公开(公告)号：US6140286A

公开(公告)日：2000-10-31

申请号：US865125

申请日：1997-05-30

申请人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

发明人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

IPC分类号： B08B3/08 ,  B23K1/00 ,  B23K1/20 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  C11D7/60 ,  C11D11/00 ,  C23G5/02 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  C11D9/04 ,  C03C23/00 ,  C23G1/02

CPC分类号： C11D7/262 ,  B23K1/203 ,  C11D11/0047 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/266 ,  C11D7/3227 ,  C11D7/5022 ,  C11D7/5027 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  C11D7/24 ,  C11D7/265 ,  H05K2203/0257 ,  H05K2203/0783 ,  H05K2203/086 ,  H05K2203/1518

摘要： The defluxing agent for flux residue after soldering contains an acid (preferably an organic acid, and particularly an acid stronger than abietic acid; for example, acrylic acid, acetic acid, propionic acid, benzoic acid) and an organic solvent (for example, xylene, benzyl acetate, methyl .alpha.-hydroxyisobutyrate, cyclohexanone, methyl .beta.-methoxyisobutyrate), and if necessary it further contains a monohydric alcohol, a surfactant and a corrosion inhibitor. Rinsing is preferably performed after the cleaning, using a solvent which is miscible with the defluxing agent, in order to completely remove the acid. There is also disclosed a cleaning apparatus which may be generally used for this and other cleaning.

摘要翻译： 焊接后的助焊剂残渣的脱焊剂含有酸（优选为有机酸，特别是比松香酸强的酸），例如丙烯酸，乙酸，丙酸，苯甲酸）和有机溶剂（例如二甲苯 ，乙酸苄酯，α-羟基异丁酸甲酯，环己酮，β-甲氧基异丁酸甲酯），如果需要，它还含有一元醇，表面活性剂和缓蚀剂。 优选在使用与脱流剂混溶的溶剂进行清洗之后进行冲洗以完全除去酸。 还公开了一般可用于这种和其他清洁的清洁装置。

公开(公告)号：US06050479A

公开(公告)日：2000-04-18

申请号：US987134

申请日：1997-12-08

申请人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

发明人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

IPC分类号： B08B3/08 ,  B23K1/00 ,  B23K1/20 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  C11D7/60 ,  C11D11/00 ,  C23G5/02 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  B23K28/00 ,  B08B3/00 ,  C23G1/02

CPC分类号： C11D7/262 ,  B23K1/203 ,  C11D11/0047 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/266 ,  C11D7/3227 ,  C11D7/5022 ,  C11D7/5027 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  C11D7/24 ,  C11D7/265 ,  H05K2203/0257 ,  H05K2203/0783 ,  H05K2203/086 ,  H05K2203/1518

摘要： The defluxing agent for flux residue after soldering contains an acid (preferably an organic acid, and particularly an acid stronger than abietic acid; for example, acrylic acid, acetic acid, propionic acid, benzoic acid) and an organic solvent (for example, xylene, benzyl acetate, methyl .alpha.-hydroxyisobutyrate, cyclohexanone, methyl .beta.-methoxyisobutyrate), and if necessary it further contains a monohydric alcohol, a surfactant and a corrosion inhibitor. Rinsing is preferably performed after the cleaning, using a solvent which is miscible with the defluxing agent, in order to completely remove the acid. There is also disclosed a cleaning apparatus which may be generally used for this and other cleaning.

