公开(公告)号：US20240249971A1

公开(公告)日：2024-07-25

申请号：US18417655

申请日：2024-01-19

Applicant: ASM IP Holding B.V.

Inventor： Rohan Vijay Rane ,  Ankit Kimtee ,  Todd Robert Dunn ,  Akshay Phadnis ,  Kyle Fondurulia ,  Sudhanshu Biyani ,  Mun Peow Wong

IPC: H01L21/687

CPC classification number: H01L21/68742

Abstract: Weighted lift pin constructions as disclosed may be used with a semiconductor fabrication processing apparatus. The weighted lift pin constructions comprise a lift pin and a weight element disposed along an end of the lift pin. The weight element is removably retained on the lift pin by a retaining element that may be a clip element, an O-ring element, and differently configured lift pin and weight element threaded sections. When the clip element or O-ring element used, the weight element includes a collar adjacent an end of an opening in the weight element to accommodate placement of the clip or O-ring element therein as retained on the lift pin to thereby maintain axial placement of the lift pin relative to the weight element. Such maintained axial placement may also be achieved by interference locked engagement between differently configured lift pin and weighted element threaded sections.

公开(公告)号：US20240209505A1

公开(公告)日：2024-06-27

申请号：US18423969

申请日：2024-01-26

Applicant: ASM IP Holding B.V.

Inventor： William Petro ,  Venkata Motupalli ,  Pawan Sharma ,  Ankit Kimtee ,  Eric James Shero ,  Todd Robert Dunn

IPC: C23C16/52 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/45544

Abstract: A precursor monitoring assembly for use in reactor systems to provide real-time and direct measurements of the availability of source materials from a source vessel. The assembly includes one or more force or load sensors, such as load cells, positioned between a bottom wall of an interior tray and an exterior wall (e.g., a base of a source vessel) and/or outside the source vessel. A signal conditioning element processes the output electrical signals from the sensors, then a controller processes the output signals from the signal conditioning components with a conversion factor, for example, to determine a current weight of source material stored in the source vessel. The controller uses this weight to calculate the amount of available source material or chemistry in the source vessel.

公开(公告)号：US20240167160A1

公开(公告)日：2024-05-23

申请号：US18510043

申请日：2023-11-15

Applicant: ASM IP Holding B.V.

Inventor： Ankit Kimtee ,  Sudhanshu Biyani ,  Kyle Fondurulia ,  Yeonsu Rhee ,  Shubham Garg

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/46

CPC classification number: C23C16/45591 ,  C23C16/4585 ,  C23C16/4586 ,  C23C16/46

Abstract: Various embodiments of the present technology may provide a feature to isolate an upper chamber of a reaction chamber from a lower chamber of a reaction chamber. In one case, a susceptor has a groove along an outer edge that is configured to mate with a spacer plate. A seal is disposed in the groove. In another case, a flow control ring, which rests on the susceptor, has a groove along an outer edge that is configured to mate with the spacer plate.

公开(公告)号：US11959168B2

公开(公告)日：2024-04-16

申请号：US17239768

申请日：2021-04-26

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Ankit Kimtee ,  Sudhanshu Biyani ,  Jonathan Robert Bakke ,  Eric James Shero

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/448 ,  C23C16/50

CPC classification number: C23C16/448 ,  C23C16/44 ,  C23C16/4408 ,  C23C16/45525 ,  C23C16/50

Abstract: The present disclosure is generally directed to a solid source precursor delivery system. More specifically, the present disclosure is directed to a solid source precursor vessel that can be utilized to vaporize a supply of solid precursor stored within the vessel. The disclosed source vessel utilizes a plurality of individual cavities or pockets within the interior of the vessel. Each individual pocket may be loaded with precursor. In an arrangement, the pockets may be loaded with pre-formed blocks of compressed precursor material that typically have a higher density than was previously achieved when packing solid precursor within a source vessel. The increased density of the solid precursor material increases a capacity of the source vessel resulting in longer intervals between replacement and/or refilling the source vessel.

