-
公开(公告)号：US20150239001A1
公开(公告)日：2015-08-27
申请号：US14186002
申请日：2014-02-21
Applicant: TSMC Solar Ltd.
Inventor： Pei-Chen TSAI
CPC classification number: B05C11/1002 , B05C3/005 , B05C3/02 , H01L31/1828 , Y02E10/50 , Y02E10/543 , Y02P70/521
Abstract: An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof.
Abstract translation: 一种用于化学浴沉积的设备包括限定化学罐，循环管和设置在化学罐内部的至少一个流量调节装置的壳体。 化学罐在顶表面上具有开口，并且构造成在化学罐内容纳和保持至少一个基底。 所述循环管具有至少一部分在所述化学罐内部，并且构造成向所述化学罐供应至少一种化学品。 至少一个流动调节装置包括涡轮机，扩散器和起泡器中的任何一个或其组合。
-
32.发明申请公开(公告)号：US20150210822A1
公开(公告)日：2015-07-30
申请号：US14665474
申请日：2015-03-23
Applicant: VOXELJET AG
Inventor： Ingo Ederer , Daniel Gunther , Johannes Franz Gunther
IPC: C08J9/40
CPC classification number: C08J9/405 , B05C3/005 , B05C3/02 , B05C5/0283 , B29C64/00 , B29C71/0009 , B33Y10/00 , B33Y40/00 , B33Y70/00 , B33Y80/00 , C08J7/02 , C08J7/18 , C08J2351/00
Abstract: The instant invention relates to a method for changing characteristics of a plastic component, wherein a medium is introduced into the plastic component, which encompasses a porosity and wherein the medium forms a homogenous compound with the plastic component by at least partially dissolving the plastic component.
Abstract translation: 本发明涉及一种用于改变塑料部件特性的方法，其中将介质引入到塑料部件中，其包含孔隙率，并且其中介质通过至少部分地溶解塑料部件而与塑料部件形成均匀的化合物。
-
公开(公告)号：US20150000595A1
公开(公告)日：2015-01-01
申请号：US14485221
申请日：2014-09-12
Applicant: PARTICLE MEASURING SYSTEMS INC.
Inventor： Boris Zachar GORBUNOV , Harald Wilhelm Julius GNEWUCH
CPC classification number: B05C3/005 , B01D5/0027 , B05C3/02 , G01N15/02 , G01N15/065 , G01N33/0011 , G01N2015/0046 , Y10T137/6416 , Y10T137/8593
Abstract: The invention provides an apparatus for increasing the size of gas-entrained particles in order to render the gas-entrained particles detectable by a particle detector, the apparatus comprising an evaporation chamber (2) and a condenser (7); the apparatus is configured so that vapour-laden gas from the evaporation chamber can flow into the condenser and condensation of the vaporisable substance onto gas-entrained particles in the condenser takes place to increase the size of the particles so that they are capable of being detected by a particle detector.
Abstract translation: 本发明提供了一种用于增加气体夹带颗粒的尺寸的装置，以使由气体夹带的颗粒可被颗粒检测器检测到，该装置包括蒸发室（2）和冷凝器（7）; 该装置构造成使得来自蒸发室的含气体气体可以流入冷凝器，并且可冷凝物中的可蒸发物质与气体夹带的颗粒的冷凝发生，以增加颗粒的尺寸，使得它们能够被检测 通过粒子检测器。
-
34.发明申请公开(公告)号：US20140065307A1
公开(公告)日：2014-03-06
申请号：US13966103
申请日：2013-08-13
Applicant: Synos Technology, Inc.
Inventor： Sang In Lee
CPC classification number: B05C3/005 , B05D1/40 , C23C16/45551 , C23C16/4557 , C23C16/45572 , C23C16/463
Abstract: Cooling a heated substrate undergoing a deposition process (e.g., ALD, MLD or CVD) and a deposition reactor for performing the deposition process by routing a cooled purge gas through a path in the deposition reactor and then injecting the cooled purge gas onto the substrate. The deposition reactor may include a heater to heat precursor. As the precursor passes the heater, the precursor is heated to a temperature conducive to the deposition process. As a result of operating the heater and routing the heated precursor, the temperature of the substrate and the deposition reactor may be increased. To drop the temperature of the substrate and the deposition reactor, a purge gas cooled to a temperature lower than the heated precursor is injected onto the substrate via the deposition reactor
Abstract translation: 冷却经历沉积工艺（例如ALD，MLD或CVD）的加热衬底和沉积反应器，用于通过将冷却的吹扫气体穿过沉积反应器中的路径，然后将冷却的吹扫气体注入到衬底上来执行沉积工艺。 沉积反应器可以包括加热器以加热前体。 当前体通过加热器时，将前体加热到有利于沉积过程的温度。 作为操作加热器并布置加热的前体的结果，可以增加基板和沉积反应器的温度。 为了降低基板和沉积反应器的温度，将冷却到低于被加热前体的温度的吹扫气体经由沉积反应器
-
公开(公告)号：US20140037846A1
公开(公告)日：2014-02-06
申请号：US13943523
申请日：2013-07-16
Applicant: Synos Technology, Inc.
