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公开(公告)号：US07180571B2
公开(公告)日：2007-02-20
申请号：US11006821
申请日：2004-12-08
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , F16F6/00 , F16F15/00 , F16F15/03 , G03F7/709 , H01J37/3056
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a substrate support constructed to support a substrate, a projection system configured to project a patterned radiation beam onto a target portion of the substrate, and a frame onto which at least a part of the projection system is mounted. A fluid provider is arranged to provide a fluid between the substrate and a downstream end of the projection system. The apparatus also includes an actuator associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system for cushioning vibrational forces when the actuator positions the fluid provider.
摘要翻译： 公开了一种光刻投影装置。 该装置包括构造成支撑基板的基板支撑件，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，以及安装投影系统的至少一部分的框架。 流体供应器被布置成在基板和投影系统的下游端之间提供流体。 该装置还包括与框架相关联并与流体提供者相关联并且被布置成定位流体提供者的致动器，以及用于当致动器定位流体供应器时缓冲振动力的缓冲系统。
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公开(公告)号：US08976335B2
公开(公告)日：2015-03-10
申请号：US13333237
申请日：2011-12-21
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
CPC分类号： G03F7/70875 , G03F7/70716 , H01L21/683 , H01L21/6875
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.
摘要翻译： 布置成将图案从图案形成装置转印到基板上的光刻设备，所述光刻设备具有安装在第一物体上的第一物体和平面元件，以改善与第二物体的热传递。
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23.发明授权Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权测量方法，测量仪器，光刻设备和器件制造方法公开(公告)号：US08593646B2
公开(公告)日：2013-11-26
申请号：US13369614
申请日：2012-02-09
申请人： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
发明人： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.
摘要翻译： 设备（AS）测量光刻基板（W）上的标记（202）的位置。 测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。 基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记 ）。 该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。 在一个实施例中，物镜（524）相对于参考框架保持固定，而移动的光学元件（562）相对于参考框架赋予辐射点的移动。
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24.发明申请公开(公告)号：US20110299057A1
公开(公告)日：2011-12-08
申请号：US13100740
申请日：2011-05-04
申请人： Johannes Antonius Gerardus AKKERMANS , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
发明人： Johannes Antonius Gerardus AKKERMANS , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
IPC分类号： G03B27/58
CPC分类号： G03F7/70725 , G03F7/70991
摘要： A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.
摘要翻译： 一种用于定位物体的舞台装置，舞台装置包括被配置为保持对象的桌子，被配置为支撑桌子的支撑结构，桌子可相对于支撑结构移动，支撑结构包括第一数据时钟和 第二数据时钟和包括第一数据时钟和第二数据时钟中的另一个的表; 以及电路，被配置为使所述第一和第二数据时钟同步，所述电路包括发射机和接收机，所述发射机被配置为将时钟信号数据从所述第一数据时钟无线传输到所述第二数据时钟;以及同步电路， 数据时钟具有来自接收机接收的无线传输时钟信号数据的第一个数据时钟。
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公开(公告)号：US07696492B2
公开(公告)日：2010-04-13
申请号：US11637936
申请日：2006-12-13
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译： 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。
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27.发明授权Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system 有权光刻设备，用于去除支撑表面上的一个或多个突起的材料的方法以及物品支撑系统公开(公告)号：US08810777B2
公开(公告)日：2014-08-19
申请号：US12699562
申请日：2010-02-03
IPC分类号： G03B27/58 , G03F7/20 , B24B35/00 , B24B31/112
CPC分类号： B24B31/112 , B24B35/00 , G03B27/58 , G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.
摘要翻译： 平版印刷投影设备包括一个光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投影到基板的目标部分上;支撑台，其包括用于支撑物品的突起，检测器以检测高度 突起的偏差，用于改变突起材料的高度的材料去除装置，耦合在检测器和材料去除装置之间的控制器，其中材料去除装置包括从由以下组成的组中选择的去除工具：机械抛光装置， 磁流变整理工具，以及单点或多点金刚石工具。
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公开(公告)号：US08411247B2
公开(公告)日：2013-04-02
申请号：US12618832
申请日：2009-11-16
CPC分类号： G03F7/70875 , F25B21/00 , G03F7/70858 , Y02B30/66
摘要： A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.
摘要翻译： 光刻设备包括可移动的第一物体和包括热交换体的热交换器，所述热交换体包括具有电热量或磁热量特性的材料，并且被配置为通过与第一物体的热交换来影响第一物体的温度 以及发电机，其被配置为向所述热交换体提供电磁场，以改变所述热交换体的温度，以便冷却或加热所述第一物体。
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29.发明申请LITHOGRAPHIC APPARATUS, A METHOD FOR REMOVING MATERIAL OF ONE OR MORE PROTRUSIONS ON A SUPPORT SURFACE, AND AN ARTICLE SUPPORT SYSTEM 有权平面设备，一种用于移除支持表面上的一个或多个主题的材料的方法，以及一个文章支持系统公开(公告)号：US20100214549A1
公开(公告)日：2010-08-26
申请号：US12699562
申请日：2010-02-03
CPC分类号： B24B31/112 , B24B35/00 , G03B27/58 , G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.
摘要翻译： 平版印刷投影设备包括一个光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投影到基板的目标部分上;支撑台，其包括用于支撑物品的突起，检测器以检测高度 突起的偏差，用于改变突起材料的高度的材料去除装置，耦合在检测器和材料去除装置之间的控制器，其中材料去除装置包括从由以下组成的组中选择的去除工具：机械抛光装置， 磁流变整理工具，以及单点或多点金刚石工具。
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公开(公告)号：US20100141914A1
公开(公告)日：2010-06-10
申请号：US12618832
申请日：2009-11-16
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , F25B21/00 , G03F7/70858 , Y02B30/66
摘要： A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.
摘要翻译： 光刻设备包括可移动的第一物体和包括热交换体的热交换器，所述热交换体包括具有电热量或磁热量特性的材料，并且被配置为通过与第一物体的热交换来影响第一物体的温度 以及发电机，其被配置为向所述热交换体提供电磁场，以改变所述热交换体的温度，以便冷却或加热所述第一物体。
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