公开(公告)号：US07372544B2

公开(公告)日：2008-05-13

申请号：US11797605

申请日：2007-05-04

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/44 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US20070216885A1

公开(公告)日：2007-09-20

申请号：US11797605

申请日：2007-05-04

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US20070211434A1

公开(公告)日：2007-09-13

申请号：US11747482

申请日：2007-05-11

申请人： Hiroshi Chiba ,  Tetsuro Ogushi ,  Akira Yamada ,  Hiroshi Yamabuchi

发明人： Hiroshi Chiba ,  Tetsuro Ogushi ,  Akira Yamada ,  Hiroshi Yamabuchi

IPC分类号： H05K7/20

CPC分类号： H01L23/473 ,  H01L2224/49111 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/00

摘要： A low-cost heat sink easy to assemble which is designed to be mounted on a power semiconductor module (5) through the medium of cooling water includes a base member (1), a heat sink body (2) superposed on the base member (1) to form in cooperation with the base member (1) a passage through which the coolant flows, and a bellows-like flow straightening plate (6) disposed between the power semiconductor module (5) and the base member (1) in physical contact with the power semiconductor module (5) on one hand and with the base member (1) on the other hand. The flow straightening plate (6) partitions the passage into a plurality of flow straightening channels (14A, 14B).

摘要翻译： 设计成通过冷却水介质安装在功率半导体模块（5）上的易于组装的低成本散热器包括：基座部件（1），重叠在基体部件上的散热体（2） 1）与基部构件（1）协作形成冷却剂流过的通道，以及物理上设置在功率半导体模块（5）和基座构件（1）之间的波纹管状流动矫直板（6） 一方面与功率半导体模块（5）接触，另一方面与基座部件（1）接触。 流动矫直板（6）将通道分隔成多个流动矫直通道（14A，14B）。

公开(公告)号：US20060221502A1

公开(公告)日：2006-10-05

申请号：US11158050

申请日：2005-06-22

申请人： Jun Watanabe ,  Yoshiharu Kasamatsu ,  Takayuki Musashi ,  Hiroshi Chiba

发明人： Jun Watanabe ,  Yoshiharu Kasamatsu ,  Takayuki Musashi ,  Hiroshi Chiba

IPC分类号： G11B5/60

CPC分类号： G11B5/6005 ,  G11B5/6082

摘要： A magnetic head includes a head slider configured to float above a recording medium and having an element part for recording to and reproducing from the recording medium, the element part being situated on a medium facing surface facing to the recording medium. The medium facing surface has a first air bearing surface situated in a vicinity of a side of an air flow-out end. The medium facing surface has a rear rail having the element part situated at the side of the air flow-out end of the first air bearing surface. The first air bearing surface is covered with a lubricating layer made of water repellent resin and has an average surface roughness larger than an average surface roughness of a surface of the element part.

摘要翻译： 磁头包括头部滑动器，其被配置为浮动在记录介质上方并且具有用于记录到记录介质并从记录介质再现的元件部分，元件部分位于面向记录介质的面向介质的表面上。 面向介质的表面具有位于空气流出端侧的附近的第一空气支承表面。 面向介质的表面具有后轨道，其中元件部分位于第一空气轴承表面的空气流出端的一侧。 第一空气轴承表面覆盖有由防水树脂制成的润滑层，并且其平均表面粗糙度大于元件部件的表面的平均表面粗糙度。

公开(公告)号：US20060152699A1

公开(公告)日：2006-07-13

申请号：US11372269

申请日：2006-03-10

申请人： Masahiro Nei ,  Naoyuki Kobayashi ,  Hiroshi Chiba ,  Shigeru Hirukawa

发明人： Masahiro Nei ,  Naoyuki Kobayashi ,  Hiroshi Chiba ,  Shigeru Hirukawa

IPC分类号： G03B27/42

CPC分类号： G03F9/7019 ,  G03F7/70341 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7034 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7096

摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

摘要翻译： 曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。 曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统 底物不通过液体。 曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测 系统。 可以以令人满意的图案转印精度进行液浸曝光。

公开(公告)号：US20060106260A1

公开(公告)日：2006-05-18

申请号：US11063737

申请日：2005-02-24

申请人： Hiroshi Chiba ,  Yukiko Oshikubo ,  Keiji Watanabe ,  Eishin Yamakawa ,  Takeshi Toukairin

发明人： Hiroshi Chiba ,  Yukiko Oshikubo ,  Keiji Watanabe ,  Eishin Yamakawa ,  Takeshi Toukairin

IPC分类号： G11B5/65 ,  C07C43/12

CPC分类号： C08G65/007 ,  C08G65/2639 ,  C08G65/3318 ,  C09J171/02 ,  G11B5/725

摘要： There are provided a composition that exhibits sufficient flowability and also displays high substrate adhesion, and a magnetic recording medium, a head slider and a magnetic recording device that use this composition as a lubricant and are thus not prone to faults. The composition comprises a fluorine-containing polyether represented by formula (1), (in formula (1), p and q represent, independently of the symbols in other formulae, any chosen integers). The composition can be produced by reacting a polymer represented by formula (2) with glycidol, HOCH2CF2O(CF2CF2O)p(CF2O)qCF2CH2OH   (2) (in formula (2), p and q represent, independently of the symbols in other formulae, any chosen integers).

