摘要:
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
摘要:
A charged beam apparatus of this invention comprises a sample table on which a sample is placed, a column for irradiating a charged beam on a surface of the sample, a gas supply mechanism having a gas supply opening for injecting a gas to an irradiated position of the charged beam, and a driving mechanism for moving the gas supply opening parallel to the surface of the sample in order to position the gas supply opening, and moving the gas supply opening perpendicularly to the surface of the sample in order to set a distance from the gas supply opening to a processing position. This allows the gas pressure to be stably held with a high accuracy at the processing position. Accordingly, desired deposition or etching can be performed with a high accuracy, and this further improves the quality of the mask.
摘要:
In a charged beam drawing apparatus for drawing a desired pattern on a sample by deflecting a charged beam on the sample while continuously moving a stage on which the sample is placed, a mark having a line-and-space pattern, in which a plurality of heavy metal marks each having a width equal to a side of the charged beam are arranged with spaces each equal to the width between them, is formed on the sample. The charged beam is radiated onto the mark while the position of the beam is fixed, and at the same time the stage is continuously moved in the longitudinal direction of the mark, thereby detecting a reflected beam from the mark. On the basis of the signal of the detected reflected beam, a relative vibration during the continuous movement of the stage is measured. This makes it possible to measure the relative vibration produced by the continuous movement of the stage, resulting in an increase in drawing accuracy.
摘要:
A tripping device with burning prevention switch has a electromagnet 10 and a burning prevention switch 14 both of which are cased in each separate insulating bodies. The electromagnet 10 and the burning prevention switch 14 are combined by engagement of projections 15, 16, provided on the burning prevention switch 14 and a hollow 12 and a hole 13, respectively, that are provided on the electromagnet 10.
摘要:
A charged beam applying apparatus comprises a column at least having a charged beam generation section and optical system for controlling the charged beam and a chamber for holding a specimen in place which is exposed with the charged beam. At least one inner portion of the column is formed of a specific material whose an atomic number is equal or less than 22. When a contamination is cleaned off in the column through the utilization of an oxidation effect, an oxide film is sometimes formed inside the column. The electric charging of the oxide film causes a beam control error. The specific material such as the metal of the atomic number causes very much less such error. This is because such specific material involves less emission of secondary electrons and less electric charging in the oxide film formed.
摘要:
A charged beam apparatus comprises a source tank provided outside the column and containing a plasma source, a plasma generating apparatus for generating plasma from a plasma source supplied from the source tank, gate valves and an exhausting pump for introducing plasma generated by the plasma generating apparatus into the column and for exhausting the plasma therefrom, and an O-ring for restricting a passage of plasma in the column such that those portions of cleaning portions to be cleaned to which internal contaminants stick are mainly exposed to plasma. Therefore, it is possible to generation of an oxide film, a fluoride film, or the likes which cause drifting can be restricted.
摘要:
A circuit breaker having a thermal tripping device comprising a bimetal element and a heater has a holding member attached to the stationary part of the bimetal element, for holding the bimetal element and the heater at respective first end parts thereof. The holding member has an arm connected to a flexible copper wire and generates heat when an over-current flows through it, the arm conducting this heat to the attached end part of the bimetal element to cause the bimetal element to bend and deflect a second end thereof to provide circuit breaking action.
摘要:
In a precise rotation mechanism for slightly rotating an object, a drive disk is placed on a flat and smooth surface of a base and rotating disk is mounted on the disk surface of the drive disk and rotatably supported by a pivot bearing on a coupling section of the drive disk. Fixed sections of the drive disk are fixed on the base and movable sections of the drive disk are tiltably coupled to the fixed sections through the coupling section by elastic hinges and also coupled to the fixed sections by driving members made of piezoelectric elements, which are elongated/contracted upon application of a voltage to slightly move the movable sections. Fixing members made of the piezoelectric elements are respectively fixed to the movable sections. When one of the fixing members is contracted, the rotating disk is urged by one of the fixing members against the movable sections and is movable together with the movable sections.
摘要:
An IC tester including a specimen chamber and an electron optical column for radiating an electron beam to a specimen placed in the specimen chamber, wherein a fixed table is attached to a Z table in the specimen chamber and includes downwardly protruding spring contact pins which are connected to lead wires led outside of the specimen chamber. A probe card unit for testing an IC wafer is provided on the upper surface of the fixed table and includes electric terminals having the same positional relation as that of the spring contact pins. A probe card unit fixing mechanism is attached to the undersurface of the fixed table and is so arranged that the probe card unit can be slid laterally along the undersurface of the fixed table and then upward to press the probe card unit against the undersurface of the fixed table and to bring the spring contact pins into electrical contact with their corresponding probe card terminals.