公开(公告)号：US20070023705A1

公开(公告)日：2007-02-01

申请号：US11168190

申请日：2005-06-27

申请人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov ,  Oleh Khodykin

发明人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov ,  Oleh Khodykin

IPC分类号： G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  H05G2/005

摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

摘要翻译： 一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物 收集器光学元件上的材料化合物。 该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物 可能被确定为有效。 延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。

公开(公告)号：US20060192154A1

公开(公告)日：2006-08-31

申请号：US11067124

申请日：2005-02-25

申请人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

发明人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US20070187627A1

公开(公告)日：2007-08-16

申请号：US11705954

申请日：2007-02-13

申请人： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov

发明人： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov

IPC分类号： G01J3/10

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

摘要翻译： 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US20070158597A1

公开(公告)日：2007-07-12

申请号：US11647016

申请日：2006-12-27

申请人： Igor Fomenkov ,  Alexander Ershov

发明人： Igor Fomenkov ,  Alexander Ershov

IPC分类号： G01J3/10

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis. of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20060249699A1

公开(公告)日：2006-11-09

申请号：US11406216

申请日：2006-04-17

申请人： Norbert Bowering ,  Oleh Khodykin ,  Alexander Bykanov ,  Igor Fomenkov

发明人： Norbert Bowering ,  Oleh Khodykin ,  Alexander Bykanov ,  Igor Fomenkov

IPC分类号： G01J3/10

CPC分类号： H05G2/006 ,  B82Y10/00 ,  G21K2201/061 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.

摘要翻译： 公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。 在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素 元素表面。 锡化合物可以包括SnBr 4，SnBr 2和SnH 4。 另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

公开(公告)号：US5978391A

公开(公告)日：1999-11-02

申请号：US896384

申请日：1997-07-18

申请人： Palash P. Das ,  Richard L. Sandstrom ,  Igor Fomenkov

发明人： Palash P. Das ,  Richard L. Sandstrom ,  Igor Fomenkov

IPC分类号： G01M11/00 ,  G01J3/02 ,  G01J3/06 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/034 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

CPC分类号： H01S3/1303 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/134 ,  H01S3/225 ,  H01S3/1392

摘要： The preferred embodiment of the invention uses known atomic or molecular absorptions as absolute wavelength standards for calibrating wavelength measurement instruments used in tunable lasers. Examples of atomic and molecular absorptions are carbon and molecular oxygen that have absorptions including 193.0905 nm and 193.2728 nm, respectively, for use with a tunable Argon Fluoride excimer laser at approximately 193 nm. A wavelength measuring device (e.g., a wavemeter) is equipped with a gas cell containing the absorption gas. During a calibration procedure, the wavelength measured by the wavemeter is compared to the atomic or molecular absorption. The wavemeter's calibration constants are then adjusted accordingly to match the wavemeter's output to the atomic or molecular absorption wavelength. Such calibration procedures, therefore, calibrate the wavemeter to absolute standards and correct for any drift in the wavemeter that may occur between calibrations. Some gases, such as molecular oxygen, have multiple molecular absorptions within the tunable range of the laser. The use of multiple absorptions during calibration procedure enhances the precision of the procedure due to the proximity of an absorption line to the final wavelength of interest. After calibration, the laser is tuned to the final wavelength of interest using the calibrated wavemeter.

摘要翻译： 本发明的优选实施方案使用已知的原子或分子吸收作为用于校准可调激光器中使用的波长测量仪器的绝对波长标准。 原子和分子吸收的实例是碳和分子氧，它们分别具有包括193.0905nm和193.2728nm的吸收，用于在约193nm的可调谐氩化物准分子激光器。 波长测量装置（例如波分计）装备有包含吸收气体的气室。 在校准过程中，将波分计测得的波长与原子或分子吸收进行比较。 然后相应调整波形计的校准常数，以将波长计的输出与原子或分子吸收波长相匹配。 因此，这种校准程序将波形计校准为绝对标准，并校正校准之间可能发生的波长计中的任何漂移。 一些气体，如分子氧，在激光器的可调谐范围内具有多个分子吸收。 在校准过程中使用多重吸收增加了由于吸收线与感兴趣的最终波长的接近而导致的程序精度。 校准后，使用校准波长计将激光器调谐到感兴趣的最终波长。

公开(公告)号：US20130043401A1

公开(公告)日：2013-02-21

申请号：US13249504

申请日：2011-09-30

申请人： Matthew Graham ,  Steven Chang ,  Jim Crouch ,  Igor Fomenkov

发明人： Matthew Graham ,  Steven Chang ,  Jim Crouch ,  Igor Fomenkov

IPC分类号： G01J1/42 ,  G01J1/16

CPC分类号： G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.

摘要翻译： 一种装置包括驱动激光系统，其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统，其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统，其在目标区域中提供含有目标材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离，两个或更多个传感器被配置为当被放大的脉冲波束与目标混合物相交时，检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。 控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。

公开(公告)号：US20070125970A1

公开(公告)日：2007-06-07

申请号：US11646938

申请日：2006-12-27

申请人： Igor Fomenkov ,  Alexander Ershov

发明人： Igor Fomenkov ,  Alexander Ershov

IPC分类号： G01J3/10

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US5450207A

公开(公告)日：1995-09-12

申请号：US93355

申请日：1993-07-16

申请人： Igor Fomenkov

发明人： Igor Fomenkov

IPC分类号： G01J3/51 ,  G01J20060101 ,  G01J1/42 ,  G01J3/12 ,  G01J3/28 ,  G01J9/00 ,  H01S20060101 ,  H01S3/10 ,  H01S3/13 ,  H01S3/139 ,  H01S3/225

CPC分类号： H01S3/1303 ,  G01J3/12 ,  H01S3/1392 ,  G01J2003/2866 ,  G01J9/00

摘要： Calibration of a wavelength adjustment mechanism of a laser is achieved using a hollow cathode absorption lamp. The lamp is provided with a vaporous material having a precisely known wavelength of maximum absorption. A photo-detector detects the amount of light from the laser beam absorbed by the vaporous material as a function of wavelength. The wavelength of the laser is adjusted to achieve maximum absorption such that the actual laser beam wavelength may be compared with an expected, wavelength to determine a calibration offset. The hollow cathode lamp is operated to produce a vaporous material of known absorption characteristic but is illuminated at a level substantially below a level required for conventional opto-galvanic resonance.

摘要翻译： 使用中空阴极吸收灯实现激光的波长调节机构的校准。 该灯具有具有精确已知的最大吸收波长的气态材料。 光检测器检测作为波长的函数的由气态材料吸收的激光束的光量。 调整激光器的波长以实现最大吸收，使得实际的激光束波长可以与预期的波长进行比较以确定校准偏移。 空心阴极灯被操作以产生已知吸收特性的气态材料，但被照射在基本上低于常规光电共振所需水平的水平。

公开(公告)号：US20080017801A1

公开(公告)日：2008-01-24

申请号：US11647024

申请日：2006-12-27

申请人： Igor Fomenkov ,  Alexander Ershov

发明人： Igor Fomenkov ,  Alexander Ershov

IPC分类号： G01J1/18 ,  G01J1/04

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.