摘要:
A circuit for generating scanning pulses comprising a plurality of stages of basic circuits connected in series, said each basic circuit comprising first, second and third insulated gate field-effect transistors (MISTs) each of which has first and second terminals each being either of source and drain terminals and a gate terminal, said first terminal of said first MIST being used as a clock pulse-applying terminal, said gate terminal of said first MIST being used as an input terminal, said second terminal of said first MIST and said first terminal and said gate terminal of said second MIST being connected and used as a scanning pulse output terminal, said second terminal of said second MIST and said first terminal of said third MIST being connected and used as an output terminal, said second terminal of said third MIST being used as a ground terminal, said gate terminal of said third MIST being used as a feedback input terminal.
摘要:
In a solid-state imaging device having, in one major surface region of a semiconductor substrate, photoelectric conversion elements which are disposed in a two-dimensional array, vertical switching metal-insulator-semiconductor field effect transistors and horizontal switching metal-insulator-semiconductor field effect transistors which select the photoelectric conversion elements, and vertical and horizontal scanning circuits which turn the switching transistors "on" and "off," a solid-state imaging device characterized in that the vertical switching metal-insulator-semiconductor field effect transistors which are not selected are placed into a deeper cutoff state, i.e., the major surface regions of the semiconductor substrate corresponding to gate electrodes of these vertical switching metal-insulator-semiconductor field effect transistors are placed at an accumulation level.
摘要:
A hot carrier lifetime of a MOS transistor is estimated, depending on model formulas: 1/τ=1/τ0+1/τb; τb∝1sub−mb·Idmb−2·exp(a/|Vbs|), where τ denotes a lifetime, Isub denotes a substrate current, Id denotes a drain current, Vbs denotes a substrate voltage, τ0 denotes a lifetime at the time the substrate voltage Vbs=0, τb denotes a quantity representing deterioration of a lifetime at the time the substrate voltage |Vbs|>0, and mb and ‘a’ are model parameters. Furthermore, a parameter Age representing a cumulative stress quantity is calculated depending on model formulas: Age=Age0+Ageb; Ageb=∫1/Hb[Isubmb·Id2−m]·exp(−a/|Vbs|)dt, where t denotes time, Hb is a model parameter, Age0 denotes a parameter representing a cumulative stress quantity at the time the substrate voltage Vbs=0, and Agebs denotes a quantity representing an increase of the cumulative stress quantity at the time the substrate voltage at |Vbs|>0. Thereby, a lifetime in actual use is determined with accuracy even when a substrate voltage is applied, and circuit characteristic degradation is simulated with high accuracy.
摘要翻译:根据模型公式估计MOS晶体管的热载流子寿命:1 / tau = 1 /τ0 + 1 /τb b; tau>>>> exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp exp (a / | V SUB)|其中,τ表示寿命,I SUB表示衬底电流,I表示漏极电流, V SUB表示衬底电压,τO表示衬底电压V BAT = 0时的寿命,τ< / SUB>表示在基板电压| V bs> 0时表示寿命的劣化的量,mb和'a'是模型参数。 此外,根据模型公式计算表示累积应力量的参数Age:年龄=年龄 SUB> +年龄B SUB> 年龄 B> SUB> SUB> SUB> SUB> exp(-a / | V bs |)dt,其中t表示时间,H B b是模型参数, 年龄<0 SUB>表示表示衬底电压V BAT = 0时的累积应力量的参数,而Age < 基板电压在| V bs> 0时的累积应力量的增加。 因此,即使施加基板电压,也能够精确地确定实际使用寿命,并且以高精度模拟电路特性劣化。
摘要:
In calculating a substrate current Isub using a substrate current model equation expressed as Isub=(Ai/Bi)·(Vds−Vdsat)·Id·exp (−Bi·lc/(Vds−Vdsat)) (where Id, Vds and Vdsat are drain current, a drain voltage and a saturation drain voltage, respectively, of a MOS transistor, lc is a characteristic length, Ai is a model parameter and Bi is a given constant), the characteristic length lc is a function lc=lc[lc0+lc1·Vgd] (where lc0 and lc1 are model parameters) of a primary expression (lc0+lc1·Vgd) regarding a gate-drain voltage Vgd (=Vgs−Vds: Vgs is a gate voltage of the MOS transistor) of the MOS transistor.
