公开(公告)号：US20230226814A1

公开(公告)日：2023-07-20

申请号：US18159152

申请日：2023-01-25

Applicant: FUJIFILM Corporation

Inventor： Ichiro KOYAMA ,  Shunsuke YANAGI ,  Kazuaki ENOMOTO ,  Kotaro KUDO

IPC: B41C1/10

CPC classification number: B41C1/1016 ,  B41C2201/02 ,  B41C2210/04 ,  B41C2210/22 ,  B41C2201/14

Abstract: Provided is an on-press development type lithographic printing plate precursor having a support, an image-recording layer, and an outermost layer in this order, in which the outermost layer has a sea-island structure consisting of a discontinuous phase that contains a hydrophobic polymer and a continuous phase that contains a water-soluble polymer. Also provided are a method of preparing a lithographic printing plate and a lithographic printing method in which the on-press development type lithographic printing plate precursor is used.

公开(公告)号：US20200095438A1

公开(公告)日：2020-03-26

申请号：US16695074

申请日：2019-11-25

Applicant: FUJIFILM CORPORATION

Inventor： Ichiro KOYAMA ,  Noriaki SATO ,  Shota SUZUKI ,  Yasuhiro SAWAMURA

IPC: C09D11/101 ,  C09D11/107 ,  C09D11/30 ,  B41J11/00 ,  B41M5/00

Abstract: Provided is a photocurable ink composition including a resin which has an amine structure having an α-hydrogen atom and contains at least one selected from the group consisting of an alkylthio group, an alkylenethioalkylene group, and a mercapto group and at least one selected from the group consisting of a fluorinated hydrocarbon group, a polysiloxane group, and a hydrocarbon group having 12 or more carbon atoms; at least one of a monofunctional radically polymerizable monomer or a bifunctional radically polymerizable monomer; and a photopolymerization initiator.

公开(公告)号：US20200056061A1

公开(公告)日：2020-02-20

申请号：US16662000

申请日：2019-10-23

Applicant: FUJIFILM CORPORATION

Inventor： Noriaki SATO ,  Ichiro KOYAMA ,  Shota SUZUKI ,  Yasuhiro SAWAMURA

IPC: C09D11/38 ,  C08L33/14 ,  C08L33/26 ,  C08K5/07 ,  C08K5/00 ,  B41J2/44

Abstract: Provided are a photocurable ink composition including a resin which contains an amino group having one or more hydrogen atoms on a carbon atom at an ca-position and having an amine value of 3.5 mmol/g to 12 mmol/g, and a radically polymerizable monomer, in which the radically polymerizable monomer contains at least one of a monofunctional radically polymerizable monomer or a bifunctional radically polymerizable monomer, a total content of the monofunctional radically polymerizable monomer and the bifunctional radically polymerizable monomer is 50% by mass or greater with respect to a total mass of the photocurable ink composition, and a content of a radically polymerizable monomer containing an acid group in the radically polymerizable monomers is 1.5 mmol or less per 100 g of the photocurable ink composition; and an image forming method performed by using the photocurable ink composition.

公开(公告)号：US20200048487A1

公开(公告)日：2020-02-13

申请号：US16584957

申请日：2019-09-27

Applicant: FUJIFILM CORPORATION

Inventor： Ichiro KOYAMA ,  Noriaki SATO ,  Shota SUZUKI

IPC: C09D11/38 ,  C09D11/102 ,  B41M5/00

Abstract: An ink composition including water, particles that include a polymer having at least one of a urethane bond or a urea bond and have a polymerizable group, and a hydrophobic compound that has an alkyl group having 8 or more carbon atoms and has a molecular weight of 5000 or less, a method for producing the ink composition, and an image-forming method.

公开(公告)号：US20190308156A1

公开(公告)日：2019-10-10

申请号：US16442548

申请日：2019-06-17

Applicant: FUJIFILM CORPORATION

Inventor： Ichiro KOYAMA ,  Noriaki SATO ,  Shota SUZUKI

IPC: B01J13/14 ,  C09D11/30 ,  C08G18/76 ,  C08G18/32 ,  C08G18/48 ,  B41J11/00

Abstract: An aqueous dispersion is provided, the aqueous dispersion including: a microcapsule including a core and a shell that has a three-dimensionally crosslinked structure including (a) at least one selected from the group consisting of a urethane bond and a urea bond and (b) an anionic group and a nonionic group as hydrophilic groups, in which at least one of the shell or the core has a thermal-polymerizable group; and water, in which the nonionic group is a group (W) represented by Formula (W) below, *RW1—OnwRW2  Formula (W) in which, in Formula (W), RW1 represents an alkylene group that has 1 to 6 carbon atoms and that may be branched, RW2 represents an alkyl group that has 1 to 6 carbon atoms and that may be branched, nw represents an integer of 2 to 200, and * represents a linkage position.

