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38 条记录 (耗时 0.025 秒)

    Method and apparatus for large-scale diamond polishing
    21.
    发明授权
    Method and apparatus for large-scale diamond polishing 失效
    用于大规模金刚石抛光的方法和装置

    公开(公告)号：US06652763B1

    公开(公告)日：2003-11-25

    申请号：US09541178

    申请日：2000-04-03

    申请人： Ronghua Wei ,  Daniel J. Gregoire

    发明人： Ronghua Wei ,  Daniel J. Gregoire

    IPC分类号： B44C122

    CPC分类号： H01J37/32688 ,  C30B29/04 ,  C30B33/00 ,  H01J37/32623 ,  H01J2237/336

    摘要： A method and apparatus for the polishing of diamond surfaces, wherein the diamond surface is subjected to plasma-enhanced chemical etching using an atomic oxygen polishing plasma source, are disclosed. In the apparatus, a magnetic filter passes a plume of high-density, low-energy, atomic oxygen plasma. The plasma is capable of uniformly polishing diamond surfaces.

    摘要翻译： 公开了一种用于抛光金刚石表面的方法和设备，其中使用原子氧抛光等离子体源对金刚石表面进行等离子体增强化学蚀刻。 在该装置中，磁性过滤器通过高密度，低能量的原子氧等离子体的羽流。 等离子体能够均匀抛光金刚石表面。

    Method and apparatus for testing parts and materials in a controlled environment such as an atomic oxygen atmosphere
    22.
    发明授权
    Method and apparatus for testing parts and materials in a controlled environment such as an atomic oxygen atmosphere 失效
    用于在诸如原子氧气氛的受控环境中测试零件和材料的方法和装置

    公开(公告)号：US5281535A

    公开(公告)日：1994-01-25

    申请号：US906791

    申请日：1992-06-30

    申请人： Ronghua Wei ,  Paul J. Wilbur ,  Samuel C. Wu

    发明人： Ronghua Wei ,  Paul J. Wilbur ,  Samuel C. Wu

    IPC分类号： G01N17/00 ,  G01N33/20 ,  G01N3/56 ,  G01N19/06

    CPC分类号： G01N33/20 ,  G01N17/00

    摘要： Method and apparatus are provided for testing parts and materials in a controlled environment, especially an atomic oxygen environment. The apparatus includes a housing which has sample station located in its interior to receive a test sample. A contact element contacts a surface of the test sample, and a drive reciprocates the contact element so that the surface is subjected to wear along a wear path. At least one testing fluid is introduced and removed from the interior with the locations of introduction on removal preferably being such that the testing fluid flows across the test sample. The drive may be a carriage operated through the housing sidewall by a ferromagnetic coupling, and the sample station may be a turntable rotated by a ferromagnetic coupling. A second sample station may be included so that different wear path configurations are possible. The method includes the steps of placing a test sample on a sample support station, contacting the test sample with a contact element, isolating the interior of the housing from the ambient environment, introducing and removing at least one testing fluid at locations such that the testing fluid flows across the test sample, reciprocally moving the contact element on the test sample and measuring an amount of wear after a selected interval of time. Preferably, the test sample is rotated during reciprocation of the contact element. Temperature and pressure may be monitored and controlled.

    摘要翻译： 提供了用于在受控环境，特别是原子氧环境中测试零件和材料的方法和装置。 该装置包括壳体，其具有位于其内部的采样台以接收测试样本。 接触元件接触测试样品的表面，并且驱动器使接触元件往复运动，使得表面沿磨损路径磨损。 至少一个测试流体从内部引入和移除，除去引入位置优选地使得测试流体流过测试样品。 驱动器可以是通过铁磁耦合操作通过壳体侧壁的滑架，并且样品台可以是通过铁磁耦合旋转的转盘。 可以包括第二采样站，使得不同的磨损路径配置是可能的。 该方法包括以下步骤：将测试样品放置在样品支持站上，使测试样品与接触元件接触，将壳体的内部与周围环境隔离，在至少一个测试流体的位置处引入和去除至少一个测试流体， 流体流过测试样品，将接触元件往复移动到测试样品上，并在选定的时间间隔后测量磨损量。 优选地，测试样品在接触元件的往复运动期间旋转。 可以监测和控制温度和压力。

    Amorphous aluminum alloy coatings
    23.
    发明授权
    Amorphous aluminum alloy coatings 有权
    无定形铝合金涂层

    公开(公告)号：US09103022B2

    公开(公告)日：2015-08-11

    申请号：US11865160

    申请日：2007-10-01

    申请人： Ronghua Wei ,  Marta Jakab ,  Craig Engel

    发明人： Ronghua Wei ,  Marta Jakab ,  Craig Engel

    IPC分类号： C23C14/35 ,  C23C14/34 ,  C22C45/08 ,  C23C14/14

    CPC分类号： C23C14/3414 ,  C22C45/08 ,  C23C14/14 ,  C23C14/35 ,  Y10T428/12

    摘要： The present disclosure relates to an amorphous aluminum alloy coating. The aluminum alloy coating may specifically include one of cerium, cobalt and/or molybdenum as alloying elements and be applied by a physical vapor deposition process to a desired thickness. The coating may supply improved corrosion resistance to a given environmental condition.

