摘要:
A document feeding device includes a carrying unit capable of carrying documents, a drawing device drawing and supplying the documents, a drawing device drive source driving the drawing device, a separation unit including a separation device to separate the documents one by one, a separation device drive source driving the separation device, a conveying device conveying the documents, a reading unit including a reading device to read information of the documents, a discharge device discharging the documents, a first document detector provided between a document set position and the separation unit to detect the documents, and a second document detector provided downstream of the separation unit and near a separation position to detect the documents. The first and second document detectors detect the trailing end of each of the documents to control the operation of the drawing device on the basis of the result of the detection.
摘要:
A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要:
To provide a shield case and an MEMS microphone having the shield case which can secure on a top plate the minimum distance for adhering with a gasket in a view point of airtightness.The shield case according to the invention is a shield case for shielding an MEMS chip mounted on a board from the outside, which includes a top plate and a plurality of side plates and the thickness of each of the plurality of side plates is larger than that of the top plate. According to this configuration, the area of the top plate can be made larger as compared with a conventional shield case having a uniform thickness. Thus, the area for adhering the gasket to the top plate can be secured without changing the position, size and range etc. of the chucking area from those of the conventional shield case.
摘要:
An automatic document feeder, for transferring a document through a scanning position three times, includes: a first transfer mechanism to reverse a given document via a reversing path, and transfer the same to a scanning position; a second transfer mechanism to transfer the given document from the scanning position to one of a switchback path and a document discharging part; a switchback mechanism to transfer the given document to a lay-by on the switchback path, and then transfer the given document towards the reversing path via a re-entry path; and a control unit to control the mechanisms so that a second original document passes through the scanning position a first time before a first original document passes through the scanning position a third time, and to pause travel of the second original document at the lay-by as the first original document is passed through the scanning position a third time.
摘要:
A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.
摘要:
An automatic document feeder, included in an image reading system that can be included in an image forming apparatus, is configured to transfer an original document to an image reader included in the image reading system, and includes a first drive unit configured to include a first motor to drive the document separation and feed unit, a second drive unit configured to include a second motor to drive the document conveyance unit, a third drive unit configured to include a third motor to drive the document discharging unit, where at least two motors of the first, second, and third motors disposed in a substantially in-line arrangement, and a cooling member configured to supply a coolant to the at least two motors disposed in a substantially in-line arrangement, to the first, second, and third motors, in that order.
摘要:
A substrate polishing apparatus wherein a semiconductor substrate is held by a top ring 10-2 or 11-2 and is pressed against a polishing surface of a polishing table 10-1 or 10-2. A surface to be polished of the semiconductor substrate is polished by a relative movement between the semiconductor substrate and the polishing surface. The apparatus includes a pressing force changing mechanism for changing a pressing force for pressing the semiconductor substrate, a relative movement seed changing mechanism for changing the number of revolutions of the top ring and/or the polishing table, and a control mechanism. The control mechanism performs the polishing through plural polishing processes on the polishing table 10-1 or 10-2 while changing the pressing force and the number of revolutions.
摘要:
An electrolytic processing apparatus is used to remove a metal film formed on a surface of a substrate. The electrolytic processing apparatus includes a feeding electrode 31 for feeding electricity to a metal film 6 on a substrate W, a processing electrode 32 for processing the metal film 6, a substrate carrier 11 for holding the substrate W, a first supply passage 51 for supplying a first electrolytic processing liquid, a second supply passage 52 for supplying a second electrolytic processing liquid, an insulating member 36 for electrically isolating the first electrolytic processing liquid and the second electrolytic processing liquid, a table 12 on which the feeding electrode 31, the processing electrode 32, and the insulating member 36 are disposed, and a relative movement mechanism 17 for making a relative movement between the table 12 and the substrate carrier 11.
摘要:
A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abrasive liquid containing abrasive particles, and cleaning a polished surface of the substrate by supplying a cleaning liquid having substantially the same pH as the abrasive liquid or similar pH to the abrasive liquid so that a pH of the abrasive liquid attached to the polished surface of the substrate is not rapidly changed.
摘要:
A polishing apparatus and method has a function of polishing a surface of a film formed on a substrate to a flat mirror finish and a function of polishing unnecessary metal film such as copper film deposited on an outer peripheral portion of the substrate to remove such unnecessary metal film. The polishing apparatus comprises a surface polishing mechanism comprising a polishing table having a polishing surface and a top ring for holding the substrate and pressing the substrate against the polishing surface of the polishing table to thereby polish a surface of the substrate, and an outer periphery polishing mechanism for polishing an outer peripheral portion of the substrate.