公开(公告)号：US20050103620A1

公开(公告)日：2005-05-19

申请号：US10710946

申请日：2004-08-13

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C14/00 ,  C23C14/34 ,  C23C14/35 ,  C23C14/54 ,  H01J37/34 ,  C23C14/32

CPC classification number: H01J37/3405 ,  C23C14/0063 ,  C23C14/345 ,  C23C14/352 ,  C23C14/542 ,  H01J37/3408 ,  H01J37/3411 ,  H01J37/342 ,  H01J37/3429 ,  H01J37/3438 ,  H01J37/3444 ,  H01J37/3455 ,  H01J37/3458 ,  H01J37/347

Abstract: A plasma source includes a chamber for containing a feed gas. An anode is positioned in the chamber. A segmented magnetron cathode comprising a plurality of electrically isolated magnetron cathode segments is positioned in the chamber proximate to the anode. A power supply is electrically connected to an electrical in-put of a switch. A respective one of the plurality of electrical out-puts of the switch is electrically connected to a respective one of the plurality of magnetron cathode segments. The power supply generates a train of voltage pulses that ignites a plasma from the feed gas. Individual voltage pulses in the train of voltage pulses are routed by the switch in a predetermined sequence to at least two of the plurality of magnetron cathode segments.

Abstract translation: 等离子体源包括用于容纳进料气体的室。 阳极位于腔室中。 包括多个电隔离的磁控管阴极段的分段磁控管阴极位于靠近阳极的室中。 电源电连接到开关的电输入。 开关的多个电输出中的相应一个电连接到多个磁控管阴极段中的相应一个。 电源产生一串电压脉冲，其从进料气体点燃等离子体。 电压脉冲串中的单个电压脉冲由开关以预定顺序路由到多个磁控管阴极段中的至少两个。

公开(公告)号：US06805779B2

公开(公告)日：2004-10-19

申请号：US10249202

申请日：2003-03-21

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C1400

CPC classification number: H01J37/32623 ,  H01J37/32321 ,  H01J37/3405

Abstract: The present invention relates to a plasma generator that generates a plasma with a multi-step ionization process. The plasma generator includes an excited atom source that generates excited atoms from ground state atoms supplied by a feed gas source. A plasma chamber confines a volume of excited atoms generated by the excited atom source. An energy source is coupled to the volume of excited atoms confined by the plasma chamber. The energy source raises an energy of excited atoms in the volume of excited atoms so that at least a portion of the excited atoms in the volume of excited atoms is ionized, thereby generating a plasma with a multi-step ionization process.

Abstract translation: 本发明涉及一种利用多步电离过程产生等离子体的等离子体发生器。 等离子体发生器包括激发的原子源，其从由原料气源供应的基态原子产生激发原子。 等离子体室限制由激发原子源产生的激发原子的体积。 能量源耦合到由等离子体室限制的激发原子的体积。 能量源激发激发原子的体积中的激发原子的能量，使得被激发原子的体积中的激发原子的至少一部分被离子化，从而通过多步电离过程产生等离子体。

公开(公告)号：US20180044780A1

公开(公告)日：2018-02-15

申请号：US15791110

申请日：2017-10-23

Applicant: Roman Chistyakov ,  Bassam Hanna Abraham

Inventor： Roman Chistyakov ,  Bassam Hanna Abraham

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34

CPC classification number: C23C14/3414 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/564 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.

公开(公告)号：US09771648B2

公开(公告)日：2017-09-26

申请号：US11735452

申请日：2007-04-14

Applicant: Roman Chistyakov ,  Bassam Hanna Abraham

Inventor： Roman Chistyakov ,  Bassam Hanna Abraham

IPC: C23C14/54 ,  C23C14/30 ,  C23C14/35 ,  H01J37/34 ,  C23C14/34

CPC classification number: C23C14/354 ,  C23C14/3414 ,  C23C14/3485 ,  C23C14/352 ,  H01J37/3408 ,  H01J37/3423 ,  H01J37/3444 ,  H01J37/3467 ,  H01J37/347

Abstract: A sputtering apparatus includes a chamber for containing a feed gas. An anode is positioned inside the chamber. A cathode assembly comprising target material is positioned adjacent to an anode inside the chamber. A magnet is positioned adjacent to cathode assembly. A platen that supports a substrate is positioned adjacent to the cathode assembly. An output of the power supply is electrically connected to the cathode assembly. The power supply generates a plurality of voltage pulse trains comprising at least a first and a second voltage pulse train. The first voltage pulse train generates a first discharge from the feed gas that causes sputtering of a first layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the first voltage pulse train. The second voltage pulse train generates a second discharge from the feed gas that causes sputtering of a second layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the second voltage pulse train.

