摘要:
A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
摘要:
A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween. The external electrode is also formed to shield the outer gas volume and walls of the discharge chamber from the preionization unit. A semi-transparent external electrode prevents charged particles emanating from the main discharge area from settling on the housing and causing field distortion and discharge instabilities.
摘要:
Precise timing control can be obtained for a gas discharge laser, such as an excimer or molecular fluorine laser, using a timed trigger ionization. Instead of using a standard approach to control the timing of the emission or amplification of an optical pulse using the discharge of the main electrodes, the timing of which can only be controlled to within about 10 ns, a trigger ionization pulse applied subsequent to the charging of the main electrodes can be used to control the timing of the discharge, thereby decreasing the timing variations to about 1 ns. Since ionization of the laser gas can consume relatively small amounts of energy, such a circuit can be based on a fast, high-voltage, solid state switch that is virtually free of jitter. Trigger ionization also can be used to synchronize the timing of dual chambers in a MOPA configuration. In one such approach, ionization trigger can include at least a portion of the optical pulse from the oscillator in a MOPA configuration.
摘要:
Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.
摘要:
An excimer or molecular fluorine laser system includes a laser tube filled with a gas mixture including fluorine and a buffer gas, and multiple electrodes within the laser tube connected with a pulsed discharge circuit for energizing the gas mixture. At least one of the electrodes is longer than 28 inches in length, preferably two main electrodes are each extended to greater than 28 inches in length. The laser system further includes a resonator including the laser tube for generating a pulsed laser beam having a desired energy. The laser system is configured such that an output beam would be emitted having an energy below the desired energy if each of the electrodes were 28 inches in length or less, and the laser system outputs a beam at the desired energy due to the length of the electrodes being extended to a length greater than 28 inches.
摘要:
Arcing is minimized in a discharge chamber of a gas laser system by utilizing an electrode which comprises a surface portion capable of functioning as one of an anode and a cathode in order to energize a gas mixture in a discharge chamber of the gas discharge laser system, a shoulder portion being positioned on either side of the surface portion and being exposed to the gas mixture, and a coating layer made of electrically insulating material, wherein the coating layer is attached to the shoulder portion by a cold spraying method.
摘要:
An excimer or molecular fluorine laser, such as a KrF- or ArF-laser, or a molecular fluorine (F2) laser, particularly for photolithography applications, has a gas mixture including a trace amount of a gas additive. The concentration of the gas additive in the gas mixture is optimized for improving energy stability and/or the overshoot control of the laser output beam. The concentration is further determined and adjusted at new fills and/or during laser operation based on its effect on the output pulse energy in view of constraints and/or aging on the discharge circuit and/or other components of the laser system. Attenuation control is also provided for increasing the lifetimes of components of the laser system by controlling the concentration of the gas additive over time. A specific preferred concentration of xenon is more than 100 ppm for improving the energy stability and/or overshoot control. The laser system may be equipped with an internal gas supply unit including an internal xenon gas supply, or a xenon generator for supplying xenon gas from condensed matter xenon.
摘要:
A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween. The external electrode is also formed to shield the outer gas volume and walls of the discharge chamber from the preionization unit. A semi-transparent external electrode prevents charged particles emanating from the main discharge area from settling on the housing and causing field distortion and discharge instabilities.
摘要:
Arcing is minimized in a discharge chamber of a gas laser system by utilizing an electrode which comprises a surface portion capable of functioning as one of an anode and a cathode in order to energize a gas mixture in a discharge chamber of the gas discharge laser system, a shoulder portion being positioned on either side of the surface portion and being exposed to the gas mixture, and a coating layer made of electrically insulating material, wherein the coating layer is attached to the shoulder portion by a cold spraying method.
摘要:
Arcing is minimized in a discharge chamber of a gas laser system by utilizing an electrode which comprises a surface portion capable of functioning as one of an anode and a cathode in order to energize a gas mixture in a discharge chamber of the gas discharge laser system, a shoulder portion being positioned on either side of the surface portion and being exposed to the gas mixture, and a coating layer made of electrically insulating material, wherein the coating layer is attached to the shoulder portion by a cold spraying method.