公开(公告)号：US5578127A

公开(公告)日：1996-11-26

申请号：US574732

申请日：1995-12-19

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： B65G49/07 ,  G03F7/16 ,  H01L21/00 ,  H01L21/31 ,  H01L21/677 ,  H01L21/68 ,  B05B13/02 ,  B05C5/00 ,  B05C13/00

CPC分类号： G03F7/16 ,  H01L21/6715 ,  Y10S134/902

摘要： A system for coating a photoresist on a semiconductor wafer includes a loading/unloading unit and a process unit. A convey path is arranged in the process unit, and an adhesion process section, a pre-bake section, a cooling section, a resist coating section, and a cover film coating section are arranged along the convey path. The adhesion process section, the pre-bake section, and the cover film coating section are arranged in individual process chambers, while the cooling section and the resist coating section are arranged in a common main process chamber. A convey robot is disposed to be movable along the convey path, and a substrate is conveyed among the process chambers by the convey robot. A convey member is arranged in and dedicated to the main process chamber, and the substrate is conveyed from the cooling section to the-resist coating section by the convey member.

摘要翻译： 用于在半导体晶片上涂覆光致抗蚀剂的系统包括装载/卸载单元和处理单元。 输送路径布置在处理单元中，沿着传送路径布置粘合处理部分，预烘烤部分，冷却部分，抗蚀剂涂覆部分和覆盖膜涂覆部分。 粘附处理部分，预烘烤部分和覆盖膜涂覆部分被布置在各个处理室中，而冷却部分和抗蚀剂涂覆部分被布置在共同的主处理室中。 输送机器人设置成可沿输送路径移动，并且基板通过输送机器人在处理室之间输送。 传送部件布置在主处理室中并专用于主处理室，并且基板通过传送部件从冷却部分传送到抗蚀涂层部分。

公开(公告)号：US5122041A

公开(公告)日：1992-06-16

申请号：US540479

申请日：1990-06-19

申请人： Taketoshi Yokota ,  Yoshio Kimura ,  Kenichi Ida

发明人： Taketoshi Yokota ,  Yoshio Kimura ,  Kenichi Ida

IPC分类号： F04C18/02 ,  F04C27/00

CPC分类号： F04C27/005 ,  F04C18/0253 ,  F04C18/0261 ,  F04C2240/801

摘要： A scroll type fluid displacement apparatus, in particular, a compressor unit is disclosed. The apparatus includes a pair of scroll members interfitting at an angular and radial offset for forming fluid pockets, each scroll member including an end plate and a spiral element. A seal plate is provided on the surface of the end plate of at least one scroll member and is movable between the surface of the end plate of the scroll member and the axial end surface of the spiral element of the other scroll member. A fluid introducing mechanism is provided on the central portion of the spiral elements for introducing a high-pressure fluid between the seal plate and the end plate to move the seal plate in the axial direction for sealing the fluid pockets more completely.

公开(公告)号：US5089305A

公开(公告)日：1992-02-18

申请号：US585199

申请日：1990-09-20

申请人： Mitsuru Ushijima ,  Osamu Hirakawa ,  Masami Akimoto ,  Yoshio Kimura ,  Noriyuki Anai

发明人： Mitsuru Ushijima ,  Osamu Hirakawa ,  Masami Akimoto ,  Yoshio Kimura ,  Noriyuki Anai

IPC分类号： B05B15/02 ,  B05C11/08 ,  G03F7/16

CPC分类号： B05B15/025 ,  B05C11/08 ,  G03F7/162

摘要： Disclosed is a coating apparatus for applying a resist or developing solution to a semiconductor wafer. This coating apparatus comprises a plurality of nozzles supplied with various resist from a resist source and each adapted to drip the different solution onto the wafer, a vessel in which the nozzles is kept on stand-by, while maintaining the liquids in a predetermined state in the vicinity of discharge port portions of the nozzles, when the nozzles need not be operated, and a nozzle operating mechanism for selecting one of the nozzles kept on stand-by in the vessel, and transporting the selected nozzle to the location of the wafer, whereby the resist is applied to the wafer by means of only the nozzle transported by the nozzle operating mechanism.

