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36 条记录 (耗时 0.027 秒)

    Negative-acting chemically amplified photoresist composition
    22.
    发明授权
    Negative-acting chemically amplified photoresist composition 有权
    负性化学放大光致抗蚀剂组合物

    公开(公告)号：US06576394B1

    公开(公告)日：2003-06-10

    申请号：US09596098

    申请日：2000-06-16

    申请人： Pingyong Xu ,  Ping-Hung Lu ,  Ralph R. Dammel

    发明人： Pingyong Xu ,  Ping-Hung Lu ,  Ralph R. Dammel

    IPC分类号： G03C1492

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/122

    摘要： A chemically-amplified, negative-acting, radiation-sensitive photoresist composition that is developable in an alkaline medium, the photoresist comprising: a) a phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid generator that forms an acid upon exposure to radiation, in an amount sufficient to initiate crosslinking of the film-forming binder resin; c) a crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises an etherified aminoplast polymer or oligomer; d) a second crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises either 1) a hydroxy substituted- or 2) a hydroxy C1-C4 alkyl substituted-C1-C12 alkyl phenol, wherein the total amount of the crosslinking agents from steps c) and d) is an effective crosslinking amount; and e) a photoresist solvent, and a process for producing a microelectronic device utilizing such a photoresist composition.

    摘要翻译： 一种可在碱性介质中显影的化学放大的，负性的，辐射敏感的光致抗蚀剂组合物，光致抗蚀剂包括：a）具有环键羟基的酚醛膜形成聚合物粘合剂树脂; b）形成 暴露于辐射后的酸，其量足以引发成膜粘合剂树脂的交联; c）在暴露于通过暴露于辐射产生的步骤b）的酸暴露于酸后形成碳鎓离子的交联剂，其包含 醚化的氨基塑料聚合物或低聚物; d）第二交联剂，其暴露于通过暴露于辐射产生的步骤b）的酸形成碳鎓离子，并且其包括1）羟基取代的或2）羟基C 1 -C 4 烷基取代的C 1 -C 12烷基苯酚，其中来自步骤c）和d）的交联剂的总量是有效的交联量; ande）光致抗蚀剂溶剂，以及利用这种光致抗蚀剂组合物制造微电子器件的方法。

    Fractionated novolak resin and photoresist composition therefrom
    23.
    发明授权
    Fractionated novolak resin and photoresist composition therefrom 失效
    分馏的酚醛清漆树脂及其光致抗蚀剂组合物

    公开(公告)号：US6045966A

    公开(公告)日：2000-04-04

    申请号：US991034

    申请日：1997-12-15

    申请人： M. Dalil Rahman ,  Michelle Cook ,  Ping-Hung Lu

    发明人： M. Dalil Rahman ,  Michelle Cook ,  Ping-Hung Lu

    IPC分类号： C08G8/00 ,  C08G8/08 ,  G03F7/023 ,  G03C5/00

    CPC分类号： G03F7/0236 ,  C08G8/00 ,  C08G8/08

    摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such a novolak resin fraction. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

    摘要翻译： 本发明提供通过分离这种酚醛清漆树脂级分来制备具有一致的分子量和光致抗蚀剂组合物性能优异的成膜分级酚醛清漆树脂的方法。 还提供了一种从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。

    Antireflective Coating Compositions Comprising Siloxane Polymer
    26.
    发明申请
    Antireflective Coating Compositions Comprising Siloxane Polymer 审中-公开
    包含硅氧烷聚合物的抗反射涂料组合物

    公开(公告)号：US20070298349A1

    公开(公告)日：2007-12-27

    申请号：US11425813

    申请日：2006-06-22

    申请人： Ruzhi Zhang ,  Mark O. Neisser ,  Woo-Kyu Kim ,  David J. Abdallah ,  Francis Houlihan ,  Ping-Hung Lu ,  Hong Zhuang

    发明人： Ruzhi Zhang ,  Mark O. Neisser ,  Woo-Kyu Kim ,  David J. Abdallah ,  Francis Houlihan ,  Ping-Hung Lu ,  Hong Zhuang

    IPC分类号： G03C1/00

    CPC分类号： C09D183/04 ,  G03F7/038 ,  G03F7/0757 ,  G03F7/091 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282

    摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).

    摘要翻译： 本发明涉及一种用于形成光致抗蚀剂底层的新型抗反射涂料组合物，其包含酸产生剂和新型硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团， 其中m为0或1，W和W'独立地为价键或连接环状醚与聚合物硅的连接基团，L选自氢，W'和W，或L和W'组合 包括将环醚与聚合物的硅连接的脂环族连接基团。 本发明还涉及一种用于对涂覆在新型抗反射涂料组合物上的光致抗蚀剂进行成像的方法，并提供良好的光刻结果。 本发明还涉及新的硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团。

    Nanocomposite photosensitive composition and use thereof
    27.
    发明申请
    Nanocomposite photosensitive composition and use thereof 有权
    纳米复合光敏组合物及其用途

    公开(公告)号：US20060228645A1

    公开(公告)日：2006-10-12

    申请号：US11103134

    申请日：2005-04-11

    申请人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    发明人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0047 ,  G03F7/027 ,  G03F7/0382 ,  Y10S430/106

    摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator

    摘要翻译： 本发明涉及一种光刻胶组合物，其适用于作为负性光致抗蚀剂的成像曝光和显影，其包含负性光致抗蚀剂组合物和平均粒度等于或大于10纳米的无机颗粒材料，其中光致抗蚀剂涂膜的厚度 大于5微米。 负光致抗蚀剂组合物选自（1）包含（i）树脂粘合剂，（ii）光致酸产生剂和（iii）交联剂）的组合物; 或（2）组合物，其包含（i）树脂粘合剂，（ii）任选的可加成聚合的烯属不饱和化合物和（iii）光引发剂; 或（3）包含（i）含有至少两个侧链不饱和基团的光聚合化合物的组合物; （ii）烯属不饱和光聚合聚环氧烷亲水化合物; 和（iii）光引发剂