公开(公告)号：US06831258B2

公开(公告)日：2004-12-14

申请号：US10611345

申请日：2003-06-30

申请人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

发明人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

IPC分类号： H05B102

CPC分类号： H01L21/67115 ,  G03F7/168 ,  G03F7/38

摘要： A heating apparatus for performing heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to detect intensity of reflected light from the resist on the wafer, and a control section for controlling heating performed by the heating plate on the basis of the detected intensity of reflected light so that heating amount applied to a plurality of wafers becomes constant. Accordingly, the heating amount of the wafer can be controlled to be constant and variations in dimension of resist patterns can be reduced.

摘要翻译： 用于在曝光前后施加抗蚀剂的晶片上进行热处理的加热装置包括用于加热放置在加热板上的晶片的加热板，用于在晶片上照射光以检测反射的强度的光强度检测装置 来自晶片上的抗蚀剂的光，以及控制部分，用于根据检测到的反射光强度控制由加热板进行的加热，使得施加到多个晶片的加热量变得恒定。 因此，可以将晶片的加热量控制为恒定，并且可以减小抗蚀剂图案的尺寸变化。

公开(公告)号：US5728494A

公开(公告)日：1998-03-17

申请号：US730017

申请日：1996-10-11

申请人： Kenji Kawano ,  Shinichi Ito ,  Iwao Higashikawa ,  Masamitsu Itoh ,  Takashi Kamo ,  Hiroaki Hazama ,  Takayuki Iwamatsu

发明人： Kenji Kawano ,  Shinichi Ito ,  Iwao Higashikawa ,  Masamitsu Itoh ,  Takashi Kamo ,  Hiroaki Hazama ,  Takayuki Iwamatsu

IPC分类号： G03F1/32 ,  G03F1/68 ,  G03F9/00

CPC分类号： G03F1/32 ,  G03F1/68

摘要： This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film. In addition, this invention provides a method of manufacturing an exposure mask, including the steps of forming a translucent film on a light-transmitting substrate, forming a photosensitive resin film on the translucent film, forming a photosensitive resin pattern by exposing the photosensitive resin film to a radiation or a charged particle beam, removing an exposed portion of the translucent film by using the photosensitive resin pattern as a mask, removing the photosensitive resin pattern, and forming a stabilized region in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film before the step of forming the photo-sensitive resin film or after the step of forming the photosensitive resin pattern. Also, this invention provides an apparatus for manufacturing an exposure mask.

摘要翻译： 本发明提供一种曝光掩模，其包括形成在透光基板上并具有掩模图案的半透明膜，以及形成在透光基板和半透膜之间的边界中的至少半透明的表面的稳定区域 膜以防止半透明膜的物理性质的变化。 此外，本发明提供一种制造曝光掩模的方法，包括以下步骤：在透光性基板上形成半透膜，在半透膜上形成感光性树脂膜，通过使感光性树脂膜曝光，形成感光性树脂图案 通过使用感光性树脂图案作为掩模去除透光性膜的露出部分，除去感光性树脂图案，在透光性基板与透光性的界面之间形成稳定区域 或在形成感光树脂膜的步骤之前或在形成感光性树脂图案的步骤之后，至少在半透明膜的表面上。 此外，本发明提供了一种用于制造曝光掩模的装置。

公开(公告)号：US07727853B2

公开(公告)日：2010-06-01

申请号：US12216228

申请日：2008-07-01

申请人： Tomoyuki Takeishi ,  Kenji Kawano ,  Hiroshi Ikegami ,  Shinichi Ito ,  Riichiro Takahashi

发明人： Tomoyuki Takeishi ,  Kenji Kawano ,  Hiroshi Ikegami ,  Shinichi Ito ,  Riichiro Takahashi

IPC分类号： H01L21/76

CPC分类号： H01L23/544 ,  B23K26/066 ,  B23K26/364 ,  B23K26/40 ,  B23K2103/172 ,  G03F7/2026 ,  G03F7/70341 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084 ,  G21K5/10 ,  H01J2237/30438 ,  H01L2223/54453 ,  H01L2924/0002 ,  Y10S438/949 ,  H01L2924/00