公开(公告)号：US4895842A

公开(公告)日：1990-01-23

申请号：US912480

申请日：1986-09-29

申请人： Shosuke Okamoto ,  Yoshio Okada ,  Akiko Okunomiya ,  Taketoshi Naito ,  Yoshio Kimura ,  Morihiko Yamada ,  Norio Ohno ,  Yasuhiro Katsuura ,  Yumi Seki

发明人： Shosuke Okamoto ,  Yoshio Okada ,  Akiko Okunomiya ,  Taketoshi Naito ,  Yoshio Kimura ,  Morihiko Yamada ,  Norio Ohno ,  Yasuhiro Katsuura ,  Yumi Seki

IPC分类号： A61K38/00 ,  C07D211/16 ,  C07D211/32 ,  C07D211/62 ,  C07D213/30 ,  C07D213/40 ,  C07D213/64 ,  C07D213/643 ,  C07D213/75 ,  C07D239/42 ,  C07D295/185 ,  C07D307/14 ,  C07D401/12 ,  C07K5/065

CPC分类号： C07D213/30 ,  C07D211/16 ,  C07D211/32 ,  C07D211/62 ,  C07D213/40 ,  C07D213/643 ,  C07D213/75 ,  C07D239/42 ,  C07D295/185 ,  C07D307/14 ,  C07D401/12 ,  C07K5/06078 ,  A61K38/00

摘要： A phenylalanine derivative having the formula (I): ##STR1## where R.sup.1 and R.sup.2 are independently hydrogen provided that both R.sup.1 and R.sup.2 are not hydrogen at the same time;C.sub.1 -C.sub.8 alkyl which may be substituted with hydroxy, hydroxycarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, C.sub.1 -C.sub.4 alkylmercapto, C.sub.1 -C.sub.4 alkoxy, carbamoyl, sulfamoyl, pyridyl, or phenyl which may further be substituted with nitro, C.sub.1 -C.sub.4 alkoxy, or halogen;C.sub.6 -C.sub.8 cycloalkyl which may be substituted with hydroxy, C.sub.1 -C.sub.4 alkoxy, hydroxylcarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, or C.sub.1 -C.sub.4 alkyl;phenyl which may be substituted with halogen, nitro, trifluoromethyl, C.sub.1 -C.sub.4 alkoxy C.sub.1 C.sub.4 alkylmercapto, C.sub.1 -C.sub.4 alkylcarbonyl, phenylcarbonyl, hydroxycarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, carbamoyl, sulfamoyl, amidino, pyridylcarbonyl, or C.sub.1 -C.sub.6 alkyl which may further be substituted with C.sub.1 -C.sub.4 alkylcarbonyl, hydroxycarbonyl, or C.sub.1 -C.sub.4 alkoxycarbonyl;pyridyl which may be substituted with halogen or C.sub.1 -C.sub.4 alkoxy;pyrimidyl;N-benzylazacyclohexyl; andR.sup.1 and R.sup.2 may form with the nitrogen atom attached thereto a ring structure as morpholino; thiomorpholino; piperazino which may be substituted with phenylcarbonyl, benzyl, or C.sub.1 -C.sub.4 alkyl;pyrrolidyl which may be substituted with hydroxycarbonyl or C.sub.1 -C.sub.4 alkoxycarbonyl; andpiperidino substituted with C.sub.1 -C.sub.4 alkyl, phenyl C.sub.1 -C.sub.4 alkyl, phenycarbonyl, or C.sub.1 -C.sub.4 alkoxycarbonyl;X is hydrogen; nitro; amino; or --OZ wherein Z is hydrogen; C.sub.1 -C.sub.4 alkyl; C.sub.2 -C.sub.4 alkenyl; benzyl which may be substituted with halogen, C.sub.1 -C.sub.4 alkyl, nitro, trifluoromethyl, hydroxycarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, or cyano; phenylcarbonylmethyl; pyridylmethyl; phenyl which may be substituted with nitro or halogen; pyridyl or pyrimidyl which may be substituted with nitro; phenylsulfonyl which may be substituted with C.sub.1 -C.sub.4 alkyl; or benzyloxycarbonyl which may be substituted with halogen;n is 4 to 10; andthe mark * indicates that the configuration of the carbon may be either one of D-configuration, L-configuration and DL-configuration or a pharmaceutical acceptable salt thereof.This phenylalanine derivative is effective as a proteinase inhibitor.

