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    Nanostructure and nanocomposite based compositions and photovoltaic devices
    31.
    发明申请
    Nanostructure and nanocomposite based compositions and photovoltaic devices 审中-公开
    纳米结构和纳米复合材料组合物和光伏器件

    公开(公告)号：US20050126628A1

    公开(公告)日：2005-06-16

    申请号：US10778009

    申请日：2004-02-11

    Applicant: Erik Scher ,  Mihai Buretea ,  Calvin Chow ,  Stephen Empedocles ,  Andreas Meisel ,  J. Parce ,  Jeff Whiteford

    Inventor： Erik Scher ,  Mihai Buretea ,  Calvin Chow ,  Stephen Empedocles ,  Andreas Meisel ,  J. Parce ,  Jeff Whiteford

    IPC: H01L31/00 ,  H01L31/0264 ,  H01L31/036 ,  H01L31/04

    CPC classification number: H01L51/426 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y30/00 ,  H01L27/302 ,  H01L29/0665 ,  H01L29/0673 ,  H01L29/127 ,  H01L31/0352 ,  H01L51/0036 ,  H01L51/0037 ,  H01L51/4213 ,  H01L51/4266 ,  Y02E10/549 ,  Y02P70/521

    Abstract: Nanocomposite photovoltaic devices are provided that generally include semiconductor nanocrystals as at least a portion of a photoactive layer. Photovoltaic devices and other layered devices that comprise core-shell nanostructures and/or two populations of nanostructures, where the nanostructures are not necessarily part of a nanocomposite, are also provided, as are devices including a recombination material and/or multiple electrodes. Varied architectures for such devices are also provided, including flexible and rigid architectures, planar and non-planar architectures, and the like, as are systems incorporating such devices, and methods and systems for fabricating such devices. Compositions comprising two populations of nanostructures of different materials or nanostructures and a small molecule are also described, as are doped polymer nanocomposites. Compositions useful for making nanocomposites are also described.

    Abstract translation: 提供纳米复合光伏器件，其通常包括作为光活性层的至少一部分的半导体纳米晶体。 还提供了包括核 - 壳纳米结构和/或两个纳米结构群的其他分层器件，其中纳米结构不一定是纳米复合材料的一部分，以及包括复合材料和/或多个电极的器件也是如此。 还提供了用于这种装置的各种架构，包括柔性和刚性结构，平面和非平面架构等，以及并入这种装置的系统以及用于制造这种装置的方法和系统。 还描述了包含不同材料或纳米结构的两个纳米结构群和小分子的组合物，以及掺杂的聚合物纳米复合材料。 还描述了可用于制备纳米复合材料的组合物。

    Polyimide layer comprising functional material, device employing the same and method of manufacturing same device
    33.
    发明授权
    Polyimide layer comprising functional material, device employing the same and method of manufacturing same device 有权
    包含功能材料的聚酰亚胺层，采用该聚酰亚胺层的装置和制造相同装置的方法

    公开(公告)号：US06649283B1

    公开(公告)日：2003-11-18

    申请号：US09622125

    申请日：2000-12-08

    Applicant: Donald Lupo ,  Akio Yasuda ,  Martin Grell ,  Dieter Neher ,  Tzenka Miteva ,  Andreas Meisel

    Inventor： Donald Lupo ,  Akio Yasuda ,  Martin Grell ,  Dieter Neher ,  Tzenka Miteva ,  Andreas Meisel

    IPC: H05B3314

    CPC classification number: H01L51/5293 ,  H01L51/0012 ,  H01L51/0035 ,  H01L51/0039 ,  H01L51/0052 ,  H01L51/0053 ,  H01L51/0059 ,  H01L51/007 ,  H01L51/5012 ,  H01L2251/308 ,  Y10S428/917 ,  Y10T428/10 ,  Y10T428/1023 ,  Y10T428/31721