摘要： A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

摘要翻译： 一种处理方法，用于在形成在基板上的膜中选择性地减少或去除待曝光的区域，该方法包括相对地扫描基板上的形状比整个第一区域要暴露的整个第一区域的第一曝光灯 区域，以选择性地去除或减少要暴露的第一区域，并且用第二曝光光将待暴露的整个第一区域暴露在整个第一区域内的整个第二区域，以选择性地暴露待暴露的整个第二区域。

公开(公告)号：US20080064226A1

公开(公告)日：2008-03-13

申请号：US11976499

申请日：2007-10-25

申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara

发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara

IPC分类号： H01L21/31

CPC分类号： H01L21/67115 ,  G03F7/0042 ,  G03F7/0392 ,  G03F7/38 ,  H01L21/0273 ,  H01L21/67109

摘要： A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment being carried out in a manner of relatively moving a heating section for heating the chemically amplified resist film and the substrate forming a gas stream flowing reverse to the relatively moving direction of the heating section between the lower surface of the heating section and the chemically amplified resist film.

摘要翻译： 一种处理衬底的方法，包括在衬底上形成化学放大抗蚀剂膜，将能量束照射到化学放大抗蚀剂膜上以在其中形成潜像，对化学放大抗蚀剂膜进行热处理，加热处理为 以相对移动用于加热化学放大抗蚀剂膜的加热部分和形成在加热部分的下表面和化学放大抗蚀剂膜之间形成与加热部分的相对移动方向相反的方向流动的气流的加热部分的方式进行 。

公开(公告)号：US07005249B2

公开(公告)日：2006-02-28

申请号：US11030064

申请日：2005-01-07

申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

IPC分类号： G03C5/00

CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/08 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/38 ,  G03F7/70358 ,  G03F7/70558 ,  H01L21/67109 ,  H01L21/67115

摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

公开(公告)号：US07005238B2

公开(公告)日：2006-02-28

申请号：US11030135

申请日：2005-01-07

申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

IPC分类号： G03C5/00

CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/08 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/38 ,  G03F7/70358 ,  G03F7/70558 ,  H01L21/67109 ,  H01L21/67115

摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

公开(公告)号：US06603101B2

公开(公告)日：2003-08-05

申请号：US10189480

申请日：2002-07-08

申请人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

发明人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

IPC分类号： H05B102

CPC分类号： H01L21/67115 ,  G03F7/168 ,  G03F7/38

摘要： A heating apparatus for performing heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to detect intensity of reflected light from the resist on the wafer, and a control section for controlling heating performed by the heating plate on the basis of the detected intensity of reflected light so that heating amount applied to a plurality of wafers becomes constant. Accordingly, the heating amount of the wafer can be controlled to be constant and variations in dimension of resist patterns can be reduced.

公开(公告)号：US08813346B2

公开(公告)日：2014-08-26

申请号：US13092381

申请日：2011-04-22

申请人： Hideki Ogawa ,  Atsushi Tanada ,  Hitoshi Matsuura ,  Kiyoshi Tanaka ,  Hiroshi Kishi ,  Kenji Kawano

发明人： Hideki Ogawa ,  Atsushi Tanada ,  Hitoshi Matsuura ,  Kiyoshi Tanaka ,  Hiroshi Kishi ,  Kenji Kawano

IPC分类号： H01F7/06 ,  H01F1/22 ,  H01F41/02 ,  H01F1/12 ,  H01F1/24 ,  H01F1/26 ,  H01F5/02 ,  H01F5/06 ,  H01F41/06 ,  H01F41/10 ,  H01F41/12

CPC分类号： H01F1/22 ,  B22F2998/00 ,  C22C1/02 ,  C22C2202/02 ,  H01F1/12 ,  H01F1/14766 ,  H01F1/24 ,  H01F1/26 ,  H01F1/33 ,  H01F5/02 ,  H01F5/06 ,  H01F41/02 ,  H01F41/0246 ,  H01F41/098 ,  H01F41/10 ,  H01F41/125 ,  Y10T29/4902 ,  Y10T29/49069 ,  Y10T29/49071 ,  Y10T29/49073 ,  Y10T29/49144 ,  C22C33/0278

摘要： A coil-type electronic component has a coil inside or on the surface of its base material and is characterized in that: the base material is constituted by a group of grains of a soft magnetic alloy containing iron, silicon and other element that oxidizes more easily than iron; the surface of each soft magnetic alloy grain has an oxide layer formed on its surface as a result of oxidization of the grain; this oxide layer contains the other element that oxidizes more easily than iron by a quantity larger than that in the soft magnetic alloy grain; and grains are bonded with one another via this oxide layer.

