公开(公告)号：US20090052787A1

公开(公告)日：2009-02-26

申请号：US12194373

申请日：2008-08-19

申请人： Naoyuki Satoh

发明人： Naoyuki Satoh

IPC分类号： G06K9/62 ,  G06K9/60

CPC分类号： G06F17/30247 ,  G06Q30/0643 ,  Y10S707/915

摘要： In an image search apparatus, a data manager responds to an instruction for a first search condition issued via a user interface to manage data of a target model acquired from a database and generates an image to be displayed on a user interface. A determination processor responds to an instruction for a second search condition issued by positioning a pointer on the whole model image to compare a closed area defined by the specified position with boundary information of each part image, retrieves candidate part images, and prioritizes the candidate part images in order of increasing area calculated based on the boundary information. A parts selection processor displays the retrieved candidate part images on the user interface according to the order of increasing area in response to an instruction for a third search condition for choosing a target part image from among the candidate part images.

摘要翻译： 在图像搜索装置中，数据管理器响应经由用户界面发布的第一搜索条件的指令来管理从数据库获取的目标模型的数据，并生成要在用户界面上显示的图像。 确定处理器响应通过将指针定位在整个模型图像上而发出的第二搜索条件的指令，以将由指定位置定义的封闭区域与每个部位图像的边界信息进行比较，检索候选部分图像，并且将候选部分 图像按照边界信息计算的增加面积的顺序。 部件选择处理器响应于用于从候选部位图像中选择目标部位图像的第三搜索条件的指令，根据增加面积的顺序，在用户界面上显示检索到的候选部位图像。

公开(公告)号：US06229545B1

公开(公告)日：2001-05-08

申请号：US09037536

申请日：1998-03-10

申请人： Naoyuki Satoh

发明人： Naoyuki Satoh

IPC分类号： G06T1500

CPC分类号： G06T17/00

摘要： A method of generating a solid-shell object from a solid object having a shelling-designated surface and other surfaces includes the steps of inwardly displacing the other surfaces to generate displaced surfaces, dividing the shelling-designated surface and the displaced surfaces into portions, removing unnecessary portions among the portions to leave necessary portions of the shelling-designated surface and the displaced surfaces, and connecting the necessary portions of the shelling-designated surface and the displaced surfaces together to generate a first surface model. The method further includes the steps of removing the shelling-designated surface from the solid object to generate a second surface model, and connecting the first surface model and the second surface model to generate the solid-shell object.

摘要翻译： 从具有脱壳指定表面和其他表面的固体物体产生固体壳物体的方法包括使其它表面向内移位以产生移位表面的步骤，将脱壳指定表面和位移表面分割成部分，去除 在该部分中不必要的部分留下脱壳指定表面和移动表面的必要部分，并将脱壳指定表面和移位表面的必要部分连接在一起以产生第一表面模型。 该方法还包括以下步骤：从固体物体去除脱壳指定的表面以产生第二表面模型，以及连接第一表面模型和第二表面模型以生成固体 - 壳体。

公开(公告)号：US6045893A

公开(公告)日：2000-04-04

申请号：US75822

申请日：1998-05-12

申请人： Hideko Fukushima ,  Naoyuki Satoh ,  Hiroyuki Itoh ,  Tomomi Ogawa

发明人： Hideko Fukushima ,  Naoyuki Satoh ,  Hiroyuki Itoh ,  Tomomi Ogawa

IPC分类号： H05K1/09 ,  C04B35/00 ,  H01F17/00 ,  H01F17/04 ,  H01F41/04 ,  H01F41/16 ,  H01G4/30 ,  H01L23/544 ,  H05K1/03 ,  H05K3/46 ,  B32B3/00

CPC分类号： H01L23/544 ,  H01F17/0013 ,  H01F17/04 ,  H01F41/043 ,  H01F41/046 ,  H01F41/16 ,  H01G4/30 ,  H01L2223/54473 ,  H01L2924/0002 ,  H01L2924/09701 ,  H05K1/0306 ,  H05K3/4611 ,  H05K3/4629 ,  Y10S428/901 ,  Y10T428/24917 ,  Y10T428/24926

摘要： A multilayered electronic part with minimized silver diffusion into ceramic body. The multilayered electronic part is produced by sintering a green ceramic body of a plurality of ceramic layers comprising a main phase and a grain boundary phase, at least one of the ceramic layers being printed thereon Ag-containing internal electrode patterns which may serve as markers for indicating several information such as a production number, a name of manufacturer, a kind of circuit, etc. By the production method of the invention, the diffusion of Ag in the internal electrode patterns into the ceramic body is effectively prevented to avoid the deterioration of the electrical characteristics as well as to avoid the blackening of the ceramic to ensure a high lightness of the ceramic body which enhances the reliability of the visual identification and distinguishability of the markers.

