SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE
    22.
    发明申请
    SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE 有权
    标本观察方法和装置,以及使用方法和装置的检查方法和装置

    公开(公告)号:US20110155905A1

    公开(公告)日:2011-06-30

    申请号:US12937145

    申请日:2009-04-10

    IPC分类号: G01N23/225 G01N23/00

    摘要: A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.

    摘要翻译: 提供了一种技术,其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。 该样本观察方法包括:用电子束照射样本; 检测已经产生的待观察的电子,并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。 电子束照射包括用电子束照射样本,其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量,从而使次级 发射电子和镜电子作为待观察的电子进行混合。 要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。 对于100nm以下的细小异物和图案,可以快速进行观察和检查。

    Shield case and MEMS microphone having it
    23.
    发明授权
    Shield case and MEMS microphone having it 有权
    屏蔽盒和MEMS麦克风

    公开(公告)号:US07904123B2

    公开(公告)日:2011-03-08

    申请号:US12160663

    申请日:2007-09-13

    IPC分类号: H04M1/00 H04R9/08

    摘要: To provide a shield case and an MEMS microphone having the shield case which can secure on a top plate the minimum distance for adhering with a gasket in a view point of airtightness.The shield case according to the invention is a shield case for shielding an MEMS chip mounted on a board from the outside, which includes a top plate and a plurality of side plates and the thickness of each of the plurality of side plates is larger than that of the top plate. According to this configuration, the area of the top plate can be made larger as compared with a conventional shield case having a uniform thickness. Thus, the area for adhering the gasket to the top plate can be secured without changing the position, size and range etc. of the chucking area from those of the conventional shield case.

    摘要翻译: 为了提供一种屏蔽壳和具有屏蔽壳的MEMS麦克风,该屏蔽壳可以在气密的视点中固定在顶板上具有用垫片粘附的最小距离。 根据本发明的屏蔽盒是用于屏蔽从外部安装在板上的MEMS芯片的屏蔽盒,其包括顶板和多个侧板,并且多个侧板中的每一个的厚度大于 的顶板。 根据这种构造,与具有均匀厚度的常规屏蔽壳相比,可以使顶板的面积更大。 因此,可以在不改变卡盘区域的位置,尺寸和范围等与常规屏蔽壳体的位置,尺寸和范围等的情况下确保将垫圈粘附到顶板的区域。

    Automatic document feeder, image reading device including the same, and image forming apparatus including the same
    24.
    发明授权
    Automatic document feeder, image reading device including the same, and image forming apparatus including the same 有权
    自动送稿器,包括该图像读取装置的图像读取装置以及包括该自动送纸器的图像形成装置

    公开(公告)号:US07869755B2

    公开(公告)日:2011-01-11

    申请号:US11790887

    申请日:2007-04-27

    IPC分类号: G03G15/00 B65H85/00

    CPC分类号: G03G15/602

    摘要: An automatic document feeder, for transferring a document through a scanning position three times, includes: a first transfer mechanism to reverse a given document via a reversing path, and transfer the same to a scanning position; a second transfer mechanism to transfer the given document from the scanning position to one of a switchback path and a document discharging part; a switchback mechanism to transfer the given document to a lay-by on the switchback path, and then transfer the given document towards the reversing path via a re-entry path; and a control unit to control the mechanisms so that a second original document passes through the scanning position a first time before a first original document passes through the scanning position a third time, and to pause travel of the second original document at the lay-by as the first original document is passed through the scanning position a third time.

    摘要翻译: 一种用于通过扫描位置传送文件三次的自动文件馈送器包括:第一传送机构,用于经由反转路径反转给定文档,并将其传送到扫描位置; 第二传送机构,用于将给定文档从扫描位置传送到转向路径和文档排放部分之一; 转发机构,用于将给定文档传送到转回路径上的停靠位,然后经由重新进入路径将给定文档转发到反转路径; 以及控制单元,用于控制机构,使得第二原稿在第一次原稿通过扫描位置之前第一次经过扫描位置,并且暂停第二原稿在平铺处的行进 因为第一个原始文档第三次通过扫描位置。

    ELECTRODE COVERING MATERIAL, ELECTRODE STRUCTURE AND SEMICONDUCTOR DEVICE
    25.
    发明申请
    ELECTRODE COVERING MATERIAL, ELECTRODE STRUCTURE AND SEMICONDUCTOR DEVICE 有权
    电极覆盖材料,电极结构和半导体器件

    公开(公告)号:US20100314611A1

    公开(公告)日:2010-12-16

    申请号:US12515585

    申请日:2007-11-21

    摘要: A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.

