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    Method and apparatus for EUV plasma source target delivery
    1.
    发明申请
    Method and apparatus for EUV plasma source target delivery 有权
    用于EUV等离子体源目标传递的方法和装置

    公开(公告)号：US20060192154A1

    公开(公告)日：2006-08-31

    申请号：US11067124

    申请日：2005-02-25

    申请人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

    发明人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

    摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

    摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

    EUV collector debris management
    2.
    发明申请
    EUV collector debris management 失效
    EUV收集器碎片管理

    公开(公告)号：US20060091109A1

    公开(公告)日：2006-05-04

    申请号：US10979945

    申请日：2004-11-01

    申请人： William Partlo ,  Richard Sandstrom ,  Igor Fomenkov ,  Alexander Ershov ,  William Oldham ,  William Marx ,  Oscar Hemberg

    发明人： William Partlo ,  Richard Sandstrom ,  Igor Fomenkov ,  Alexander Ershov ,  William Oldham ,  William Marx ,  Oscar Hemberg

    IPC分类号： H01L21/306 ,  B08B6/00 ,  B44C1/22

    CPC分类号： B08B7/00

    摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.

    摘要翻译： 可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。 蚀刻剂源材料可以包含卤素或卤素化合物。 蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。 该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。 还可以存在离子加速剂将离子朝向反射表面加速。 离子可以包括蚀刻剂源材料。 该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

    Laser produced plasma EUV light source
    3.
    发明申请
    Laser produced plasma EUV light source 有权
    激光产生等离子体EUV光源

    公开(公告)号：US20080179548A1

    公开(公告)日：2008-07-31

    申请号：US11786145

    申请日：2007-04-10

    申请人： Alexander Bykanov ,  Norbert Bowering ,  Igor Fomenkov ,  David Brandt ,  Alexander Ershov ,  Oleh Khodykin ,  William Partlo

    发明人： Alexander Bykanov ,  Norbert Bowering ,  Igor Fomenkov ,  David Brandt ,  Alexander Ershov ,  Oleh Khodykin ,  William Partlo

    IPC分类号： H05H1/24

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

    摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.

    摘要翻译： 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。 在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

    Laser output beam wavefront splitter for bandwidth spectrum control
    4.
    发明申请
    Laser output beam wavefront splitter for bandwidth spectrum control 有权

    公开(公告)号：US20050286598A1

    公开(公告)日：2005-12-29

    申请号：US10875662

    申请日：2004-06-23

    申请人： Richard Sandstrom ,  Daniel Brown ,  Alexander Ershov ,  Igor Fomenkov ,  William Partlo

    发明人： Richard Sandstrom ,  Daniel Brown ,  Alexander Ershov ,  Igor Fomenkov ,  William Partlo

    IPC分类号： G03F7/20 ,  H01S3/08 ,  H01S3/097 ,  H01S3/10 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/22

    CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

    摘要： An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.

    LPP EUV light source drive laser system
    7.
    发明申请
    LPP EUV light source drive laser system 有权
    LPP EUV光源驱动激光系统

    公开(公告)号：US20060192152A1

    公开(公告)日：2006-08-31

    申请号：US11217161

    申请日：2005-08-31

    申请人： Alexander Ershov ,  Alexander Bykanov ,  Oleh Khodykin ,  Igor Fomenkov

    发明人： Alexander Ershov ,  Alexander Bykanov ,  Oleh Khodykin ,  Igor Fomenkov

    IPC分类号： G01J1/00

    CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/008

    摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

    摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下 聚焦镜头。 驱动激光器可以包括CO 2激光器。 驱动激光重定向机构可以包括镜子。

    LPP EUV light source drive laser system
    8.
    发明申请
    LPP EUV light source drive laser system 有权
    LPP EUV光源驱动激光系统

    公开(公告)号：US20070001131A1

    公开(公告)日：2007-01-04

    申请号：US11174299

    申请日：2005-06-29

    申请人： Alexander Ershov ,  Alexander Bykanov ,  Oleh Khodykin ,  Igor Fomenkov

    发明人： Alexander Ershov ,  Alexander Bykanov ,  Oleh Khodykin ,  Igor Fomenkov

    IPC分类号： G01J1/00

    CPC分类号： H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

    摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下 聚焦镜头。 驱动激光器可以包括CO 2激光器。 驱动激光重定向机构可以包括镜子。

    Collector for EUV light source
    9.
    发明申请
    Collector for EUV light source 有权
    EUV光源收集器

    公开(公告)号：US20060131515A1

    公开(公告)日：2006-06-22

    申请号：US10798740

    申请日：2004-03-10

    申请人： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

    发明人： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

    IPC分类号： G01J1/00

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

    摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

    EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION
    10.
    发明申请
    EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 有权
    EUV光源收集器腐蚀减轻

    公开(公告)号：US20060289808A1

    公开(公告)日：2006-12-28

    申请号：US11238828

    申请日：2005-09-28

    申请人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov

    发明人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov

    IPC分类号： H01J61/62

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003

    摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

    摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。