摘要翻译： 多层电子部件，其最小化银扩散到陶瓷体中。 多层电子部件通过烧结包含主相和晶界相的多个陶瓷层的生坯陶瓷体来制造，至少一个陶瓷层被印刷在其上的含Ag内部电极图案，其可以用作 表示生产编号，制造商名称，电路种类等多种信息。通过本发明的制造方法，可以有效地防止Ag在内部电极图案中扩散到陶瓷体中，以避免劣化 电气特性以及避免陶瓷变黑以确保陶瓷体的高亮度，从而提高了可视化识别的可靠性和标记的可区分性。

公开(公告)号：US09117635B2

公开(公告)日：2015-08-25

申请号：US13245194

申请日：2011-09-26

申请人： Naoyuki Satoh ,  Nobuyuki Nagayama ,  Keiichi Nagakubo

发明人： Naoyuki Satoh ,  Nobuyuki Nagayama ,  Keiichi Nagakubo

IPC分类号： C23C16/50 ,  C23C16/503 ,  C23C16/505 ,  C23C16/509 ,  C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01J37/32449 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/505 ,  C23C16/509 ,  H01J37/32009 ,  H01J37/3244 ,  H01J37/32541

摘要： An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.

摘要翻译： 将等离子体蚀刻用电极板形成为具有规定厚度的盘状，在多个同心圆的不同圆周上设置贯穿电极板表面垂直的表面的多个气孔，电极板为 在电极板的径向方向分成两个或更多个区域，设置在两个或更多个区域中的气孔的类型通过区域彼此不同。

公开(公告)号：US07867926B2

公开(公告)日：2011-01-11

申请号：US12155474

申请日：2008-06-04

申请人： Naoyuki Satoh ,  Takeshi Tamura ,  Hiroyuki Ide ,  Manabu Hama

发明人： Naoyuki Satoh ,  Takeshi Tamura ,  Hiroyuki Ide ,  Manabu Hama

IPC分类号： H01L21/00

CPC分类号： H01L21/3105 ,  H01L21/67115 ,  H01L21/67225 ,  H01L21/68742 ,  Y10T117/1016

摘要： A substrate processing apparatus is used for radiating UV rays onto a target film formed on a target surface of a substrate to perform a curing process of the target film. The apparatus includes a hot plate configured to heat the substrate to a predetermined temperature, a plurality of support pins disposed on the hot plate to support the substrate, and a UV radiating device configured to radiate UV rays onto the target surface of the substrate supported on the support pins. The support pins are preset to provide a predetermined thermal conductivity to conduct heat of the substrate to the hot plate. The hot plate is preset to have a predetermined thermal capacity sufficient to absorb heat conducted through the support pins.

摘要翻译： 使用基板处理装置将UV线照射到形成在基板的目标表面上的目标膜上，进行目标膜的固化处理。 该装置包括：被配置为将基板加热到预定温度的热板，设置在热板上的多个支撑销以支撑基板;以及UV辐射装置，其配置成将紫外线辐射到支撑在基板上的基板的目标表面上 支撑销。 支撑销被预设为提供预定的热导率以将基板的热量传导到热板。 热板被预设为具有足以吸收通过支撑销传导的热的预定热容量。

公开(公告)号：US07862959B2

公开(公告)日：2011-01-04

申请号：US11030963

申请日：2005-01-10

申请人： Katsuya Okumura ,  Kazuya Nagaseki ,  Naoyuki Satoh

发明人： Katsuya Okumura ,  Kazuya Nagaseki ,  Naoyuki Satoh

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/50 ,  H01J37/3174 ,  H01J2237/31788 ,  H01J2237/31794

摘要： The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the plurality of cells is exposed to a charged particle beam, each of the plurality of cells is adapted to make the charged particle beam pass through itself to the other side thereof based on the pattern of the opening formed in the cell. Thus, when a substrate to be processed is arranged on the other side of the cell, the pattern of the opening formed in the cell is transferred to the substrate to be processed and hence an exposure pattern is formed on the substrate to be processed. The feature of the present invention is that a part of or all the plurality of cells can be exchanged at the mask portion.

摘要翻译： 本发明是用于曝光的转印掩模，其包括具有多个单元的掩模部分，每个单元都形成有预定图案的开口。当多个单元的一侧暴露于带电粒子束时， 多个单元适于基于形成在单元中的开口的图案使带电粒子束自身通过其自身的另一侧。 因此，当待处理基板布置在单元的另一侧时，形成在单元中的开口的图案被转移到待处理的基板，因此在待处理的基板上形成曝光图案。 本发明的特征在于，可以在掩模部分更换多个单元的一部分或全部。

公开(公告)号：US20090022946A1

公开(公告)日：2009-01-22

申请号：US12223765

申请日：2007-02-08

申请人： Masato Hayashi ,  Msanori Yamaguchi ,  Yohei Yamada ,  Jun Murase ,  Katsuyuki Ono ,  Naoyuki Satoh