摘要:
The present invention consists in providing a CCD type color solid-state imager in which color signals respectively separated in time can be derived from picture elements for respective colors arrayed in the shape of a matrix and which permits interlacing without degrading a resolution and without causing image lag. Concretely, pairs of CCD shift registers which are electrically insulated and separated and which run in the vertical direction are arrayed in the horizontal direction, signal charges stored in adjacent picture elements are sent into the individual opposing CCD registers through transfer gates arrayed in a checkerboard pattern, and signal charges transferred in time sequence are distributed to a plurality of CCD shift registers which run in the horizontal direction, whereby a CCD type color solid-state imager having a high resolution and exhibiting no image lag is obtained.
摘要:
A method for fabricating a solid-state imaging device using photoconductive film, comprising the step of depositing a photoconductive material onto a scanner IC by the use of a shield plate, the scanner IC including vertical switching MOS transistors and horizontal switching MOS transistors arrayed in the form of a matrix and vertical and horizontal scanning shift registers for scanning the vertical and horizontal switching MOS transistors respectively, the shield plate having an open part corresponding to a vertical switching MOS transistor array area.
摘要:
In a solid-state imaging device having a plurality of photosensitive portions and a semiconductor substrate which includes at least scanning means for scanning the photosensitive portions, the photosensitive portions including a layer of a photosensitive material overlying the semiconductor substrate and a transparent electrically conductive film overlying the photosensitive material layer; a solid-state imaging device characterized in that the photosensitive material is an amorphous material whose indispensable constituent is silicon and which contains hydrogen. The hydrogen content of the photosensitive material is preferably 5 atomic-% to 30 atomic-%, especially 10 atomic-% to 25 atomic-%.
摘要:
In a solid-state imaging device having a semiconductor integrated circuit in which a plurality of switching elements for addressing positions of picture elements and scanning circuitry for turning the switching elements "on" and "off" in time sequence are disposed on an identical substrate, a photoconductive film which is disposed on the integrated circuit and which is connected with the respective switching elements, and a light transmitting electrode which is disposed on the photoconductive film, a voltage being applied to the light transmitting electrode thereby to bias a region of the photoconductive film on a light entrance side either positively or negatively with respect to a region thereof on the opposite side; a solid-state imaging device characterized in that said each switching element is an element which uses carriers of a polarity opposite to that of carriers having a greater mobility in said photoconductive film.
摘要:
A solid-state color imaging device contains semiconductive photoelectric elements for light of the respective primary colors, and means for sequentially transmitting charges as electric signals, the charges having been generated and stored according to the quantities of the corresponding primary color light beams received by the photoelectric elements. Transparent conductive films are provided through transparent insulating films on the light receiving sides of the photoelectric elements for at least two primary color light beams, and the charge storage capacitances of the respective photoelectric elements or the ratios of the quantities of light actually reaching photoelectric transduction portions to the entering quantities of the corresponding primary color light beam in the respective photoelectric elements are set at predetermined values.
摘要:
In a solid-state image pickup device having photoelectric elements each of which includes one or more switching MOS field-effect transistors and which are arrayed in one dimension or two dimensions on one semiconductor substrate, and scanning circuits which address the photoelectric devices time-sequentially, a transparent or semitransparent electrode is disposed over a light detecting region provided for the switching field-effect transistor, with an insulating oxide film intervening therebetween, whereby a capacitance is formed between the electrode and the substrate, charges generated under the electrode by photoexcitation are stored in a charge-storage region including the capacitance for a certain time, and the stored charges are taken out by the scanning circuits to a signal output line connecting the drains of the transistors in common.