公开(公告)号：US20190023918A1

公开(公告)日：2019-01-24

申请号：US16048393

申请日：2018-07-30

Applicant: FUJIFILM CORPORATION

Inventor： Ichiro KOYAMA ,  Noriaki SATO ,  Shota SUZUKI

IPC: C09D11/102 ,  C09D11/30 ,  C08J3/03 ,  C08L71/00

Abstract: Provided are an aqueous dispersion including a microcapsule and water, the microcapsule including: a shell having a three-dimensional cross-linked structure containing: at least one bond selected from a urethane bond or a urea bond; and an anionic group and a nonionic group as hydrophilic groups; and a core, at least one of the shell having a photopolymerization initiating group or the core containing a photopolymerization initiator being satisfied, and at least one of the shell having a polymerizable group or the core containing a polymerizable compound being satisfied; a method for manufacturing the same; and an image forming method using the aqueous dispersion.

公开(公告)号：US20170198176A1

公开(公告)日：2017-07-13

申请号：US15468288

申请日：2017-03-24

Applicant: FUJIFILM Corporation

Inventor： Yoshitaka KAMOCHI ,  Ichiro KOYAMA ,  Yu IWAI ,  Atsushi NAKAMURA ,  Mitsuru SAWANO

IPC: C09J11/06 ,  H01L21/683 ,  C09J153/02 ,  C09J7/00 ,  B32B25/04 ,  B32B7/12

CPC classification number: C09J11/06 ,  B32B3/08 ,  B32B7/04 ,  B32B7/06 ,  B32B7/12 ,  B32B9/043 ,  B32B15/06 ,  B32B25/04 ,  B32B25/08 ,  B32B25/12 ,  B32B25/14 ,  B32B25/16 ,  B32B25/18 ,  B32B25/20 ,  B32B27/06 ,  B32B27/08 ,  B32B27/20 ,  B32B27/26 ,  B32B27/28 ,  B32B27/285 ,  B32B27/286 ,  B32B27/304 ,  B32B27/306 ,  B32B27/325 ,  B32B27/34 ,  B32B27/36 ,  B32B27/365 ,  B32B27/38 ,  B32B27/42 ,  B32B2250/03 ,  B32B2255/10 ,  B32B2255/26 ,  B32B2270/00 ,  B32B2307/30 ,  B32B2307/306 ,  B32B2307/51 ,  B32B2307/58 ,  B32B2307/584 ,  B32B2307/732 ,  B32B2307/748 ,  B32B2457/14 ,  C08J3/092 ,  C08J5/18 ,  C08J2309/06 ,  C08J2353/02 ,  C09J7/00 ,  C09J7/10 ,  C09J121/00 ,  C09J153/025 ,  C09J2201/622 ,  C09J2203/326 ,  C09J2453/00 ,  H01L21/02 ,  H01L21/6836 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68386

Abstract: Provided are a composition which has good elastomer solubility, is thus capable of increasing a concentration of solid contents, and is capable of forming a film having excellent drying properties, surface morphology, and heat resistance, a process for producing a sheet, a sheet, a laminate, and a laminate with a device wafer.This composition includes an elastomer having a 5% thermal mass reduction temperature of 375° C. or higher when heated at an elevation rate of 20° C./min from 25° C., a solvent represented by the following General Formula (1) and having a boiling point of 160° C. or higher, and a solvent having a boiling point of lower than 120° C. In General Formula (1), R1 to R6 each independently represent a hydrogen atom or an aliphatic hydrocarbon group.

公开(公告)号：US20160240816A1

公开(公告)日：2016-08-18

申请号：US15139989

申请日：2016-04-27

Applicant: FUJIFILM Corporation

Inventor： Kazuyoshi MIZUTANI ,  Yu IWAI ,  Ichiro KOYAMA ,  Yoshitaka KAMOCHI

IPC: H01L51/52 ,  G03F7/11 ,  G03F7/004 ,  G03F7/039 ,  H01L51/42 ,  B32B27/08

CPC classification number: H01L51/5253 ,  B32B27/08 ,  B32B2307/4026 ,  B32B2307/54 ,  B32B2457/00 ,  B32B2457/14 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/325 ,  H01L51/4253 ,  H01L51/448 ,  Y02E10/549 ,  Y02P70/521