公开(公告)号：US20230313367A1

公开(公告)日：2023-10-05

申请号：US18127785

申请日：2023-03-29

Applicant: ASM IP Holding B.V.

Inventor： Ankit Kimtee ,  Akshay Phadnis ,  Kyle Fondurulia ,  Thomas Fitzgerald

IPC: C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4411 ,  C23C16/45565 ,  C23C16/45544

Abstract: A reactor system for use in semiconductor processing, such as for chemical vapor deposition (CVD), atomic layer deposition (ALD), and other deposition steps, that makes use of a reactor module with two or more reaction chambers. The reactor system includes components of a cooling system to provide enhanced temperature uniformity across a chamber lid enclosing the housing or vessel containing the reaction chambers. In part, the cooling system is adapted to utilize convective heat transfer and includes a finned heat sink positioned at the center of the chamber lid in the center space between the external portions of the showerheads of the reaction chambers. Further, the cooling system includes a fan positioned to have its outlet at the center space and over the finned heat sink so that air is directed into the center space and onto the heat sink.

公开(公告)号：US20230234014A1

公开(公告)日：2023-07-27

申请号：US18100331

申请日：2023-01-23

Applicant: ASM IP Holding B.V.

Inventor： Venkata Motupalli ,  Pawan Sharma ,  Ankit Kimtee ,  Eric Shero ,  Todd Dunn

IPC: B01J19/00

CPC classification number: B01J19/004 ,  B01J19/0046

Abstract: A source vessel weight monitoring assembly for use in reactor systems to provide real-time and direct measurements of the availability of source or process materials from a source vessel. The assembly includes one or more force or load sensors, such as load cells, positioned between a bottom wall of the source vessel and a support element for the vessel (e.g., a base of a source vessel enclosure). The sensors are positioned to at least partially support the vessel, and a signal conditioning element processes the output electrical signals from the sensors, then a controller processes the output signals from the signal conditioning components with a conversion factor, for example, to determine a current weight of the source vessel and process material (e.g., solid, liquid, or gaseous precursor) stored therein. The controller uses this weight to calculate the amount of available process material or chemistry in the source vessel.

公开(公告)号：US11626308B2

公开(公告)日：2023-04-11

申请号：US17319146

申请日：2021-05-13

Applicant: ASM IP Holding B.V.

Inventor： Surojit Ganguli ,  Todd Robert Dunn ,  Ankit Kimtee

IPC: H01L21/68 ,  G01N21/03 ,  H01L29/06

Abstract: A laser alignment fixture for a reactor system may be used to align components of the reactor system to allow for a uniform deposition of a thin film onto a substrate. The laser alignment fixture may include: a lid assembly; and a plurality of laser and sensor assemblies. The laser alignment fixture may align at least: a flow control ring, a susceptor, and a side wall of the reactor system.

公开(公告)号：US20230061477A1

公开(公告)日：2023-03-02

申请号：US17895370

申请日：2022-08-25

Applicant: ASM IP Holding B.V.

Inventor： Thomas Fitzgerald ,  Rohan Rane ,  Jereld Winkler ,  Ankit Kimtee ,  Todd Robert Dunn

IPC: C23C16/458 ,  C23C16/455

Abstract: A reaction chamber may comprise a reaction chamber volume enclosed within the reaction chamber; a susceptor configured to support a substrate disposed in the reaction chamber volume; a reaction space above the susceptor, and a lower chamber space below the susceptor, within the reaction chamber volume; and/or a sealing system causing the reaction space and the lower chamber space to be at least partially fluidly separate. A sealing system may comprise a spacer plate surrounding and coupled to the susceptor; and/or a spring coupled to the spacer plate and the susceptor having a spring bias toward a compressed position or an extended position, such that the spring bias facilitates creation of at least a partial seal between the spacer plate and the susceptor, causing at least partial fluid separation between the reaction space and the lower chamber space as the susceptor moves up and down within the reaction chamber.