摘要翻译： 焊接后的助焊剂残渣的脱焊剂含有酸（优选为有机酸，特别是比松香酸强的酸），例如丙烯酸，乙酸，丙酸，苯甲酸）和有机溶剂（例如二甲苯 ，乙酸苄酯，α-羟基异丁酸甲酯，环己酮，β-甲氧基异丁酸甲酯），如果需要，它还含有一元醇，表面活性剂和缓蚀剂。 优选在使用与脱流剂混溶的溶剂进行清洗之后进行冲洗以完全除去酸。 还公开了一般可用于这种和其他清洁的清洁装置。

公开(公告)号：US5695571A

公开(公告)日：1997-12-09

申请号：US252174

申请日：1994-06-01

申请人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

发明人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

IPC分类号： B08B3/08 ,  B23K1/00 ,  B23K1/20 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  C11D7/60 ,  C11D11/00 ,  C23G5/02 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26

CPC分类号： C11D7/262 ,  B23K1/203 ,  C11D11/0047 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/266 ,  C11D7/3227 ,  C11D7/5022 ,  C11D7/5027 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  C11D7/24 ,  C11D7/265 ,  H05K2203/0257 ,  H05K2203/0783 ,  H05K2203/086 ,  H05K2203/1518

摘要： The defluxing agent for flux residue after soldering contains an acid (preferably an organic acid, and particularly an acid stronger than abietic acid; for example, acrylic acid, acetic acid, propionic acid, benzoic acid) and an organic solvent (for example, xylene, benzyl acetate, methyl .alpha.-hydroxyisobutyrate, cyclohexanone, methyl .beta.-methoxyisobutyrate), and if necessary it further contains a monohydric alcohol, a surfactant and a corrosion inhibitor. Rinsing is preferably performed after the cleaning, using a solvent which is miscible with the defluxing agent, in order to completely remove the acid. There is also disclosed a cleaning apparatus which may be generally used for this and other cleaning.

摘要翻译： 焊接后的焊剂残渣的脱焊剂含有酸（优选为有机酸，特别是比松香酸强的酸），例如丙烯酸，乙酸，丙酸，苯甲酸）和有机溶剂（例如二甲苯 ，乙酸苄酯，α-羟基异丁酸甲酯，环己酮，β-甲氧基异丁酸甲酯），如果需要，它还含有一元醇，表面活性剂和缓蚀剂。 优选在使用与脱流剂混溶的溶剂进行清洗之后进行冲洗以完全除去酸。 还公开了一般可用于这种和其他清洁的清洁装置。

公开(公告)号：US5633121A

公开(公告)日：1997-05-27

申请号：US662299

申请日：1996-06-12

申请人： Takahisa Namiki ,  Yasuo Yamagishi ,  Ei Yano

发明人： Takahisa Namiki ,  Yasuo Yamagishi ,  Ei Yano

IPC分类号： G01N21/88 ,  G01B11/06 ,  G01N21/956 ,  G01R31/28 ,  H05K3/00 ,  H05K3/06 ,  H05K3/18 ,  H05K3/38 ,  G03F7/00

CPC分类号： G01B11/0633 ,  G01R31/2805 ,  H05K3/0079 ,  H05K3/385 ,  H05K2203/0315 ,  H05K2203/0392 ,  H05K2203/1157 ,  H05K2203/162

摘要： The surface of a copper layer in a circuit board is irradiated with a beam, and the degree of progress of oxidation of the surface of the copper layer is determined by taking advantage of the resultant reflected beam (for example, an intensity or a hue of a reflected beam). Then, the step of coating a resist is carried out only when the thickness of the copper oxide film is not more than about 10 nm. Alternatively, the step of coating a resist may be carried out after removal or reduction of the oxide film or cladding of the oxide film with copper.The present invention enables occurrence of peeling of the resist or dive of plating to be prevented in the step of effecting selective etching or plating of a copper layer in a circuit board using a resist pattern as a mask.

摘要翻译： 用光束照射电路板中的铜层的表面，并且通过利用所得到的反射光束（例如，强度或色调的强度或色调来确定铜层的表面的氧化进程的程度） 反射光束）。 然后，只有当氧化铜膜的厚度不大于约10nm时，才进行涂覆抗蚀剂的步骤。 或者，涂布抗蚀剂的步骤可以在用铜去除或还原氧化膜或氧化膜的包层之后进行。 在使用抗蚀剂图案作为掩模的电路板中进行铜层的选择性蚀刻或镀覆的步骤中，本发明能够防止抗蚀剂的剥离或电镀的潜在的发生。

