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104 条记录 (耗时 0.031 秒)

    Method and apparatus for specimen fabrication
    24.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US07138628B2

    公开(公告)日：2006-11-21

    申请号：US11390201

    申请日：2006-03-28

    申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    IPC分类号： H01J37/20

    CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A specimen fabrication apparatus including: a specimen chamber, a sample stage in the specimen chamber, to mount a specimen substrate, a transfer unit to extract a micro-specimen from the specimen substrate, and to transfer the micro-specimen, within the specimen chamber; a specimen holder in the specimen chamber, to receive the micro-specimen from the transfer unit, and to have the micro-specimen affixed thereto, and an irradiating optical system to irradiate an ion beam to the specimen substrate or to the micro-specimen affixed to the specimen holder, wherein the transfer unit effects transfer of the micro-specimen from the specimen substrate to the specimen holder, and the irradiating optical system irradiates the ion beam onto the micro-specimen affixed to the specimen holder, while the specimen chamber remains substantially sealed.

    摘要翻译： 一种标本制造装置，包括：试样室，试样室中的样品台，安装试样基板，转移单元，从试样基板取出微量试样，并在试样室内转移微量试样 ; 在样本室中的样本保持器，用于从转印单元接收微量样本，并且将微型样品固定在其上;以及照射光学系统，用于将离子束照射到样品基底或贴在微型样品上 所述转印单元将所述微量试样从所述试样基板转移到所述试样保持体，并且所述照射光学系统将所述离子束照射到固定在所述试样保持器上的所述微量试样上， 基本上密封。

    Projection ion beam machining apparatus
    25.
    发明授权
    Projection ion beam machining apparatus 有权
    投影离子束加工设备

    公开(公告)号：US06583426B1

    公开(公告)日：2003-06-24

    申请号：US09508265

    申请日：2000-05-22

    申请人： Yoshimi Kawanami ,  Kaoru Umemura ,  Yuuichi Madokoro ,  Satoshi Tomimatsu

    发明人： Yoshimi Kawanami ,  Kaoru Umemura ,  Yuuichi Madokoro ,  Satoshi Tomimatsu

    IPC分类号： G21K510

    CPC分类号： H01J37/3056 ,  H01J2237/31737 ,  H01J2237/3174

    摘要： In a projection ion beam machining apparatus having a liquid metal ion source, a combination of two or three electrostatic lenses arranged between the liquid metal ion source and a sample and a stencil mask exchangeably arranged in the combination of the electrostatic lenses, when a distance from substantial center of the electrostatic lens most proximate to the ion source and an ion emitting portion of the ion source is designated by Lo, a distance from the substantial center of the electiostatic lens most proximiate to the sample and the surface of the sample is designated by Li and a distance between the substantial centers of the two lenses is designated by L, by making a value of (L/Lo)(L/Li) equal to or larger than 400, current density on the sample of ion beam accelerated to several 10 kV for projecting a pattern of a stencil mask can be made equal to or larger than 20 mA per 1 square cm and resolution of edge can be made equal to or smaller than 0.2 &mgr;m when the size of the ion beam is 5 &mgr;m. As a result, a region having a size equal to or smaller than several 10 &mgr;m can be machined at speed several times or more as fast as that of FIB having equivalent machining accuracy.

    摘要翻译： 在具有液体金属离子源的投影离子束加工设备中，配置在液体金属离子源和样品之间的两个或三个静电透镜的组合和可交换地布置在静电透镜的组合中的模板掩模，当距离 最接近离子源的静电透镜的实质中心和离子源的离子发射部分由Lo表示，距离最接近的静电透镜的实质中心到样品的距离，并且样品的表面由 Li和两个透镜的实质中心之间的距离由L表示，通过使（L / Lo）（L / Li）的值等于或大于400，离子束样品上的电流密度加速到几 可以将用于投影模板掩模图案的10kV用于每1平方厘米等于或大于20mA，当离子的尺寸可以使边缘分辨率等于或小于0.2μm 梁是5 mum。 结果，可以以等于加工精度的FIB的速度加工几倍或更多倍的尺寸等于或小于几个10μm的区域。

    Dual beam apparatus with tilting sample stage
    26.
    发明授权
    Dual beam apparatus with tilting sample stage 有权
    具有倾斜样品台的双光束装置

    公开(公告)号：US08431891B2

    公开(公告)日：2013-04-30

    申请号：US12731910

    申请日：2010-03-25

    申请人： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

    发明人： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/261 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/08 ,  H01J2237/20207 ,  H01J2237/24528 ,  H01J2237/28 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： An ion beam processing apparatus includes an ion beam irradiation optical system that irradiate a rectangular ion beam to a sample held on a first sample stage, an electron beam irradiation optical system that irradiates an electron beam to the sample, and a second sample stage on which a test piece, extracted from the sample by a probe, is mounted. An angle of irradiation of the ion beam can be tilted by rotating the second sample stage about a tilting axis. A controller controls the width of skew of an intensity profile representing an edge of the rectangular ion beam in a direction perpendicular to a first direction in which the tilting axis of the second sample stage is projected on the second sample stage surface so that the width will be smaller than the width of skew of an intensity profile representing another edge of the ion beam in a direction parallel to the first direction.

    摘要翻译： 一种离子束处理装置，包括：将矩形离子束照射到保持在第一样品台上的样品的离子束照射光学系统，向样品照射电子束的电子束照射光学系统;以及第二样品台， 通过探针从样品中提取的试片被安装。 离子束的照射角度可以通过使第二样品台围绕倾斜轴旋转来倾斜。 控制器控制表示矩形离子束在与第二样品台的倾斜轴投射到第二样品台表面上的第一方向垂直的方向上的强度分布的偏斜宽度，使得宽度将 小于在平行于第一方向的方向上表示离子束的另一边缘的强度分布的偏斜宽度。

    Method and apparatus for specimen fabrication
    29.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US07268356B2

    公开(公告)日：2007-09-11

    申请号：US10898592

    申请日：2004-07-26

    申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

    发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

    IPC分类号： G21G5/00

    CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

    摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

    摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。