公开(公告)号：US20150315698A1

公开(公告)日：2015-11-05

申请号：US14797968

申请日：2015-07-13

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C14/35

CPC classification number: C23C14/354 ,  H01J37/32082 ,  H01J37/32137 ,  H01J37/32165 ,  H01J37/32431 ,  H01J37/32623 ,  H01J37/3405 ,  H01J37/3408

Abstract: A high current density plasma generator includes a chamber that contains a feed gas. An anode is positioned in the chamber. A cathode assembly is position adjacent to the anode inside the chamber. A power supply having an output is electrically connected between the anode and the cathode assembly. The power supply generates at the output an oscillating voltage that produces a plasma from the feed gas. At least one of an amplitude, frequency, rise time, and fall time of the oscillatory voltage is chosen to increase an ionization rate of the feed gas.

Abstract translation: 高电流密度等离子体发生器包括含有进料气体的室。 阳极位于腔室中。 阴极组件位于室内阳极附近。 具有输出的电源电连接在阳极和阴极组件之间。 电源在输出端产生产生来自进料气体的等离子体的振荡电压。 选择振荡电压的幅度，频率，上升时间和下降时间中的至少一个以增加进料气体的电离速率。

公开(公告)号：US20110019332A1

公开(公告)日：2011-01-27

申请号：US12870388

申请日：2010-08-27

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: H01T23/00

CPC classification number: H01J37/3408 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3455

Abstract: Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply generates a multi-stage voltage pulse that includes a low-power stage with a first peak voltage having a magnitude and a rise time that is sufficient to generate a weakly-ionized plasma from the feed gas. The multi-stage voltage pulse also includes a transient stage with a second peak voltage having a magnitude and a rise time that is sufficient to shift an electron energy distribution in the weakly-ionized plasma to higher energies that increase an ionization rate which results in a rapid increase in electron density and a formation of a strongly-ionized plasma.

Abstract translation: 公开了用于产生强电离等离子体的方法和装置。 根据一个实施例的强电离等离子体发生器包括用于限制进料气体的室。 阳极和阴极组件位于室内。 脉冲电源电连接在阳极和阴极组件之间。 脉冲电源产生多级电压脉冲，其包括具有第一峰值电压的低功率级，其具有足以产生来自进料气体的弱离子化等离子体的大小和上升时间。 多级电压脉冲还包括具有第二峰值电压的瞬态级，其具有足以将弱离子化等离子体中的电子能量分布移位到增加电离速率的较高能量的幅度和上升时间，这导致电离率 电子密度的快速增加和强电离等离子体的形成。

公开(公告)号：US07808184B2

公开(公告)日：2010-10-05

申请号：US11465574

申请日：2006-08-18

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: H05B31/26

CPC classification number: H01J37/3408 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3455

Abstract: Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply generates a multi-stage voltage pulse that includes a low-power stage with a first peak voltage having a magnitude and a rise time that is sufficient to generate a weakly-ionized plasma from the feed gas. The multi-stage voltage pulse also includes a transient stage with a second peak voltage having a magnitude and a rise time that is sufficient to shift an electron energy distribution in the weakly-ionized plasma to higher energies that increase an ionization rate which results in a rapid increase in electron density and a formation of a strongly-ionized plasma.