摘要翻译： 提供了表现出足够的流动性并且还显示出高的基材粘附性的组合物，以及使用该组合物作为润滑剂并因此不易发生故障的磁记录介质，磁头滑块和磁记录装置。 该组合物包含由式（1）表示的含氟聚醚，（式（1）中，p和q独立于其它式中的符号表示任意选定的整数）。 该组合物可以通过使由式（2）表示的聚合物与缩水甘油反应来制备，<？in-line-formula description =“In-line Formulas”end =“lead”？> HOCH 2 CF （CF 2 O 2）（CF 2 O）O（CF 2 CH 2 O）O（CF 2 O） α（2）<βin-line-formula description =“In-line Formulas”end =“tail” （在式（2）中，p和q独立于其它式中的符号表示任何所选择的整数）。

公开(公告)号：US06670309B2

公开(公告)日：2003-12-30

申请号：US09795424

申请日：2001-02-28

申请人： Hiroshi Chiba ,  Keiji Watanabe ,  Eishin Yamakawa ,  Takeshi Tokairin

发明人： Hiroshi Chiba ,  Keiji Watanabe ,  Eishin Yamakawa ,  Takeshi Tokairin

IPC分类号： C10M17500

CPC分类号： B01J20/08 ,  B01D15/00 ,  B01J20/103 ,  C07C17/38

摘要： In preparing a purified fluorine-based solvent from a fluorine-based solution comprising a lubricant based on a fluororesin having an organic terminal group and a fluorocarbon-based solvent, impurities including ionic pollutants contained in the fluorine-based solution or the lubricant are selectively removed by an adsorption process. The preparation apparatus of a purified fluorine-based solvent is also disclosed.

公开(公告)号：US5749274A

公开(公告)日：1998-05-12

申请号：US663362

申请日：1996-06-13

申请人： Hiroshi Chiba

发明人： Hiroshi Chiba

IPC分类号： B23B31/20 ,  B23B3/24 ,  B23B5/08 ,  B23B23/04 ,  B23B31/40 ,  B23B33/00 ,  F16C13/00 ,  G03G15/00 ,  G03G15/09 ,  B23B1/00

CPC分类号： B23B3/24 ,  B23B23/04 ,  B23B31/404 ,  B23B33/00 ,  G03G15/0928 ,  G03G15/751 ,  B23B2270/20 ,  Y10T82/10 ,  Y10T82/22 ,  Y10T82/2529

摘要： A cylindrical member used as an electrophotographic photosensitive drum or a developing sleeve has a cylindrical surface with a high shape accuracy (straightness and roundness). In cutting the outer circumferential surface of a cylindrical work by cutting tools rotating around the work, clamp portions of a right work holder and a left work holder are inserted into the two ends of the work. The work is held by abutting these tapered surfaces against circular ridge portions formed in the inner edges of end faces of the work and pressing the work in the axial direction.

摘要翻译： 用作电子照相感光鼓或显影套筒的圆柱形构件具有高的形状精度（直线度和圆度）的圆柱形表面。 在通过围绕工件旋转的切削刀具切割圆柱形工件的外圆周表面时，将右工件夹和左工件夹的夹紧部分插入工件的两端。 通过将这些锥形表面抵靠形成在工件的端面的内边缘中的圆形脊部并沿着轴向按压工件来保持工件。

公开(公告)号：US5739899A

公开(公告)日：1998-04-14

申请号：US649815

申请日：1996-05-17

申请人： Kenji Nishi ,  Seiro Murakami ,  Hiroshi Chiba

发明人： Kenji Nishi ,  Seiro Murakami ,  Hiroshi Chiba

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC分类号： G03F9/7019 ,  A61K38/395 ,  G03F7/70066 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70691 ,  G03F9/7011 ,  G03F9/7026 ,  G03F9/7034

摘要： A projection exposure apparatus wherein a pattern formed on a mask is projected onto a substrate through a projection optical system. The apparatus has an illumination optical system for illuminating the mask by exposure light, and a first adjusting member which is disposed in the illumination optical system to change telecentricity on the substrate. The apparatus further has a second adjusting member for adjusting at least one of the position of the substrate in the direction of an optical axis of the projection optical system and the tilt of the substrate, and a control system for controlling the first and second adjusting members. The control system locally corrects the position of a spatial image formed by the projection optical system.

摘要翻译： 投影曝光装置，其中通过投影光学系统将形成在掩模上的图案投影到基板上。 该装置具有用于通过曝光来照射掩模的照明光学系统，以及设置在照明光学系统中以改变基板上的远心度的第一调节构件。 该装置还具有第二调节构件，用于调整基板在投影光学系统的光轴方向上的位置和基板的倾斜中的至少一个以及用于控制第一和第二调节构件的控制系统 。 控制系统局部校正由投影光学系统形成的空间图像的位置。

公开(公告)号：US5196769A

公开(公告)日：1993-03-23

申请号：US776292

申请日：1991-12-09

申请人： Hiroshi Chiba ,  Satoshi Miura ,  Motonobu Hattori ,  Takeshi Obata

发明人： Hiroshi Chiba ,  Satoshi Miura ,  Motonobu Hattori ,  Takeshi Obata

IPC分类号： H02P27/06 ,  D01H1/32 ,  H02P5/74

CPC分类号： H02P5/74 ,  D01H1/32 ,  H02P29/025

摘要： The present invention relates to a motor control device using an inverter or inverters, in particular, it relates to a motor control device suitable for the prevention of inertial rotation of a motor or motors or for the maintenance of synchronized operation of a plurality of motors in a service-interruption time; a DC side voltage is compared with a target voltage and a correction signal relating to the deviation voltage is added to a speed instruction for the inverter; thereby in a service-interruption time a motor can be continuously and smoothly decelerated keeping the DC side voltage of an inverter at a target voltage value. By utilizing a motor control device according to the present invention for a spinning machine etc., unevenness in thread winding or thread cut in a service interruption time can be prevented.