Inventor： Sang In Lee , Il Song Lee
CPC classification number: B05C3/005 , B05D1/00 , C23C16/45551 , C23C16/4557
Abstract: Heating of precursor before exposing the substrate to the precursor for depositing material on the substrate using a deposition method (e.g., ALD, MLD or CVD). A reactor for injecting precursor onto the substrate includes a heater placed in a path between a channel connected to a source of the precursor and a reaction chamber of the reactor. As the precursor passes the heater, the precursor is heated to a temperature conducive to the deposition process. Alternatively or in addition to the heater, the reactor may inject a heated gas that mixes with the precursor to increase the temperature of the precursor before exposing the substrate to the precursor.
Abstract translation: 在使用沉积方法（例如，ALD，MLD或CVD）将衬底暴露于前体以在衬底上沉积材料之前加热前体。 用于将前体注入到基底上的反应器包括放置在连接到前体源的通道和反应器的反应室之间的路径中的加热器。 当前体通过加热器时，将前体加热到有利于沉积过程的温度。 或者或加热器之外，反应器可以注入与前体混合的加热气体，以在将衬底暴露于前体之前增加前体的温度。
-
Patent Agency Ranking
公开(公告)号：US20130312661A1
公开(公告)日：2013-11-28
申请号：US13550320
申请日：2012-07-16
Applicant: YU-CHIU SHIH , HSIU-PO LIU
Inventor： YU-CHIU SHIH , HSIU-PO LIU
IPC: C03C17/00
CPC classification number: C03C17/001 , B05C3/005 , B05C3/109 , B05C9/04 , B05C9/08 , B05D1/18 , B05D1/34 , B05D2203/35 , B05D2252/10 , C03C17/002
Abstract: A barrier type deposition apparatus has a barrier in a closed chamber of a base to separate the chamber into two depositing rooms. The deposition apparatus may deposits a thin film on a side of a glass substrate, which is a part of the deposition apparatus. While the barrier is another glass substrate, it may deposit two different thin films respectively on opposite sides of the glass substrate in the same time.
Abstract translation: 屏障型沉积装置在基座的封闭室中具有隔离物，以将室分离成两个存放室。 沉积设备可以在作为沉积设备的一部分的玻璃基底的一侧上沉积薄膜。 虽然屏障是另一个玻璃基板，但它可以在同一时间分别在玻璃基板的相对两侧沉积两个不同的薄膜。
-
37.发明申请公开(公告)号：US20130145985A1
公开(公告)日：2013-06-13
申请号：US13372369
申请日：2012-02-13
Applicant: Kendall W. Prince , Gordon L. King , Roderick Hughes , Richard B. Flora
Inventor： Kendall W. Prince , Gordon L. King , Roderick Hughes , Richard B. Flora
IPC: B05C3/00
CPC classification number: B05C3/00 , B05C3/005 , B05C3/12 , B05C11/1042 , B05D1/265 , B28B3/2636 , B28B11/044 , B29C48/12 , B29C48/154
Abstract: A coating apparatus and method are disclosed that applies a coating to a product in a uniform and controlled manner. The coating apparatus comprises a feeding stage, an optional pre-treatment stage, at least one coating stage and a finishing stage. The coating stage(s) comprise a coating material feeder and a coating device. The coating device includes an aperture conforming to the perimeter of a substrate to be coated in a first and second dimension. As the substrate passes through the aperture, coating material is applied in a uniform and consistent layer. The coating material also back fills minor surface imperfections and blemishes on the substrate to achieve a consistent finish across the whole area where coating material is applied.
Abstract translation: 公开了以均匀和受控的方式将涂层施加到产品上的涂布装置和方法。 涂覆装置包括进料段，任选的预处理阶段，至少一个涂布阶段和整理阶段。 涂覆阶段包括涂料供料器和涂布装置。 涂覆装置包括与第一和第二尺寸要涂覆的基底的周边相一致的孔。 当基底通过孔时，涂层材料以均匀且一致的层施加。 涂层材料还填充了基材上的小的表面缺陷和瑕疵，以在涂覆材料的整个区域上实现一致的整理。
-
公开(公告)号：US08402910B2
公开(公告)日：2013-03-26
申请号：US12758037
申请日：2010-04-12
Applicant: Shao-Kai Pei
Inventor： Shao-Kai Pei
Abstract: A dip coating apparatus includes a housing and a workpiece holder movably and rotatably received in the housing. The housing includes an immersing portion configured for carrying out immersion process and a drying portion configured for carrying out drying process. The inner spaces of the immersing portion and the drying portion are communicated with each other. The lifting workpiece holder is configured for fixed workpieces thereon and moving and rotating relative to the immersing portion and the drying portion of the housing. The workpieces are driven by the lifting-rotating to carry out the immersion process and the drying process.