    摘要翻译： 本公开涉及无定形铝合金涂层。 铝合金涂层可以具体包括铈，钴和/或钼中的一种作为合金元素，并通过物理气相沉积工艺施加到期望的厚度。 涂层可以为给定的环境条件提供改善的耐腐蚀性。

    Apparatus and method for RF plasma enhanced magnetron sputter deposition
    24.
    发明授权
    Apparatus and method for RF plasma enhanced magnetron sputter deposition 有权
    射频等离子体增强磁控溅射沉积的装置和方法

    公开(公告)号：US08273222B2

    公开(公告)日：2012-09-25

    申请号：US11749739

    申请日：2007-05-16

    申请人： Ronghua Wei ,  Sabrina L. Lee

    发明人： Ronghua Wei ,  Sabrina L. Lee

    IPC分类号： C23C14/00 ,  C23C14/32 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00

    CPC分类号： C23C14/35 ,  C23C14/046 ,  H01J37/32366 ,  H01J37/3405 ,  H01J37/3438

    摘要： The present disclosure relates to an apparatus and method for depositing coatings on the surface of a workpiece with sputtering material in an ion plasma environment. The apparatus may include a magnetron including a core cooling system surrounded by a magnet assembly and target material having a surface capable of providing a source of sputtering material. An RF plasma generation assembly is also provided in the apparatus including an RF antenna capable of providing an RF plasma and drawing ions to one or both of the workpiece surface and target material surface.

    摘要翻译： 本公开涉及一种用于在离子等离子体环境中用溅射材料在工件的表面上沉积涂层的装置和方法。 该装置可以包括磁控管，其包括由磁体组件包围的芯冷却系统和具有能够提供溅射材料源的表面的靶材料。 在该设备中还提供了RF等离子体产生组件，其包括能够提供RF等离子体并且将离子牵引到工件表面和目标材料表面中的一个或两个的RF天线。

    Plasma immersion ion processing for coating of hollow substrates
    25.
    发明授权
    Plasma immersion ion processing for coating of hollow substrates 有权
    用于涂覆中空基板的等离子浸渍离子处理

    公开(公告)号：US08029875B2

    公开(公告)日：2011-10-04

    申请号：US11752787

    申请日：2007-05-23

    申请人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

    IPC分类号： H05H1/24

    CPC分类号： C23C16/0245 ,  C23C16/045 ,  C23C16/24 ,  C23C16/26 ,  C23C16/505

    摘要： The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.

    摘要翻译： 本公开涉及等离子体离子沉积和涂层形成的方法。 可以提供真空室，其中真空室由具有长度，直径和内表面的中空衬底形成。 可以在室内形成等离子体，同时向中空衬底施加负偏压以将离子从等离子体吸入中空衬底的内表面，以将离子沉积到内表面上并形成涂层。 该涂层可具有至少500的维氏硬度值（Hv）。

    MODIFIED CARBON NANOTUBE ARRAYS
    26.
    发明申请
    MODIFIED CARBON NANOTUBE ARRAYS 审中-公开
    改性碳纳米管阵列

    公开(公告)号：US20110003109A1

    公开(公告)日：2011-01-06

    申请号：US12496207

    申请日：2009-07-01

    申请人： Keith A. Slinker ,  Kent Coulter ,  Ronghua Wei

    发明人： Keith A. Slinker ,  Kent Coulter ,  Ronghua Wei

    IPC分类号： B32B5/02 ,  C23F1/00

    CPC分类号： B82B3/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/174 ,  C01B32/176 ,  C01B2202/08 ,  H01J1/304 ,  H01J9/025 ,  H01J2201/30469 ,  Y10T428/23957

    摘要： The invention relates to carbon nanotube arrays and methods for the preparation and modification of carbon nanotube arrays. The method includes synthesizing a plurality of carbon nanotubes on a substrate such that the carbon nanotubes are substantially vertically aligned and exposing the array to a plasma to change the topography of the array, change the structure or chemical nature of the individual nanotubes, remove at least a portion of the carbon nanotubes, and/or removing nanotubes to expose monodispserse groupings of nanotubes.

    摘要翻译： 本发明涉及碳纳米管阵列及碳纳米管阵列的制备和改性方法。 该方法包括在基板上合成多个碳纳米管，使得碳纳米管基本上垂直取向并将阵列暴露于等离子体以改变阵列的形貌，改变单个纳米管的结构或化学性质，至少去除 碳纳米管的一部分，和/或去除纳米管以暴露纳米管的单分散组。

    Method for magnetron sputter deposition
    28.
    发明申请
    Method for magnetron sputter deposition 审中-公开
    磁控溅射沉积方法

    公开(公告)号：US20060076231A1

    公开(公告)日：2006-04-13

    申请号：US10962772

    申请日：2004-10-12

    申请人： Ronghua Wei

    发明人： Ronghua Wei

    IPC分类号： C23C14/00 ,  C23C14/32

    CPC分类号： H01J37/3405 ,  C23C14/046 ,  C23C14/35

    摘要： A method for depositing a coating on an interior surface of a hollowed workpiece. The method comprises providing the hollowed workpiece in a vacuum chamber, the hollowed workpiece comprising an interior surface substantially defining a bore having a longitudinal axis; positioning a magnetron within thed bore along substantially the length of said longitudinal axis and substantially radially equidistant from the interior surface, said magnetron comprising an external sputter target material; and, generating a circumferential magnetic field about the sputter target material for a time and under sputter deposition conditions effective to produce an interior surface comprising a substantially uniform coating comprising said sputter target material.

    摘要翻译： 一种在中空工件的内表面上沉积涂层的方法。 所述方法包括在真空室中设置所述中空工件，所述中空工件包括基本上限定具有纵向轴线的孔的内表面; 将磁控管沿所述纵向轴线的大致长度定位在所述钻孔内，并且与所述内表面基本上径向等距离地定位，所述磁控管包括外部溅射靶材料; 以及在有效产生包括包括所述溅射靶材料的基本上均匀的涂层的内表面的时间和溅射沉积条件下，围绕溅射靶材料产生周向磁场。