公开(公告)号：US5482174A

公开(公告)日：1996-01-09

申请号：US253559

申请日：1994-06-03

申请人： Takahisa Namiki ,  Yasuo Yamagishi ,  Ei Yano

发明人： Takahisa Namiki ,  Yasuo Yamagishi ,  Ei Yano

IPC分类号： C23G1/10 ,  C23G5/032 ,  H01L21/304 ,  H05K3/06 ,  H05K3/22 ,  H05K3/24 ,  H05K3/26 ,  B44C1/22 ,  C23F1/00

CPC分类号： H05K3/22 ,  C23G1/103 ,  H05K2203/0315 ,  H05K2203/0789 ,  H05K2203/1157 ,  H05K3/061

摘要： A method for removing copper oxide on a surface of a copper film is comprising the steps of treating the surface of the copper film with acid, neutralizing the surface of the copper film treated with acid, and washing the neutralized surface of the copper film.

摘要翻译： 一种在铜膜表面除去氧化铜的方法包括以下步骤：用酸处理铜膜表面，中和用酸处理的铜膜的表面，并洗涤铜膜的中和表面。

公开(公告)号：US06319810B1

公开(公告)日：2001-11-20

申请号：US08659356

申请日：1996-06-06

申请人： Masayuki Ochiai ,  Yasuo Yamagishi ,  Ichiro Yamaguchi ,  Masahiro Yoshikawa ,  Koki Otake ,  Masataka Mizukoshi ,  Yuuji Watanabe

发明人： Masayuki Ochiai ,  Yasuo Yamagishi ,  Ichiro Yamaguchi ,  Masahiro Yoshikawa ,  Koki Otake ,  Masataka Mizukoshi ,  Yuuji Watanabe

IPC分类号： H01L2144

CPC分类号： H01L24/12 ,  B23K3/0623 ,  H01L21/4853 ,  H01L21/6835 ,  H01L24/11 ,  H01L2224/11003 ,  H01L2224/1111 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/45124 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/10253 ,  H05K3/3463 ,  H05K3/3478 ,  H05K3/3484 ,  H05K3/3489 ,  H05K2201/10992 ,  H05K2203/0113 ,  H05K2203/016 ,  H05K2203/0278 ,  H05K2203/0338 ,  H05K2203/041 ,  H05K2203/043 ,  H05K2203/0557 ,  H05K2203/087 ,  H05K2203/1105 ,  H05K2203/1157 ,  H05K2203/1476 ,  H01L2924/00 ,  H01L2224/48

摘要： Method for forming solder bumps on a first member such as a semiconductor chip having electrode pads formed thereon. A flat plate having holes is prepared and the holes are filled with solder paste by squeezing. The flat plate is then overlapped with the first member with the flat plate above the first plate. The flat plate and the first member are heated to a temperature higher than the melting point of the solder alloy in the solder paste. Therefore, solder bumps having identical sizes and uniform structures can be obtained.

摘要翻译： 在诸如其上形成有电极焊盘的半导体芯片的第一部件上形成焊料凸块的方法。 准备具有孔的平板，并通过挤压填充焊膏。 然后平板与第一构件重叠，平板在第一板上。 平板和第一构件被加热到高于焊膏中的焊料合金的熔点的温度。 因此，可以获得具有相同尺寸和均匀结构的焊料凸块。

公开(公告)号：US06596094B2

公开(公告)日：2003-07-22

申请号：US09993615

申请日：2001-11-27

申请人： Masayuki Ochiai ,  Yasuo Yamagishi ,  Hiroki Uchida ,  Masayuki Kitajima ,  Masakazu Takesue ,  Tadaaki Shono

发明人： Masayuki Ochiai ,  Yasuo Yamagishi ,  Hiroki Uchida ,  Masayuki Kitajima ,  Masakazu Takesue ,  Tadaaki Shono

IPC分类号： B23K35363

CPC分类号： B23K35/025 ,  B23K35/0244 ,  B23K35/262 ,  H05K3/3463 ,  H05K3/3484 ,  H05K2201/0215 ,  H05K2201/0218 ,  H05K2201/10689 ,  H05K2203/0545 ,  Y10T428/12063 ,  Y10T428/12882

摘要： A solder paste, includes a flux, a solder alloy particle scattered or mixed in the flux and including Sn and Zn as composition elements, and a metal particle scattered or mixed in the flux and including an element in the IB group in the periodic table as a composition element.