Abstract translation: 浸涂装置包括壳体和可移动和可旋转地容纳在壳体中的工件保持件。 壳体包括构造成用于进行浸渍处理的浸渍部分和构造成进行干燥处理的干燥部分。 浸渍部分和干燥部分的内部空间彼此连通。 提升工件保持器构造成用于其上的固定工件，并相对于壳体的浸渍部分和干燥部分移动和旋转。 工件由提升旋转驱动，进行浸渍处理和干燥处理。
-
公开(公告)号：US20090068372A1
公开(公告)日：2009-03-12
申请号：US11851709
申请日：2007-09-07
Applicant: Robert Irving
Inventor： Robert Irving
Abstract: An apparatus for applying a wax seal to an article such as a wine bottle including a bottom tank formed of at least one upstanding wall and a bottom wall and having an open top end, the bottom tank being fitted with electrical heating means; an upper tank formed of at least one upstanding wall and having an open top end and a closed bottom wall, the upper tank being fitted with electrical heating means, the upper tank being connected at its closed bottom wall with the open top end of said bottom tank, a screen adjustably located inside the upper tank, a pump located in the bottom tank and extending into the upper tank for conveying molten wax from the bottom tank to the upper tank and an overflow opening in the upper tank.
Abstract translation: 一种用于将蜡密封件施加到诸如酒瓶的物品的装置，包括由至少一个直立的壁和底壁形成的底部容器，并且具有敞开的顶端，底部容器装有电加热装置; 由至少一个直立的壁形成并具有敞开的顶端和封闭的底壁的上部箱体，上部箱体装配有电加热装置，上部箱体在其封闭的底部壁处与所述底部的敞开的顶端连接 罐，可调节地位于上罐内的屏幕，位于底箱中并延伸到上罐中的泵，用于将熔融的蜡从底罐输送到上罐，并且在上罐中具有溢流开口。
-
40.发明授权公开(公告)号：US06660086B1
公开(公告)日：2003-12-09
申请号：US09518870
申请日：2000-03-06
Applicant: Kendall W. Prince , Gordon L. King , Roderick Hughes , Richard B. Flora
Inventor： Kendall W. Prince , Gordon L. King , Roderick Hughes , Richard B. Flora
IPC: B05C1102
CPC classification number: B05C3/00 , B05C3/005 , B05C3/12 , B05C11/1042 , B05D1/265 , B28B3/2636 , B28B11/044 , B29C47/003 , B29C47/025
Abstract: A coating apparatus and method are disclosed that applies a coating to a product in a uniform and controlled manner. The coating apparatus comprises a feeding stage, an optional pre-treatment stage, at least one coating stage and a finishing stage. The coating stage(s) comprise a coating material feeder and a coating device. The coating device includes an aperture conforming to the perimeter of a substrate to be coated in a first and second dimension. As the substrate passes through the aperture, coating material is applied in a uniform and consistent layer ranging from 0.001″ to 0.250″. The coating material also back fills minor surface imperfections and blemishes on the substrate to achieve a consistent finish across the whole area where coating material is applied. The coating device includes first and second shell portions. The first shell portion has a concave surface surrounding the aperture portion. The concave surface allows for coating material to collect prior to deposition upon the surface of the substrate. The second shell has a substantially flat face and a mirror aperture that aligns with the aperture of the first shell. A groove is formed along the perimeter of the aperture to collect coating material for coating the object as it passes through the apertures of both shells.
Abstract translation: 公开了以均匀和受控的方式将涂层施加到产品上的涂布装置和方法。 涂覆装置包括进料段，任选的预处理阶段，至少一个涂布阶段和整理阶段。 涂覆阶段包括涂料供料器和涂布装置。 涂覆装置包括与第一和第二尺寸要涂覆的基底的周边相一致的孔。 当基底穿过孔时，涂层材料以0.001“至0.250”范围内均匀且一致的层施加。 涂层材料还填充了基材上的小的表面缺陷和瑕疵，以在涂覆材料的整个区域上实现一致的整理。 涂覆装置包括第一和第二壳部分。 第一外壳部分具有围绕孔部分的凹形表面。 凹形表面允许涂层材料在沉积之前收集在基底表面上。 第二壳体具有基本平坦的面和与第一壳体的孔对准的反射镜孔。 沿着孔的周边形成凹槽以收集用于在物体穿过两个孔的孔时涂覆物体的涂层材料。
-
-
-
-
-
-
-
-
-
Search Results
60
records
(took 0.018 seconds)