公开(公告)号：US08728565B2

公开(公告)日：2014-05-20

申请号：US13881080

申请日：2011-04-08

申请人： Fukutaro Kato ,  Eiichi Nagao ,  Tsuyoshi Amimoto ,  Yoshio Kimura ,  Noboru Hosokawa ,  Junji Tanimura ,  Satoru Toyama

发明人： Fukutaro Kato ,  Eiichi Nagao ,  Tsuyoshi Amimoto ,  Yoshio Kimura ,  Noboru Hosokawa ,  Junji Tanimura ,  Satoru Toyama

IPC分类号： B05D5/12 ,  C23C16/52

CPC分类号： H01F41/005 ,  B05D5/00 ,  H01B3/20 ,  H01F27/12

摘要： The present invention provides a method for inhibiting production of copper sulfide in an electrical insulating oil inside an oil-filled electrical apparatus, including adding a benzotriazole compound not having a long-chain alkyl group when the oil-filled electrical apparatus is an open-type oil-filled electrical apparatus, or adding a benzotriazole compound having a long-chain alkyl group when the oil-filled electrical apparatus is a closed-type oil-filled electrical apparatus.

摘要翻译： 本发明提供了一种用于在充油电气设备内的电绝缘油中抑制硫化铜的生产的方法，包括在充油电气设备是开放型的情况下加入不具有长链烷基的苯并三唑化合物 充油电气设备，或者当充油电气设备是闭式充油电气设备时，加入具有长链烷基的苯并三唑化合物。

公开(公告)号：US08547574B2

公开(公告)日：2013-10-01

申请号：US12388213

申请日：2009-02-18

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： G06F3/12 ,  G06F15/16 ,  H04L12/58 ,  H04J3/24

CPC分类号： G06F3/1236 ,  G06F3/1209 ,  G06F3/1292 ,  H04L63/08 ,  H04N1/00307 ,  H04N1/00347 ,  H04N2201/0036 ,  H04N2201/0039 ,  H04N2201/0044 ,  H04N2201/0046 ,  H04N2201/0055 ,  H04N2201/0094

摘要： A technique for providing a first information processing apparatus configured to acquire first identification information as information for identifying the information processing apparatus, searching for a second information processing apparatus capable of wireless communication, acquiring a second identification information as information for identifying the second information processing apparatus that was found, comparing the first identification information and the second identification information, changing the first identification information when the first identification information and the second identification information are identical, and notifying when the first identification information is changed.

摘要翻译： 一种用于提供第一信息处理设备的技术，被配置为获取第一识别信息作为用于识别信息处理设备的信息，搜索能够进行无线通信的第二信息处理设备，获取第二识别信息作为用于识别第二信息处理设备的信息 比较第一识别信息和第二识别信息，当第一识别信息和第二识别信息相同时，改变第一识别信息，并通知第一识别信息何时改变。

