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84 条记录 (耗时 0.022 秒)

    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
    7.
    发明授权
    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof 失效
    具有N，N-二取代磺酰胺侧基的聚合物及其用途

    公开(公告)号：US5442087A

    公开(公告)日：1995-08-15

    申请号：US165148

    申请日：1993-12-10

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  G03F7/039 ,  C07C271/12 ,  C07C271/24 ,  C07C271/28 ,  C07C311/06

    CPC分类号： C08F20/38 ,  C07C311/53 ,  G03F7/039 ,  Y10S430/107

    摘要： The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R1-SO2-N（CO-OR2）-R3-O-CO-CR4 = CH2和R1-N（CO-OR2）-SO2-R3-O-CO-CR4 = CH2的单体， 其中R 1是（C 1 -C 20）烷基，（C 3 -C 10）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基，任选地被杂原子取代的含烷基基团中的单个亚甲基， （C3-C11）烷基，（C3-C11）烯基或（C7-C11）芳烷基，R3是未取代或取代的（C1-C6）烷基，（C3-C6）环烷基，（C6-C4）芳基或 （C7-C20）芳烷基，R4为氢原子或甲基。 它还涉及具有至少5mol％具有式（e）-R3-N（CO-OR2）-SO2-R1（I）和/或-R3-SO2-N（CO- OR2）-R1（II）和对辐射敏感的混合物，其包含：a）在光化辐射的影响下形成酸的化合物，和b）在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度，以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

    Sulphonyliso(thio)ureas
    10.
    发明授权
    Sulphonyliso(thio)ureas 失效
    磺酰基（硫）脲

    公开(公告)号：US4923505A

    公开(公告)日：1990-05-08

    申请号：US242398

    申请日：1988-09-09

    申请人： Hans-Jochem Riebel ,  Christa Fest ,  Klaus-Helmut Muller ,  Hans-Joachim Santel ,  Robert R. Schmidt ,  Harry Strang

    发明人： Hans-Jochem Riebel ,  Christa Fest ,  Klaus-Helmut Muller ,  Hans-Joachim Santel ,  Robert R. Schmidt ,  Harry Strang

    IPC分类号： A01N47/42 ,  C07C67/00 ,  C07C301/00 ,  C07C311/53 ,  C07C325/00 ,  C07D239/42 ,  C07D239/47 ,  C07D239/52 ,  C07D251/16 ,  C07D251/22 ,  C07D251/46 ,  C07D521/00

    CPC分类号： C07D521/00 ,  A01N47/42

    摘要： Herbicidal sulphonyliso(thio)ureas of the formula ##STR1## in which M stands for hydrogen or an alkali metal equivalent or an alkaline earth metal equivalent,n stands for the numbers zero or 1,Q stands for oxygen or sulphur,R.sup.1 stands for C.sub.1 -C.sub.6 -alkyl which is optionally substituted by substituents from the series comprising halogen or C.sub.1 -C.sub.4 -alkoxy,R.sup.2 stands for an optionally substituted phenyl radical,R.sup.3 stands for C.sub.1 -C.sub.2 -alkyl or C.sub.1 -C.sub.2 -alkoxy which are optionally substituted by halogen,R.sup.4 stands for C.sub.1 -C.sub.2 -alkyl or C.sub.1 -C.sub.2 -alkoxy which are optionally substituted by halogen, and Z stands for N or CH, with the proviso that Z stands for N when n stands for zero.Intermediates of the formula ##STR2## and ##STR3## are also new.

    摘要翻译： 其中M代表氢或碱金属当量或碱土金属当量的式（I）的除草磺酰基（硫代）脲，n代表数字0或1，Q代表氧或硫，R1 代表任选被包含卤素或C 1 -C 4 - 烷氧基的系列的取代基取代的C 1 -C 6 - 烷基，R 2代表任意取代的苯基，R 3代表C 1 -C 2烷基或C 1 -C 2烷氧基， 任选被卤素取代，R 4代表任选被卤素取代的C 1 -C 2 - 烷基或C 1 -C 2 - 烷氧基，Z代表N或CH，条件是当n代表0时，Z代表N。 公式和的中间体也是新的。