公开(公告)号：US20060219931A1

公开(公告)日：2006-10-05

申请号：US11432365

申请日：2006-05-12

Applicant: Jan Van Der Werf ,  Mark Kroon ,  Wilhelmus Keur ,  Vadim Banine ,  Hans Van Der Laan ,  Johannes Moors ,  Erik Loopstra

Inventor： Jan Van Der Werf ,  Mark Kroon ,  Wilhelmus Keur ,  Vadim Banine ,  Hans Van Der Laan ,  Johannes Moors ,  Erik Loopstra

IPC: G01J1/42

CPC classification number: G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

Abstract: A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

Abstract translation: 公开了一种与光刻设备一起使用的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成二次辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。

公开(公告)号：US20060176458A1

公开(公告)日：2006-08-10

申请号：US11375039

申请日：2006-03-15

Applicant: Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Timotheus Sengers ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/42

CPC classification number: G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

Abstract translation: 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。

公开(公告)号：US20060139589A1

公开(公告)日：2006-06-29

申请号：US11022939

申请日：2004-12-28

Applicant: Tammo Uitterdijk ,  Erik Loopstra ,  Laurens Sanderse

Inventor： Tammo Uitterdijk ,  Erik Loopstra ,  Laurens Sanderse

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/70958

Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

Abstract translation: 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。

公开(公告)号：US20060131682A1

公开(公告)日：2006-06-22

申请号：US11015770

申请日：2004-12-20

Applicant: Johannes Hubertus Moors ,  Erik Ham ,  Gert-Jan Heerens ,  Paulus Martinus Liebregts ,  Erik Loopstra ,  Henri Gerard Werij

Inventor： Johannes Hubertus Moors ,  Erik Ham ,  Gert-Jan Heerens ,  Paulus Martinus Liebregts ,  Erik Loopstra ,  Henri Gerard Werij

IPC: H01L31/0232

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

Abstract translation: 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

公开(公告)号：US20060119812A1

公开(公告)日：2006-06-08

申请号：US11001083

申请日：2004-12-02

Applicant: Stefan Kruijswijk ,  Erik Loopstra

Inventor： Stefan Kruijswijk ,  Erik Loopstra

IPC: G03B27/42

CPC classification number: G03F7/70075 ,  G03F7/70083

Abstract: The invention relates to a lithographic apparatus, a device manufacturing method and a device thus manufactured. The lithographic apparatus is of the scanning type, in which a target portion of a substrate is scanned through a patterned radiation beam. Inhomogeneities in the radiation beam may become visible in the form of stripes on the substrate. By imparting an additional movement to the substrate table and optionally to the patterning device of the apparatus, during scanning, in a direction at an angle with the scanning movement, such inhomogeneities are smeared out, and the overall homogeneity of the illumination may be improved.

Abstract translation: 本发明涉及光刻设备，器件制造方法和由此制造的器件。 光刻设备是扫描型的，其中基板的目标部分通过图案化的辐射束被扫描。 辐射束中的不均匀性可能以基板上的条纹的形式变得可见。 通过在扫描期间，在与扫描运动成一定角度的方向上向衬底台施加额外的运动并且可选地赋予设备的图案形成装置，这样的不均匀性被涂抹，并且可以提高照明的整体均匀性。

公开(公告)号：US20060066826A1

公开(公告)日：2006-03-30

申请号：US10948749

申请日：2004-09-24

Applicant: Carlo Maria Luijten ,  Sjoerd Lambertus Donders ,  Nicolaas Kemper ,  Martinus Antonius Leenders ,  Erik Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

Inventor： Carlo Maria Luijten ,  Sjoerd Lambertus Donders ,  Nicolaas Kemper ,  Martinus Antonius Leenders ,  Erik Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC: G03B27/42

CPC classification number: G03F7/70341

Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

公开(公告)号：US20060033898A1

公开(公告)日：2006-02-16

申请号：US11205325

申请日：2005-08-17

Applicant: Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

Inventor： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

IPC: G03B27/42

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Abstract translation: 公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。

公开(公告)号：US20050264778A1

公开(公告)日：2005-12-01

申请号：US10857614

申请日：2004-06-01

Applicant: Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Meijer ,  Jeroen Maria Mertens ,  Johannes Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Abstract translation: 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

公开(公告)号：US20050263068A1

公开(公告)日：2005-12-01

申请号：US10966110

申请日：2004-10-18

Applicant: Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

Inventor： Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

IPC: G03F7/20 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00 ,  H01L21/027

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20050259232A1

公开(公告)日：2005-11-24

申请号：US10847661

申请日：2004-05-18

Applicant: Bob Streefkerk ,  Sjoerd Donders ,  Erik Loopstra ,  Johannes Mulkens

Inventor： Bob Streefkerk ,  Sjoerd Donders ,  Erik Loopstra ,  Johannes Mulkens

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Abstract translation: 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。