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21.发明授权Method for forming conductive film, thin-film transistor, panel with thin-film transistor, and method for manufacturing thin-film transistor 有权用于形成导电膜的方法，薄膜晶体管，具有薄膜晶体管的面板以及制造薄膜晶体管的方法公开(公告)号：US08119462B2
公开(公告)日：2012-02-21
申请号：US12364836
申请日：2009-02-03
申请人： Satoru Takasawa , Masaki Takei , Hirohisa Takahashi , Hiroaki Katagiri , Sadayuki Ukishima , Noriaki Tani , Satoru Ishibashi , Tadashi Masuda
发明人： Satoru Takasawa , Masaki Takei , Hirohisa Takahashi , Hiroaki Katagiri , Sadayuki Ukishima , Noriaki Tani , Satoru Ishibashi , Tadashi Masuda
IPC分类号： H01L21/00
CPC分类号： H01L29/41733 , C23C14/185 , C23C14/3407 , C23C14/5806 , H01L21/2855 , H01L21/76843 , H01L21/76877 , H01L23/53238 , H01L27/124 , H01L29/42384 , H01L29/458 , H01L29/4908 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： A conductive film having high adhesion and low specific resistance is formed. A target containing copper as a main component is sputtered in vacuum ambience while an oxygen gas introduced, and then, a conductive film containing copper as a main component and additive metals, such as Ti or Zr, is formed. Such a conductive film has high adhesion to a silicon layer and a glass substrate and is hardly peeled off from the substrate. Furthermore, the specific resistance is low and the contact resistance to a transparent conductive film is also low. Thus, no deterioration in the electric characteristics occurs even when the conductive film is used for an electrode film. Accordingly, the conductive film formed by the present invention suited for TFT, and electrode films and barrier films of semiconductor elements, in particular.
摘要翻译： 形成具有高粘附性和低电阻率的导电膜。 在真空环境中溅射含有铜作为主要成分的靶，同时引入氧气，然后形成以铜为主要成分的导电膜和添加金属如Ti或Zr。 这种导电膜对硅层和玻璃基板具有高粘附性，并且几乎不从基板剥离。 此外，电阻率低，并且对透明导电膜的接触电阻也低。 因此，即使将导电膜用于电极膜也不会发生电特性的劣化。 因此，特别是适用于TFT的本发明形成的导电膜以及半导体元件的电极膜和阻挡膜。
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公开(公告)号：US20090303406A1
公开(公告)日：2009-12-10
申请号：US12475907
申请日：2009-06-01
申请人： Satoru Takasawa , Masaki Takei , Hirohisa Takahashi , Hiroaki Katagiri , Sadayuki Ukishima , Noriaki Tani , Satoru Ishibashi , Tadashi Masuda
发明人： Satoru Takasawa , Masaki Takei , Hirohisa Takahashi , Hiroaki Katagiri , Sadayuki Ukishima , Noriaki Tani , Satoru Ishibashi , Tadashi Masuda
IPC分类号： G02F1/1343 , C23F1/00 , H01L29/78
CPC分类号： H01L23/53238 , H01L21/2855 , H01L23/53233 , H01L27/124 , H01L2924/0002 , H05K1/0306 , H05K3/16 , H05K3/388 , H01L2924/00
摘要： A wiring film having excellent adhesion and barrier property and a low resistance value is formed. An oxygen gas is introduced into a vacuum chamber in which an object to be film formed is disposed; a sputtering target is sputtered in a vacuum ambience containing oxygen; and a first metallic film is formed on a surface of the object to be film formed. The first sputtering target includes copper as a major component and at least one kind of additive elements selected from an additive element group consisting of Mg, Al, Si, Be, Ca, Sr, Ba, Ra, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb and Dy. Thereafter, a second metallic film is formed on a surface of the first metallic film by sputtering the sputtering target in a state in which the introduction of the oxygen gas into a vacuum ambience is stopped, and then a wiring film is formed by etching the first and second metallic films.
