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公开(公告)号：US12074007B2
公开(公告)日：2024-08-27
申请号：US18357904
申请日：2023-07-24
Applicant: FEI Company
Inventor： Bart Jozef Janssen , Edwin Verschueren , Erik Franken
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/20214 , H01J2237/226
Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
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公开(公告)号：US12070753B2
公开(公告)日：2024-08-27
申请号：US16834973
申请日：2020-03-30
Applicant: FEI Company
Inventor： Jakub Drahotsky
IPC: B01L7/00 , G01N1/28 , G01N1/42 , H01J37/20 , H01J37/26 , G01N23/203 , G01N23/225
CPC classification number: B01L7/50 , G01N1/2813 , G01N1/42 , H01J37/20 , H01J37/26 , G01K2203/00 , G01N23/203 , G01N23/225 , G01N2223/053 , G01N2223/071 , G01N2223/102 , H01J2237/2001 , H01J2237/2065 , H01J2237/24585
Abstract: Temperatures of cryo-electron microscopy samples are assessed based on images portions associated with high temperature superconductor (HTSC) areas or other thermal sensor materials that are thermally coupled to or thermally proximate the samples. Such thermal areas can be provided on sample mounts such as metallic grids, carbon films, or on sample stages. In examples using HTSCs, HTSCs having critical temperatures between −175° C. and −135° C. are typically used.
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公开(公告)号：US20240249905A1
公开(公告)日：2024-07-25
申请号：US18409499
申请日：2024-01-10
Applicant: FEI Company
Inventor： Alexander Henstra , Ali Mohammadi-Gheidari
CPC classification number: H01J37/04 , H01J37/261
Abstract: Charged particle optical devices, systems, and methods are provided. A charged particle optical device can include a dispersing element disposed substantially on a beam axis, the dispersing element being configured to disperse particles of a beam of charged particles by energy in a dispersal plane parallel with the beam axis. The charged particle optical device can include a selector, disposed on the beam axis at a position substantially corresponding to a first crossover plane. The charged particle optical device can include an undispersing element. The charged particle optical device can include a cutoff disposed on the beam axis downstream of the selector at a position substantially corresponding to a second crossover plane on the beam axis. The second crossover plane can be downstream of the first crossover plane. The cutoff can include a material that is opaque to electrons and defining an aperture substantially aligned with the beam axis.
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公开(公告)号：US12040196B2
公开(公告)日：2024-07-16
申请号：US17578903
申请日：2022-01-19
Applicant: FEI Company
Inventor： James Clarke , Micah LeDoux , Jason Lee Monfort , Brett Avedisian
IPC: G01N1/32 , G11C5/02 , G11C5/06 , H01J37/305 , H01L21/3213 , H01L21/67 , H10B41/27 , H10B43/27
CPC classification number: H01L21/32131 , G01N1/32 , G11C5/025 , G11C5/06 , H01J37/3056 , H01L21/67069 , H10B41/27 , H10B43/27
Abstract: Apparatus and methods are disclosed for sample preparation, suitable for online or offline use with multilayer samples. Ion beam technology is leveraged to provide rapid, accurate delayering with etch stops at a succession of target layers. In one aspect, a trench is milled around a region of interest (ROI), and a conductive coating is developed on an inner sidewall. Thereby, reliable conducting paths are formed between intermediate layers within the ROI and a base layer, and stray current paths extending outside the ROI are eliminated, providing better quality etch progress monitoring, during subsequent etching, from body or scattered currents. Ion beam assisted gas etching provides rapid delayering with etch stops at target polysilicon layers. Uniform etching at deep layers can be achieved. Variations and results are disclosed.
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公开(公告)号：US20240222067A1
公开(公告)日：2024-07-04
申请号：US18393233
申请日：2023-12-21
Applicant: FEI Company
Inventor： Radek Smolka , Lukas Zabransky , Branislav Straka , Marek Melichar
IPC: H01J37/244 , H01J37/10 , H01J37/24
CPC classification number: H01J37/244 , H01J37/10 , H01J37/24 , H01J2237/24578 , H01J2237/2826
Abstract: Disclosed herein are systems and methods for calibration of a charged particle beam microscope, including a source configured to generate a CPB comprising a plurality of charged particles having a known energy; at least one lens; a detector; and a controller. According to various disclosed embodiments, the controller may determine, based on a calibration characteristic, that the CPB microscope requires recalibration. Based on that determination, the controller may operate the source to generate a calibration CPB and configure the at least one lens to act as a charged particle mirror. The controller may receive data from the detector associated with the plurality of charged particles after reflecting off the charged particle mirror. The controller may then analyze the data from the detector and automatically recalibrate the CPB microscope based on calibration characteristics in the data from the detector.
