公开(公告)号：US08840728B2

公开(公告)日：2014-09-23

申请号：US13378163

申请日：2010-06-21

申请人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

发明人： Shoichi Terada ,  Yoshio Kimura ,  Takahiro Kitano

IPC分类号： C23C16/00 ,  B05C21/00 ,  B05C13/02 ,  B05C13/00 ,  H01L21/687 ,  H01L21/56 ,  H01L21/673 ,  H01L21/67 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C33/58 ,  B28B7/38 ,  B65B33/00 ,  B05D3/02

CPC分类号： B05C13/00 ,  B29C33/58 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/566 ,  H01L21/67057 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67333 ,  H01L21/68707 ,  H01L2924/0002 ,  Y10S414/141 ,  H01L2924/00

摘要： The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.

摘要翻译： 本发明是一种模板处理装置，在模板上形成具有形成在其前表面上的转印图案的模板上的脱模剂的膜，该模板处理装置包括：处理站，在前表面形成脱模剂膜 模板; 以及能够保持多个模板并将模板搬入/离开处理站的模板搬入/出站，其中处理站包括：清洁模板的前表面的清洁单元; 涂布单元，将脱模剂施加到模板的清洁前表面上; 加热单元烘烤所施加的脱模剂; 以及将模板携带到清洁单元，涂布单元和加热单元的携带单元。

公开(公告)号：US08772413B2

公开(公告)日：2014-07-08

申请号：US13392639

申请日：2010-08-27

申请人： Takahiro Kitano ,  Kozo Nogi ,  Kunihiko Ishizaki

发明人： Takahiro Kitano ,  Kozo Nogi ,  Kunihiko Ishizaki

IPC分类号： C08F2/01

摘要： Disclosed is a method for producing a water absorbent resin, by which a surface-crosslinked water absorbent resin having excellent physical properties can be efficiently obtained at low cost, while assuring high productivity. When the production scale is increased to a continuous production at 1 t/hr or more, the physical properties are improved and stabilized (for example, standard deviation of the physical properties is reduced) by a surface-crosslinking treatment, and the absorption against pressure (AAP) and liquid permeability (SFC) are further improved. Specifically disclosed is a method for producing a water absorbent resin, which is characterized in that the stirring shaft of the continuous mixing apparatus for the surface-crosslinking agent is heated during the mixing step of the surface-crosslinking agent or that the continuous mixing apparatus for the surface-crosslinking agent is operated at a pressure that is reduced relative to the ambient pressure and a gas flow is passed through the mixing apparatus during the mixing of the surface-crosslinking agent so that the gas flow in the mixing apparatus is 40° C. or more (when defined with respect to the gas temperature at the exit).

公开(公告)号：US08304020B2

公开(公告)日：2012-11-06

申请号：US12364729

申请日：2009-02-03

申请人： Tetsuo Fukuoka ,  Takahiro Kitano

发明人： Tetsuo Fukuoka ,  Takahiro Kitano

IPC分类号： C23C16/00 ,  B05D5/10 ,  B05D3/00

CPC分类号： G03B27/52 ,  C09J5/02

摘要： There are provided an adhesion promoting process using a comparatively small amount of an adhesion promoting gas for processing a workpiece, an adhesion promoting device for carrying out the adhesion promoting process, a coating and developing system including the adhesion promoting device, and a storage medium storing a program specifying a set of instructions for carrying out the adhesion promoting process.The adhesion promoting process includes the steps of: placing a workpiece on a support table disposed in a processing space defined by a processing vessel; adjusting the temperature of the workpiece placed on the support table to a first temperature at which an adhesion promoting gas does not condense on the workpiece in dew drops; supplying the adhesion promoting gas to the temperature-controlled workpiece to make a surface of the workpiece hydrophobic through the interaction of molecules contained in the adhesion promoting gas and the surface of the workpiece; and adjusting the temperature of the workpiece to a second temperature higher than the first temperature to supply thermal energy to excessive molecules remaining on the surface of the workpiece and evacuating the processing space to remove the excessive molecules from the surface of the workpiece.