摘要翻译： 形成具有优异的粘附性和阻隔性和低电阻值的布线膜。 将氧气引入其中设置有被成膜物体的真空室中; 溅射靶在含有氧的真空环境中溅射; 并且在待成膜物体的表面上形成第一金属膜。 第一溅射靶包括铜作为主要成分，以及选自由Mg，Al，Si，Be，Ca，Sr，Ba，Ra，Sc，Y，La，Ce组成的添加元素组中的至少一种添加元素， Pr，Nd，Pm，Sm，Eu，Gd，Tb和Dy。 此后，在将氧气引入真空环境的状态下，通过溅射溅射靶溅射溅射靶，在第一金属膜的表面上形成第二金属膜，然后通过蚀刻第一金属膜形成布线膜 和第二金属膜。
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公开(公告)号：US5554418A
公开(公告)日：1996-09-10
申请号：US310760
申请日：1994-09-27
申请人： Kazuyuki Ito , Kyuzo Nakamura , Michio Ishikawa , Jun Togawa , Noriaki Tani , Masanori Hashimoto , Yumiko Ohashi
发明人： Kazuyuki Ito , Kyuzo Nakamura , Michio Ishikawa , Jun Togawa , Noriaki Tani , Masanori Hashimoto , Yumiko Ohashi
IPC分类号： C08J7/06 , C01B33/12 , C23C16/40 , G11B5/72 , G11B5/73 , G11B5/738 , G11B5/84 , G11B7/26 , B05D3/06 , C23C16/00
CPC分类号： C23C16/402
摘要： A passivation film is formed by plasma CVD process in which organic oxysilane is used as a raw gas. When an SiO.sub.2 film as the passivation film is formed on a surface of a substrate, Ar, He or NH.sub.3 gas is used as a reactive gas which serves as an auxiliary for decomposing the raw gas. Ashing of the substrate by oxygen or hydrogen radicals is thus prevented. Fluorine group gas of CF.sub.4 or NF.sub.3 may be added to the reactive gas. The SiO.sub.2 film as a passivation film as described above may be formed first as an initial passivation film and then another passivation film may be formed on top of the initial passivation film by using a reactive gas having an ashing effect such as O.sub.2, N.sub.2 O, O.sub.3 and H.sub.2.
摘要翻译： 通过等离子体CVD工艺形成钝化膜，其中使用有机氧化硅作为原料气体。 当在基板的表面上形成作为钝化膜的SiO 2膜时，使用Ar，He或NH 3气体作为用作分解原料气体的辅助剂的反应性气体。 因此防止了氧或氢自由基的底物灰化。 可以将CF4或NF3的氟族气体加入反应气体中。 可以首先形成如上所述的钝化膜的SiO 2膜作为初始钝化膜，然后通过使用具有灰化效应的反应气体，例如O 2，N 2 O，O 3，可以在初始钝化膜的顶部形成另一钝化膜 和H2。
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公开(公告)号：US5069983A
公开(公告)日：1991-12-03
申请号：US414235
申请日：1989-09-29
申请人： Kyuzo Nakamura , Yoshifumi Ota , Michio Ishikawa , Noriaki Tani , Masanori Hashimoto , Yuzo Murata
发明人： Kyuzo Nakamura , Yoshifumi Ota , Michio Ishikawa , Noriaki Tani , Masanori Hashimoto , Yuzo Murata
CPC分类号： G11B5/7325 , G11B5/738 , Y10S428/90 , Y10S428/928 , Y10T428/12465 , Y10T428/12847 , Y10T428/12854
摘要： A magnetic recording member having high coercive force, comprising:(a) a non-magnetic substrate;(b) a Cr base film formed on said substrate by a film forming process; and(c) a Co alloy film formed on said Cr base film by the same film forming process as in (b),wherein said Cr base film contains in addition to Cr at least one additional element selected from the group consisting of rare earth elements, Si, Cu, P and Ge, and wherein said Co alloy film is formed by continuous operation of said film forming process without interruption after completion of the formation of said Cr base film.