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Patent Agency Ranking
公开(公告)号：US12020895B2
公开(公告)日：2024-06-25
申请号：US17666385
申请日：2022-02-07
Applicant: FEI Company
Inventor： Jakub Kuba , John M. Mitchels , Jakub Drahotský , Michal Valík
CPC classification number: H01J37/185 , H01J37/28 , G01N1/42 , H01J2237/184 , H01J2237/186
Abstract: Various approaches are provided for contamination-free vacuum transfer of samples. As one example, an apparatus includes a compartment configured to store multiple samples held by a cartridge removably coupled to the compartment, a sample port for transferring the cartridge between a charged particle system and a position within the compartment, and a valve configured to seal the compartment at vacuum pressure during transport of the multiple samples between charged particle systems. In this way, samples such as lamellae may be transferred between charged particle systems while maintaining the samples at vacuum pressure, thereby reducing the possibility of sample contamination during sample transfer.
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27.发明公开公开(公告)号：US20240203685A1
公开(公告)日：2024-06-20
申请号：US18068769
申请日：2022-12-20
Applicant: FEI Company
Inventor： Bart Buijsse , Pleun Dona
CPC classification number: H01J37/20 , H01J37/261 , H01J37/28
Abstract: Systems, methods, and components of charged particle microscopes affording improved contrast in dose sensitive samples are described. A pole piece for an electron microscope can include a body, being substantially concentric with a central axis. The body can define an upper surface, substantially normal to the central axis, a lower surface, substantially normal to the central axis, a central aperture formed in the body from the upper surface to the lower surface. The central aperture can be substantially rotationally symmetrical about the central axis. The body can define a lateral surface, inclined relative to the central axis and tapering toward the upper surface and a plurality of lateral apertures formed in the body from the lateral surface to the central aperture. The plurality of lateral apertures can be arrayed substantially symmetrically about the central axis.
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公开(公告)号：US12000789B2
公开(公告)日：2024-06-04
申请号：US17561497
申请日：2021-12-23
Applicant: FEI Company
Inventor： Libor Novak , Krishna Kanth Neelisetty , Veronika Hammerova , Jan Lasko
IPC: G01N23/2204 , G01N23/2251 , G01N23/2273 , H01J37/20
CPC classification number: G01N23/2204 , G01N23/2251 , G01N23/2273 , H01J37/20
Abstract: A system for positioning a sample in a charged particle apparatus (CPA) or an X-ray photoelectron spectroscopy (XPS) system includes a sample carrier coupled to a stage inside the vacuum chamber of the CPA or XPS system. The system allows transferring of the sample carrier among multiple CPAs, XPS systems and glove boxes in inert gas or in vacuum. The sample carrier is releasably coupled with the stage in the vacuum chamber of the CPA or the XPS. Multiple electrodes in a sample area of the sample carrier are electrically connectable with the stage by multiple spring contacts between the sample carrier and the stage.
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29.发明公开公开(公告)号：US20240177967A1
公开(公告)日：2024-05-30
申请号：US18522679
申请日：2023-11-29
Applicant: FEI Company
Inventor： Matej Dolník , Veronika Vrbovská , Radim Kríž , Jakub Kuba , Tilman Franke
IPC: H01J37/305
CPC classification number: H01J37/3056 , H01J2237/31749
Abstract: The disclosure relates to a method for micromachining a biological sample for creating a lamella for analysis in a Cryo-Charged Particle Microscope (Cryo-CPM). The method comprising the steps of providing a biological sample on a sample carrier; Locating a sample area on the sample carrier, said sample area comprising a region of interest having biological material from which a lamella can be created; and Micromachining at least part of the biological sample so as to remove material in a part of the sample area surrounding the region of interest, in order to increase a visual contrast between the biological material in the region of interest and its surroundings. With the increased visual contrast a location for a potential lamella can be identified.
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公开(公告)号：US11994341B2
公开(公告)日：2024-05-28
申请号：US17709398
申请日：2022-03-30
Applicant: FEI Company
Inventor： Maarten Kuijper , Hervé Remigy , Mathijs Petrus Wilhelmus Van Den Boogaard , Adrian Koh , Ivanka Spee , John Hazenberg , Marius Van Der Does
CPC classification number: F25D3/10 , F25D29/001 , G01N1/42
Abstract: The invention relates to a method and an apparatus for preparing a cryogenic sample, whereby the sample is subjected to rapid cooling using a cryogen. A pair of conduits for transporting cryogenic fluid are provided, each of which conduits opens out into a mouthpiece, which mouthpieces are arranged to face each other across an intervening gap, wherein in said gap a sample that is provided on a substantially planar sample carrier can be received. Cryogenic fluid can be pumped through said conduits so as to concurrently flush from said mouthpieces and suddenly immerse the sample in cryogenic fluid from two opposite sides. As defined herein, at least one of said mouthpieces comprises at least two nozzle openings for evenly cooling said substantially planar sample carrier during said flushing.
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