Nitride semiconductor device having current confining layer
    24.
    发明授权
    Nitride semiconductor device having current confining layer 有权
    具有电流限制层的氮化物半导体器件

    公开(公告)号:US08076685B2

    公开(公告)日:2011-12-13

    申请号:US12556946

    申请日:2009-09-10

    IPC分类号: H01L33/00

    摘要: A nitride semiconductor device includes an active layer formed between an n-type cladding layer and a p-type cladding layer, and a current confining layer having a conductive area through which a current flows to the active layer. The current confining layer includes a first semiconductor layer, a second semiconductor layer and a third semiconductor layer. The second semiconductor layer is formed on and in contact with the first semiconductor layer and has a smaller lattice constant than that of the first semiconductor layer. The third semiconductor layer is formed on and in contact with the second semiconductor layer and has a lattice constant that is smaller than that of the first semiconductor layer and larger than that of the second semiconductor layer.

    摘要翻译: 氮化物半导体器件包括形成在n型覆层和p型覆层之间的有源层和具有电流流向有源层的导电区域的电流限制层。 电流限制层包括第一半导体层,第二半导体层和第三半导体层。 第二半导体层形成在第一半导体层上并与第一半导体层接触,并且具有比第一半导体层的晶格常数更小的晶格常数。 第三半导体层形成在第二半导体层上并与第二半导体层接触,并且具有小于第一半导体层的晶格常数,并且大于第二半导体层的晶格常数。

    PROPYLENE HOMOPOLYMER FOR CAPACITORS
    25.
    发明申请
    PROPYLENE HOMOPOLYMER FOR CAPACITORS 有权
    用于电容器的丙烯共聚物

    公开(公告)号:US20110301309A1

    公开(公告)日:2011-12-08

    申请号:US13146378

    申请日:2010-01-26

    IPC分类号: C08F110/06

    摘要: [Object] To provide a propylene homopolymer suitable for capacitor films having high withstand voltage and a stretched film formed by stretching the propylene homopolymer.[Solution] A propylene homopolymer of the present invention for capacitors satisfies the following requirements (i) to (v) and (ix): (i) the MFR is 1 to 10 g/10 minutes; (ii) the meso pentad fraction (mmm) measured by 13C-NMR is 0.940 to 0.995; (iii) the integrted amount of elution at 90° C. by CFC using o-dichlorobenzene is 0.5% by weight or less; (iv) the melting point measured using DSC is 152° C. or more; (v) the chlorine content is 2 ppm by weight or less; and (ix) in an elution temperature-elution volume curve measured by cross-fractionation chromatography (CFC) using o-dichlorobenzene, the maximum peak has a peak top temperature in the range of 105° C. to 130° C. and half width of 7.0° C. or less.

    摘要翻译: 本发明提供适用于具有高耐压性的电容器膜的丙烯均聚物和通过拉伸丙烯均聚物形成的拉伸膜。 [溶液]本发明的电容器用丙烯均聚物满足以下要求(i)〜(v)和(ix):(i)MFR为1〜10g / 10分钟; (ii)通过13 C-NMR测量的内消旋五单元组分数(mmm)为0.940〜0.995; (iii)通过CFC使用邻二氯苯在90℃下洗脱的积分量为0.5重量%以下; (iv)使用DSC测定的熔点为152℃以上; (v)氯含量为2重量ppm以下; 和(ix)在通过使用邻二氯苯的交叉分级分离色谱(CFC)测量的洗脱温度 - 洗脱体积曲线中,最大峰的峰顶温度在105℃至130℃的范围内,半宽度 为7.0℃以下。

    FLUORESCENT LAMP
    27.
    发明申请
    FLUORESCENT LAMP 审中-公开
    日光灯

    公开(公告)号:US20100045162A1

    公开(公告)日:2010-02-25

    申请号:US12536762

    申请日:2009-08-06

    申请人: Satoshi Tamura

    发明人: Satoshi Tamura

    IPC分类号: H01J63/04

    CPC分类号: H01J5/50 H01J61/70

    摘要: A fluorescent lamp includes sealed glass tube 1, a pair of opposed electrodes 2 provided in glass tube 1 wire lead 3 one end of which is connected to one of electrodes 2 and the other end of which passes through an end face of glass tube 1 in a gastight manner and is drawn to the outside of glass tube 1, cylindrical member 5 provided at an end of glass tube 1 and containing a portion of wire lead 3 that is drawn to the outside of glass tube 1, and solder portion 6 formed of a solder material contained in the interior of cylindrical member 5, wherein in the cylindrical member 5 an opening 8 is formed that is opposite the end face of the glass tube 1 and solder portion 6 is exposed to the outside in opening 8.