公开(公告)号：US6025258A

公开(公告)日：2000-02-15

申请号：US516284

申请日：1995-08-17

申请人： Masayuki Ochiai ,  Hidefumi Ueda ,  Michio Sono ,  Ichiro Yamaguchi ,  Kazuhiko Mitobe ,  Koki Otake ,  Junichi Kasai ,  Nobuo Kamehara ,  Yasuo Yamagishi ,  Masataka Mizukoshi

发明人： Masayuki Ochiai ,  Hidefumi Ueda ,  Michio Sono ,  Ichiro Yamaguchi ,  Kazuhiko Mitobe ,  Koki Otake ,  Junichi Kasai ,  Nobuo Kamehara ,  Yasuo Yamagishi ,  Masataka Mizukoshi

IPC分类号： B23K3/06 ,  H01L21/48 ,  H01L21/60 ,  H01L21/68 ,  H05K3/34 ,  H01L21/283

CPC分类号： H01L24/742 ,  B23K3/0623 ,  H01L21/4853 ,  H01L21/6835 ,  H01L24/11 ,  H05K3/3484 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2224/0558 ,  H01L2224/11002 ,  H01L2224/11003 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/16 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/0103 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01051 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/15787 ,  H05K2201/10992 ,  H05K2203/0113 ,  H05K2203/016 ,  H05K2203/0278 ,  H05K2203/0338 ,  H05K2203/041 ,  H05K2203/043 ,  H05K2203/0557 ,  H05K2203/087 ,  H05K2203/1105 ,  H05K2203/1157 ,  H05K2203/1476 ,  H05K3/3463 ,  H05K3/3489

摘要： A method for fabricating solder bumps onto a semiconductor chip. A solder ball forming member having a flat surface and a plurality of cavities arranged on the flat surface in a predetermined pattern is prepared. The cavities are then filled with a solder paste, and the solder ball forming member is heated to a temperature higher than the melting point of the solder so that the molten solder powder in the solder paste form solder balls due to surface tension. The semiconductor chip is then moved toward the solder ball forming member to transfer the heated solder balls from the solder ball forming member to the semiconductor chip.

摘要翻译： 一种用于在半导体芯片上制造焊料凸块的方法。 制备具有平坦表面的焊球形成构件和以预定图案布置在平坦表面上的多个空腔。 然后用焊膏填充空腔，并将焊球形成构件加热到高于焊料熔点的温度，使得焊膏中的熔融焊料粉由于表面张力而形成焊球。 然后将半导体芯片移动到焊球形成部件，以将加热的焊球从焊球形成部件转移到半导体芯片。

公开(公告)号：US5643831A

公开(公告)日：1997-07-01

申请号：US547532

申请日：1995-10-24

申请人： Masayuki Ochiai ,  Hidefumi Ueda ,  Michio Sono ,  Ichiro Yamaguchi ,  Kazuhiko Mitobe ,  Koki Otake ,  Junichi Kasai ,  Nobuo Kamehara ,  Yasuo Yamagishi ,  Masataka Mizukoshi ,  Yutaka Yamada ,  Susumu Abe

发明人： Masayuki Ochiai ,  Hidefumi Ueda ,  Michio Sono ,  Ichiro Yamaguchi ,  Kazuhiko Mitobe ,  Koki Otake ,  Junichi Kasai ,  Nobuo Kamehara ,  Yasuo Yamagishi ,  Masataka Mizukoshi ,  Yutaka Yamada ,  Susumu Abe

