公开(公告)号：US5612169A

公开(公告)日：1997-03-18

申请号：US287054

申请日：1994-08-08

申请人： Mathias Eichhorn ,  Gerhard Buhr

发明人： Mathias Eichhorn ,  Gerhard Buhr

IPC分类号： C07C311/16 ,  C07C311/53 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492 ,  G03C1/494 ,  G03C1/725 ,  G03C1/76

CPC分类号： G03F7/0045 ,  C07C311/53

摘要： The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n>1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical. The invention further relates to a positive radiation-sensitive mixture containing a) a compound which under the influence of actinic radiation forms acid, b) an acid-cleavable compound whose cleavage products in an aqueous alkaline developer have a higher solubility than the starting compound, and c) a polymeric binder which is insoluble in water but is soluble or at least swellable in aqueous alkaline solutions, in which the compound b) is a sulfonamide of the formula I or II. The mixture according to the invention is particularly suitable for the manufacture of offset printing plates and photoresists.

摘要翻译： 本发明涉及式R 1 [-N（CO-OR 2）-SO 2 -R 3] n（I）和R 1 [-SO 2 -N（CO-OR 2）-R 3] n（II））的N，N-二取代磺酰胺 ，其中n为1-的R1为（C1-C20）烷基，（C3-C10）环烷基，（C6-C14）芳基或（C7-C20）芳烷基，对于n> 1- （C 1 -C 20）烷烃或（C 6 -C 7）环烷烃，非缩合或稠合的单 - 或多核（C 6 -C 18）芳族化合物的3-或4-价基团，R 2是（C 3 -C 11）烷基 ，（C 3 -C 11）烯基或（C 7 -C 11）芳烷基，R 3是未取代或取代的（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基 。 本发明还涉及一种正辐射敏感性混合物，其包含a）在光化辐射影响下形成酸的化合物，b）酸性可裂解化合物，其在水性碱性显影剂中的裂解产物具有比起始化合物更高的溶解度， 和c）不溶于水但在碱性水溶液中可溶或至少可溶胀的聚合物粘合剂，其中化合物b）是式I或II的磺酰胺。 根据本发明的混合物特别适用于制造胶版印刷版和光致抗蚀剂。

公开(公告)号：US5529886A

公开(公告)日：1996-06-25

申请号：US432229

申请日：1995-05-01

申请人： Mathias Eichhorn ,  Gerhard Buhr

发明人： Mathias Eichhorn ,  Gerhard Buhr

IPC分类号： C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  G03F7/039

CPC分类号： C08F20/38 ,  C07C311/53 ,  G03F7/039 ,  Y10S430/107

摘要： The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

摘要翻译： 本发明涉及式R1-SO2-N（CO-OR2）-R3-O-CO-CR4 = CH2和R1-N（CO-OR2）-SO2-R3-O-CO-CR4 = CH2的单体， 其中R 1是（C 1 -C 20）烷基，（C 3 -C 10）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基，所述含烷基基团中的各个亚甲基任选被杂原子取代， （C 3 -C 11）烷基，C 3 -C 11）烯基或（C 7 -C 11）芳烷基，R 3是未取代或取代的（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 6 -C 14） -C 20）芳烷基，R 4为氢原子或甲基。 它还涉及具有至少5mol％具有式（e）-R3-N（CO-OR2）-SO2-R1（I）和/或-R3-SO2-N（CO- OR2）-R1（II）和对辐射敏感的混合物，其包含：a）在光化辐射的影响下形成酸的化合物，和b）在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度，以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

公开(公告)号：US5498506A

公开(公告)日：1996-03-12

申请号：US362491

申请日：1995-01-09

申请人： Horst Wengenroth ,  Horst Roeschert ,  Walter Spiess ,  Gerhard Buhr ,  Georg Pawlowski

发明人： Horst Wengenroth ,  Horst Roeschert ,  Walter Spiess ,  Gerhard Buhr ,  Georg Pawlowski

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  G03C1/492

CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/039

摘要： The invention relates to a radiation-sensitive mixture comprising a) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, b) a compound which forms an acid under the action of actinic radiation and c) a compound which contains at least one C-O-C or C-O-Si bond which can be cleaved by an acid, wherein said mixture additionally contains 0.1 to 70 mol %, based on the maximum amount of acid which can theoretically be produced from the compound b), of at least one compound having at least one nitrogen atom in an amine or amide bond. The mixture is used in particular in the production of electronic components. The invention also relates to a recording material having a substrate and a radiation-sensitive coating.

