摘要:
A cleaning composition for paint delivery systems includes 3-90% of an organic solvent which may comprise one or more aromatic hydrocarbons, aliphatic hydrocarbons and aliphatic esters. The composition also includes between 0.5 and 30% of a hydroxy carboxylic acid such as glycolic acid, as well as a coupling agent which may comprise one or more alcohols, glycols or glycol ethers.
摘要:
The defluxing agent for flux residue after soldering contains an acid (preferably an organic acid, and particularly an acid stronger than abietic acid; for example, acrylic acid, acetic acid, propionic acid, benzoic acid) and an organic solvent (for example, xylene, benzyl acetate, methyl .alpha.-hydroxyisobutyrate, cyclohexanone, methyl .beta.-methoxyisobutyrate), and if necessary it further contains a monohydric alcohol, a surfactant and a corrosion inhibitor. Rinsing is preferably performed after the cleaning, using a solvent which is miscible with the defluxing agent, in order to completely remove the acid. There is also disclosed a cleaning apparatus which may be generally used for this and other cleaning.
摘要:
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.
摘要:
A composition and method for the removal of ionic salt deposits from a surface using an organic solvent of low polarity and a complexing agent. The complexing agent is chosen from a group which includes podands, cryptands, and coronands. The method provides nearly complete removal of ionic salt deposits with a single washing of the surface with the low polar cleaning mixture.
摘要:
A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.
摘要:
The invention relates to methods and compositions for cleaning a wide range of soil types from dirty articles, such as metal, ceramic or glass substrates. A first class of solvent compositions used for cleaning is an oxidative stable mixture of non-polar aromatic hydrocarbons and an organic polar component for cleaning of low and intermediate polar soils. Alternately, water and surfactant is added to the mixture to form a water-in-oil emulsion for cleaning high polarity soils. A second class of solvent compositions used for cleaning dirty articles is a hydrogenated or dehydrogenated analogue of a terpene compound. The solvent composition is used in a process wherein a dirty article is contacted with the solvent under conditions that result in cleaning the soil type from the article. Residual solvent contamination is removed from the article surface by contacting the contaminated article at an elevated temperature with an aqueous medium and/or a low-boiling solvent. The solvent residue is then removed by evaporation.
摘要:
A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.
摘要:
Aggressive, water-soluble coating remover compositions are disclosed. The compositions contain .gamma.-butyrolactone, an organic acid, and water, and optionally include solvents, surfactants, thickeners, and rust inhibitors. The coating removers of the invention are uniquely effective in that they are both water rinsable and capable of removing highly crosslinked coatings.
摘要:
Solid detergent compositions according to the present invention include at least one alkali metal silicate, at least one polycarboxylic acid, at least one saccharide or sugar alcohol and water. Suitable saccharides include sucrose, fructose, inulin, maltose and lactulose, and may be present in the composition in a concentration of at least 0.5 wt %. Compositions according to certain embodiments form stable solid block detergent compositions that do not swell significantly even when subjected to elevated temperatures.
摘要:
Certain substituted phenolic compounds when used with or without 1,2-epoxides as the sole stabilizer components are very effective in stabilizing n-propyl bromide (NPB). In a standard commercially important 60° C. stability test, representative substituted phenolic compounds used pursuant to this invention, can enable NPB to pass the test even though present at levels of about 50 ppm (wt/wt) or less in NPB containing no other stabilizer additive component. In fact, amounts as low as 1 ppm have been found effective with various substituted phenolic compounds. In addition, it has been found that one of the preferred stabilizers of this invention—2,6-di-tert-butyl-p-cresol—even though higher boiling than NPB, left inconsequential amounts of residue at least throughout the range of 1 to 30 ppm (wt/wt). Also, it has been found that certain other preferred stabilizers of this invention can provide synergistically improved stability in passing the 60° C. stability test when used with at least one 1,2-epoxide, notably butylene oxide.