摘要翻译： 具有高矫顽力的磁记录元件，包括：（a）非磁性基片; （b）通过成膜工艺在所述基板上形成的Cr基膜; 和（c）通过与（b）中相同的成膜方法在所述Cr基膜上形成的Co合金膜，其中所述Cr基膜除Cr之外还含有至少一种选自稀土元素 Si，Cu，P和Ge，并且其中所述Co合金膜是在所述Cr基膜的形成完成之后，通过所述成膜工艺的连续操作而不间断地形成的。
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公开(公告)号：US08154531B2
公开(公告)日：2012-04-10
申请号：US13137212
申请日：2011-07-28
申请人： Hirohisa Takahashi , Satoru Ishibashi , Noriaki Tani , Sadayuki Ukishima , Satoru Takasawa , Kyuzo Nakamura , Haruhiko Yamamoto
发明人： Hirohisa Takahashi , Satoru Ishibashi , Noriaki Tani , Sadayuki Ukishima , Satoru Takasawa , Kyuzo Nakamura , Haruhiko Yamamoto
IPC分类号： G06F3/041
CPC分类号： G06F3/045
摘要： A touch panel having high durability is provided. Either one or both of a display device and a flexible panel have island-shaped protective bodies formed on surfaces of electrode layers (upper electrode layer, lower electrode layer), and a transparent conductive film is exposed between the protective bodies. Since the protective bodies protrude highly from the surface of the transparent conductive film, when the flexible panel is pressed and the upper electrode and the lower electrode layer are brought into contact, a load to be applied to the transparent conductive film is reduced by the protective bodies, so that the transparent conductive film is not broken.
摘要翻译： 提供了具有高耐久性的触摸面板。 显示装置和柔性面板中的任一个或两者具有形成在电极层（上电极层，下电极层）的表面上的岛状保护体，并且在保护体之间露出透明导电膜。 由于保护体从透明导电膜的表面突出高度突出，当按压柔性面板并使上部电极和下部电极层接触时，通过保护性 使透明导电膜不破裂。
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公开(公告)号：US08031183B2
公开(公告)日：2011-10-04
申请号：US12814039
申请日：2010-06-11
申请人： Hirohisa Takahashi , Satoru Ishibashi , Noriaki Tani , Sadayuki Ukishima , Satoru Takasawa , Kyuzo Nakamura , Haruhiko Yamamoto
发明人： Hirohisa Takahashi , Satoru Ishibashi , Noriaki Tani , Sadayuki Ukishima , Satoru Takasawa , Kyuzo Nakamura , Haruhiko Yamamoto
IPC分类号： G06F3/041
CPC分类号： G06F3/045
摘要： A touch panel having high durability is provided. Either one or both of a display device and a flexible panel have island-shaped protective bodies formed on surfaces of electrode layers (upper electrode layer, lower electrode layer), and a transparent conductive film is exposed between the protective bodies. Since the protective bodies protrude highly from the surface of the transparent conductive film, when the flexible panel is pressed and the upper electrode and the lower electrode layer are brought into contact, a load to be applied to the transparent conductive film is reduced by the protective bodies, so that the transparent conductive film is not broken.
摘要翻译： 提供了具有高耐久性的触摸面板。 显示装置和柔性面板中的任一个或两者具有形成在电极层（上电极层，下电极层）的表面上的岛状保护体，并且在保护体之间露出透明导电膜。 由于保护体从透明导电膜的表面突出高度突出，当按压柔性面板并使上部电极和下部电极层接触时，通过保护性 使透明导电膜不破裂。
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公开(公告)号：US07999464B2
公开(公告)日：2011-08-16
申请号：US12245113
申请日：2008-10-03
IPC分类号： H05B33/02
CPC分类号： C09K11/565 , H01L27/3267 , H05B33/14
摘要： A display device which can be driven by a thin-film transistor and has a high brightness is provided. A low-voltage-driven inorganic luminescent layer and a control transistor are formed on a substrate. The voltage which is applied to the inorganic luminescent layer is controlled by the control transistor. The inorganic luminescent layer has such strength against heat and any damage such that the inorganic luminescent layer can be formed by sputtering method. A top-emission type display device and a bottom-emission type display device can be formed on the same substrate and the luminescent light can be emitted from the same position.