摘要翻译： 提供了使用相对少量用于加工工件的粘附促进气体的粘合促进方法，用于进行粘合促进过程的粘合促进装置，包括粘附促进装置的涂覆和显影系统以及存储 指定用于执行粘附促进过程的一组指令的程序。 粘合促进方法包括以下步骤：将工件放置在设置在由处理容器限定的处理空间中的支撑台上; 将放置在支撑台上的工件的温度调节到粘附促进气体在露滴中不会在工件上冷凝的第一温度; 将粘合促进气体供应到温度控制的工件，以通过包含在粘附促进气体中的分子与工件的表面的相互作用使工件的表面疏水化; 并且将工件的温度调节到高于第一温度的第二温度，以将热能提供给留在工件表面上的过量分子，并抽空处理空间以从工件的表面去除过量的分子。

公开(公告)号：US08256370B2

公开(公告)日：2012-09-04

申请号：US12390752

申请日：2009-02-23

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05C11/02 ,  B05C13/00 ,  B05C13/02 ,  B05C5/00 ,  B05C21/00 ,  B05B13/04 ,  B65G53/16 ,  B65G53/00 ,  B65G53/26 ,  B65G69/06

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/027 ,  H01L21/67051 ,  H01L21/6838

摘要： A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.

摘要翻译： 涂布装置包括：液膜形成机构，其被构造成形成用于防止来自涂布液的污染物沉积或留在基板的背面周边部分上的处理液体的液膜。 液膜形成机构包括面对基板的后侧周边部分的相对面部分和用于将处理液体供给到对面部分上的处理液体供应部分。 所述涂布装置还包括姿势调节机构，所述姿势调节机构设置在所述基板保持部件周围，并且被配置为抑制正在旋转的所述基板的周边部分的垂直摆动。 所述姿势调节机构包括沿所述基板的旋转方向排列的排出孔，其构造成在所述周边部的内侧将气体输送到所述基板的背侧区域。

公开(公告)号：US08025925B2

公开(公告)日：2011-09-27

申请号：US11378319

申请日：2006-03-20

申请人： Tetsuo Fukuoka ,  Takahiro Kitano ,  Nobuaki Matsuoka

发明人： Tetsuo Fukuoka ,  Takahiro Kitano ,  Nobuaki Matsuoka

IPC分类号： B05D3/02 ,  H05B3/68 ,  C23C16/00

CPC分类号： F27B5/04 ,  F27D3/0084 ,  H01L21/67109

摘要： A heating apparatus is configured to include a hot plate at which a substrate is placed, a top plate opposed to the substrate, a gas discharging part provided on one end side of the hot plate for discharging gas between the hot plate and the top plate, an exhaust part provided to be opposed to the gas discharging part with the hot plate interposed therebetween, and a heating part independently heating a first region and a second region of the substrate. A heating process is performed with good within-wafer uniformity by forming an unidirectional flow to heat the first region and the second region at different temperatures.

摘要翻译： 加热装置构成为包括放置基板的加热板，与基板相对的顶板，设置在热板的一端侧的气体排出部，用于在加热板和顶板之间排出气体， 排气部，设置成与所述气体排出部相对设置，其间插入有所述热板;加热部，​​独立地加热所述基板的第一区域和第二区域。 通过形成单向流以在不同温度下加热第一区域和第二区域，进行具有良好的晶片内均匀性的加热过程。

公开(公告)号：US08021062B2

公开(公告)日：2011-09-20

申请号：US12774006

申请日：2010-05-05

申请人： Takanori Nishi ,  Takahiro Kitano ,  Katsuya Okumura

发明人： Takanori Nishi ,  Takahiro Kitano ,  Katsuya Okumura

IPC分类号： G03B13/00 ,  G03B5/00

CPC分类号： G03F7/3021 ,  G03F7/26 ,  G03F7/38 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67178

摘要： A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle.

摘要翻译： 显影装置具有用于保持基板的基板保持器，设置在基板保持器中的加热器，并且加热用于通过PEB处理抗蚀剂膜的基板保持器上的基板，冷却器以冷却基板保持器上的基板， 显影溶液喷嘴将显影液供给到基板保持器上的基板，以及控制器，用于控制加热器，冷却器和显影喷嘴。

公开(公告)号：US20110204300A1

公开(公告)日：2011-08-25

申请号：US13125875

申请日：2009-10-22

申请人： Takahiro Kitano

发明人： Takahiro Kitano

IPC分类号： H01B1/02 ,  D01F9/12 ,  B82Y40/00 ,  B82Y30/00

CPC分类号： H01B1/24 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/172 ,  C01B32/174

摘要： [Description] A method for producing a metallic carbon nanotube, by which a dispersion with a high concentration can be obtained. Specifically disclosed is a method for producing a metallic carbon nanotube, which comprises a fullerene addition step wherein fullerenes are added into a carbon nanotube-containing solution in which metallic carbon nanotubes and semiconductive carbon nanotubes are mixed, and a taking-out step wherein carbon nanotubes dispersed by the added fullerenes are taken out.

