公开(公告)号：US06777161B2

公开(公告)日：2004-08-17

申请号：US10118896

申请日：2002-04-10

申请人： Shoichiro Yasunami ,  Kazuyoshi Mizutani

发明人： Shoichiro Yasunami ,  Kazuyoshi Mizutani

IPC分类号： G03C174

CPC分类号： G03F7/095 ,  G03F7/0382 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/128

摘要： To provide a lower layer resist composition for a silicon-containing two-layer resist, which is excellent in the dry etching resistance and film thickness uniformity. A lower layer resist composition for a silicon-containing two-layer resist, comprising (a) a phenol-based polymer, (b) a compound capable of generating a sulfonic acid at a temperature of 100° C. or more, (c) a phenol-based acid crosslinking agent having two or more benzene rings and capable of crosslinking with the polymer under the action of an acid, and (d) a solvent.

摘要翻译： 1.一种用于含硅双层抗蚀剂的下层抗蚀剂组合物，其包含（a）一种含硅双层抗蚀剂的下层抗蚀剂组合物，其包含（a） 酚类聚合物，（b）能够在100℃以上的温度下产生磺酸的化合物，（c）具有两个以上苯环并能够与聚合物交联的苯酚系酸交联剂 在酸的作用下，和（d）溶剂。

公开(公告)号：US06555289B2

公开(公告)日：2003-04-29

申请号：US09826850

申请日：2001-04-06

申请人： Tomoya Sasaki ,  Kazuyoshi Mizutani ,  Shoichiro Yasunami

发明人： Tomoya Sasaki ,  Kazuyoshi Mizutani ,  Shoichiro Yasunami

IPC分类号： G03C173

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： Provided is a positive photoresist composition for use in the production of a semiconductor device, which ensures high resolution, reduced edge roughness of a line pattern and a small number of development defects. The positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an alkali developer increases under the action of an acid.

公开(公告)号：US06479213B2

公开(公告)日：2002-11-12

申请号：US10020958

申请日：2001-12-19

申请人： Kazuyoshi Mizutani ,  Shoichiro Yasunami

发明人： Kazuyoshi Mizutani ,  Shoichiro Yasunami

IPC分类号： G03F7004

CPC分类号： G03F7/0757 ,  G03F7/0392

摘要： Disclosed is a positive photoresist composition comprising an alkali-soluble polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I′) and a positive photoresist composition comprising an acid-decomposable polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I″): wherein L1 represents at least one divalent linking group selected from —A—OCO—, —A—COO—, —A—NHCO—, —A—NHCOO—, —A—NHCONH—, —A—CONH—, —A—OCONH— and —A—S—, A represents a single bond or an arylene group, X represents a divalent linking group, and n represents an integer of 1 to 6.

摘要翻译： 公开了一种正型光致抗蚀剂组合物，其包含含有至少一种由下式（I'）表示的结构单元作为共聚组分的碱溶性聚硅氧烷和包含可酸分解的聚硅氧烷的正性光致抗蚀剂组合物，其含有至少一种 由下式（I“）表示的结构单元：其中L1表示至少一个选自-A-OCO-，-A-COO-，-A-NHCO-，-A-NHCOO-，-A -NHCONH-，-A-CONH-，-A-OCONH-和-AS-，A表示单键或亚芳基，X表示二价连接基团，n表示1〜6的整数。

公开(公告)号：US06090531A

公开(公告)日：2000-07-18

申请号：US908522

申请日：1997-08-07

申请人： Kazuyoshi Mizutani ,  Hiroshi Yoshimoto

发明人： Kazuyoshi Mizutani ,  Hiroshi Yoshimoto

IPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/26 ,  G03F7/38

CPC分类号： G03F7/091

摘要： A composition for anti-reflective coating material is disclosed, comprising a polymer compound having repeating units having specific structure, and optionally a melamine, guanamine, urea, phenol, naphthol or hydroxyanthracene compound substituted by at least one group selected from the group consisting of a methylol group and an alkoxymethyl group at two or more positions. The composition for anti-reflective coating material of the present invention is effective for the reduction of adverse effects of reflection by the substrate in a lithographic process using various radiations. A resist pattern formation process which comprises the use of the composition for anti-reflective coating material is also disclosed.

