SEMICONDUCTOR DEVICE WITH A DEFECT LAYER AND METHOD OF FABRICATION THEREFOR

    公开(公告)号:US20230081675A1

    公开(公告)日:2023-03-16

    申请号:US17447018

    申请日:2021-09-07

    Applicant: NXP B.V.

    Abstract: A semiconductor device includes a semiconductor substrate, a first semiconductor region of a first semiconductor type, formed within the semiconductor substrate, wherein the first semiconductor region includes a first doped region formed in a lower portion of the first semiconductor region and a second doped region formed over the first doped region in an upper portion of the first semiconductor region. A defect layer having an upper surface formed in an upper portion of the first doped region. A second semiconductor region of a second semiconductor type is formed over the first semiconductor region.

    Bipolar transistor
    22.
    发明授权
    Bipolar transistor 有权
    双极晶体管

    公开(公告)号:US09570546B2

    公开(公告)日:2017-02-14

    申请号:US14852385

    申请日:2015-09-11

    Applicant: NXP B.V.

    Abstract: A semiconductor device comprising a bipolar transistor and a method of making the same. A power amplifier including a bipolar transistor. The bipolar transistor includes a collector including a laterally extending drift region. The also includes a base located above the collector. The bipolar transistor further includes an emitter located above the base. The bipolar transistor also includes a doped region having a conductivity type that is different to that of the collector. The doped region extends laterally beneath the collector to form a junction at a region of contact between the doped region and the collector. The doped region has a non-uniform lateral doping profile. A doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor.

    Abstract translation: 一种包括双极晶体管的半导体器件及其制造方法。 一种功率放大器,包括双极晶体管。 双极晶体管包括具有横向延伸漂移区的集电极。 还包括位于收集器上方的基座。 双极晶体管还包括位于基极上方的发射极。 双极晶体管还包括具有不同于集电极的导电类型的掺杂区域。 掺杂区域在集电极下方横向延伸以在掺杂区域和集电极之间的接触区域处形成结。 掺杂区域具有非均匀的横向掺杂分布。 在最接近双极晶体管的集电极 - 基极结的掺杂区域的一部分中,掺杂区域的掺杂水平最高。

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