    摘要翻译: 提供一种半导体器件,并且包括具有栅电极,栅极绝缘层,由有机半导体材料层构成的沟道形成区域和由金属制成的源极/漏极电极的场效应晶体管。 与包含沟道形成区域的有机半导体材料层接触的源极/漏极电极的一部分被电极涂覆材料覆盖。 由于电极涂层材料由具有与金属离子结合的官能团的有机分子和与由金属构成的源/漏电极结合的官能团构成,所以可以实现低接触电阻和高迁移率。

    Automatic document feeder, image reading system including same, and image forming apparatus including same
    26.
    发明申请
    Automatic document feeder, image reading system including same, and image forming apparatus including same 有权
    自动送稿器,包括其的图像读取系统,以及包括其的图像形成装置

    公开(公告)号:US20080308995A1

    公开(公告)日:2008-12-18

    申请号:US12155426

    申请日:2008-06-04

    IPC分类号: B65H5/00

    CPC分类号: G03G15/602 G03G2215/00189

    摘要: An automatic document feeder, included in an image reading system that can be included in an image forming apparatus, is configured to transfer an original document to an image reader included in the image reading system, and includes a first drive unit configured to include a first motor to drive the document separation and feed unit, a second drive unit configured to include a second motor to drive the document conveyance unit, a third drive unit configured to include a third motor to drive the document discharging unit, where at least two motors of the first, second, and third motors disposed in a substantially in-line arrangement, and a cooling member configured to supply a coolant to the at least two motors disposed in a substantially in-line arrangement, to the first, second, and third motors, in that order.

    摘要翻译: 包括在可以包括在图像形成装置中的图像读取系统中的自动文件馈送器被配置为将原始文档传送到包括在图像读取系统中的图像读取器,并且包括第一驱动单元,其被配置为包括第一 电动机驱动文件分离和供给单元,第二驱动单元,被配置为包括驱动文件传送单元的第二电动机;第三驱动单元,被配置为包括第三电动机以驱动文件排出单元,其中至少两个电动机 第一,第二和第三电动机以大致一字排列的方式设置;以及冷却构件,其构造成将冷却剂以大致一字排列的方式设置在所述至少两个电动机上,所述至少两个电动机连接到所述第一,第二和第三电动机 , 以该顺序。

    Substrate polishing apparatus and substrate polishing method
    27.
    发明申请
    Substrate polishing apparatus and substrate polishing method 审中-公开
    基板抛光装置和基板抛光方法

    公开(公告)号:US20070238395A1

    公开(公告)日:2007-10-11

    申请号:US11806581

    申请日:2007-06-01

    IPC分类号: B24B1/00 B24B7/00

    摘要: A substrate polishing apparatus wherein a semiconductor substrate is held by a top ring 10-2 or 11-2 and is pressed against a polishing surface of a polishing table 10-1 or 10-2. A surface to be polished of the semiconductor substrate is polished by a relative movement between the semiconductor substrate and the polishing surface. The apparatus includes a pressing force changing mechanism for changing a pressing force for pressing the semiconductor substrate, a relative movement seed changing mechanism for changing the number of revolutions of the top ring and/or the polishing table, and a control mechanism. The control mechanism performs the polishing through plural polishing processes on the polishing table 10-1 or 10-2 while changing the pressing force and the number of revolutions.