    Abstract: The invention relates to novel layers comprising polyimide and organic functional material such as hole transport material, electron transport material and/or emitter material having a glass transition temperature of higher than 80° C. The layers can be prepared by mixing the functional material with a polyimide precursor material, forming a thin film out of the mixture and converting said mixture into doped polyimide. Said doped polyimide layers can be used for the manufacture of electronic and optoelectronic devices such as e.g. light emitting devices. Due to the content of functional material, they can act as hole transport, electron transport or emitter layer. Moreover, the layers can be processed to have aligning properties for liquid crystals, thus allowing the manufacture of devices emitting polarized light. Furthermore, after conversion to doped polyimide, the layers are resistant to solvent treatment allowing the preparation of multi-layers by successive coating and conversion cycles.

    Abstract translation: 本发明涉及包含聚酰亚胺和有机功能材料如空穴传输材料，电子传输材料和/或玻璃化转变温度高于80℃的发射体材料的新颖层。这些层可以通过将功能材料与 聚酰亚胺前体材料，从混合物中形成薄膜并将所述混合物转化成掺杂的聚酰亚胺。 所述掺杂的聚酰亚胺层可用于制造电子和光电器件，例如， 发光装置。 由于功能材料的含量，它们可以作为空穴传输，电子传输或发射极层。 此外，这些层可以被加工成具有用于液晶的对准性质，从而允许制造发射偏振光的器件。 此外，在转化为掺杂聚酰亚胺之后，这些层对溶剂处理是耐受的，允许通过连续的涂覆和转化循环制备多层。

    Method for automatic offset calculation for deposition of an aligned metal pattern onto selective emitter pattern and subsequent monitoring of alignment
    35.
    发明授权
    Method for automatic offset calculation for deposition of an aligned metal pattern onto selective emitter pattern and subsequent monitoring of alignment 失效
    用于自动偏移计算的方法，用于将对准的金属图案沉积到选择性发射器图案上并随后监视对准

    公开(公告)号：US08673793B2

    公开(公告)日：2014-03-18

    申请号：US13358131

    申请日：2012-01-25

    Applicant: Andreas Meisel

    Inventor： Andreas Meisel

    IPC: H01L21/31 ,  H01L21/469

    CPC classification number: H01L31/1804 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L31/022425 ,  H01L31/022441 ,  Y02E10/547 ,  Y02P70/521

    Abstract: A method for calculating an offset value for aligned deposition of a second pattern onto a first pattern, comprising steps of: (a) loading a substrate with the first pattern on a surface of the substrate into a pattern recognition device at an original position inside the pattern recognition device; (b) determining a coordinate of a prescribed point of the first pattern by the pattern recognition device; (c) superimposing the second pattern onto the first pattern on the surface of the substrate; (d) bringing back the substrate with the first pattern and the second pattern into the original position inside the pattern recognition device; (e) determining a coordinate of a prescribed point of the second pattern by the pattern recognition device; wherein the prescribed point of the first pattern corresponds to the prescribed point of the second pattern; and (f) calculating the offset value between the first pattern and the second pattern.

    Abstract translation: 一种用于计算用于将第二图案对准沉积到第一图案上的偏移值的方法，包括以下步骤：（a）将基板的表面上的第一图案的基板加载到图案识别装置内部的原始位置 图案识别装置; （b）通过图案识别装置确定第一图案的规定点的坐标; （c）将第二图案叠加在基板的表面上的第一图案上; （d）将具有第一图案和第二图案的基板返回到图案识别装置内部的原始位置; （e）通过图案识别装置确定第二图案的规定点的坐标; 其中所述第一图案的规定点对应于所述第二图案的规定点; 和（f）计算第一图案和第二图案之间的偏移值。

    METHODS AND APPARATUS FOR ALIGNING A SET OF PATTERNS ON A SILICON SUBSTRATE
    37.
    发明申请
    METHODS AND APPARATUS FOR ALIGNING A SET OF PATTERNS ON A SILICON SUBSTRATE 失效
    用于对准硅基板上的一组图案的方法和装置