摘要翻译： [说明]可以得到高浓度分散液的金属碳纳米管的制造方法。 具体公开了一种制造金属碳纳米管的方法，其包括富勒烯添加步骤，其中将富勒烯加入到其中混合有金属碳纳米管和半导体碳纳米管的含碳纳米管的溶液中，以及取出步骤，其中将碳纳米管 被添加的富勒烯分散后取出。

公开(公告)号：US20110117291A1

公开(公告)日：2011-05-19

申请号：US12943204

申请日：2010-11-10

申请人： Koukichi HIROSHIRO ,  Takanori Nishi ,  Takahiro Kitano ,  Shoichi Terada

发明人： Koukichi HIROSHIRO ,  Takanori Nishi ,  Takahiro Kitano ,  Shoichi Terada

IPC分类号： B05D3/06 ,  B05D1/36 ,  B05D3/10 ,  B05C5/00 ,  B05B5/025 ,  B05C11/00 ,  B05C3/00 ,  G05D7/00

CPC分类号： H01L21/67173 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6715 ,  H01L21/67757

摘要： In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template.

摘要翻译： 在模板处理面上形成脱模剂的膜的模板处理中，首先对模板的处理面进行清洗。 此后，在涂布单元中，将脱模剂施加到模板的处理表面。 然后将模板上的脱模剂干燥。 然后，将酒精施加到模板上的脱模剂上，使脱模剂粘附在模板的处理表面上，并除去脱模剂的未反应部分。 此后，将模板上的醇干燥并除去。 以这种方式，在模板的处理表面上以预定的膜厚度形成剥离剂的膜。

公开(公告)号：US20090285991A1

公开(公告)日：2009-11-19

申请号：US12390752

申请日：2009-02-23

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05D3/12 ,  B05C13/00 ,  B05C11/08

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/027 ,  H01L21/67051 ,  H01L21/6838

摘要： A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.

摘要翻译： 涂布装置包括：液膜形成机构，其被构造成形成用于防止来自涂布液的污染物沉积或留在基板的背面周边部分上的处理液体的液膜。 液膜形成机构包括面对基板的后侧周边部分的相对面部分和用于将处理液体供给到对面部分上的处理液体供应部分。 所述涂布装置还包括姿势调节机构，所述姿势调节机构设置在所述基板保持部件周围，并且被配置为抑制正在旋转的所述基板的周边部分的垂直摆动。 所述姿势调节机构包括沿所述基板的旋转方向排列的排出孔，其构造成在所述周边部的内侧将气体输送到所述基板的背侧区域。

公开(公告)号：US20090052025A1

公开(公告)日：2009-02-26

申请号：US11908706

申请日：2006-03-14

申请人： Takahiro Kitano ,  Masayasu Ogushi

发明人： Takahiro Kitano ,  Masayasu Ogushi

IPC分类号： G02B27/12 ,  B32B37/14 ,  C08K3/04

CPC分类号： G03B21/625 ,  B29D11/00278 ,  G02B3/0031 ,  G02B5/003 ,  G02B27/0018

摘要： To provide a lenticular lens sheet having a fine light shielding pattern that has high color reproducibility. [MEANS FOR SOLVING PROBLEMS] The above problem can be solved by a lenticular lens sheet, in which the average primary particle diameter of carbon black contained in a light shielding layer is not less than 10 nm and not more than 50 nm and, preferably, in an image of the cross-section of the light shielding layer under scanning electron microscopic observation, the area ratio of carbon black to the whole image is not less than 60% and not more than 95%, and a process for producing the lenticular lens sheet.

摘要翻译： 提供具有高色彩再现性的细光屏蔽图案的双凸透镜片。 解决问题的手段上述问题可以通过双凸透镜片来解决，其中遮光层中包含的炭黑的平均一次粒径不小于10nm且不大于50nm，并且优选地， 在扫描电子显微镜观察下的遮光层的截面图像中，炭黑与整体图像的面积比不小于60％且不大于95％，并且制造双凸透镜的方法 片。