IPC分类号： B23K3/06 ,  H01L21/48 ,  H01L21/60 ,  H01L21/68 ,  H05K3/34 ,  H01L21/283

CPC分类号： H05K3/3484 ,  B23K3/0623 ,  H01L21/4853 ,  H01L21/6835 ,  H01L24/11 ,  H01L2224/11003 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/15787 ,  H05K2201/10992 ,  H05K2203/0113 ,  H05K2203/016 ,  H05K2203/0338 ,  H05K2203/041 ,  H05K2203/1476 ,  H05K3/3463 ,  H05K3/3489

摘要： A method for fabricating a semiconductor device using a solder ball forming plate having cavities. The plate is made from a silicon plate having a flat surface in a crystallographic plane, and an orientation flat in a crystallographic plane. The cavities are formed on the flat surface of the plate by etching, using a mask having openings in the shape of rhombus arranged such that one side of the rhombus is generally parallel to the crystallographic plane. As a result, the cavities having wedge-shaped bottom are formed. The cavities are then filled with a solder paste and are heated to form solder balls in the cavities while the plate in an inclined position. The solder balls are then transferred from the plate to a semiconductor chip.

摘要翻译： 一种使用具有空腔的焊球形成板制造半导体器件的方法。 该板由具有<110>结晶平面中的平坦表面的硅板制成，并且在<1-11>晶面中平行取向。 通过蚀刻在板的平坦表面上形成空腔，使用具有菱形形状的开口的掩模，其布置成使得菱形的一侧大致平行于<1-11>晶面。 结果，形成了具有楔形底部的空腔。 然后用焊膏填充空腔，并在板中处于倾斜位置的同时加热以在空腔中形成焊球。 然后将焊球从板转移到半导体芯片。

公开(公告)号：US06528346B2

公开(公告)日：2003-03-04

申请号：US09749521

申请日：2000-12-28

申请人： Masayuki Ochiai ,  Hidefumi Ueda ,  Michio Sono ,  Ichiro Yamaguchi ,  Kazuhiko Mitobe ,  Koki Otake ,  Junichi Kasai ,  Nobuo Kamehara ,  Yasuo Yamagishi ,  Masataka Mizukoshi

发明人： Masayuki Ochiai ,  Hidefumi Ueda ,  Michio Sono ,  Ichiro Yamaguchi ,  Kazuhiko Mitobe ,  Koki Otake ,  Junichi Kasai ,  Nobuo Kamehara ,  Yasuo Yamagishi ,  Masataka Mizukoshi

IPC分类号： H01L2148

CPC分类号： B23K3/0623 ,  H01L21/4853 ,  H01L21/6835 ,  H01L24/11 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2224/11003 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/16 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01023 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/15787 ,  H01L2924/351 ,  H05K3/3463 ,  H05K3/3478 ,  H05K3/3484 ,  H05K3/3489 ,  H05K2201/10992 ,  H05K2203/0113 ,  H05K2203/016 ,  H05K2203/0278 ,  H05K2203/0338 ,  H05K2203/041 ,  H05K2203/043 ,  H05K2203/0557 ,  H05K2203/087 ,  H05K2203/1105 ,  H05K2203/1157 ,  H05K2203/1476 ,  H01L2924/00 ,  H01L2224/05599

摘要： First and second ball forming plates are prepared. The cavities of the first plate and the cavities of the second plate 20 are filled with solder paste, respectively. The first plate and the second plate are placed in a facing relationship to each other and heated to form metal balls each of which corresponds to the total metal components of the solder paste in one cavity of the first plate and one cavity in the second plate. The metal balls are formed in the cavities of the lower plate 10. The metal balls are transferred from the cavities of the first plate to a device on which bumps are to be formed.

摘要翻译： 制备第一和第二球形成板。 第一板的空腔和第二板20的空腔分别用焊膏填充。 第一板和第二板相互放置成面对的关系，并加热形成金属球，每个金属球对应于第一板的一个空腔中的焊膏的总金属成分和第二板中的一个空腔。 金属球形成在下板10的空腔中。金属球从第一板的空腔传送到要在其上形成凸块的装置。