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公开(公告)号：US10691030B2
公开(公告)日：2020-06-23
申请号：US16192853
申请日：2018-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Frank Staals , Eric Jos Anton Brouwer , Carlo Cornelius Maria Luijten , Jean-Pierre Agnes Henricus Marie Vaessen
IPC: G03F7/20 , G01N21/956 , G01N21/47
Abstract: A focus metrology target includes one or more periodic arrays of features. A measurement of focus performance of a lithographic apparatus is based at least in part on diffraction signals obtained from the focus metrology target. Each periodic array of features includes a repeating arrangement of first zones interleaved with second zones, a feature density being different in the first zones and the second zones. Each first zone includes a repeating arrangement of first features. A minimum dimension of each first feature is close to but not less than a resolution limit of the printing by the lithographic apparatus, so as to comply with a design rule in a given a process environment. A region of high feature density may further include a repeating arrangement of larger features.
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公开(公告)号：US09696638B2
公开(公告)日：2017-07-04
申请号：US14965467
申请日：2015-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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公开(公告)号：US09229340B2
公开(公告)日：2016-01-05
申请号：US14036991
申请日：2013-09-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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公开(公告)号：US12197136B2
公开(公告)日：2025-01-14
申请号：US18229984
申请日：2023-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Mark John Maslow , Koenraad Van Ingen Schenau , Patrick Warnaar , Abraham Slachter , Roy Anunciado , Simon Hendrik Celine Van Gorp , Frank Staals , Marinus Jochemsen
IPC: G03F7/00 , G03F1/00 , G06F30/20 , G06F30/33 , G06F30/398 , G06T7/00 , G21K5/00 , H01L21/00 , H01L21/66 , G06F119/18
Abstract: A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature manufactured on the substrate by a manufacturing process including a lithographic process and one or more further processes; determining one or more image-related metrics in dependence on a contour determined from the image, wherein one of the one or more image-related metrics is an edge placement error, EPE, of the at least one feature; and determining one or more control parameters of the lithographic process and/or the one or more further processes in dependence on the edge placement error, wherein at least one control parameter is determined so as to minimize the edge placement error of the at least one feature.
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公开(公告)号：US11977334B2
公开(公告)日：2024-05-07
申请号：US18089940
申请日：2022-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Duan-Fu Stephen Hsu , Christoph Rene Konrad Cebulla Hennerkes , Rafael C. Howell , Zhan Shi , Xiaoyang Jason Li , Frank Staals
IPC: G03F7/00
CPC classification number: G03F7/70266 , G03F7/705 , G03F7/7055
Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.
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Patent Agency Ranking
公开(公告)号：US11768442B2
公开(公告)日：2023-09-26
申请号：US17973221
申请日：2022-10-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Mark John Maslow , Koenraad Van Ingen Schenau , Patrick Warnaar , Abraham Slachter , Roy Anunciado , Simon Hendrik Celine Van Gorp , Frank Staals , Marinus Jochemsen
IPC: G06F30/20 , G06F30/33 , G06F30/398 , G03F7/00 , G03F1/00 , G06T7/00 , G21K5/00 , H01L21/00 , H01L21/66 , G06F119/18
CPC classification number: G03F7/70625 , G06F30/20 , G06T7/0004 , H01L22/20 , G03F1/00 , G06F30/33 , G06F30/398 , G06F2119/18 , G21K5/00 , H01L21/00
Abstract: A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature of a device being manufactured in a layer on the substrate; obtaining a layout of features associated with a previous layer adjacent to the layer on the substrate; calculating one or more image-related metrics in dependence on: 1) a contour determined from the image including the at least one feature and 2) the layout; and determining one or more control parameters of a lithographic apparatus and/or one or more further processes in a manufacturing process of the device in dependence on the one or more image-related metrics, wherein at least one of the control parameters is determined to modify the geometry of the contour in order to improve the one or more image-related metrics.
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公开(公告)号：US20230161264A1
公开(公告)日：2023-05-25
申请号：US18089940
申请日：2022-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Duan-Fu Stephen HSU , Christoph Rene Konrad Cebulla Hennerkes , Rafael C. Howell , Zhan Shi , Xiaoyang Jason Li , Frank Staals
IPC: G03F7/20
CPC classification number: G03F7/70266 , G03F7/705 , G03F7/7055
Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.
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公开(公告)号：US20210349395A1
公开(公告)日：2021-11-11
申请号：US17379662
申请日：2021-07-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Patrick WARNAAR , Patricius Aloysius Jacobus Tinnemans , Grzegorz Grzela , Everhardus Cornelis Mos , Wim Tjibbo Tel , Marinus Jochemsen , Bart Peter Bert Segers , Frank Staals
IPC: G03F7/20
Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.
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公开(公告)号：US20210003927A1
公开(公告)日：2021-01-07
申请号：US17023474
申请日：2020-09-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Davit Harutyunyan , Fei Jia , Frank Staals , Fuming Wang , Hugo Thomas Looijestijn , Cornelis Johannes Rijnierse , Maxim Pisarenco , Roy Werkman , Thomas Theeuwes , Tom Van Hemert , Vahid Bastani , Jochem Sebastiaan Wildenberg , Everhardus Cornelis Mos , Erik Johannes Maria Wallerbos
Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
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公开(公告)号：US10649342B2
公开(公告)日：2020-05-12
申请号：US16308835
申请日：2017-06-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Léon Maria Albertus Van Der Logt , Bart Peter Bert Segers , Simon Hendrik Celine Van Gorp , Carlo Cornelis Maria Luijten , Frank Staals
IPC: G03F7/20
Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.
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