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45 条记录 (耗时 0.024 秒)

    Plasma-assisted melting
    32.
    发明授权
    Plasma-assisted melting 失效
    等离子体辅助熔化

    公开(公告)号：US07189940B2

    公开(公告)日：2007-03-13

    申请号：US10449600

    申请日：2003-06-02

    申请人： Satyendra Kumar ,  Devendra Kumar

    发明人： Satyendra Kumar ,  Devendra Kumar

    IPC分类号： B23K10/00

    CPC分类号： C21B13/125 ,  C21C5/5205 ,  C22B4/005 ,  C22B4/08 ,  C22B9/226 ,  F27D7/06 ,  F27D99/0006 ,  F27D2099/0026 ,  H01J37/32009 ,  H01J37/32192 ,  H01J37/32366 ,  H01J2237/0206 ,  H01J2237/33 ,  H01J2237/336 ,  H01J2237/338 ,  H05B6/6402 ,  H05B6/78 ,  H05B6/784 ,  H05H1/46 ,  H05H2001/4607 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S588/90

    摘要： Apparatus and methods for plasma-assisted melting are provided. In one embodiment, a plasma-assisted melting method can include: (1) adding a solid to a melting region, (2) forming a plasma in a cavity by subjecting a gas to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, wherein the cavity has a wall, (3) sustaining the plasma in the cavity such that energy from the plasma passes through the wall into the melting region and melts the solid into a liquid, and (4) collecting the liquid. Solids that can be melted consistent with this invention can include metals, such as metal ore and scrap metal. Various plasma catalysts are also provided.

    摘要翻译： 提供了等离子体辅助熔化的装置和方法。 在一个实施方案中，等离子体辅助熔化方法可以包括：（1）向熔融区域添加固体，（2）通过使气体在频率小于约333GHz的电磁辐射下在空腔中形成等离子体 存在等离子体催化剂，其中空腔具有壁，（3）在空腔中维持等离子体，使得来自等离子体的能量通过壁进入熔融区域并将固体熔融成液体，以及（4）收集 液体。 可以熔融的与本发明一致的固体可以包括金属，例如金属矿和废金属。 还提供了各种等离子体催化剂。

    Forced convection furnance gas plenum
    33.
    发明授权
    Forced convection furnance gas plenum 失效
    强制对流炉气室

    公开(公告)号：US5814789A

    公开(公告)日：1998-09-29

    申请号：US685243

    申请日：1996-07-18

    申请人： Brian O'Leary ,  David S. Harvey ,  Francis C. Nutter ,  Martin I. Soderlund

    发明人： Brian O'Leary ,  David S. Harvey ,  Francis C. Nutter ,  Martin I. Soderlund

    IPC分类号： F27B9/10 ,  F27B17/00 ,  F27D7/04 ,  H05K3/34

    CPC分类号： F27D7/04 ,  F27B17/0083 ,  F27B9/10 ,  F27D2007/045

    摘要： A forced convection furnace gas plenum having a mixing chamber to provide a heated gas of a more uniform temperature is presented. The plenum includes a heating element for heating gas and an orifice plate for metering the flow of heated gas to product within the furnace. A heater plate having larger apertures than those of the orifice plate is disposed between the heating element and the orifice plate. The apertures in the heater plate are sized to allow heated gas to pass therethrough into the mixing chamber, located between the heater plate and the orifice plate, with minimal pressure loss. The heated gas mixes in the mixing chamber, causing the temperature to become more uniform before the gas exits through the orifice plate to impinge on the product.

    摘要翻译： 提出了一种具有混合室以提供更均匀温度的加热气体的强制对流炉气室。 气室包括用于加热气体的加热元件和用于计量加热气体流到炉内产品的孔板。 在加热元件和孔板之间设置有具有比孔板的孔大的孔的加热器板。 加热器板中的孔的尺寸设计成允许加热的气体通过其进入位于加热器板和孔板之间的混合室中，同时具有最小的压力损失。 加热的气体在混合室中混合，导致温度变得更均匀，然后气体通过孔板离开以撞击产品。

    Furnace chamber having eductor to enhance thermal processing
    34.
    发明授权
    Furnace chamber having eductor to enhance thermal processing 失效
    具有喷射器的炉室具有增强热处理能力

    公开(公告)号：US5795146A

    公开(公告)日：1998-08-18

    申请号：US653709

    申请日：1996-05-23

    申请人： Gary A. Orbeck

    发明人： Gary A. Orbeck

    IPC分类号： F27B17/00 ,  F27B3/22

    CPC分类号： F27B17/0083

    摘要： A furnace for thermally processing product includes one or more eductors. The eductor provides for increased circulation of atmosphere within the furnace for heat transfer or outgassing purposes. The eductor may be used to introduce clean gas to a product which outgasses volatiles to enhance the outgassing process by lowering the partial pressure of the volatile across the product as it is being heated. The eductor is also used to enhance heating or cooling of a product. Additionally, the eductor may be used to reduce or eliminate air stagnation areas within the furnace. The eductor may be located entirely within the furnace to recirculate the atmosphere of the furnace. Alternatively, the eductor may be located outside the furnace housing such that the eductor entrains gas from ports attached to the furnace and then reintroduces the gas into the furnace after the gas is cleaned, heated or cooled.

