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    Scanning electron microscope
    34.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US06667476B2

    公开(公告)日：2003-12-23

    申请号：US09486042

    申请日：2000-02-17

    申请人： Hideo Todokoro ,  Shou Takami ,  Makoto Ezumi ,  Osamu Yamada ,  Yoichi Ose ,  Tomohiro Kudo

    发明人： Hideo Todokoro ,  Shou Takami ,  Makoto Ezumi ,  Osamu Yamada ,  Yoichi Ose ,  Tomohiro Kudo

    IPC分类号： H01J3728

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/04756

    摘要： The present invention relates to a scanning electron microscope employing a deceleration field forming technology (retarding), more particularly a scanning electron microscope which separates and detects secondary electrons at high efficiency. The object of the present invention is accomplished by providing an electron source, a lens for condensing the primary electron beam which is emitted from said electron source, a detector for detecting electrons which are generated by radiation of the primary electron beam onto a specimen, a first deceleration means for decelerating the primary electron beam which is radiated onto said specimen, a second deceleration means for decelerating electrons which are generated on the specimen, and a deflector for deflecting said electrons which are decelerated by said second decelerating means.

    摘要翻译： 本发明涉及一种使用减速场形成技术（延迟）的扫描电子显微镜，更具体地说，涉及一种以高效率分离和检测二次电子的扫描电子显微镜。 本发明的目的是通过提供电子源，用于冷凝从所述电子源发射的一次电子束的透镜，用于检测通过将一次电子束辐射到样本上产生的电子的检测器， 第一减速装置，用于使被辐射到所述样本上的一次电子束减速，用于减速在所述样本上产生的电子的第二减速装置，以及用于使由所述第二减速装置减速的所述电子偏转的偏转器。

    Scanning electron microscope
    35.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US08698080B2

    公开(公告)日：2014-04-15

    申请号：US12289461

    申请日：2008-10-28

    申请人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    发明人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    IPC分类号： G01N23/00

    CPC分类号： H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/12 ,  H01J2237/2817

    摘要： An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam. Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1.5 is satisfied.

    摘要翻译： 本发明的目的是减少带电粒子束的轨道偏转由带电粒子束照射区域表面上的不均匀样品表面电位产生的电位梯度的光束漂移，不均匀的样品表面电位为 通过使用带电粒子束观察绝缘物质样品时进行通电而产生。 设定要照射到样品上的带电粒子束的能量被设定为使得从样品产生的二次电子的产生效率等于1或更大。 平板电极（26）以与样品直接相对的方式定位。 这里，平板电极是能够独立施加电压的电极，并且具有一次带电粒子束可以穿过的孔。 此外，可以独立地对安装有样品的样品台（12）施加电压。 这里，与样品直接相对的样品台的表面形成为在其上没有凸起和凹陷的平坦化结构。 此外，设置在平板电极（26）中的孔的直径D和平板电极（26）与样品之间的距离L被设定为使得满足D / L＆lt; nlE; 1.5的关系。

    Scanning electron microscope
    36.
    发明申请
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US20070057183A1

    公开(公告)日：2007-03-15

    申请号：US10566634

    申请日：2005-08-10

    申请人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    发明人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    IPC分类号： G21K7/00

    CPC分类号： H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/12 ,  H01J2237/2817

    摘要： An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam. Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1.5 is satisfied.

    摘要翻译： 本发明的目的是减少带电粒子束的轨道偏转由带电粒子束照射区域表面上的不均匀样品表面电位产生的电位梯度的光束漂移，不均匀的样品表面电位为 通过使用带电粒子束观察绝缘物质样品时进行通电而产生。 设定要照射到样品上的带电粒子束的能量被设定为使得从样品产生的二次电子的产生效率等于1或更大。 平板电极（26）以与样品直接相对的方式定位。 这里，平板电极是能够独立施加电压的电极，并且具有一次带电粒子束可以穿过的孔。 此外，可以独立地对安装有样品的样品台（12）施加电压。 这里，与样品直接相对的样品台的表面形成为在其上没有凸起和凹陷的平坦化结构。 此外，设置在平板电极（26）中的孔的直径D和平板电极（26）与样品之间的距离L被设定为使得满足D / L <1.5的关系。

    Scanning electron microscope
    37.
    发明申请
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US20090065694A1

    公开(公告)日：2009-03-12

    申请号：US12289461

    申请日：2008-10-28

    申请人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    发明人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    IPC分类号： G21K7/00

    CPC分类号： H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/12 ,  H01J2237/2817

    摘要： An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam.Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1. 5 is satisfied.

    摘要翻译： 本发明的目的是减少带电粒子束的轨道偏转由带电粒子束照射区域表面上的不均匀样品表面电位产生的电位梯度的光束漂移，不均匀的样品表面电位为 通过使用带电粒子束观察绝缘物质样品时进行通电而产生。 设定要照射到样品上的带电粒子束的能量被设定为使得从样品产生的二次电子的产生效率等于1或更大。 平板电极（26）以与样品直接相对的方式定位。 这里，平板电极是能够独立施加电压的电极，并且具有一次带电粒子束可以穿过的孔。 此外，可以独立地对安装有样品的样品台（12）施加电压。 这里，与样品直接相对的样品台的表面形成为在其上没有凸起和凹陷的平坦化结构。 此外，设置在平板电极（26）中的孔的直径D和平板电极（26）与样品之间的距离L设定为D / L <1的关系。 5满足。

    Scanning electron microscope
    40.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US07459681B2

    公开(公告)日：2008-12-02

    申请号：US10566634

    申请日：2005-08-10

    申请人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    发明人： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

    IPC分类号： H01J37/28 ,  H01J37/00 ,  G21K5/08

    CPC分类号： H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/12 ,  H01J2237/2817

    摘要： An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam.Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1.5 is satisfied.

    摘要翻译： 本发明的目的是减少带电粒子束的轨道偏转由带电粒子束照射区域表面上的不均匀样品表面电位产生的电位梯度的光束漂移，不均匀的样品表面电位为 通过使用带电粒子束观察绝缘物质样品时进行通电而产生。 设定要照射到样品上的带电粒子束的能量被设定为使得从样品产生的二次电子的产生效率等于1或更大。 平板电极（26）以与样品直接相对的方式定位。 这里，平板电极是能够独立施加电压的电极，并且具有一次带电粒子束可以穿过的孔。 此外，可以独立地对安装有样品的样品台（12）施加电压。 这里，与样品直接相对的样品台的表面形成为在其上没有凸起和凹陷的平坦化结构。 此外，设置在平板电极（26）中的孔的直径D和平板电极（26）与样品之间的距离L被设定为使得满足D / L <1.5的关系。