摘要翻译： 提供了可以由薄膜晶体管驱动并且具有高亮度的显示装置。 在基板上形成低压驱动的无机发光层和控制晶体管。 施加到无机发光层的电压由控制晶体管控制。 无机发光层具有抗热的能力和任何可通过溅射法形成无机发光层的损伤。 顶部发光型显示装置和底部发光型显示装置可以形成在同一基板上，并且可以从同一位置发射发光。
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公开(公告)号：US20090134013A1
公开(公告)日：2009-05-28
申请号：US12359675
申请日：2009-01-26
IPC分类号： C23C14/34
CPC分类号： C23C14/3414 , C23C14/086 , C23C14/5806
摘要： A transparent electroconductive film having a low resistivity is provided. In a film-forming method of the present invention, a transparent electroconductive film is formed on a surface of a substrate by sputtering, in a vacuum atmosphere, a target in which ZnO is a main component and Al2O3 and TiO2 are added to ZnO, and then the transparent electroconductive film is annealed by the heating thereof at a temperature of 250° C. or more and 400° C. or less. The resistivity of the obtained transparent electroconductive film is reduced because the film has ZnO as the main component and Al and Ti added therein. The transparent electroconductive film formed by the present invention is suitable as a transparent electrode for the FDP, etc.
摘要翻译： 提供具有低电阻率的透明导电膜。 在本发明的成膜方法中，在真空气氛中，通过溅射在基板的表面上形成透明导电膜，其中ZnO作为主要成分，并将Al 2 O 3和TiO 2加入到ZnO中， 然后通过在250℃以上且400℃以下的温度下的加热对透明导电膜进行退火。 所得到的透明导电膜的电阻率降低，因为膜以ZnO为主要成分，并添加了Al和Ti。 由本发明形成的透明导电膜适合作为FDP等的透明电极。
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公开(公告)号：US20080245657A1
公开(公告)日：2008-10-09
申请号：US12136313
申请日：2008-06-10
IPC分类号： C23C14/34
CPC分类号： C23C14/352 , C23C14/10 , H01J37/3405 , H01J37/3423
摘要： A sputtering apparatus according to the present invention is provided with first to fourth targets. The first and the second targets are disposed so that their surfaces face each other. The third and the fourth targets are also disposed so that their surfaces face each other. When a dielectric film is formed, sputtering is alternately performed on the first and the second targets and on the third and the fourth targets. When sputtering is performed on two of the targets having surfaces that face each other, the remaining two targets function as a ground. As a result, abnormal discharges are inhibited.
摘要翻译： 根据本发明的溅射装置设置有第一至第四靶。 第一和第二靶被设置为使得它们的表面彼此面对。 第三和第四目标也被设置为使得它们的表面彼此面对。 当形成电介质膜时，在第一和第二靶和第三靶和第四靶上交替地进行溅射。 当对具有彼此相对的表面的两个靶进行溅射时，剩余的两个靶用作地面。 结果，异常放电被抑制。
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公开(公告)号：US20080210556A1
公开(公告)日：2008-09-04
申请号：US11987934
申请日：2007-12-06
IPC分类号： C23C14/00
CPC分类号： C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/3417 , H01J37/345 , H01J37/3452 , H01J37/347 , H01J37/3482 , H01L51/5203 , H01L51/56
摘要： A sputtering apparatus with high usage efficiency of a target is provided. A sputtering apparatus of the present invention includes first and second ring magnets, first and second magnet members arranged inside a ring of the first and second ring magnets, wherein in the first and second ring magnets and the first and second magnet members, magnetic poles with the same magnetism are faced toward the rear surface of a first and a second targets. Thus, in the rear surface of the first and second targets, the magnetic poles with the same polarity are adjacently arranged, and the absolute value of the strength of horizontal magnetic field components formed in the surfaces of the first and second targets becomes small and the strength distribution becomes narrow, and the strength of vertical magnetic field components becomes uniform; and consequently, a non-erosion portion is not produced in the first and second targets.
摘要翻译： 提供了具有目标的高使用效率的溅射装置。 本发明的溅射装置包括第一和第二环形磁体，布置在第一和第二环形磁体的环内的第一和第二磁体构件，其中在第一和第二环形磁体以及第一和第二磁体构件中， 相同的磁性面向第一和第二靶的后表面。 因此，在第一靶和第二靶的后表面中，相邻极性的磁极相邻配置，并且形成在第一靶和第二靶的表面中的水平磁场成分的强度的绝对值变小， 强度分布变窄，垂直磁场分量的强度变得均匀; 因此在第一和第二靶中不产生非侵蚀部分。
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