摘要翻译： PCT No.PCT / EP93 / 01430 Sec。 371日期1995年1月9日 102（e）1995年4月9日PCT PCT 1993年6月7日PCT公布。 出版物WO94 / 01805 日本1990年1月20日。本发明涉及一种辐射敏感性混合物，其包含a）不溶于水但在碱性水溶液中可溶或至少可溶胀的粘合剂，b）在光化反应的作用下形成酸的化合物 辐射和c）含有至少一个可被酸裂解的COC或CO-Si键的化合物，其中所述混合物另外含有0.1-70mol％，基于理论上可从 化合物b），至少一种在胺或酰胺键中具有至少一个氮原子的化合物。 该混合物特别用于生产电子元件。 本发明还涉及具有基底和辐射敏感性涂层的记录材料。

公开(公告)号：US5292626A

公开(公告)日：1994-03-08

申请号：US750313

申请日：1991-08-27

申请人： Gerhard Buhr ,  Andreas Elsaesser ,  Hans W. Frass ,  Ernst I. Leupold

发明人： Gerhard Buhr ,  Andreas Elsaesser ,  Hans W. Frass ,  Ernst I. Leupold

IPC分类号： G03F7/32

CPC分类号： G03F7/322

摘要： The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.The developer composition gives a very good yield, makes possible short developing times and does not cause any problems due to flaky deposits of layer constituents or foaming. A process for developing positive-working, negative-working and reversible reprographic layers with the developer composition is also disclosed.

摘要翻译： 本发明涉及一种用于辐射敏感的阳性作用和负性和可逆复制层的显影剂组合物，除了辐射敏感化合物或化合物的辐射敏感组合之外，其包含作为必需成分的不溶性粘合剂的粘合剂 所述显影剂组合物的特征在于其含有（a）O-羧甲基或O，O-双羧基甲基乙二醇或适当取代的聚乙二醇，其包含2至约500个 乙二醇单元，（b）至少一种在水中显示碱性反应的化合物，其选自碱金属氢氧化物，碱金属硅酸盐，碱金属磷酸盐，碱金属硼酸盐，氢氧化铵，硅酸铵，磷酸铵和硼酸铵 ，（c）水。 显影剂组合物产生非常好的产率，使得可能短的显影时间，并且不会由于层成分的片状沉积或发泡而引起任何问题。 还公开了利用显影剂组合物开发正性，负性和可逆复制层的方法。

公开(公告)号：US4927732A

公开(公告)日：1990-05-22

申请号：US260307

申请日：1988-10-20

申请人： Hans-Joachim Merrem ,  Gerhard Buhr ,  Ruediger Lenz

发明人： Hans-Joachim Merrem ,  Gerhard Buhr ,  Ruediger Lenz

IPC分类号： G03C1/00 ,  G03C1/72 ,  G03C1/73 ,  G03F7/004 ,  G03F7/022 ,  G03F7/09

CPC分类号： G03F7/091

摘要： A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C--O--C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.

摘要翻译： 公开了一种正性感光性组合物，其包含与邻醌二叠氮类型的光敏化合物或包含光解酸供体与含有COC基团的化合物组合的粘合剂，在水溶性溶剂中可溶或溶胀的粘合剂， 碱性溶液和通式I的染料（I）本发明的光敏组合物比含有其它染料的可比组合物具有更高的光敏性。

公开(公告)号：US4802312A

公开(公告)日：1989-02-07

申请号：US395619

申请日：1982-07-06

申请人： Karl C. Glaeser ,  Gerhard Buhr

发明人： Karl C. Glaeser ,  Gerhard Buhr

IPC分类号： B24C1/08 ,  B24C1/00

CPC分类号： B24C7/0084 ,  B24C11/005 ,  B24C7/0046

摘要： For sand blasting a stream of a suspension of a carrier gas and solid particles under superatmospheric pressure is restricted so that it is accelerated, and a liquid-carrying additive gas is mixed with the stream to moisten the particles. The additive gas is introduced into the stream at a pressure greater than the pressure of the stream at the location by between 1.5 and 2.5 times. Normally the additive-gas pressure is about twice the carrier-gas pressure, that is the additive gas is normally introduced at a pressure of between about 10 bar and 30 bar. This high-pressure introduction ensures that the additive gas enters well into the carrier-gas stream so that the liquid carried by the additive gas contacts and wets the solids carried by the carrier gas without just passing through it and wetting the inside of the sand-blast mix nozzle. The additive gas is introduced into the stream in a unit of time at a rate sufficient to introduce into the stream a quantity of the liquid equal to between about one-twentieth to one-thirtieth, preferably one-twenty-fifth, the mass of the particles passing the location during the unit of time.

