摘要:
An electrically-erasable, programmable ROM cell, or an EEPROM cell, is constructed using an enhancement transistor merged with a floating-gate transistor, where the floating-gate transistor has a small tunnel window, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. The bitlines and source/drain regions are buried beneath relatively thick silicon oxide, which allows a favorable ratio of control gate to floating gate capacitance. Programming and erasing are provided by the tunnel window are near or above the channel side of the source. The window has a thinner dielectric than the remainder of the floating gate, to allow Fowler-Nordheim tunneling. By using dedicated drain or ground lines, rather than a virtual-ground layout, and by using thick oxide for isolation between bitlines, the floating gate can extend onto adjacent bitlines and isolation area, resulting in a favorable coupling ratio. Isolation between wordlines is also by thick thermal oxide in a preferred embodiment, further improving the coupling ratio. Bitline and wordline spacing may be selected for optimum pitch or aspect ratio. Bitline to substrate capacitance is minimized.
摘要:
One embodiment of the invention includes a memory system. The system comprises a memory cell coupled to a bit-line node. The memory cell can be configured to generate a bit-line current on the bit-line node in response to a bias voltage during a read operation. The system further comprises a sense amplifier configured to maintain a substantially constant voltage magnitude of the bit-line node during a pre-charge phase and a sense phase of the read operation based on regulating current flow to and from the bit-line node, and to determine a memory value of the flash memory transistor during the read operation based on a magnitude of the bit-line current on the bit-line node.
摘要:
A memory circuit and method to reduce wordline coupling is disclosed. The circuit includes a plurality of memory cells arranged in rows (702, 704, and 706) and columns (750, 752). A first conductor (710, 850) is coupled to a plurality of the rows (702, 704, and 706) of memory cells. A first transistor (810) has a current path coupled between a voltage supply terminal (800) and the first conductor (850) and a control terminal coupled to receive a first control signal (PLV). A second transistor (820) has a current path coupled between the voltage supply terminal and the first conductor and a control terminal coupled to receive a second control signal (PLW).
摘要:
Methods and apparatus for trimming a reference circuit. A representative technique includes transmitting a constant signal (e.g., a constant current or voltage). The constant signal is received (e.g., at a device pin or other contact). The constant signal is compared to a reference signal. Variables are obtained for program/erase pulses from a user. The reference circuit signal is adjusted to match the constant signal by sending program/erase pulses to the reference circuit. The program/erase pulses are set based on the variables for program/erase pulses and a result of comparing the constant signal with the reference signal.
摘要:
An electrically-erasable, electrically-programmable, read-only-memory cell array is formed in pairs at a face of a semiconductor substrate (22). Each memory cell includes a source region (11) and a drain region (12), with a corresponding channel region between. A Fowler-Nordheim tunnel-window (13a) is located over the source line (17) connected to source (11). A floating gate (13) includes a tunnel-window section. A control gate (14) is disposed over the floating gate (13), insulated by an intervening inter-level dielectric (27). The floating gate (13) and the control gate (14) include a channel section (Ch). The channel section (Ch) is used as a self-alignment implant mask for the source (11) and drain (12) regions, such that the channel-junction edges are aligned with the corresponding edges of the channel section (Ch). The memory cell is programmed by hot-carrier injection from the channel to the floating gate (13), and erased by Fowler-Nordheim tunneling from the floating gate (13) through the tunnel window (13a) to the source-line (17 ). The program and erase regions of the cells are physically separate from each other, and the characteristics, including the oxides, of each of those regions may be made optimum independently from each other.
摘要:
An improved negative charge pump system for erasing a memory array in a memory which has a supply voltage and a negative charge pump. The negative charge pump system includes (a) a device for selecting a memory array to be erased; (b) a device for switching on the supply voltage Vnn for the charge pump; (c) a device for pumping the supply voltage Vnn with the charge pump to produce a pumped negative voltage; (d) a device for erasing the selected array with the pumped negative voltage; (e) a device for stopping the pumping; and (f) a device for providing a discharge path for voltages trapped in the charge pump.
摘要:
An electrically-erasable, programmable ROM cell, or an EEPROM cell, is constructed using an enhancement transistor merged with a floating-gate transistor, where the floating-gate transistor has a small tunnel window, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. The bitlines and source/drain regions are buried beneath relatively thick silicon oxide, which allows a favorable ratio of control gate to floating gate capacitance. Programming and erasure are provided by the tunnel window area, which is located near or above the channel side of the source. The window has a thinner dielectric than the remainder of the floating gate, to allow Fowler-Nordheim tunneling. By using dedicated drain or ground lines, rather than a virtual-ground layout, and by using thick oxide for isolation between bitlines, the floating gate can extend onto adjacent bitlines and isolation area, resulting in a favorable coupling ratio. Isolation between cells in the wordline direction is by a self-aligned implanted region, in this embodiment.
摘要:
An FeRAM memory array wherein the plate lines run in the direction of word lines is described that provides a reduced plate line resistance in arrays having a common plate line connection. The lower plate line resistance reduces the magnitude of negative spikes on the plate line to reduce the potential for FeCap depolarization. Two or more plate lines of a plurality of columns of memory cells are interconnected along a bit line direction. Some or all of the plate lines of one or more columns of dummy memory cells may also be interconnected to reduce the plate line resistance and minimize any increase in the bit line capacitance for the active cells of the array. The improved FeRAM array provides a reduced data error rate, particularly at fast memory cycle times.
摘要:
A supply-voltage detecting stage (11) that supplies first and second reference currents (I.sub.REFP and I.sub.REFN) which vary with the supply voltage (V.sub.cc) and are coupled by first and second gain stages (12A and 12B), respectively, to first and second temperature-detecting stages (13A and 13B), respectively. First and second temperature-detecting stages (13A and 13B) increase the coupled reference currents (I.sub.REFP and I.sub.REFN), respectively, to compensate for temperature increase through use temperature-sensitive, long-channel transistors (M34-M37 and M42-M45), supplying temperature and supply-voltage compensated output bias voltages at output terminals (MIRN and MIRP).
摘要:
A method for erasing blocks of a non-volatile memory includes detecting whether a block is in at least one of an erased state or a state secured from erasure; then setting a flag register at a first level for each block detected to be in at least one of an erased state or a state secured from erasure or at a second level for each block not so detected; then selecting for erasure blocks that have their respective flags set at the second level; and then erasing the selected blocks.