公开(公告)号：US20240168381A1

公开(公告)日：2024-05-23

申请号：US18377365

申请日：2023-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jincheol PARK ,  Seonghyeon AHN ,  Honggu IM ,  Sungmin KO ,  Juyoung KIM ,  Juhyeon PARK ,  Naery YU

IPC: G03F7/022 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0226 ,  G03F7/0045 ,  G03F7/2004

Abstract: A photoresist composition for extreme ultraviolet (EUV) radiation and a method of manufacturing a semiconductor device, the photoresist composition includes a polymer resin; a photoacid generator; and a photoreactive additive that includes at least two diazonaphthoquinone (DNQ) groups, wherein the at least two DNQ groups are represented by Formula 1 or Formula 2 described herein.

公开(公告)号：US20230194985A1

公开(公告)日：2023-06-22

申请号：US18076818

申请日：2022-12-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jinjoo KIM ,  Sumin KIM ,  Hyunwoo KIM ,  Yechan KIM ,  Juyoung KIM ,  Jicheol PARK ,  Giyoung SONG ,  Suk Koo HONG

IPC: G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0392 ,  H01L21/0276 ,  H01L21/0275

Abstract: A brush polymer for a photoresist, a photoresist composition, and a method of manufacturing an integrated circuit device, the brush polymer including a core and a plurality of side polymer chains, the plurality of side polymer chains being bonded to the core and extending from the core to form a bottle-brush polymer or a star-brush polymer, together with the core, wherein each of the plurality of side polymer chains includes a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2:

公开(公告)号：US20230120542A1

公开(公告)日：2023-04-20

申请号：US18080348

申请日：2022-12-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sumin KIM ,  Hyunwoo KIM ,  Sukkoo HONG ,  Yechan KIM ,  Juyoung KIM ,  Jinjoo KIM ,  Juhyeon PARK ,  Hyunji SONG ,  Songse YI

IPC: G03F7/004 ,  C07C381/12 ,  G03F7/039 ,  C07C309/12

Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.

公开(公告)号：US20210240078A1

公开(公告)日：2021-08-05

申请号：US17005636

申请日：2020-08-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sumin KIM ,  Hyunwoo KIM ,  Sukkoo HONG ,  Yechan KIM ,  Juyoung KIM ,  Jinjoo KIM ,  Juhyeon PARK ,  Hyunji SONG ,  Songse YI

IPC: G03F7/004 ,  C07C381/12 ,  C07C309/12 ,  G03F7/039

Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.

公开(公告)号：US20160366721A1

公开(公告)日：2016-12-15

申请号：US15183223

申请日：2016-06-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junhyuk SONG ,  Daejoong KIM ,  Juyoung KIM ,  Daewoo LEE ,  Hyungtaig LIM ,  Minjae KIM

IPC: H04W76/04 ,  H04W4/06 ,  H04W52/02

CPC classification number: H04L12/189 ,  H04W4/06 ,  H04W52/0225 ,  H04W72/005 ,  H04W76/28 ,  Y02D70/1262 ,  Y02D70/1264 ,  Y02D70/23 ,  Y02D70/24

Abstract: A method and an apparatus for group communication in a mobile communication system are provided. The method includes receiving a first message including information related to a discontinuous reception (DRX) cycle from a network device, transmitting a second message based on the first message to at least one terminal, and transmitting data to the at least one terminal based on the information related to the DRX cycle.

Abstract translation: 提供了一种用于移动通信系统中的组通信的方法和装置。 该方法包括从网络设备接收包括与不连续接收（DRX）周期有关的信息的第一消息，基于第一消息向至少一个终端发送第二消息，并且基于所述至少一个终端向所述至少一个终端发送数据 与DRX周期相关的信息。

公开(公告)号：US20160366566A1

公开(公告)日：2016-12-15

申请号：US15176619

申请日：2016-06-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hanseok KIM ,  Dongsook KIM ,  Juyoung KIM ,  Junhyuk SONG ,  Hyungtaig LIM

IPC: H04W4/08 ,  H04W28/02 ,  H04L12/26

CPC classification number: H04W4/08 ,  H04L41/083 ,  H04L43/106 ,  H04W28/0236

Abstract: A method and an apparatus for reducing delay in enhanced multimedia broadcast multicast services (eMBMS)-based group communication are provided. The method includes receiving the user packet, including information of a time stamp assigned by a broadcast/multicast service centre (BM-SC), from the BM-SC, and transmitting the user packet to a terminal through a physical multicast channel based on information of the time stamp, wherein the time stamp is assigned at an interval set to a value less than a multimedia broadcast multicast services (MBMS) scheduling period.

