公开(公告)号：US10153133B2

公开(公告)日：2018-12-11

申请号：US14974376

申请日：2015-12-18

Applicant: APPLIED MATERIALS, INC.

Inventor： Satoru Kobayashi ,  Hideo Sugai ,  Soonam Park ,  Kartik Ramaswamy ,  Dmitry Lubomirsky

IPC: H01J37/32

Abstract: A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a user interface for controlling the rotation frequency.

公开(公告)号：US09846130B2

公开(公告)日：2017-12-19

申请号：US14628733

申请日：2015-02-23

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Yufei Zhu ,  Saurabh Garg ,  Soonam Park ,  Dmitry Lubomirsky

IPC: G01N22/00

CPC classification number: G01N22/00

Abstract: A test device for testing an electrical property of a chamber component, such as a ceramic ring, includes an outer conductor and an inner conductor disposed within and electrically isolated from the outer conductor. The outer conductor has a base, a top, and an interior sidewall disposed between the base and the top. The inner conductor has a top portion having a first diameter and a bottom portion having a second diameter, in which the second diameter is greater than the first diameter. A sample area is defined between the base of the outer conductor and the bottom portion of the inner conductor, and is configured to receive a chamber component. The electrical property of the chamber component is measurable based on application of a signal to at least one of the outer conductor or the inner conductor.

公开(公告)号：US09728437B2

公开(公告)日：2017-08-08

申请号：US14612472

申请日：2015-02-03

Applicant: Applied Materials, Inc.

Inventor： Toan Q. Tran ,  Sultan Malik ,  Dmitry Lubomirsky ,  Shambhu N. Roy ,  Satoru Kobayashi ,  Tae Seung Cho ,  Soonam Park ,  Shankar Venkataraman

IPC: H01L21/683 ,  H01L21/3065 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/3065 ,  H01L21/67103

Abstract: A wafer chuck assembly includes a puck, a shaft and a base. An insulating material defines a top surface of the puck, a heater element is embedded within the insulating material, and a conductive plate lies beneath the insulating material. The shaft includes a housing coupled with the plate, and electrical connectors for the heater elements and the electrodes. A conductive base housing couples with the shaft housing, and the connectors pass through a terminal block within the base housing. A method of plasma processing includes loading a workpiece onto a chuck having an insulating top surface, providing a DC voltage differential across two electrodes within the top surface, heating the chuck by passing current through heater elements, providing process gases in a chamber surrounding the chuck, and providing an RF voltage between a conductive plate beneath the chuck, and one or more walls of the chamber.

公开(公告)号：US09161428B2

公开(公告)日：2015-10-13

申请号：US13804616

申请日：2013-03-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenneth S. Collins ,  Satoru Kobayashi ,  Lawrence Wong ,  Jonathan Liu ,  Yang Yang ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/32174 ,  H05H2001/4682

Abstract: Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Abstract translation: 通过相位锁定反馈控制回路根据期望或用户选择的相位差控制不同RF线圈天线之间的相位差，等离子体反应器中的等离子体分布被控制。

公开(公告)号：US20150270105A1

公开(公告)日：2015-09-24

申请号：US14221132

申请日：2014-03-20

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Soonam Park ,  Dmitry Lubomirsky ,  Hideo Sugai

IPC: H01J37/32 ,  H01J37/244

CPC classification number: H01J37/32229 ,  H01J7/24 ,  H01J19/80 ,  H01J37/244 ,  H01J37/32201 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32935 ,  H01J37/3299 ,  H05B41/16

Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

公开(公告)号：US20130284370A1

公开(公告)日：2013-10-31

申请号：US13804616

申请日：2013-03-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenneth S. Collins ,  Satoru Kobayashi ,  Lawrence Wong ,  Jonathan Liu ,  Yang Yang ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H05H1/46

CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/32174 ,  H05H2001/4682

Abstract: Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Abstract translation: 通过相位锁定反馈控制回路根据期望或用户选择的相位差控制不同RF线圈天线之间的相位差，等离子体反应器中的等离子体分布被控制。

公开(公告)号：US20130284369A1

公开(公告)日：2013-10-31

申请号：US13632302

申请日：2012-10-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Satoru Kobayashi ,  Lawrence Wong ,  Jonathan Liu ,  Yang Yang ,  Kartik Ramaswamy ,  Shahid Rauf ,  Shane C. Nevil ,  Kallol Bera ,  Kenneth S. Collins

IPC: C23C16/505 ,  B05C9/00

CPC classification number: C23C16/505 ,  B05C9/00 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/3299

Abstract: Plasma distribution is controlled in a plasma reactor by controlling the phase difference between opposing RF electrodes, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Abstract translation: 通过相位锁定反馈控制回路根据期望或用户选择的相位差控制相对RF电极之间的相位差，在等离子体反应器中控制等离子体分布。

公开(公告)号：US11972930B2

公开(公告)日：2024-04-30

申请号：US17542781

申请日：2021-12-06

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Hideo Sugai ,  Toan Tran ,  Soonam Park ,  Dmitry Lubomirsky

IPC: H01J37/32

CPC classification number: H01J37/32293 ,  H01J37/32192 ,  H01J37/32211 ,  H01J37/32229 ,  H01J37/32935 ,  H01J2237/334

Abstract: A plasma reactor has a cylindrical microwave cavity overlying a workpiece processing chamber, a microwave source having a pair of microwave source outputs, and a pair of respective waveguides. The cavity has first and second input ports in a sidewall and space apart by an azimuthal angle. Each of the waveguides has a microwave input end coupled to a microwave source output and a microwave output end coupled to a respective one of the first and second input ports, a coupling aperture plate at the output end with a rectangular coupling aperture in the coupling aperture plate, and an iris plate between the coupling aperture plate and the microwave input end with a rectangular iris opening in the iris plate.

公开(公告)号：US10593560B2

公开(公告)日：2020-03-17

申请号：US15909812

申请日：2018-03-01

Applicant: Applied Materials, Inc.

Inventor： Tae Seung Cho ,  Soonwook Jung ,  Junghoon Kim ,  Satoru Kobayashi ,  Kenneth D. Schatz ,  Soonam Park ,  Dmitry Lubomirsky

IPC: C23C16/00 ,  H01L21/316 ,  H01L21/3213 ,  H01L21/67 ,  H01L21/3105 ,  H01J37/32 ,  H05H1/46

Abstract: Exemplary magnetic induction plasma systems for generating plasma products are provided. The magnetic induction plasma system may include a first plasma source including a plurality of first sections and a plurality of second sections arranged in an alternating manner and fluidly coupled with each other such that at least a portion of plasma products generated inside the first plasma source may circulate through at least one of the plurality of first sections and at least one of the plurality of second sections inside the first plasma source. Each of the plurality of second sections may include a dielectric material. The system may further include a plurality of first magnetic elements each of which may define a closed loop. Each of the plurality of second sections may define a plurality of recesses for receiving one of the plurality of first magnetic elements therein.

公开(公告)号：US10460915B2

公开(公告)日：2019-10-29

申请号：US15582282

申请日：2017-04-28

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Kirby Hane Floyd ,  Hiroji Hanawa ,  Soonam Park ,  Dmitry Lubomirsky

IPC: H01L21/687 ,  H01J37/32 ,  H02K7/14

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.