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公开(公告)号：US07705962B2
公开(公告)日：2010-04-27
申请号：US11330394
申请日：2006-01-12
Applicant: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Frits Van Der Meulen
Inventor： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Frits Van Der Meulen
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.
Abstract translation: 构造成在投影系统和基板之间的空间中容纳液体的液体限制结构在其下表面中具有凹槽，该凹部对于相对低的压力源和相对高的压力源是开放的，并且液体和/或气体 从液体限制结构和基板之间提取。
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22.发明申请LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING AN ARTICLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权光刻设备，制造用于光刻设备的设备的方法和设备制造方法公开(公告)号：US20100060870A1
公开(公告)日：2010-03-11
申请号：US12555301
申请日：2009-09-08
Applicant: Nina Vladimirovna DZIOMKINA , Nicolaas TEN KATE , Sandra VAN DER GRAAF , Henricus Jozef CASTELIJNS
Inventor： Nina Vladimirovna DZIOMKINA , Nicolaas TEN KATE , Sandra VAN DER GRAAF , Henricus Jozef CASTELIJNS
CPC classification number: G03B27/52 , C23C16/45555 , G03F7/70341 , G03F7/70916 , G03F7/7095
Abstract: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.
Abstract translation: 公开了一种光刻设备，其中将特定涂层施加到特定表面。 涂层由至少99wt％的以下至少一种制成：过渡金属氧化物; 不良金属氧化物，硫化物或硒化物; 具有式ATiOn的化合物，其中A是元素周期表第2族的元素; 或掺杂有周期表第3,5或7族金属的TiO 2，其中涂层小于或等于49nm厚。
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23.发明申请LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD 有权光刻装置，干燥装置，计量装置和装置制造方法公开(公告)号：US20100045950A1
公开(公告)日：2010-02-25
申请号：US12543011
申请日：2009-08-18
Applicant: Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
IPC: G03B27/52
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Abstract translation: 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。
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公开(公告)号：US07619718B2
公开(公告)日：2009-11-17
申请号：US10679324
申请日：2003-10-07
Applicant: Florence Luo , Herman Vogel , George H Harrold , Nicolaas ten Kate
Inventor： Florence Luo , Herman Vogel , George H Harrold , Nicolaas ten Kate
IPC: G03B27/62
CPC classification number: G03F1/64 , G03F7/70933 , G03F7/70983
Abstract: The present invention provides methods and systems for fast purging of pellicle volumes. A purge device has a base which is enclosed in a controlled environment filled with purge gas. The base has a cavity formed on a surface therein. The cavity receives a reticle-pellicle assembly including a pellicle surface and an enclosed pellicle volume. A first region within the cavity can be formed to hold purging gas at a high pressure. A gap region is formed below the pellicle within the cavity. A displacement force on the pellicle due to a pressure difference between purging gas in the enclosed volume and purging gas in the gap region is kept within a tolerance range of the pellicle. According to further embodiments, a purge device is provided that includes a flow barrier (e.g., non-contacting and/or contacting barriers). A pressure balancing plate and/or flow resistant plates are provided in a purge device.
Abstract translation: 本发明提供用于快速吹扫防护薄膜体积的方法和系统。 净化装置具有封闭在充满吹扫气体的受控环境中的基部。 底座具有形成在其中的表面上的空腔。 空腔容纳包括防护薄膜表面和封闭防护薄膜体积的掩模版防护薄膜组件。 可以形成腔内的第一区域以保持高压下的清洗气体。 间隙区域形成在空腔内的防护薄膜下方。 由于封闭容积中的吹扫气体与间隙区域中的净化气体之间的压力差，防护薄膜上的位移力保持在防护薄膜的容许范围内。 根据另外的实施例，提供了包括流动屏障（例如，非接触和/或接触屏障）的清洗装置。 在净化装置中设置压力平衡板和/或防流动板。
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公开(公告)号：US20090168042A1
公开(公告)日：2009-07-02
申请号：US12292962
申请日：2008-12-01
Applicant: Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
Inventor： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
IPC: G03B27/60
CPC classification number: G03F7/70341
Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.
Abstract translation: 公开了一种浸没式光刻投影装置。 所述设备包括用于保持基板的基板台，所述基板台被构造和布置成允许液体从所述基板流出并且超过所述基板台的顶表面的边缘，以及用于收集所述边缘下方的液体流的槽 。 描述了用于改善液体回收的几个特征。
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Patent Agency Ranking
公开(公告)号：US20090161083A1
公开(公告)日：2009-06-25
申请号：US12292961
申请日：2008-12-01
Applicant: Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
Inventor： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
IPC: G03B27/52
CPC classification number: G03B27/52 , G03F7/70341
Abstract: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.
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公开(公告)号：US07136142B2
公开(公告)日：2006-11-14
申请号：US10852686
申请日：2004-05-25
Applicant: Marcel Beckers , Ronald Johannes Hultermans , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars , Jan-Marius Schotsman , Ronald Van Der Ham , Johannes Antonius Maria Martina Van Uijtregt
Inventor： Marcel Beckers , Ronald Johannes Hultermans , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars , Jan-Marius Schotsman , Ronald Van Der Ham , Johannes Antonius Maria Martina Van Uijtregt
CPC classification number: G03F7/70933 , G03F7/70908
Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.
Abstract translation: 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于冲洗基本层流的气体穿过辐射束和/或沿着光学部件的表面冲洗的气体冲洗装置。 气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。 内缘定义了总气体出口面积。 气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。 层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。
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公开(公告)号：US10551752B2
公开(公告)日：2020-02-04
申请号：US13046283
申请日：2011-03-11
Applicant: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
Inventor： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC: G03F7/20
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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29.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09423699B2
公开(公告)日：2016-08-23
申请号：US13323520
申请日：2011-12-12
Applicant: Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。
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30.发明授权Lithographic apparatus, drying device, metrology apparatus and device manufacturing method 有权平版印刷设备，干燥装置，计量装置和装置制造方法公开(公告)号：US08953142B2
公开(公告)日：2015-02-10
申请号：US12543011
申请日：2009-08-18
Applicant: Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Abstract translation: 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。
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