示装置的LLT阻挡层,方法和装置

    公开(公告)号:US20080290798A1

    公开(公告)日:2008-11-27

    申请号:US12080711

    申请日:2008-04-04

    CPC classification number: H05B33/04 H01L51/524 H01L51/5253 H01L2251/5315

    Abstract: A method is disclosed for inhibiting oxygen and moisture penetration of a top emission device comprising the steps of depositing a low liquidus temperature (LLT) inorganic material on at least a portion of the top emission device to create a deposited LLT material, and optionally heat treating the deposited LLT material in a substantially oxygen and moisture free environment to form a LLT barrier layer, and optionally placing a cover glass over the LLT barrier layer. A top emission display device is also disclosed comprising a substrate, at least one electronic or optoelectronic layer, and a LLT barrier layer, wherein the electronic or optoelectronic layer is hermetically sealed between the LLT barrier layer and the substrate and an optional cover glass over the LLT barrier layer.

    Abstract translation: 公开了一种用于抑制顶部发射装置的氧气和水分渗透的方法,包括以下步骤:在顶部发射装置的至少一部分上沉积低液相线温度(LLT)无机材料以产生沉积的LLT材料,以及任选地热处理 沉积的LLT材料在基本上无氧和无湿度的环境中以形成LLT阻挡层,并且可选地将覆盖玻璃放置在LLT阻挡层上。 还公开了一种顶部发射显示装置,其包括衬底,至少一个电子或光电子层和LLT势垒层,其中电子或光电子层气密地密封在LLT阻挡层和衬底之间,以及可选的覆盖玻璃 LLT阻挡层。

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