OSTOMY APPLIANCE WAFER HAVING AN ABSORBENT LAYER LOCATED BETWEEN A FIRST ADHESIVE AND A SECOND ADHESIVE
    36.
    发明申请
    OSTOMY APPLIANCE WAFER HAVING AN ABSORBENT LAYER LOCATED BETWEEN A FIRST ADHESIVE AND A SECOND ADHESIVE 有权
    具有位于第一粘合剂和第二粘合剂之间的吸收层的异物电极

    公开(公告)号:US20160158057A1

    公开(公告)日:2016-06-09

    申请号:US15042154

    申请日:2016-02-12

    申请人: Coloplast A/S

    IPC分类号: A61F5/443 A61L24/06 A61L24/04

    摘要: An ostomy appliance wafer is provided with a stoma-receiving hole formed through the wafer. The wafer includes a backing layer, and an absorbent layer located between a first adhesive and a second adhesive. The first adhesive is disposed over the backing layer to define a peripheral edge area, a central area surrounding the hole, and an intermediate area of the wafer that is located between the peripheral edge area and the central area. The absorbent layer is disposed on the first adhesive either in A) the central area of the wafer, B) the intermediate area of the wafer, or C) the central area and the intermediate area of the wafer. The second adhesive is disposed over both a portion of an outer edge area of the absorbent layer and a portion of the first adhesive peripheral to the outer edge area of the absorbent layer.

    摘要翻译: 造口器具晶片设置有穿过晶片形成的造口容纳孔。 晶片包括背衬层和位于第一粘合剂和第二粘合剂之间的吸收层。 第一粘合剂设置在背衬层上以限定周边边缘区域,围绕孔的中心区域和位于周边边缘区域和中心区域之间的晶片的中间区域。 在A)晶片的中心区域,B)晶片的中间区域,或C)晶片的中心区域和中间区域中,吸收层设置在第一粘合剂上。 第二粘合剂设置在吸收层的外边缘区域的一部分和吸收层的外边缘区域周围的第一粘合剂的一部分上。