    摘要翻译: 荧光灯包括密封的玻璃管1,设置在玻璃管1中的一对相对电极2,引线3的一端连接到电极2中的一个,另一端穿过玻璃管1的端面 并且被吸引到玻璃管1的外侧,设置在玻璃管1的端部并包含被引导到玻璃管1的外部的引线3的一部分的圆柱形部件5以及由玻璃管1的外部形成的焊料部6 包含在圆筒构件5的内部的焊料材料,其中在圆筒构件5中形成有与玻璃管1的端面相对的开口8,并且在开口8中将焊料部分6暴露于外部。

    Production method of decorative film
    28.
    发明授权
    Production method of decorative film 有权
    装饰膜的生产方法

    公开(公告)号:US07335274B2

    公开(公告)日:2008-02-26

    申请号:US11525544

    申请日:2006-09-22

    摘要: A production method of a decorative film comprising a step of, in a state in which a transparent resin film is laid on a surface of a laminate sheet in which a pattern layer is placed on one surface of a base film of a thermoplastic resin, inserting the laminate sheet and the transparent resin film into between a pair of endless belts placed opposite each other, thereby obtaining a decorative film, wherein the transparent resin film is preheated by contact with a peripheral surface of a preheat roll urged toward the endless belt, and the transparent resin film is run so as to constantly contact a peripheral surface of at least one guide roll during a period between departure from the peripheral surface of the preheat roll and contact with the laminate sheet.

    摘要翻译: 一种装饰膜的制造方法,其特征在于,在将热塑性树脂的基膜的一个面上配置有图案层的层压片的表面上放置透明树脂膜的状态下,插入 层叠片和透明树脂膜形成在彼此相对放置的一对环形带之间,从而获得装饰膜,其中透明树脂膜通过与向环形带施力的预热辊的周面接触而预热,以及 运行透明树脂膜,以便在从预热辊的周面离开之间的期间和与层叠片接触的期间中,与至少一个导辊的周面不断接触。

    Information processing apparatus and authentication control method
    29.
    发明申请
    Information processing apparatus and authentication control method 审中-公开
    信息处理装置和认证控制方法

    公开(公告)号:US20070180255A1

    公开(公告)日:2007-08-02

    申请号:US11698386

    申请日:2007-01-26

    IPC分类号: H04L9/00

    CPC分类号: G06F21/31

    摘要: According to one embodiment, an information processing apparatus includes a plurality of authentication units, and a setting unit configured to selectively set a first authentication mode and a second authentication mode, the first authentication mode determining a person to be authenticated to be an authenticated person when authentication by any one of the plurality of authentication units succeeds, and the second authentication mode determining the person to be authenticated to be an authenticated person when the authentications by two or more of the plurality of authentication units succeed.

    摘要翻译: 根据一个实施例,一种信息处理设备包括多个认证单元,以及设置单元,被配置为选择性地设置第一认证模式和第二认证模式,所述第一认证模式确定要认证的人是认证人, 所述多个认证单元中的任何一个的认证成功,并且当所述多个认证单元中的两个或更多个认证单元的认证成功时,所述第二认证模式将所述被认证的人确定为认证人。

    Method for fabricating nitride-based compound semiconductor element
    30.
    发明授权
    Method for fabricating nitride-based compound semiconductor element 有权
    氮化物系化合物半导体元件的制造方法

    公开(公告)号:US07148149B2

    公开(公告)日:2006-12-12

    申请号:US11017681

    申请日:2004-12-22

    IPC分类号: H01L21/302 H01L21/3065

    摘要: A method for fabricating a nitride semiconductor element according to the present invention comprises the steps of: forming a nitride semiconductor layer 13 on a base substrate 11; forming, on part of the upper surface of the nitride semiconductor layer 13, a conductive film 14 made of an electron emitting layer 14b and a dry etching mask layer 14a from bottom to top; performing dry etching on the nitride semiconductor layer 13; and performing wet etching on the nitride semiconductor layer 13 by emitting electrons from the nitride semiconductor layer 13 through the conductive film 14 to the outside.

    摘要翻译: 根据本发明的制造氮化物半导体元件的方法包括以下步骤:在基底基板11上形成氮化物半导体层13; 在氮化物半导体层13的上表面的一部分上形成从底部到顶部由电子发射层14b和干蚀刻掩模层14a形成的导电膜14; 在氮化物半导体层13上进行干蚀刻; 以及通过从氮化物半导体层13通过导电膜14向外部发射电子而在氮化物半导体层13上进行湿式蚀刻。