发明人： Masato Hayashi ,  Msanori Yamaguchi ,  Yohei Yamada ,  Jun Murase ,  Katsuyuki Ono ,  Naoyuki Satoh

IPC分类号： B32B7/00 ,  B44C1/22

CPC分类号： B81C1/00682 ,  B81B2201/0292 ,  B81B2203/0127 ,  B81C1/00158 ,  G03F1/20 ,  H01J5/18 ,  Y10T428/24174

摘要： The present invention provides a membrane structure having favorable pressure resistance and a manufacturing method of the same. After forming an opening (21a) on a substrate (21) by Deep Digging Reactive Ion Etching (DRIE), vertical streak formed by DRIE on the side face (inner peripheral face) of the opening (21a) is removed by performing light etching with an alkali etchant. The level of overhang of an overhanging section (21b) formed when forming an opening (22a) of a BOX layer (22) is suppressed by suppressing the overetching level when forming the BOX layer (22) by etching.

摘要翻译： 本发明提供具有良好耐压性的膜结构及其制造方法。 在通过深挖反应离子蚀刻（DRIE）在基板（21）上形成开口（21a）之后，通过对开口21a的侧面（内周面）形成的由DRIE形成的垂直条纹，通过用 碱蚀刻剂。 当通过蚀刻形成BOX层（22）时，通过抑制过蚀刻水平来抑制在形成BOX层（22）的开口（22a）时形成的悬垂部分（21b）的悬垂度。

公开(公告)号：US07473567B2

公开(公告)日：2009-01-06

申请号：US11685322

申请日：2007-03-13

申请人： Kazuyuki Mitsuoka ,  Yusuke Saito ,  Naoyuki Satoh

发明人： Kazuyuki Mitsuoka ,  Yusuke Saito ,  Naoyuki Satoh

IPC分类号： H01L21/66

CPC分类号： H01L22/20 ,  H01J2237/304 ,  H01J2237/3156 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A change rate prediction method according to which there can be eliminated the need for experimentally determining electron beam intensities for making a change rate of a specification value of a predetermined film on a substrate uniform. The distribution of the shrinkage rate of a low-k film on a wafer upon the low-k film being modified is measured while changing the inputted current value inputted to a central electron beam tube of an electron beam irradiating mechanism, the relationship between the inputted current value and the shrinkage rate measured directly below the electron beam tube is calculated, and a dose distribution calculated through simulation is converted into a low-k film shrinkage rate distribution based on the ratio between the inputted current value and the dose and a power curve giving the relationship between the inputted current value and the measured shrinkage rate.

摘要翻译： 一种变化率预测方法，其中可以消除实验确定电子束强度的需要，以使基板上的预定膜的规格值的变化率均匀。 在改变输入到电子束照射机构的中央电子束管的输入电流值时，测量低k膜被修改时的低k膜在晶片上的收缩率的分布，输入的 计算直接在电子束管下方测量的电流值和收缩率，并且通过模拟计算的剂量分布基于输入的电流值与剂量之间的比率和功率曲线被转换为低k膜收缩率分布 给出输入的电流值和测量的收缩率之间的关系。

公开(公告)号：US20070231459A1

公开(公告)日：2007-10-04

申请号：US11685322

申请日：2007-03-13

申请人： Kazuyuki MITSUOKA ,  Yusuke Saito ,  Naoyuki Satoh

发明人： Kazuyuki MITSUOKA ,  Yusuke Saito ,  Naoyuki Satoh

IPC分类号： C23C16/52 ,  G06F19/00

CPC分类号： H01L22/20 ,  H01J2237/304 ,  H01J2237/3156 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A change rate prediction method according to which there can be eliminated the need for experimentally determining electron beam intensities for making a change rate of a specification value of a predetermined film on a substrate uniform. The distribution of the shrinkage rate of a low-k film on a wafer upon the low-k film being modified is measured while changing the inputted current value inputted to a central electron beam tube of an electron beam irradiating mechanism, the relationship between the inputted current value and the shrinkage rate measured directly below the electron beam tube is calculated, and a dose distribution calculated through simulation is converted into a low-k film shrinkage rate distribution based on the ratio between the inputted current value and the dose and a power curve giving the relationship between the inputted current value and the measured shrinkage rate.

摘要翻译： 一种变化率预测方法，其中可以消除实验确定电子束强度的需要，以使基板上的预定膜的规格值的变化率均匀。 在改变输入到电子束照射机构的中央电子束管的输入电流值时，测量低k膜被修改时的低k膜在晶片上的收缩率的分布，输入的 计算直接在电子束管下方测量的电流值和收缩率，并且通过模拟计算的剂量分布基于输入的电流值与剂量之间的比率和功率曲线被转换为低k膜收缩率分布 给出输入的电流值和测量的收缩率之间的关系。