    公开(公告)号：US20120083054A1

    公开(公告)日：2012-04-05

    申请号：US13239814

    申请日：2011-09-22

    Applicant: Andreas Meisel ,  Michael Burrows ,  Homer Antoniadis

    Inventor： Andreas Meisel ,  Michael Burrows ,  Homer Antoniadis

    IPC: H01L21/66

    CPC classification number: H01L31/1804 ,  H01L22/12 ,  H01L31/022425 ,  Y02E10/547 ,  Y02P70/521

    Abstract: The disclosure relates to a method of aligning a set of patterns on a substrate, which includes depositing on the substrate's surface a set of silicon nanoparticles, which includes a set of ligand molecules including a set of carbon atoms. The method involves forming a first set of regions where the nanoparticles are deposited, while the remaining portions of the substrate surface define a second set of regions. The method also includes densifying the set of nanoparticles into a thin film to form a set of silicon-organic zones on the substrate's surface, wherein the first and the second set of regions have respectively first and second reflectivity values, such that the ratio of the second reflectivity value to the first reflectivity value is greater than about 1.1.

    Abstract translation: 本公开涉及一种在衬底上对准一组图案的方法，其包括在衬底表面上沉积一组硅纳米颗粒，其包括一组包含一组碳原子的配体分子。 该方法包括形成沉积纳米颗粒的第一组区域，而衬底表面的其余部分限定第二组区域。 该方法还包括将该组纳米颗粒致密化成薄膜以在基底表面上形成一组硅 - 有机区域，其中第一和第二组区域分别具有第一和第二反射率值，使得 第一反射率值的第二反射率值大于约1.1。

    Methods and apparatus for aligning a set of patterns on a silicon substrate
    39.
    发明授权
    Methods and apparatus for aligning a set of patterns on a silicon substrate 有权
    用于在硅衬底上对准一组图案的方法和装置

    公开(公告)号：US08048814B2

    公开(公告)日：2011-11-01

    申请号：US12468540

    申请日：2009-05-19

    Applicant: Andreas Meisel ,  Michael Burrows ,  Homer Antoniadis

    Inventor： Andreas Meisel ,  Michael Burrows ,  Homer Antoniadis

    IPC: H01L21/47

    CPC classification number: H01L31/1804 ,  H01L22/12 ,  H01L31/022425 ,  Y02E10/547 ,  Y02P70/521

    Abstract: A method of aligning a set of patterns on a substrate, the substrate including a substrate surface, is disclosed. The method includes depositing a set of silicon nanoparticles on the substrate surface, the set of nanoparticles including a set of ligand molecules including a set of carbon atoms, wherein a first set of regions is formed where the silicon nanoparticles are deposited and the remaining portions of the substrate surface define a second set of regions. The method also includes densifying the set of silicon nanoparticles into a thin film wherein a set of silicon-organic zones are formed on the substrate surface, wherein the first set of regions has a first reflectivity value and the second set of regions has a second reflectivity value. The method further includes illuminating the substrate surface with an illumination source, wherein the ratio of the second reflectivity value to the first reflectivity value is greater than about 1.1.

    Abstract translation: 公开了一种在衬底上对准一组图案的方法，该衬底包括衬底表面。 该方法包括在衬底表面上沉积一组硅纳米颗粒，所述纳米颗粒组包括一组包含一组碳原子的配体分子，其中形成第一组区域，其中沉积硅纳米颗粒，其余部分 衬底表面限定第二组区域。 所述方法还包括将所述一组硅纳米颗粒致密化成薄膜，其中在基底表面上形成一组硅 - 有机区，其中所述第一组区具有第一反射率值，并且所述第二组区具有第二反射率 值。 该方法还包括用照明源照射衬底表面，其中第二反射率值与第一反射率值的比值大于约1.1。

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