公开(公告)号：US08268384B2

公开(公告)日：2012-09-18

申请号：US12887019

申请日：2010-09-21

申请人： Nobuaki Matsuoka ,  Yoshio Kimura ,  Akira Miyata

发明人： Nobuaki Matsuoka ,  Yoshio Kimura ,  Akira Miyata

IPC分类号： B05C13/02 ,  B05C11/00 ,  B05C11/02 ,  B05D3/12 ,  H01L21/20

CPC分类号： H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67754

摘要： A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

摘要翻译： 一种基板转印系统，用于通过在第一递送阶段将基底转移到可以最早进行处理的工艺块来减少总处理时间。 衬底处理设备包括相对于衬底载体传送晶片的第一传输装置和经由第一传送级在多个处理块和第一传送装置之间传送晶片的第二传送装置，以相对于 到过程块。 基于来自处理块的晶片的处理信息，确定最早期完成相关处理块内没有晶片或最后晶片的处理块的处理块，并且第一传送阶段的晶片由 第二传输设备到相关进程块。 这确保晶片平滑地转移到处理块。

公开(公告)号：US20120097336A1

公开(公告)日：2012-04-26

申请号：US13378163

申请日：2010-06-21

申请人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

发明人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

IPC分类号： B05C11/00 ,  B29C65/24 ,  C23C16/44

CPC分类号： B05C13/00 ,  B29C33/58 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/566 ,  H01L21/67057 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67333 ,  H01L21/68707 ,  H01L2924/0002 ,  Y10S414/141 ,  H01L2924/00

摘要： The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.

摘要翻译： 本发明是一种模板处理装置，在模板上形成具有形成在其前表面上的转印图案的模板上的脱模剂的膜，该模板处理装置包括：处理站，在前表面形成脱模剂膜 模板; 以及能够保持多个模板并将模板搬入/离开处理站的模板搬入/出站，其中处理站包括：清洁模板的前表面的清洁单元; 涂布单元，将脱模剂施加到模板的清洁前表面上; 加热单元烘烤施加的脱模剂; 以及将模板携带到清洁单元，涂覆单元和加热单元的携带单元。

公开(公告)号：US20120086142A1

公开(公告)日：2012-04-12

申请号：US13378079

申请日：2010-06-21

申请人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

发明人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

IPC分类号： B29C59/02 ,  B29C59/00 ,  B28B17/00

CPC分类号： H01L21/67173 ,  B29C33/58 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/67207 ,  H01L21/67745 ,  H01L21/6776

摘要： The present invention is a system including: an imprint unit transferring a transfer pattern to a coating film on a substrate using a template to form a predetermined pattern in the coating film; a treatment station connected to the imprint unit and performing a predetermined treatment on the template; a template carry-in/out station connected to the treatment station, capable of keeping templates, and carrying the template in/out from/to the treatment station; a carry line provided through the imprint unit and carrying the template between the imprint unit and the treatment station; and a substrate carry-in/out station connected to the imprint unit, capable of keeping substrates, and carrying the substrate in/out from/to the imprint unit.

摘要翻译： 本发明是一种系统，包括：压印单元，使用模板将转印图案转印到基板上的涂膜上，以在涂膜中形成预定图案; 连接到压印单元并对模板执行预定处理的处理站; 连接到治疗台的模板进/出站，能够保存模板，并将模板从/移出到处理站; 通过压印单元提供的携带线，并且在压印单元和处理站之间承载模板; 以及连接到压印单元的基板输入/输出站，能够保持基板，并将基板输入/输出到压印单元。

公开(公告)号：US08054970B2

公开(公告)日：2011-11-08

申请号：US11628204

申请日：2005-07-14

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： H04N1/44

CPC分类号： H04N1/448 ,  G06F21/608 ,  H04L9/0866 ,  H04N1/44 ,  H04N2201/0077

摘要： In an image forming method of receiving encrypted data generated by an information processing apparatus, decrypting the encrypted data into data to be printed, and causing an image forming apparatus to execute printing processing, print data is acquired by decrypting the received encrypted data, and the acquired print data is converted into image data for which the printing processing can be performed. The image data is encrypted with first key information.

摘要翻译： 在接收由信息处理装置产生的加密数据的图像形成方法中，将加密的数据解密成要打印的数据，并使图像形成装置执行打印处理，通过解密所接收的加密数据来获得打印数据， 获取的打印数据被转换成可以执行打印处理的图像数据。 图像数据用第一密钥信息加密。