摘要翻译： 对于喷砂，限制了载气和固体颗粒在超大气压下的悬浮液流，使其加速，并将载液的添加剂气体与流混合以润湿颗粒。 添加气体以比该位置处的流的压力大1.5-2.5倍的压力被引入流中。 通常，添加剂 - 气体压力是载气压力的约两倍，即通常在约10巴和30巴之间的压力下引入添加气体。 这种高压引入确保添加剂气体充分进入载气流中，使得由添加气体携带的液体接触并润湿由载气承载的固体，而不仅仅通过它并润湿砂 - 喷射混合喷嘴。 将添加气体以足以引入流中的一定时间的时间单位引入流中，所述液体的量等于大约二十分之一到一三十分之一，优选二十五分之一 颗粒在时间单位内通过位置。

公开(公告)号：US4339530A

公开(公告)日：1982-07-13

申请号：US196279

申请日：1980-10-14

申请人： Gerhard Sprintschnik ,  Rudolf Neubauer ,  Gerhard Buhr

发明人： Gerhard Sprintschnik ,  Rudolf Neubauer ,  Gerhard Buhr

IPC分类号： G03F7/038 ,  G03F7/30 ,  G03F7/32 ,  G03C5/24 ,  G03C7/02

CPC分类号： G03F7/32

摘要： This invention relates to a developer mixture for washing out light-sensitive copying layers previously exposed in imagewise manner and containing a polymer of an N-vinyl amine, of vinyl alcohol or of a vinyl alcohol derivative, an alcohol being water-soluble in an amount less than 10% by weight, and water as the main constituent, the mixture containing as said polymer a copolymer which is water-soluble or which can be dispersed in water to form a stable dispersion, composed of (a) hydrophilic units of the formula I: ##STR1## wherein A is O-R or ##STR2## R is a hydrogen atom or a methyl group; R.sub.1 is a hydrogen atom, an alkyl group or an alkoxy alkyl group having 1 to 10 carbon atoms each or an aryl group with 6 to 10 carbon atoms; R.sub.2 is an alkyl group or an acyl group having 1 to 5 carbon atoms each, and wherein a homopolymer of the hydrophilic units is water-soluble and of (b) hydrophobic units of vinyl monomers whose homopolymer is water-insoluble and which have an aromatic or a long-chain aliphatic group as the substituent, the proportion of the hydrophobic units being sufficient to ensure that an 0.1% aqueous solution of said copolymer has a surface tension of not more than 50 mN/m and that the quantity of said copolymer is at least sufficient to emulsify any quantity of alcohol exceeding the solubility limit. The invention also relates to a process for developing exposed light-sensitive copying layers using said developer mixture.

摘要翻译： 本发明涉及一种显影剂混合物，其用于洗涤先前以成像方式暴露并含有N-乙烯基胺，乙烯醇或乙烯醇衍生物的聚合物的乙烯醇衍生物的聚合物，水溶性的醇 小于10重量％，以水为主要成分，该混合物含有作为所述聚合物的共聚物，该共聚物是水溶性的，或者可以分散在水中以形成稳定的分散体，它由（a）式 I：其中A为OR或R为氢原子或甲基; R1是氢原子，烷基或具有1-10个碳原子的烷氧基烷基或具有6-10个碳原子的芳基; R 2是各自具有1至5个碳原子的烷基或酰基，并且其中亲水单元的均聚物是水溶性的，和（b）均聚物是水不溶性且具有芳族化合物的乙烯基单体的疏水单元 或长链脂族基团作为取代基时，疏水单元的比例足以确保所述共聚物的0.1％水溶液的表面张力不大于50mN / m，并且所述共聚物的量为 至少足以使超过溶解度极限的任何量的醇乳化。 本发明还涉及使用所述显影剂混合物显影曝光的感光复印层的方法。

公开(公告)号：US5776652A

公开(公告)日：1998-07-07

申请号：US949777

申请日：1997-10-14

申请人： Mathias Eichhorn ,  Gerhard Buhr

发明人： Mathias Eichhorn ,  Gerhard Buhr

IPC分类号： C07D295/12 ,  C07C245/20 ,  C07C309/06 ,  C07C323/48 ,  C07D209/88 ,  C07D295/135 ,  G03C1/56 ,  G03F7/016 ,  G03F7/021 ,  G03F7/09 ,  G03F7/023

CPC分类号： C07D295/135 ,  C07C245/20 ,  C07C323/48 ,  C07D209/88 ,  G03C1/56 ,  G03F7/0163 ,  G03F7/021 ,  G03F7/091

摘要： The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.