    摘要翻译： 热处理产品的炉子包括一个或多个喷射器。 喷射器提供炉内气氛的增加循环，用于传热或除气目的。 可以使用喷射器将清洁气体引入到产品中，该产品通过在产品被加热时降低挥发物的分压，从而排出挥发物以增强除气过程。 喷射器也用于增强产品的加热或冷却。 此外，喷射器可用于减少或消除炉内的空气滞留区域。 喷射器可以完全位于炉内以使炉的气氛再循环。 或者，喷射器可以位于炉壳体外部，使得喷射器夹带附着到炉子的端口的气体，然后在气体被清洁，加热或冷却之后将气体重新引入炉中。

    Furnace system having hybrid microwave and radiant heating
    35.
    发明授权
    Furnace system having hybrid microwave and radiant heating 有权
    具有混合微波和辐射加热的炉系统

    公开(公告)号：US09504098B2

    公开(公告)日：2016-11-22

    申请号：US14047172

    申请日：2013-10-07

    申请人： BTU International, Inc.

    发明人： Ramesh D. Peelamedu

    IPC分类号： H05B6/64 ,  H05B6/78

    CPC分类号： H05B6/6482 ,  H05B6/645 ,  H05B6/6491 ,  H05B6/76 ,  H05B6/78

    摘要： A furnace system for thermal processing of products and materials is disclosed which is particularly useful in processing touch screens for computer tablets and silicon wafers employed in fabricating solar cells. The system employs a hybrid of microwave and radiant heating of workpieces to provide controlled heating of the workpieces. A plurality of susceptors are disposed a furnace chamber. A plurality of microwave sources are arranged to provide microwave radiation in the chamber to uniformly heat workpieces in the chamber and to provide uniform heating of the susceptors. The susceptors are effective upon microwave heating by the microwave sources to provide uniform radiant heating of the workpieces in the chamber.

    摘要翻译： 公开了用于产品和材料的热处理的炉系统，其特别可用于处理用于制造太阳能电池的计算机片和硅晶片的触摸屏。 该系统采用微波和辐射加热工件的混合物来提供工件的受控加热。 多个基座设置有炉室。 多个微波源布置成在腔室中提供微波辐射以均匀地加热腔室中的工件并且提供感受器的均匀加热。 感应器通过微波源对微波加热有效，以提供室内工件的均匀辐射加热。

    Plasma-assisted enhanced coating
    38.
    发明授权
    Plasma-assisted enhanced coating 失效
    等离子体辅助增强涂层

    公开(公告)号：US07498066B2

    公开(公告)日：2009-03-03

    申请号：US10513393

    申请日：2003-05-07

    申请人： Devendra Kumar ,  Satyendra Kumar

    发明人： Devendra Kumar ,  Satyendra Kumar

    IPC分类号： H05H1/46

    CPC分类号： B05B7/226 ,  B05B7/22 ,  B05D1/62 ,  C23C14/04 ,  C23C14/32 ,  C23C16/04 ,  C23C16/50 ,  H05H1/46 ,  H05H2001/4607

    摘要： Methods and apparatus are provided for igniting, modulating, and sustaining a plasma (615) for coating objects (250). In one embodiment, a method of coating a surface of an object (250) includes forming a plasma (615) in a cavity (230) by subjecting a gas to electromagnetic radiation in the presence of a plasma catalyst (240) and adding at least one coating material (510) to the plasma (615) by energizing the material (510) with, for example, a laser (500). The material (510) is allowed to deposit on the surface of the object (250) to form a coating. Various types of plasma (240) catalysts are also provided.

    摘要翻译： 提供了用于点燃，调节和维持用于涂覆物体的等离子体（615）（250）的方法和装置。 在一个实施例中，涂覆物体（250）的表面的方法包括通过在等离子体催化剂（240）的存在下对气体进行电磁辐射而形成等离子体（615），并且至少加入 通过用例如激光（500）激发材料（510）将一个涂层材料（510）提供到等离子体（615）。 允许材料（510）沉积在物体（250）的表面上以形成涂层。 还提供了各种类型的等离子体（240）催化剂。