摘要翻译： 公开了一种抗反射涂层材料的组合物，其包含具有特定结构的重复单元的高分子化合物，以及任选的三聚氰胺，胍胺，脲，苯酚，萘酚或羟基蒽化合物，被至少一种选自以下的基团取代： 羟甲基和烷氧基甲基。 本发明的抗反射涂层材料的组合物对于在使用各种辐射的光刻工艺中减少基板反射的不利影响是有效的。 还公开了包括使用抗反射涂层材料用组合物的抗蚀图案形成方法。

公开(公告)号：US5488182A

公开(公告)日：1996-01-30

申请号：US269040

申请日：1994-06-30

申请人： Fumikazu Kobayashi ,  Kazuyoshi Mizutani ,  Kazuo Maemoto

发明人： Fumikazu Kobayashi ,  Kazuyoshi Mizutani ,  Kazuo Maemoto

IPC分类号： C07C39/12 ,  C07C43/178 ,  G03F7/022 ,  C07C39/16

CPC分类号： C07C43/1782 ,  C07C39/12 ,  C07C43/1785 ,  G03F7/0226

摘要： A novel methoxymethyl- or hydroxymethyl-containing phenol compound represented by the following formula (I), (II), (III), (IV) or (V) is disclosed: ##STR1## wherein each R represents CH.sub.2 OCH.sub.3, CH.sub.2 OH, or H, provided that at least three of the R's are CH.sub.2 OCH.sub.3 or CH.sub.2 OH, with at least one thereof being CH.sub.2 OCH.sub.3 ; each R.sub.1 represents CH.sub.2 OCH.sub.3, CH.sub.2 OH, or H, provided that at least two of the R.sub.1 's are CH.sub.2 OH; and each R.sub.2 represents CH.sub.2 OCH.sub.3, CH.sub.2 OH, or H, provided that at least two of the R.sub.2 'S are CH.sub.2 OH.

摘要翻译： 公开了由下式（I），（II），（III），（IV）或（V）表示的新的含甲氧基甲基或羟甲基的酚化合物：其中每个 R表示CH 2 OCH 3，CH 2 OH或H，条件是至少三个R是CH 2 OCH 3或CH 2 OH，其中至少一个是CH 2 OCH 3; 每个R 1表示CH 2 OCH 3，CH 2 OH或H，条件是R 1中的至少两个为CH 2 OH; 并且每个R 2表示CH 2 OCH 3，CH 2 OH或H，条件是R 2'S中的至少两个为CH 2 OH。

公开(公告)号：US08092977B2

公开(公告)日：2012-01-10

申请号：US12043356

申请日：2008-03-06

申请人： Kazuyoshi Mizutani

发明人： Kazuyoshi Mizutani

IPC分类号： G03F7/039 ,  G03F7/028 ,  C08F12/26 ,  C08F12/30

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392

摘要： A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the composition.

摘要翻译： 正型抗蚀剂组合物包括：（A）具有本说明书中定义的由式（A）表示的重复单元的树脂，其在酸的作用下分解，以增加树脂（A）在碱显影剂中的溶解度 ; 并且图案形成方法使用该组合物。

公开(公告)号：US07887988B2

公开(公告)日：2011-02-15

申请号：US11717645

申请日：2007-03-14

申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

公开(公告)号：US20090011366A1

公开(公告)日：2009-01-08

申请号：US12145151

申请日：2008-06-24

申请人： Hideaki TSUBAKI ,  Shinji Tarutani ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

发明人： Hideaki TSUBAKI ,  Shinji Tarutani ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

IPC分类号： G03C1/053 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/325 ,  Y10S430/106 ,  Y10S430/111

摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.

摘要翻译： 图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低 在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

公开(公告)号：US20080050675A1

公开(公告)日：2008-02-28

申请号：US11844591

申请日：2007-08-24

申请人： Fumiyuki Nishiyama ,  Kazuyoshi Mizutani ,  Masaomi Makino

发明人： Fumiyuki Nishiyama ,  Kazuyoshi Mizutani ,  Masaomi Makino

IPC分类号： G03C1/00

CPC分类号： G03F7/0048 ,  G03F7/0046 ,  G03F7/0392

摘要： A positive resist composition comprising: (A) a resin having a repeating unit represented by a specific formula (I) and a repeating unit represented by a specific formula (A1); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (F) a surfactant represented by a specific formula (II); and a pattern forming method using the same.

摘要翻译： 正型抗蚀剂组合物，其包含：（A）具有由特定式（I）表示的重复单元的树脂和由特定式（A1）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（F）由特定式（II）表示的表面活性剂; 以及使用该图案形成方法的图案形成方法。

公开(公告)号：US07326513B2

公开(公告)日：2008-02-05

申请号：US10791559

申请日：2004-03-03

申请人： Shoichiro Yasunami ,  Koji Shirakawa ,  Kazuyoshi Mizutani

发明人： Shoichiro Yasunami ,  Koji Shirakawa ,  Kazuyoshi Mizutani

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0392 ,  G03F7/0045

摘要： A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble in an alkali developing solution and becoming soluble in an alkali developing solution by the action of an acid, and (B) a compound capable of generating sulfonic acid upon irradiation with active rays or radiations in an amount of from 5 to 20% by weight based on the total solid content of the positive working resist composition.

摘要翻译： 一种正性抗蚀剂组合物，其包含（A1）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且具有不溶或微溶于 碱显影液，通过酸的作用变得可溶于碱性显影液，（B）以活性射线或辐射照射时能够产生磺酸的化合物的量为5〜20重量％，基于 正性抗蚀剂组合物的总固体含量。