摘要翻译： 本发明涉及1,1,2,3,3,3-六氟 - 丙磺酸芳族或杂芳族单或双重氮。 它们用于用于涂覆辐射敏感记录材料的正性或负性辐射敏感混合物中。

公开(公告)号：US5693449A

公开(公告)日：1997-12-02

申请号：US437928

申请日：1995-05-09

申请人： Stephan J. W. Platzer ,  Wojciech A. Wilczak ,  Gerhard Buhr ,  Dieter Mohr

发明人： Stephan J. W. Platzer ,  Wojciech A. Wilczak ,  Gerhard Buhr ,  Dieter Mohr

IPC分类号： G03C1/675 ,  C08F2/50 ,  G03F3/10 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/105 ,  G03F7/34

CPC分类号： G03F3/106 ,  G03F7/0295 ,  Y10S430/121 ,  Y10S430/126 ,  Y10S430/127

摘要： A photosensitive material for the production of color proofing films for multicolor printing, having (A) a transparent, flexible film support, (B) a photopolymerizable layer which contains (B1) a polymeric binder, (B2) a free-radical-polymerizable compound, (B3) a substituted bistrihalomethyl-s-triazine having an absorption maximum in the range from 300 to 380 nm and an absorbance of greater than 11,000 at the absorption maximum, and an absorbance of less than 1400 at 400 nm and above, as photoinitiator, and (B4) a dye or a colored pigment in a primary color of multicolor printing, and (C) a thermoplastic adhesive layer on the photosensitive layer. The material is processed by lamination onto an image-receiving material, exposure of the material and peeling apart of film support and image-receiving material, leaving the unexposed layer areas on the image-receiving material together with the adhesive layer. To produce a multicolored image, these steps are repeated with at least one further single-color sheet. The material has increased photosensitivity and gives color prints with lower background discoloration.

摘要翻译： 一种用于生产多色印刷用彩色印刷膜的感光材料，其具有（A）透明柔性膜载体，（B）含有（B1）聚合物粘合剂的可光聚合层，（B2）可自由基聚合的化合物 ，（B3）作为光引发剂，吸收最大值为300〜380nm，吸收最大吸光度为11000以上，400nm以上的吸光度小于1400的取代双三甲基-s-三嗪 ，和（B4）多色印刷原色的染料或着色颜料，（C）感光层上的热塑性粘合剂层。 该材料通过层压到图像接收材料上，曝光材料并剥离薄膜载体和图像接收材料，将图像接收材料上的未曝光层区域与粘合剂层一起留下。 为了产生多色图像，这些步骤与至少一个另外的单色片重复。 该材料具有增加的光敏性，并且具有较低背景变色的彩色印刷品。

公开(公告)号：US5413899A

公开(公告)日：1995-05-09

申请号：US254500

申请日：1994-06-06

申请人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

发明人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

IPC分类号： G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/021 ,  G03F7/30

CPC分类号： G03F7/022

摘要： A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

摘要翻译： 含有不溶于水但在碱性水溶液中至少溶胀或至少可溶胀的树脂粘合剂和邻萘醌二叠氮化物 - 磺酸酯的光敏混合物，该邻萘醌二叠氮化物 - 磺酸酯为式I 其中R为氢或烷基或芳基，R1为氢或1,2-萘醌-2-重氮-4-磺酰基，1,2-萘醌-2-重氮基-5-磺酰基 或7-甲氧基-1,2-萘醌-2-二叠氮-4-磺酰基，分子中定义为R1的相同或不同的萘醌二叠氮基 - 磺酰基的数目为1〜5; 可用于制备光敏抗蚀剂材料。 使用感光性混合物制造的抗蚀剂材料具有高的光敏感性和对碱性显影剂非常好的显影剂抗性，并且可以在没有水性弱碱性溶液的问题的情况下开发。