摘要:
The present invention discloses a functional electrical stimulation system comprising a primary power, a boost module, an energy storage section, an output control relay, an automatic discharge circuit, a foot/hand controlled switch, a current detection chip and a current limiting fuse. The boost module comprises n DC chopper circuits connected in series, and outputs a high voltage of 100-200V. According to an enable signal and a current detection signal, the output control relay disables/enables the DC boost module. The automatic discharge circuit discharges capacitance of the energy storage section automatically when the relay turns off the power input. The Foot/hand controlled switch, the current detection chip and the current limiting fuse form a triple accident protection circuit. The functional electrical stimulation system maximizes the intensity of electrical stimulation within the range that the human body can withstand. Meanwhile, it provides multiple security protection mechanisms and enhanced reliability to avoid danger during the use.
摘要:
The present disclosure provides methods for inducing somatic cells to form induced pluripotent stem (iPS) cells. The method includes introducing a small activating RNA (saRNA) molecule into the somatic cell, where the saRNA molecule increases transcription of a transcription factor that induces the formation of induced pluripotent stem cells. The present disclosure also provides compositions and kits comprising a saRNA molecule that increases transcription of a transcription factor that induces the formation of induced pluripotent stem cells. The present disclosure provides iPS cells comprising at least one exogenous saRNA molecule, where the saRNA molecule increases transcription of a transcription factor that induces the formation of induced pluripotent stem cells.
摘要:
A semiconductor device having a core device with a high-k gate dielectric and an I/O device with a silicon dioxide or other non-high-k gate dielectric, and a method of fabricating such a device. A core well and an I/O well are created in a semiconductor substrate and separated by an isolation structure. An I/O device is formed over the I/O well and has a silicon dioxide or a low-k gate dielectric. A resistor may be formed on an isolation structure adjacent to the core well. A core-well device such as a transistor is formed over the core well, and has a high-k gate dielectric. In some embodiments, a p-type I/O well and an n-type I/O well are created. In a preferred embodiment, the I/O device or devices are formed prior to forming the core device and protected with a sacrificial layer until the core device is fabricated.
摘要:
An electrical fuse and a method of forming the same are presented. A first-layer conductive line is formed over a base material. A via is formed over the first-layer conductive line. The via preferably comprises a barrier layer and a conductive material. A second-layer conductive line is formed over the via. A first external pad is formed coupling to the first-layer conductive line. A second external pad is formed coupling to the second-layer conductive line. The via, the first conductive line and the second conductive line are adapted to be an electrical fuse. The electrical fuse can be burned out by applying a current. The vertical structure of the preferred embodiment is suitable to be formed in any layer.
摘要:
The present invention deals with a methodology of incorporating carbon nanotubes (CNTs) into an epoxy matrix and thereby producing epoxy-based CNT nanocomposites. Both the pristine and ozonized CNTs are almost homogeneously dispersed into the resin by this approach. Compared with the pristine CNTs (p-MWCNTs), the ozonized ones (f-MWCNTs) offer considerable improvements on mechanical properties within the epoxy resin.
摘要:
In computer multimedia technology, a system, method and computer program product for optimizing images and transmission of images of a web-page transmitted over the Internet and furthermore, optimizing images of a web page on a network server. The method includes detecting the images in the web page to determine the relationship among the images; in response to the determination of the relationship among the images, combining two or more related images into a combinational image; and updating the web page to replace references to the related images with a reference to the combinational image. By optimizing web page images, the server's work required for handling heavy amount of HTTP requests in transmitting the web page images is decreased and the bandwidth requirement for transmitting the web page images is reduced. The quality of the original image is not lowered. And there is no need to make any change to the operation at the client side.
摘要:
A semiconductor device having a core device with a high-k gate dielectric and an I/O device with a silicon dioxide or other non-high-k gate dielectric, and a method of fabricating such a device. A core well and an I/O well are created in a semiconductor substrate and separated by an isolation structure. An I/O device is formed over the I/O well and has a silicon dioxide or a low-k gate dielectric. A resistor may be formed on an isolation structure adjacent to the core well. A core-well device such as a transistor is formed over the core well, and has a high-k gate dielectric. In some embodiments, a p-type I/O well and an n-type I/O well are created. In a preferred embodiment, the I/O device or devices are formed prior to forming the core device and protected with a sacrificial layer until the core device is fabricated.
摘要:
A semiconductor structure and methods of forming the same are provided. The semiconductor structure includes a semiconductor substrate; a first inter-layer dielectric (ILD) over the semiconductor substrate; a contact extending from a top surface of the first ILD into the first ILD; a second ILD over the first ILD; a bottom inter-metal dielectric (IMD) over the second ILD; and a dual damascene structure comprising a metal line in the IMD and a via in the second ILD, wherein the via is connected to the contact.
摘要:
A semiconductor device with improved source/drain junctions and methods for fabricating the device are disclosed. A preferred embodiment comprises a MOS transistor with a gate structure overlying a substrate, lightly doped source/drain regions formed in the substrate aligned to the gate structure, sidewall spacers formed on the sidewalls of the gate structure and overlying the lightly doped source/drain regions, deeper source/drain diffusions formed into the substrate aligned to the sidewall spacers and additional pocket implants of source/drain dopants formed at the boundary of the deeper source/drain diffusions and the substrate. In a preferred method, the additional pocket implants are formed using an angled ion implant with the angle being between 4 and 45 degrees from vertical. Additional embodiments include recesses formed in the source/drain regions and methods for forming the recesses.
摘要:
A semiconductor device having a core device with a high-k gate dielectric and an I/O device with a silicon dioxide or other non-high-k gate dielectric, and a method of fabricating such a device. A core well and an I/O well are created in a semiconductor substrate and separated by an isolation structure. An I/O device is formed over the I/O well and has a silicon dioxide or a low-k gate dielectric. A resistor may be formed on an isolation structure adjacent to the core well. A core-well device such as a transistor is formed over the core well, and has a high-k gate dielectric. In some embodiments, a p-type I/O well and an n-type I/O well are created. In a preferred embodiment, the I/O device or devices are formed prior to forming the core device and protected with a sacrificial layer until the core device is fabricated.