Abstract translation: 公开了用于产生强电离等离子体的方法和装置。 根据一个实施例的强电离等离子体发生器包括用于限制进料气体的室。 阳极和阴极组件位于室内。 脉冲电源电连接在阳极和阴极组件之间。 脉冲电源产生多级电压脉冲，其包括具有第一峰值电压的低功率级，其具有足以产生来自进料气体的弱离子化等离子体的大小和上升时间。 多级电压脉冲还包括具有第二峰值电压的瞬态级，其具有足以将弱离子化等离子体中的电子能量分布移位到增加电离速率的较高能量的幅度和上升时间，这导致电离率 电子密度的快速增加和强电离等离子体的形成。

公开(公告)号：US20100101935A1

公开(公告)日：2010-04-29

申请号：US12651368

申请日：2009-12-31

Applicant: Roman Chistyakov ,  Bassam Hanna Abraham

Inventor： Roman Chistyakov ,  Bassam Hanna Abraham

IPC: H05H1/00

CPC classification number: H01J37/32045 ,  H01J37/32009 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply comprising solid state switches that are controlled by micropulses generated by drivers. At least one of a pulse width and a duty cycle of the micropulses is varied so that the power supply generates a multi-step voltage waveform at the output having a low-power stage including a peak voltage and a rise time that is sufficient to generate a plasma from the feed gas and a transient stage including a peak voltage and a rise time that is sufficient to generate a more strongly-ionized plasma.

Abstract translation: 强离子化等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 脉冲电源的输出电连接在阳极和阴极组件之间。 脉冲电源包括由驱动器产生的微脉冲控制的固态开关。 微脉冲的脉冲宽度和占空比中的至少一个被改变，使得电源在具有包括峰值电压和足够产生的峰值电压和上升时间的低功率级的输出端产生多级电压波形 来自进料气体的等离子体和包括足以产生更强电离等离子体的峰值电压和上升时间的瞬态级。

公开(公告)号：US20090032191A1

公开(公告)日：2009-02-05

申请号：US12245193

申请日：2008-10-03

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: H01L21/306 ,  C23C16/513 ,  C23C14/00

CPC classification number: H01J37/32009 ,  H01J37/32623 ,  H01J37/3266 ,  H01J37/34 ,  H01J37/3408

Abstract: The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.

Abstract translation: 等离子体源技术领域本发明涉及等离子体源。 等离子体源包括具有内部阴极部分和外部阴极部分的阴极组件。 阳极定位成与外阴极部分相邻以在其间形成间隙。 第一电源产生穿过阳极和外部阴极部分之间的间隙的第一电场。 第一电场将位于间隙中的一定体积的进料气体电离，从而产生初始等离子体。 第二电源产生靠近内部阴极部分的第二电场。 第二电场对初始等离子体进行超电离以产生包含比初始等离子体更高密度的离子的等离子体。

公开(公告)号：US20070181417A1

公开(公告)日：2007-08-09

申请号：US11735452

申请日：2007-04-14

Applicant: Roman Chistyakov ,  Bassam Abraham

Inventor： Roman Chistyakov ,  Bassam Abraham

IPC: C23C14/32 ,  C23C14/00

CPC classification number: C23C14/354 ,  C23C14/3414 ,  C23C14/3485 ,  C23C14/352 ,  H01J37/3408 ,  H01J37/3423 ,  H01J37/3444 ,  H01J37/3467 ,  H01J37/347

Abstract: A sputtering apparatus includes a chamber for containing a feed gas. An anode is positioned inside the chamber. A cathode assembly comprising target material is positioned adjacent to an anode inside the chamber. A magnet is positioned adjacent to cathode assembly. A platen that supports a substrate is positioned adjacent to the cathode assembly. An output of the power supply is electrically connected to the cathode assembly. The power supply generates a plurality of voltage pulse trains comprising at least a first and a second voltage pulse train. The first voltage pulse train generates a first discharge from the feed gas that causes sputtering of a first layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the first voltage pulse train. The second voltage pulse train generates a second discharge from the feed gas that causes sputtering of a second layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the second voltage pulse train.

Abstract translation: 溅射装置包括用于容纳进料气体的室。 阳极位于室内。 包括目标材料的阴极组件邻近室内的阳极定位。 磁体定位成与阴极组件相邻。 支撑基板的压板位于与阴极组件相邻的位置。 电源的输出电连接到阴极组件。 电源产生包括至少第一和第二电压脉冲串的多个电压脉冲串。 第一电压脉冲串从进料气体产生第一次放电，该第一次放电导致第一层靶材料的溅射，该第一层靶材料的性质由峰值振幅，上升时间和第一电压中的脉冲持续时间 脉冲列车 第二电压脉冲串从进料气体产生第二次放电，其引起第二层靶材料的溅射，该第二层靶材料的性质由峰值振幅，上升时间和第二电压中的脉冲持续时间中的至少一个确定 脉冲列车