公开(公告)号：US09841689B1

公开(公告)日：2017-12-12

申请号：US14832750

申请日：2015-08-21

Applicant: KLA-TENCOR CORPORATION

Inventor： Vladimir Levinski ,  Daniel Kandel ,  Yoel Feler ,  Nadav Gutman

IPC: G02B27/52 ,  G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70283 ,  G03F7/70558

Abstract: A method is provided that comprises printing FEM wafers having different predefined focus offsets and multiple corresponding sites, measuring signals from the sites, and quantifying a focus inaccuracy by comparing the measured signals from the corresponding sites across the wafers.

公开(公告)号：US09739702B2

公开(公告)日：2017-08-22

申请号：US14161398

申请日：2014-01-22

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Irina Paykin ,  Alexander Svizher ,  Meir Aloni ,  Guy Ben Dov ,  Hadar Shalmoni ,  Vladimir Levinski

IPC: G01B11/27 ,  G01N21/01 ,  G03F7/20 ,  G02B27/42 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/01 ,  G01B11/272 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/068 ,  G02B27/4255 ,  G02B27/4272 ,  G03F7/70633 ,  G03F7/70683

Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.

公开(公告)号：US20160313658A1

公开(公告)日：2016-10-27

申请号：US15198902

申请日：2016-06-30

Applicant: KLA-TENCOR CORPORATION

Inventor： Tal Marciano ,  Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Ze'ev Lindenfeld ,  Zeng Zhao ,  Yoel Feler ,  Daniel Kandel ,  Nadav Carmel ,  Amnon Manassen ,  Nuriel Amir ,  Oded Kaminsky ,  Tal Yaziv ,  Ofer Zaharan ,  Moshe Cooper ,  Roee Sulimarski ,  Tom Leviant ,  Noga Sella ,  Boris Efraty ,  Lilach Saltoun ,  Amir Handelman ,  Eltsafon Ashwal ,  Ohad Bachar

IPC: G03F9/00

Abstract: Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe. The dependency may be analyzed in form of a landscape such as a sensitivity landscape in which regions of low sensitivity and/or points or contours of low or zero inaccuracy are detected, analytically, numerically or experimentally, and used to configure parameters of measurement, hardware and targets to achieve high measurement accuracy. Process variation is analyzed in terms of its effects on the sensitivity landscape, and these effects are used to characterize the process variation further, to optimize the measurements and make the metrology both more robust to inaccuracy sources and more flexible with respect to different targets on the wafer and available measurement conditions.

Abstract translation: 提供了用于导出计量度量对配方参数的部分连续依赖性的方法，分析衍生依赖性，根据分析确定计量配方，并根据确定的配方进行计量测量。 依赖性可以以景观的形式进行分析，例如灵敏度景观，其中检测到低分辨率或零误差的低灵敏度和/或点或等值线的区域，分析，数字或实验，并用于配置测量参数，硬件 并达到高测量精度。 根据其对灵敏度景观的影响分析过程变化，并且这些效应用于进一步表征过程变化，优化测量结果，使计量学对于不准确性来源更加鲁棒，并且对于不同的目标更灵活 晶圆和可用的测量条件。

公开(公告)号：US20140141536A1

公开(公告)日：2014-05-22

申请号：US14074412

申请日：2013-11-07

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Yoel Feler ,  Daniel Kandel

IPC: G06F17/50 ,  G03F7/20 ,  H01L21/66 ,  G03F1/38 ,  G01B11/14

CPC classification number: G03F1/38 ,  G01B11/14 ,  G03F1/70 ,  G03F7/70641 ,  G03F7/70683

Abstract: A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the unresolvable segmentation pitch along the first direction is smaller than the illumination of the lithography printing tool, wherein the plurality of cell structures have a pitch along a second direction perpendicular to the first direction, wherein the unresolvable segmentation pitch is suitable for generating a printed pattern for shifting the best focus position of the lithography tool by a selected amount to achieve a selected level of focus sensitivity.

Abstract translation: 分割的掩模包括一组单元结构，其中每个单元结构包括沿着第一方向具有不可解析的分割间距的一组特征，其中沿着第一方向的不可解析的分割间距小于光刻印刷工具的照明，其中 所述多个单元结构具有沿着垂直于所述第一方向的第二方向的间距，其中所述不可分辨的分割间距适于产生用于将所述光刻工具的最佳聚焦位置移动所选量的印刷图案，以实现所选择的等级 聚焦灵敏度。

公开(公告)号：US20140136137A1

公开(公告)日：2014-05-15

申请号：US14152562

申请日：2014-01-10

Applicant: KLA-Tencor Corporation

Inventor： Inna Tarshish-Shapir ,  Yoel Feler ,  Anat Marchelli ,  Berta Dinu ,  Vladimir Levinski ,  Boris Efraty ,  Nuriel Amir ,  Mark Ghinovker ,  Amnon Manassen ,  Sigalit Robinzon

IPC: G01R31/28

CPC classification number: G06K9/522 ,  G01B2210/56 ,  G01N21/4788 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.

Abstract translation: 提供了方法和系统，其使用选定的度量来识别指定的计量目标异常，并在几何上对所识别的目标异常进行分类，以将它们链接到相应的误差源。 可以通过从晶片上的相应目标导出来自指定感兴趣区域（ROI）的目标信号（例如来自目标信号的内核）来执行识别，使用各自的功能从目标信号计算度量，并分析用于表征目标的度量。

公开(公告)号：US20140111791A1

公开(公告)日：2014-04-24

申请号：US14057827

申请日：2013-10-18

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Ohad Bachar ,  Daria Negri ,  Boris Golovanevsky ,  Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Paykin Irina ,  Alexander Svizher ,  Meir Aloni ,  Guy Ben Dov ,  Hadar Shalmoni ,  Vladimir Levinski

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02087 ,  G01N21/45

Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。