Image sensor with pixel binning device

    公开(公告)号:US10313611B2

    公开(公告)日:2019-06-04

    申请号:US15613147

    申请日:2017-06-03

    Inventor: Zhibiao Zhou

    Abstract: An image sensor includes a first pixel and a second pixel. The first pixel receives a first signal sensed by a first photodiode. The second pixel receives a second signal sensed by a second photodiode. A pixel binning device includes a first transistor, a second transistor and a binning circuit, wherein the first transistor switchably couples to the first pixel to transfer the first signal, the second transistor switchably couples to the second pixel to transfer the second signal, and the binning circuit couples to the first transistor and the second transistor to bin the first signal and the second signal.

    Operating method of image sensor
    25.
    发明授权

    公开(公告)号:US09749567B2

    公开(公告)日:2017-08-29

    申请号:US14953411

    申请日:2015-11-29

    Abstract: An operating method of an image sensor includes the following steps. The image sensor includes at least one pixel unit. The pixel unit includes a photoelectric conversion unit, a first control unit, a capacitor unit, and a sensing unit. The photoelectric conversion unit includes a quantum film photoelectric conversion unit, and the first control unit includes an oxide semiconductor transistor. The capacitor unit is coupled to the first control unit, and the sensing unit is configured to sense signals at a sense point coupled between the first control unit and the sensing unit. The pixel unit is discharged before a readout operation. The capacitor unit is charged by electrons emitted from the photoelectric conversion unit when the photoelectric conversion unit is excited by light. Signals at the sense point are then sensed by the sensing unit.

    Image sensor pixel structure
    27.
    发明授权
    Image sensor pixel structure 有权
    图像传感器像素结构

    公开(公告)号:US09431441B1

    公开(公告)日:2016-08-30

    申请号:US14834452

    申请日:2015-08-25

    Abstract: A back side illumination image sensor pixel structure includes a substrate having a front side and a back side opposite to the front side, a sensing device formed in the substrate to receive an incident light through the back side of the substrate, two oxide-semiconductor field effect transistor (OS FET) devices formed on the front side of the substrate, and a capacitor formed on the front side of the substrate. The two OS FET devices are directly stacked on the sensing device and the capacitor is directly stacked on the OS FET devices. The two OS FET devices overlap the sensing device, and the capacitor overlaps both of the OS FET devices and the sensing device.

    Abstract translation: 背面照明图像传感器像素结构包括具有与前侧相反的前侧和后侧的基板,形成在基板中以接收穿过基板的背面的入射光的感测装置,两个氧化物半导体场 形成在基板的前侧的效应晶体管(OS FET)器件,以及形成在基板的前侧的电容器。 两个OS FET器件直接堆叠在感测器件上,电容器直接堆叠在OS FET器件上。 两个OS FET器件与感测器件重叠,并且电容器与OS FET器件和感测器件重叠。

    SEMICONDUCTOR STRUCTURE
    28.
    发明公开

    公开(公告)号:US20240170490A1

    公开(公告)日:2024-05-23

    申请号:US18424888

    申请日:2024-01-29

    Abstract: A semiconductor structure includes a semiconductor on insulator (SOI) substrate, a first electrically conductive structure, and a second electrically conductive structure. The SOI substrate includes a base substrate, a buried insulation layer disposed on the base substrate, a semiconductor layer disposed on the buried insulation layer, and a trap rich layer disposed between the buried insulation layer and the base substrate. At least a part of the first electrically conductive structure and at least a part of the second electrically conductive structure are disposed in the trap rich layer. A part of the trap rich layer is disposed between the first electrically conductive structure and the second electrically conductive structure. The first electrically conductive structure, the second electrically conductive structure, and the trap rich layer disposed between the first electrically conductive structure and the second electrically conductive structure are at least a portion of an anti-fuse structure.

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