    摘要翻译: 一种衬底抛光装置,其中半导体衬底由顶环10-2或11-2保持并且被压靠在抛光台10-1或10-2的抛光表面上。 通过半导体衬底和抛光表面之间的相对运动来抛光半导体衬底的待抛光表面。 该装置包括用于改变用于按压半导体衬底的按压力的按压力改变机构,用于改变顶环和/或抛光台的转数的相对运动种子改变机构和控制机构。 控制机构通过在研磨台10-1或10-2上进行多次研磨处理而进行研磨,同时改变按压力和转速。

    Electrolytic processing apparatus
    28.
    发明申请
    Electrolytic processing apparatus 审中-公开
    电解处理装置

    公开(公告)号:US20070034502A1

    公开(公告)日:2007-02-15

    申请号:US11202899

    申请日:2005-08-12

    IPC分类号: C25D17/00

    摘要: An electrolytic processing apparatus is used to remove a metal film formed on a surface of a substrate. The electrolytic processing apparatus includes a feeding electrode 31 for feeding electricity to a metal film 6 on a substrate W, a processing electrode 32 for processing the metal film 6, a substrate carrier 11 for holding the substrate W, a first supply passage 51 for supplying a first electrolytic processing liquid, a second supply passage 52 for supplying a second electrolytic processing liquid, an insulating member 36 for electrically isolating the first electrolytic processing liquid and the second electrolytic processing liquid, a table 12 on which the feeding electrode 31, the processing electrode 32, and the insulating member 36 are disposed, and a relative movement mechanism 17 for making a relative movement between the table 12 and the substrate carrier 11.

    摘要翻译: 使用电解处理装置去除形成在基板表面上的金属膜。 该电解处理装置包括用于向基板W上的金属膜6供电的供电电极31,用于处理金属膜6的处理电极32,用于保持基板W的基板载体11,用于供给的第一供给通道51 第一电解处理液,用于供给第二电解处理液的第二供应通道52,用于电隔离第一电解处理液和第二电解处理液的绝缘构件36,供给电极31,处理 电极32和绝缘部件36,以及用于在工作台12和基板载体11之间进行相对移动的相对移动机构17。

    Cleaning method and polishing apparatus employing such cleaning method
    29.
    发明授权
    Cleaning method and polishing apparatus employing such cleaning method 有权
    使用这种清洁方法的清洁方法和抛光装置

    公开(公告)号:US07169235B2

    公开(公告)日:2007-01-30

    申请号:US10844317

    申请日:2004-05-13

    IPC分类号: C23G1/02

    摘要: A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abrasive liquid containing abrasive particles, and cleaning a polished surface of the substrate by supplying a cleaning liquid having substantially the same pH as the abrasive liquid or similar pH to the abrasive liquid so that a pH of the abrasive liquid attached to the polished surface of the substrate is not rapidly changed.

    摘要翻译: 一种方法适用于清洗需要高度清洁度的基板,如半导体晶片,玻璃基板或液晶显示器。 该方法包括使用含磨料颗粒的磨料液研磨衬底,以及通过向研磨液中提供与磨料液体或类似pH具有基本上相同pH值的清洗液体来清洗衬底的抛光表面,使磨料的pH值 附着于基板抛光面的液体不会迅速变化。

    Polishing apparatus and method
    30.
    发明授权
    Polishing apparatus and method 有权
    抛光设备和方法

    公开(公告)号:US07108589B2

    公开(公告)日:2006-09-19

    申请号:US11187944

    申请日:2005-07-25

    IPC分类号: B24B7/00

    摘要: A polishing apparatus and method has a function of polishing a surface of a film formed on a substrate to a flat mirror finish and a function of polishing unnecessary metal film such as copper film deposited on an outer peripheral portion of the substrate to remove such unnecessary metal film. The polishing apparatus comprises a surface polishing mechanism comprising a polishing table having a polishing surface and a top ring for holding the substrate and pressing the substrate against the polishing surface of the polishing table to thereby polish a surface of the substrate, and an outer periphery polishing mechanism for polishing an outer peripheral portion of the substrate.

    摘要翻译: 抛光装置和方法具有将形成在基板上的膜的表面抛光至平面镜面的功能,以及抛光沉积在基板的外周部分上的不需要的金属膜如铜膜的功能,以去除这种不必要的金属 电影。 抛光装置包括表面抛光机构,其包括具有抛光表面的抛光台和用于保持基板的顶环,并将基板压靠在抛光台的抛光表面上,从而抛光基板的表面,以及外周抛光 用于抛光衬底的外周部分的机构。