摘要翻译： 线圈型电子部件在其基材的内侧或表面上具有线圈，其特征在于，所述基材由包含铁，硅等元素的软磁性合金的晶粒组构成，能够更容易地氧化 比铁 每个软磁合金颗粒的表面由于晶粒的氧化而在其表面上形成氧化层; 该氧化物层含有比铁更容易氧化的量比软磁性合金粒子大的量的另一种元素; 并且晶粒经由该氧化物层彼此结合。

公开(公告)号：US08064189B2

公开(公告)日：2011-11-22

申请号：US12139444

申请日：2008-06-13

申请人： Hidetoshi Masuda ,  Kenji Kawano

发明人： Hidetoshi Masuda ,  Kenji Kawano

IPC分类号： H01G4/005 ,  H01G4/236 ,  H01G4/228

CPC分类号： H01G4/005

摘要： A capacitor includes a dielectric material that is formed of anodic metal oxide; a pair of substantially comb-shaped surface electrodes formed on the same principal surface of the dielectric material; and plural substantially columnar internal electrodes whose one ends are connected to the respective comb-shaped portions of the pair of the surface electrodes and whose other ends extend in the thickness direction of the dielectric material.

摘要翻译： 电容器包括由阳极金属氧化物形成的电介质材料; 形成在电介质材料的同一主表面上的一对大致梳状的表面电极; 以及多个基本上柱状的内部电极，其一端连接到一对表面电极的各个梳状部分，并且其另一端在电介质材料的厚度方向上延伸。

公开(公告)号：US20100060142A1

公开(公告)日：2010-03-11

申请号：US12593666

申请日：2008-03-31

申请人： Norihiro Itou ,  Takeyuki Yamaki ,  Nobuhiro Ide ,  Kenji Kawano

发明人： Norihiro Itou ,  Takeyuki Yamaki ,  Nobuhiro Ide ,  Kenji Kawano

IPC分类号： H01J1/64 ,  B32B7/02

CPC分类号： H01L51/5268 ,  B82Y20/00 ,  B82Y30/00 ,  H01L2251/5369 ,  Y10T428/24942

摘要： In a plane emission device comprising a transparent substrate (1), a light scattering layer (2) formed on a surface of the transparent substrate (1), and a luminescent body (3) of organic or inorganic which is formed on a surface of the light scattering layer and emits light by light or electric energy, efficiency to takeout light to outside is improved. The light scattering layer (2) contains binder (4) and two kinds of fillers (5, 6), and when a refraction index of the binder (4) is assumed as Nb, a refraction index of one of the two kinds of fillers (5, 6) is assumed as Nf1, and a refraction index of the other is assumed as Nf2, a relationship that Nf2>Nb>Nf1 is satisfied. Since the light scattering layer (2) contains two kinds of fillers (5, 6), disorder occurs in critical angle when light exits from the light scattering layer (2) to the transparent substrate (1), incidence rate of light into the transparent substrate (1) rises, and efficiency to takeout the light to outside increases.

摘要翻译： 在包括透明基板（1）的平面发射装置中，形成在透明基板（1）的表面上的光散射层（2）和有机或无机的发光体（3）形成在 光散射层通过光或电能发光，提高了对外部的取出光的效率。 光散射层（2）含有粘合剂（4）和两种填料（5,6），当粘合剂（4）的折射率为Nb时，两种填料之一的折射率 （5,6）被假定为Nf1，将另一方的折射率设为Nf2，满足Nf2> Nb> Nf1的关系。 由于光散射层（2）含有两种填料（5,6），当光从光散射层（2）射出到透明基板（1）时，临界角发生紊乱，入射到透明层 衬底（1）上升，并且将光取出到外部的效率增加。