Abstract: Provided are a laminate which is capable of forming an excellent organic semiconductor pattern, a kit for manufacturing an organic semiconductor, which is used to manufacture such a laminate, and a resist composition for manufacturing an organic semiconductor, which is used for the kit for manufacturing an organic semiconductor.The laminate includes an organic semiconductor film, a protective film on the organic semiconductor film, and a resist film on the protective film, in which the resist film is formed of a photosensitive resin composition that contains a photoacid generator (A) which generates an organic acid of which a pKa of the generated acid is −1 or less and a resin (B) which reacts with an acid generated by the photoacid generator so that the rate of dissolution in a developer containing an organic solvent is decreased.

Abstract translation: 提供能够形成优异的有机半导体图案的层压体，用于制造这种层压体的用于制造有机半导体的套件以及用于制造用于制造的套件的有机半导体用抗蚀剂组合物 有机半导体。 层压体包括有机半导体膜，有机半导体膜上的保护膜和保护膜上的抗蚀剂膜，其中抗蚀剂膜由包含产生有机物的光致酸产生剂（A）的光敏树脂组合物形成， 产生酸的pKa为-1以下的酸和与光产酸剂生成的酸反应的树脂（B），使得含有有机溶剂的显影剂的溶解率降低。

公开(公告)号：US20160075922A1

公开(公告)日：2016-03-17

申请号：US14953697

申请日：2015-11-30

Applicant: FUJIFILM Corporation

Inventor： Yu IWAI ,  Kazuhiro FUJIMAKI ,  Ichiro KOYAMA ,  Atsushi NAKAMURA

IPC: C09J151/00 ,  H01L21/683

CPC classification number: C09J151/003 ,  C09J4/00 ,  C09J5/04 ,  C09J5/06 ,  C09J125/14 ,  C09J133/12 ,  C09J133/16 ,  C09J183/06 ,  H01L21/304 ,  H01L21/306 ,  H01L21/6835 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381

Abstract: By a temporary adhesive for production of semiconductor device containing (A) a radical polymerizable monomer or oligomer containing a fluorine atom or a silicon atom, (B) a polymer compound, and (C) a radical polymerization initiator, a temporary adhesive for production of semiconductor device, which is excellent in coating property, which reduces a problem of generation of gas therefrom in the temporary support even under high temperature condition when the member to be processed (for example, a semiconductor wafer) is subjected to a mechanical or chemical processing, and further which can easily release the temporary support for the member processed without imparting damage to the member processed even after being subjected to a process at a high temperature, and an adhesive support and a production method of semiconductor device using the same are provided.

公开(公告)号：US20150184033A1

公开(公告)日：2015-07-02

申请号：US14660244

申请日：2015-03-17

Applicant: FUJIFILM Corporation

Inventor： Yu IWAI ,  Kazuhiro FUJIMAKI ,  Ichiro KOYAMA

IPC: C09J4/00 ,  C09J7/02 ,  H01L21/683 ,  H01L21/304 ,  H01L21/306

CPC classification number: C09J4/00 ,  C08F222/10 ,  C09J4/06 ,  C09J7/00 ,  C09J7/385 ,  C09J133/06 ,  C09J2203/326 ,  C09J2400/22 ,  C09J2433/00 ,  H01L21/304 ,  H01L21/30625 ,  H01L21/31058 ,  H01L21/31133 ,  H01L21/6835 ,  H01L21/6836 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381

Abstract: The invention is directed to a temporary adhesive containing (A) a polymer compound having a radical polymerizable group in its side chain, (B) a radical polymerizable monomer, and (C) a heat radical polymerization initiator, and a production method of semiconductor device having a member processed including: adhering a first surface of a member to be processed to a substrate through an adhesive layer formed from the temporary adhesive; conducting a mechanical or chemical processing on a second surface which is different from the first surface of the member to be processed to obtain the member processed; and releasing the first surface of the member processed from the adhesive layer.

Abstract translation: 本发明涉及一种临时粘合剂，其包含（A）在侧链具有自由基聚合性基团的高分子化合物，（B）自由基聚合性单体和（C）热自由基聚合引发剂，以及半导体装置的制造方法 其特征在于，包括：通过由所述临时粘合剂形成的粘合剂层将待加工的构件的第一表面粘附到基底; 在不同于待加工构件的第一表面的第二表面上进行机械或化学处理以获得处理的构件; 并释放从粘合剂层加工的构件的第一表面。