摘要:
There is provided a polymer compound having excellent transparency and excellent heat resistance, a high refractive index, an excellent solubility in various solvents, and a low viscosity and excellent handling properties when the polymer compound is dissolved in a solvent; and a production method of the polymer compound; and a polymer composition containing the polymer compound. And there is also included an aroylbiphenyl compound of Formula (1): [in Formula (1), X is a halogen atom, and R1 is a hydrogen atom or a group of Formula (2a) or Formula (2b); and in Formula (2a) and Formula (2b), R2 and R3 are independently a hydrogen atom or a C1-6 alkyl group]; a polymer compound obtained by using the aroylbiphenyl compound; and a thermocurable film forming polymer composition comprising: as a component (A), the polymer compound, and as a component (B), a crosslinkable compound.
摘要:
A positive photosensitive resin composition that forms an image for a liquid crystal display device and an organic EL display device, for example. The resin is made of a cured film that is highly water repellent and highly oleophobic on the surface. The resin has insulating properties, retains an excellent image and causes no reflow, for example, when being cured to form a film having excellent reworkability. A positive photosensitive resin composition comprising component (A), component (B), component (C) and component (D); Component (A) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, and an N-substituted maleimide group; Component (B) is an acrylic polymer containing an acid dissociable group and a blocked isocyanate group; Component (C) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, a C3-10 fluoroalkyl group, and a silyl ether group, and Component (D) is a photoacid generator.
摘要:
It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface of a cured film thereof even after a treatment with oxygen plasma or the like, and also having an insulating property with high precision and high throughput; and a cured film suitable for a film material of various displays obtained using the positive photosensitive resin composition.
摘要:
Provided is a polyamic acid resin composition for formation of a bank, which provides excellent film characteristics and adhesion to a substrate, which can undergo patterning with use of a positive type photoresist, and which can be transformed into a polyimide after the patterning to yield a polyimide resin with upper part of film having a low surface energy. It is achieved by a polyamic acid resin composition comprising a polyamic acid [a] as a base and a polyamic acid [b] having a fluorine-containing alkyl group with a carbon number of at least 2, and containing the polyamic acid [b] in an amount of from 0.1 to 30 wt % to the total amount of the polyamic acid [a] and the polyamic acid [b].
摘要:
The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a method for arbitrarily forming a pattern having a semicircular or trapezoidal section by using the composition. The positive photosensitive resin composition of the present invention comprises an alkali-soluble resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant, and the alkali-soluble resin is a copolymer comprising a carboxylic group-containing acrylic monomer, a hydroxyl group-containing acrylic monomer and an N-substituted maleimide as essential components. By changing the postbake conditions, the composition can arbitrarily form a pattern having a semicircular or trapezoidal section.
摘要:
A positive photosensitive polyimide resin composition comprising: (a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one solvent solubilizing functional group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, (b) a photosensitive orthoquinonediazide compound, and (c) from 0.1 to 50 wt %, based on the total weight of all polymers of the composition, of a component (c1) or (c2), wherein: component (c1) is a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, and component (c2) is a polyamic acid comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g.
摘要:
The present invention relates to a peptide having the amino acid sequence: Lys Arg Ser Thr Asn, Arg Arg Tyr Lys Glu Lys Glu Lys or Ala Ile Ile Pro Asp Arg Glu Val Leu Tyr and which peptide is capable of specifically binding to the antibody which is specific to the non-A, non-B hepatitis associated antigen. The peptide can be used as an anti-HCV antibody assay reagent with high sensitivity.
摘要:
There is provided a material that after the formation of a cured film, exhibits high solvent resistance, liquid crystal-alignment properties, heat resistance, and high transparency. A composition for forming thermoset film having photo-alignment properties and containing a component (A) that is a compound having a photo-aligning group and a hydroxy group, a component (B) that is a polymer having any one of or both of a hydroxy group and a carboxy group, and a component (C) that is a crosslinker.
摘要:
There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties, including: a component (A) that is a compound having a photo-aligning group and a hydroxy group; and a component (B) that is a silicon isocyanate compound. A liquid crystal alignment layer formed from the thermoset film forming composition, and an optical device with a retardation layer obtained by use of the thermoset film forming composition.
摘要:
There is provided a polymer compound having excellent transparency and excellent heat resistance, a high refractive index, an excellent solubility in various solvents, and a low viscosity and excellent handling properties when the polymer compound is dissolved in a solvent; and a production method of the polymer compound; and a polymer composition containing the polymer compound. And there is also included an aroylbiphenyl compound of Formula (1): [in Formula (1), X is a halogen atom, and R1 is a hydrogen atom or a group of Formula (2a) or Formula (2b); and in Formula (2a) and Formula (2b), R2 and R3 are independently a hydrogen atom or a C1-6 alkyl group]; a polymer compound obtained by using the aroylbiphenyl compound; and a thermocurable film forming polymer composition comprising: as a component (A), the polymer compound, and as a component (B), a crosslinkable compound.