Abstract translation: 提供了一种用于减少基于增强多媒体广播多播服务（eMBMS）的组通信中的延迟的方法和装置。 该方法包括从BM-SC接收包括由广播/组播服务中心（BM-SC）分配的时间戳的信息的用户分组，并且基于信息通过物理多播信道将用户分组发送到终端 的时间戳，其中以设置为小于多媒体广播多播服务（MBMS）调度周期的值的间隔分配时间戳。

公开(公告)号：US20160323050A1

公开(公告)日：2016-11-03

申请号：US15141111

申请日：2016-04-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junhyuk SONG ,  Daejoong KIM ,  Juyoung KIM ,  Hyungtaig LIM

IPC: H04H20/16 ,  H04W72/08 ,  H04W28/14 ,  H04J11/00

CPC classification number: H04W28/14 ,  H04L45/16 ,  H04W4/06 ,  H04W88/08

Abstract: A method for group communication of a broadcasting server in a wireless communication system is provided. The method for group communication of a broadcasting server includes receiving a data packet from a content server, generating a transmission packet by copying the data packet, and transmitting the generated transmission packet to a base station.

Abstract translation: 提供了一种用于无线通信系统中的广播服务器的组通信的方法。 广播服务器的组通信的方法包括从内容服务器接收数据分组，通过复制数据分组来生成发送分组，并将生成的传输分组发送到基站。

公开(公告)号：US20250161521A1

公开(公告)日：2025-05-22

申请号：US19034093

申请日：2025-01-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Changhyun PARK ,  Sunghyun CHUN ,  Nakhyun KIM ,  Juyoung KIM ,  Huiyoung KIM ,  Juwan PARK ,  Changwoo JUNG ,  Seoyoung CHO

IPC: A61L9/20

Abstract: An air sterilization module according to an example embodiment includes: a housing including an intake port and an exhaust port, a main body module provided inside the housing and including a fan configured to generate airflow, a display module including a display configured to be exposed to outside of the housing, and a fixing assembly comprising a fastener configured to separably fix the display module to the main body module, wherein the fixing assembly may include a fixing member comprising a guide rail or protrusion fixed to the main body module and a support member comprising a support configured to be assembled to the fixing member while supporting the display module, any one of the fixing member and the support member may include a guide rail extending in a direction in which the support member is assembled, and an other of the fixing member and the support member may include a guide protrusion that is inserted into the guide rail and is movable along the guide rail.

公开(公告)号：US20250003139A1

公开(公告)日：2025-01-02

申请号：US18758886

申请日：2024-06-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Juyoung KIM ,  Ohjin KWON ,  Dohaeng KIM ,  Seongryeol MYEONG ,  Sungmin PARK ,  Jewoo BANG ,  Sooyoung LEE

IPC: D06F58/20 ,  D06F34/14 ,  D06F58/02 ,  D06F58/24 ,  D06F103/58 ,  D06F105/02 ,  D06F105/26 ,  D06F105/36

Abstract: A dryer including a main body; a drum inside the main body to receive an object for drying; a heat pump to supply hot and dry air to the drum, and including an evaporator, compressor, and condenser, wherein the evaporator, compressor, and condenser are configured to circulate a refrigerant through the evaporator, the compressor, and the condenser; a condensate tank to store condensate generated by the evaporator; and a connection pipe between the condenser and the evaporator, with at least a portion of the connection pipe being in the condensate tank, wherein the dryer is configured so that refrigerant that has been heat-exchanged with external air in the condenser, and discharged from the condenser, then passes through the connection pipe so as to additionally exchange heat with the condensate in the condensate tank while passing through the at least a portion of the connection pipe in the condensate tank.

公开(公告)号：US20240310724A1

公开(公告)日：2024-09-19

申请号：US18589918

申请日：2024-02-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Honggu IM ,  Jaeyeon KIM ,  Juyoung KIM ,  Jicheol PARK ,  Yechan KIM ,  Yonghoon MOON

IPC: G03F7/004 ,  G03F7/00

CPC classification number: G03F7/0045 ,  G03F7/70033

Abstract: Provided is a photoresist composition including a chemically amplified polymer, a photoacid generator, a photo-decomposable quencher including a pyridinium-based material that generates a neutral material by exposure and acts as a base to neutralize an acid before exposure, and a solvent.